EUV Source Workshop. Organization Committee. Agora 2, World Trade Center Barcelona, Spain, October 19, 2006

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1 EUV Source Workshop Agora 2, World Trade Center Barcelona, Spain, October 19, 2006 Organization Committee Vivek Bakshi (Chair, SEMATECH), Vadim Banine (ASML), Akira Endo (EUVA), Igor Fomenkov (Cymer), Hajime Kanazawa (Canon), Kazua Ota (Nikon), Joseph Pankert (Philips Extreme UV), Uwe Stamm (Xtreme technologies), Koichi Toyoda (EUVA) Thanks to Obert Wood (AMD) and Michael Goldstein / Zhiyu Zhang (Intel) for their help in the organization.

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3 Welcome to the EUV Source Workshop The EUV Source Workshop is one in a collection of single-focus industry meetings designed to increase global knowledge in key areas of semiconductor R&D As part of the SEMATECH Knowledge Series, this series focuses on accelerating solutions for critical challenges in the nanoelectronics industry For more details on other meetings in this series, please pick up one of our SEMATECH Knowledge Series flyers located at the registration area

4 Public Meeting Notice This meeting is classified as an Open Conference per the U.S. Export Administration Regulations. Confidential or Proprietary information may NOT be disclosed. All meeting attendees are permitted to take notes or otherwise make a personal record of these proceedings. Presentations and meeting summary will be available to the public, including posting on the SEMATECH public website:

5 EUV Source Workshop Agenda Part I: Commercial EUV Sources 07:00 Continental Breakfast 08:00 Welcome and Introduction Vivek Bakshi Session I: Technology Status Update Session Chair: Akira Endo (EUVA) 08:05 Update on Joint EUV Source Akira Miyake (Canon) Requirements 08:15 EUV Source Technology Status Update Vivek Bakshi (SEMATECH) Session II: Panel Discussion EUV Sources for HVM Moderator: Mike Lercel (SEMATECH/IBM) 08:30 08:40 08:50 Scanner Manufacturers ASML Canon Nikon Vadim Banine Shigeyuki Uzawa Susumu Mori 09:00 09:10 09:20 09:30 09:40 Break EUV Source Suppliers Cymer EUVA Philips Extreme UV Xtreme technologies Igor Fomenkov Akira Endo Joseph Pankert Uwe Stamm

6 EUV Source Workshop Agenda Part I: Commercial EUV Sources (cont) Session II: Panel Discussion EUV Sources for HVM Moderator: Vadim Banine (ASML) 09:55 10:05 10:15 10:25 10:35 10:45 10:55 11:05 End Users AMD IBM Intel NXP Qimonda Selete STM Toshiba Obert Wood Kurt Kimmel Yashesh Shroff Mart Graef Frank Goodwin Ichiro Mori Paolo Canestrari Tatsuhiko Higashiki

7 EUV Source Workshop Agenda Part II: R&D Topics on EUV Sources Session I: Debris Mitigation Technology Session Chair: Joseph Pankert (Philips Extreme) 11:15 Plasma Debris Interaction with Mitigation and Collector Systems A. Hassanein (ANL) 11:30 Collector Lifetime and Debris Specifications 11:45 Present and Future of EUV Collector Technology 12:00 Near Normal Incidence Collector for Easier and More Efficient Debris Mitigation D. Ruzic (UIUC) V. Rigato (Media Lario) R. Geyl (Sagem) 12:15 Lunch

8 EUV Source Workshop Agenda Part II: R&D Topics on EUV Sources Session II: Future Generation EUV Sources Session Chair: David Attwood (UC Berkeley) (A) FEL Based EUV Sources 13:15 Compact FEL Applications for EUV Lithography M. Goldstein (Intel) 13:30 Laser Readiness for all Optical EUV FEL A. Endo (EUVA) 13:45 Free Electron Laser as a Potential Source for EUV Lithography 14:00 Laser Seeded FEL R&D at the NSLS SDL and Its Potential Application for the EUV Generation M.V. Yurkov (DESY) X.J. Wang (BNL)

9 EUV Source Workshop Agenda Part II: R&D Topics on EUV Sources Session II: Future Generation EUV Sources Session Chair: Obert Wood (AMD) (B) New Concepts 14:15 Micro Discharge-Array Based EUV Sources 14:30 Some Aspects of ISAN/ASML Prototype DPP EUV Source B. Jurczyk (Starfire Industries) K. Koshelev (ISAN) 14:45 EUV Source Multiplexing M. Goldstein (Intel) 15:00 Fiber Laser Based EUV Sources A. Galvanskus (University of Michigan) 15:15 Update on Mass Limited Sn LPP Performance M. Richardson (UCF) 15:30 Break

10 EUV Source Workshop Agenda Part II: R&D Topics on EUV Sources Session III: Benchmarking Session Chair: Kurt Kimmel (IBM) (A) EUV Metrology Benchmarking 13:45 Beamline Benchmarking V. Bakshi (SEMATECH) 16:00 Benchmarking Absolute Out of Band (OOB) Measurements P. Dunne (UCD) (B) EUV Source Modeling Benchmarking 16:15 Benchmarking of HEIGHTS Simulation against LPP and DPP Discharge Experiments A. Hassanein (ANL) 16:30 Japanese Update on Sn LPP Benchmarking 16:45 Update on EUV Source Modeling Benchmarking A. Sunahara (University of Osaka) S. Zakharov (EPPRA) 17:00 Status of Modeling Benchmarking K. Nishihara (University of Osaka) 17:15 EUV Source Workshop Summary V. Bakshi (SEMATECH)

11 World Trade Center Ground Floor Auditorium Symposium CIC 1 = Resist TWG CIC2 = Mask WS Agora Source WS Port Vell 2 Optics TWG Optics WS

12 Important Information Lunch, Poster Session and Reception are in Agora 2 room (next door) Please place all pagers and/or cell phones on vibrate mode only or turn them off For any speaker questions see Mario Gonzales or Connie Reed at the projection table