Multilayer Collector Optics for Water Window Microscopy

Transcription

1 Multilayer Collector Optics for Water Window Microscopy 2015 International Workshop on EUV and soft X-Ray Sources Torsten Feigl 1, Hagen Pauer 1, Tobias Fiedler 1, Marco Perske 1, Holger Stiel 2,3, Christian Seim 2,3, Aurélie Dehlinger 2,4, Anne Blechschmidt 2,4 1 optix fab GmbH, Jena 2 Berlin Laboratory for Innovative X-ray Technologies 3 Max-Born Institute, Berlin 4 Technical University Berlin Dublin, November 11, 2015

2 Outline Introduction EUV multilayer optics activities Microscopy in the water window Summary 2 I 2015 International Workshop on

3 Outline Introduction EUV multilayer optics activities Microscopy in the water window Summary 3 I 2015 International Workshop on

4 History of optix fab. 1997: Start of EUV multilayer Fraunhofer IOF 2000: First paper at SPIE Microlithography on Mo/Si multilayer mirrors 2002: Start of cooperation with semiconductor industry: ASML, Cymer, Intel, Jenoptik, Schott Lithotec, Zeiss, etc. 2009: Coating of first NXE:3100 collector mirror 2011: Development of collector refurbishment technologies 4 I 2015 International Workshop on

5 History of optix fab. 1997: Start of EUV multilayer Fraunhofer IOF 2000: First paper at SPIE Microlithography on Mo/Si multilayer mirrors 2002: Start of cooperation with semiconductor industry: ASML, Cymer, Intel, Jenoptik, Schott Lithotec, Zeiss, etc. 2009: Coating of first NXE:3100 collector mirror 2011: Development of collector refurbishment technologies 2012: Foundation of Fraunhofer IOF spin-off company optix fab. 2013: August 1 st : Operations optix fab. Nov 11, 2015: Delivery of 3708 EUV and X-ray mirrors to customers 5 I 2015 International Workshop on

6 optix fab. organization Mission: Address: URL: Fabrication of customized EUV optics and optical components for EUV 13.5 nm, for EUV, soft and hard X-ray applications, synchrotron and FEL beamlines, metrology, R&D, HHG sources, etc. optix fab GmbH Hans-Knöll-Str. 6 D Jena Team: Torsten Feigl Marco Perske Hagen Pauer Tobias Fiedler 6 I 2015 International Workshop on

7 Outline Introduction EUV multilayer optics activities Microscopy in the water window Summary 7 I 2015 International Workshop on

8 Multilayers for 13.5 nm R = % l = nm FWHM = nm AOI = 5 deg. Berlin 8 I 2015 International Workshop on

9 Broadband Multilayers for nm R ~ 20 % l = nm FWHM = 3.86 nm AOI = 30 deg. Berlin 9 I 2015 International Workshop on

10 Beamsplitters for 13.5 nm R = 29.0 % T = 21.5 % l = 13.5 nm AOI = 45 deg. Berlin 10 I 2015 International Workshop on

11 Multilayers for the water window Berlin 11 I 2015 International Workshop on

12 Multilayers for 8 12 nm Wavelength AOI Reflectance FWHM 8.0 nm 5 deg 32.2 % 0.08 nm 9.0 nm 5 deg 36.0 % 0.11 nm 10.0 nm 5 deg 39.9 % 0.15 nm 11.0 nm 5 deg 46.3 % 0.23 nm 12.0 nm 5 deg 49.1 % 0.33 nm Berlin 12 I 2015 International Workshop on

13 Multilayers for nm 13 I 2015 International Workshop on Wavelength AOI Reflectance FWHM nm 5 deg 50.0 % 0.33 nm nm 5 deg 50.7 % 0.60 nm nm 5 deg 51.9 % 0.61 nm nm 5 deg 45.3 % 0.47 nm

14 Narrowband Multilayers for nm Wavelength AOI Reflectance FWHM ML Design 14 I 2015 International Workshop on 30.0 nm 5 deg 36.1 % 2.17 nm 30.0 nm 15 deg 11.5 % 0.60 nm narrow band 37.9 nm 15 deg 36.7 % 3.28 nm 38.0 nm 15 deg 7.4 % 0.86 nm narrow band Berlin

15 Multilayers for nm Wavelength AOI Reflectance FWHM 41.5 nm 1.5 deg 35.6 % 3.86 nm 52.4 nm 1.5 deg 31.5 % 4.25 nm Berlin 15 I 2015 International Workshop on

16 Mirrors for nm R > 30.0 % l = nm AOI = 1.76 deg. Berlin 16 I 2015 International Workshop on

17 Mirrors for nm R > 80.0 % l = nm AOI = 1.76 deg. Berlin 17 I 2015 International Workshop on

18 Gold coated synchrotron optics 18 I 2015 International Workshop on

19 EUV optics made by optix fab 19 I 2015 International Workshop on

20 Outline Introduction EUV multilayer optics activities Microscopy in the water window Summary 20 I 2015 International Workshop on

21 Water window microscopy 10 penetration depth [ m] water protein LiPF 6 Si F O N C B S P Si wavelength [nm] 21 I 2015 International Workshop on

22 Laboratory Transmission X-ray Microscope (LTXM) 22 I 2015 International Workshop on

23 Slab laser system pulse energy pulse duration repetition rate average power wavelength up to 100 mj ns 1.3 khz > 130 W 1064 nm M² 3 (horiz. axis) 23 I 2015 International Workshop on

24 Liquid nitrogen jet target system Laser beam focus Horizontal: Vertical: 10.5 ± 0.5 m 11.4 ± 0.5 m 24 I 2015 International Workshop on

25 Laboratory Transmission X-ray Microscope (LTXM) 25 I 2015 International Workshop on

26 Current water window multilayer collector: optical performance 26 I 2015 International Workshop on

27 Multilayer development for water window collector 27 I 2015 International Workshop on

28 New multilayer collector mirror: EUV reflectance at different radii 28 I 2015 International Workshop on

29 Collector mirror: Peak reflectance at different positions 29 I 2015 International Workshop on

30 Collector mirror: Center wavelength at different positions 30 I 2015 International Workshop on

31 Collector mirror: Reflectance mapping at l = nm R = 3.66 % l = nm FWHM = nm AOI = 1.5 deg. 31 I 2015 International Workshop on Berlin

32 Laboratory Transmission X-ray Microscope: Resolution C. Seim, H. Legall, H. Stiel et al SPIE (2013) 8678, I 2015 International Workshop on

33 Laboratory Transmission X-ray Microscope: Biological Imaging Cryo fixated yeast cells (Saccharomyces cerevisiae) with 250 nm Gold nanoparticles 33 I 2015 International Workshop on

34 Laboratory Transmission X-ray Microscope: Biological Imaging 34 I 2015 International Workshop on

35 Laboratory Transmission X-ray Microscope: Biological Imaging 35 I 2015 International Workshop on

36 Outline Introduction EUV multilayer optics activities Microscopy in the water window Summary 36 I 2015 International Workshop on

37 Summary Fabrication of customized EUV and VUV multilayer optics from 2 nm to 200 nm Development of new and high-reflective multilayer for nm Multilayer reflectance: R = nm (V absorption edge) Multilayer reflectance: R = nm (N 2 emission) Collector reflectance: R = nm Factor of 10 improvement! 37 I 2015 International Workshop on

38 Acknowledgements Fraunhofer IOF: Thomas Müller, Michael Scheler, Steffen Schulze PTB Berlin: Frank Scholze, Christian Laubis and team Charité Berlin: Martina Meinke, Kay Raum, ATB: Kai Reinecke HZB: Gerd Schneider, Stefan Rehbein Fraunhofer ILT: Marco Hoeffer, Dominik Esser AXILON: Urs Wiesemann, Wolfgang Diete KTH: Hans Hertz 38 I 2015 International Workshop on

39 Thank you.

40 optix fab.