Light Source Technology Advances to Support Process Stability and Performance Predictability for ArF Immersion Double Patterning
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1 Light Source Technology Advances to Support Process Stability and Performance Predictability for ArF Immersion Double Patterning Ivan Lalovic, Rajasekhar Rao, Slava Rokitski, John Melchior, Rui Jiang, Mary Haviland, Theodore Cacouris, Daniel Brown Cymer Inc. October 20, 2011
2 OUTLINE Report on field performance of the XLR 600ix light source in double patterning environment for further improvements in light-source performance and productivity Field results of new chamber technology performance Field results of new gas management technology Process application of laser Focus Drilling for process DoF enhancement 2
3 OUTLINE Report on field performance of the XLR 600ix light source in double patterning environment for further improvements in light-source performance and productivity Field results of new chamber technology performance Field results of new gas management technology Process application of laser Focus Drilling for process DoF enhancement 3
4 LIGHT SOURCE CONTRIBUTION TO LITHO CELL OPERATION Light-source Performance Double Patterning Requirement Energy stability Wavelength stability Bandwidth stability Beam stability Laser Power Stability of performance parameters Scheduled downtime CD control & Overlay control Throughput Availability Process Performance Litho Cell Productivity Cymer s XLR TM 600ix laser systems were introduced last year and have demonstrated high performance, flexibility, and reliability in immersion double patterning lithography environment. 4
5 Uptime [%] Relative Efficiency LIGHT SOURCE PLATFORM FOR DOUBLE PATTERNING High power capability enables higher throughput and supports using optimum power when desired / necessary: 60W -> 75W -> 90W Efficient light source platform. Stable and predictable performance reduces downtime; installed-base uptime greater than 99.7% XLR 600ix XLA 300/400 50% increase in relative efficiency XLA-300/400 XLR-600ix Q1 Q4 Q2 Q3 Q4 Q1 Q2 Q3 Year 2010 The XLR 600ix is the platform for reduced CoO to enable immersion double patterning XLA W XLA W XLR 600ix 90W 5
6 Dose Error (%) STABLE & PREDICTABLE PERFORMANCE WITH XLR TM 600ix Field performance of Cymer s XLR TM 600ix operating at 90W: Dose stability Bandwidth stability Wavelength stability CD control & Overlay control 90W operation at a memory fab Cymer introduced PowerOptics TM to enable long life operation at 90W. New optics materials and coatings were developed specifically for high power operation. Thermally stable amplifier ring design provides passive beam stability even at high thermal loads from 90W operation. Field data confirms stable and predictable performance at 90W Q1 Q2 Q3 Q4 6
7 OUTLINE Report on field performance of the XLR 600ix light source in double patterning environment for further improvements in light-source performance and productivity Field results of new chamber technology performance Field results of new gas management technology Process application of laser Focus Drilling for process DoF enhancement 7
8 Chamber characteristic Uptime % UPTIME IMPROVEMENT WITH NEW CHAMBER TECHNOLOGY Electrode erosion is one of the key mechanisms that limits discharge chamber lifetime and causes performance variation during life. By maintaining a constant electrode gap: chamber aging mechanism is mitigated predictable end of life (EOL) stable performance through life % 99.80% Average uptime increase realized in the field Old chamber 13-Week Uptime Average New chamber 99.60% 99.40% 99.20% 99.00% Data population: 78 systems Performance limit Old chamber New Chamber Stable performance Time Weeks from L3 Implementation To date there are ~250 systems upgraded with this new chamber The 0.3% increased system availability directly translates to greater than 24 hrs of additional productive time per year 8
9 OUTLINE Report on field performance of the XLR 600ix light source in double patterning environment for further improvements in light-source performance and productivity Field results of new chamber technology performance Field results of new gas management technology Process application of laser Focus Drilling for process DoF enhancement 9
10 IMPROVED PRODUCTIVITY WITH iglx TM GLX (gas life extension) was introduced to improve uptime iglx is Cymer s latest advancement in gas management technology that: Further extends gas life duration to 4 Bp (refill interval ~ 7 30 Bp/year) Enables automated gas optimization Reduced fluorine-mix gas usage = Refill Field test (beta) By using advanced model-based techniques, the accuracy and repeatability of chamber gas concentration greatly improve performance stability Cymer s iglx takes advantage of the predictable performance of the new chamber technology Gas management-related down time is further reduced Average F 2 Gas Usage 1 Metric GLX iglx % saving F 2 /day % F 2 /Mp % 1 Includes refills and injects Further increased system availability and tool productivity 10
11 OUTLINE Report on field performance of the XLR 600ix light source in double patterning environment for further improvements in light-source performance and productivity Field results of new chamber technology performance Field results of new gas management technology Process application of laser Focus Drilling for process DoF enhancement 11
12 Exposure Latitude % LASER FEATURE: ENABLING FOCUS DRILLING Litho tool challenge: Decreasing process window area for contact layers Desired State: Increase DoF without adversely impacting CDU / MEEF / EL in advanced immersion litho tools Light sources used in photolithography usually require narrow and stable bandwidth, to support achieving the necessary CD uniformity. Reduced process latitudes in advanced patterning applications result in CD control challenges. Cymer has developed Focus Drilling technology to support a larger process window for patterning of contact and via structures Simulation 1.35 NA ArFi Soft Annular Illumination Nominal BW Focus Drilling 1.3pm E DOF (nm) Laser Solution: Focus Drilling: Enable capability to broaden light source bandwidth 12
13 Exposure Latitude % LASER FEATURE: ENABLING FOCUS DRILLING Litho tool challenge: Decreasing process window area for contact layers Desired State: Increase DoF without adversely impacting CDU / MEEF / EL in advanced immersion litho tools Light sources used in photolithography usually require narrow and stable bandwidth, to support achieving the necessary CD uniformity. Reduced process latitudes in advanced patterning applications result in CD control challenges. Cymer has developed Focus Drilling technology to support a larger process window for patterning of contact and via structures Simulation 1.35 NA ArFi Soft Annular Illumination Nominal BW Focus Drilling 1.3pm E DOF (nm) Laser Solution: Focus Drilling: Enable capability to broaden light source bandwidth Litho process performance improvements enabled by laser features Increased DoF is achieved by operating the light source at the desired bandwidth with a modest tradeoff in exposure latitude for contact and via layers. Wafer exposures confirm simulation results. 0.7 pm 0.9 pm 1.0 pm 1.2pm Lalovic et al, SPIE 11 Paper Data courtesy ASML 13
14 LASER FEATURE: ENABLING FOCUS DRILLING Demonstrated stable wafer measurement of focus and process DoF Lalovic et al, SPIE 11 Paper Stable lithography process performance improvements enabled by laser focus drilling in field installations Stability performance equivalent to nominal laser operation 14 Data courtesy ASML
15 FOCUS DRILLING: BROAD BANDWIDTH TUNABILITY Novel improvements have been integrated into the line narrowing module (LNM) to now provide a wide spectral bandwidth tuning range. Process latitude / OPE Advanced metrology methods have been incorporated into the bandwidth analysis module (BAM) to support accurate spectral measurements over the wider range. Process repeatability Convolved bandwidth (CBW) is a spectral metric derived from the convolution of the aerial image function with the source spectral shape. Control algorithms have been developed to integrate feedback stabilization to the desired target value of any derived BW metric including CBW shown here. CDU & Yield 15
16 SUMMARY Cymer s XLR TM 600ix laser systems consistently demonstrate high performance and reliability in high volume double patterning manufacturing environment Innovative technologies, such as iglx and new chamber technology, enable XLR 600ix to meet higher productivity requirements over longer operation time» Increase productivity Flexible design architecture of Cymer s XLR TM laser systems support novel features: eg. focus drilling» Increase process latitude 16
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