Optics for EUV Production

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Horatio Jacobs
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Muellender, Martin Lowisch, Oliver Natt, Wolfgang Seitz, Franz-Josef Stickel,

1 Optics for EUV Production NXE 3100 NXE 3300 Olaf Conradi, Peter Kuerz, Ralf Arnold, Thure Boehm, Joachim Buechele, Manfred Dahl, Udo Dinger, Hans-Juergen Mann, Stephan Muellender, Martin Lowisch, Oliver Natt, Wolfgang Seitz, Franz-Josef Stickel, Thomas Stein, Bernd Thüring, Gero Wittich, Ralf Wichard, Christoph Zaczek, Winfried Kaiser

2 Agenda Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 2

3 Agenda Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 3

4 EUV program at MET (Micro Exposure Tools) ADT (NA=0.25) (α-demo Tool) Starlith 3100 (NA=0.25) Starlith 3300 (NA=0.33) Strong commitment to EUV technology: a continuous EUV development program is established since more than 15 years at Carl Zeiss 4

5 The optical train Introduction λ 13.5 nm NA 0.25 / 0.33 Field 26 x 33 mm² Mag 4x intermediate focus field facet mirror illuminator reticle projection optics plasma source pupil facet mirror collector wafer 5

6 Agenda Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 6

7 NXE 3100 Six complete systems shipped to ASML 7

(uncorrected) field normalized normalized intensity intensity 100.0 100.0 80.0 80.0 60.

8 NXE 3100 Six illumination systems qualified Parameter Measured Pupil Transmission Uniformity (un-corrected) Telecentricity [Tx/Ty] (wafer level) Ellipticity [E90/E45] Example: Uniformity (uncorrected) field normalized normalized intensity intensity uncorrected ±1% corrected: < ±0.5% field field position position [mm] [mm] 8

9 NXE 3100 Six projection optics qualified wave front aberrations rms [nm] prototype lens RMS(Z5-Z37) RMS(spherical) RMS(coma) RMS(ast) RMS(3-foil) Lens 2 to 6 are very similar tools 9

10 NXE 3100 Flare is well in Specification for all delivered systems 10 8 flare [%] tools 10

11 Agenda Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 11

12 NXE Prequalification Illuminator already shipped to ASML 12

13 NXE Off-axis illumination enables lossless setting changes annular dipole x dipole y 13

NXE 3300 - Facet Performance - PF Reflectivity Mean reflectivity

14 NXE Facet Performance - PF Reflectivity Mean reflectivity of pupil facets is well above design target. acceptance range 14

15 NXE Facet Performance - PF Reflectivity Peak wavelength is well centered around design target. acceptance range 15

16 Illuminator qualification spilt up in geometric and energetic alignment geometric alignment example 3100 example 3100 energetic alignment 16

17 and are ready for qualification visible metrology cabin EUV qualification chamber ready for illuminator qualification 17

NXE 3300 - Functional tests on first illuminator with a limited number of field facets

18 NXE Functional tests on first illuminator with a limited number of field facets annular dipole x dipole y First switching of field facets as functional test of illuminator 18

19 Agenda Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 19

20 NXE 3300 Projection optics design for NA Enabling for for higher higher NA: NA: Larger Larger mirror mirror sizes sizes Slit width 26mm MAG = 4x CRAO = 6 significantly steeper aspheres NA 0.25 NA 0.33 schematic designs for illustration only. Full field 6 mirror designs can be extended to NA

21 NXE 3300 Projection Optics Surface figure in Specification achieved surface quality rms = 0.1 nm residual error [nm] residual error internal target 21

NXE 3300 Projection Optics First mirrors are well in flare specification and more than 60 mirrors in production! 0.30 MSFR [nm rms] 0.25 0.20 0.15 0.10 ADT 3100 3300 0.05 0.

22 NXE 3300 Projection Optics First mirrors are well in flare specification and more than 60 mirrors in production! 0.30 MSFR [nm rms] ADT Dez Dez Dez Dez Dez Dez Dez Dez Dez 11 [year] MSFR 3100 average 102 pm 3100 Champion 59 pm First 3300 mirrors 78 pm 52 pm First results on 3300 mirrors well below the 6% flare Specification - 4% (below a 2µm line) can be expected 22

23 NXE 3300 Projection Optics Coating Results of first POB mirrors Wavelength matching: Δλ: 0,2% (target: 0.2%) Reflectivity: R: target + 1.2% Homogeneity ΔR max : 5 (target. 0.4%) 23

24 Agenda Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 24

7 6 mirrors central obscured 8 mirrors unobscured central

25 We see design solutions for high NA systems enabling 11 nm resolution and beyond NA x mirrors central obscured 8 mirrors unobscured central obscured 27 nm NXE: nm NXE: nm 8 nm schematic designs for illustration only. 25

26 Summary 1 NXE 3100 Program six systems are delivered to ASML all key performance parameter are within specification optics fulfills requirements for 27 nm hp and enables R&D for the 22 nm node 2 NXE 3300 Projection Optics more than 60 mirrors in production 4% flare expected based on current mirror quality first mirrors successfully coated 3 NXE 3300 Illumination System pre-qualification Illuminator already shipped to ASML metrology tools ready for qualification of first system first tests on flexible fly s eye successful 26

27 ACKNOWLEDGEMENT Thanks to the EUV teams at ASML and Carl Zeiss SMT and our partners We gratefully acknowledge funding from the German Federal Ministry of Education and Research (BMBF) in the framework of the CATRENE program (13N10567, CT301 EXEPT ) 27

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Optics for EUV Lithography

Optics for EUV Lithography Dr. Sascha Migura, Carl Zeiss SMT GmbH, Oberkochen, Germany 2018 EUVL Workshop June 13 th, 2018 Berkeley, CA, USA The resolution of the optical system determines the minimum