Recent Developments in Laser Microprocessing Technologies for Manufacturing Applications

Transcription

1 Recent Develpments in Laser Micrprcessing Technlgies fr Manufacturing Applicatins J.P.H Burt 1,2, A.D Gater 1, A.Menachery 2, R.Pethig 2 and N.H. Rizvi 1 1 UK Laser Micrmachining Centre. 2 Schl f Infrmatics, University f Wales Bangr. AILU Industry Technlgy Prgramme Phtn 06 Cnference, 4 September 2006

2 Established under DTI s Micr & Nan Technlgy Manufacturing Initiative in Prvider f cmmercial state f the art laser micrmachining services t industry and research. Applicatins develpment wrk. Feasibility studies. Prduct prttyping. Batch prductin.

3 LASERS IN MANUFACTURING Laser micrmachining a versatile, pwerful & mature ptin fr many manufacturing applicatins. Many sectrs e.g. displays, bitech, pt/micr electrnics rely n laser prcesses fr current and future prductin requirements. Key drivers fr laser prcessing being adpted int manufacturing envirnments: technical advantage scalable prcesses autmatin capabilities ecnmic drivers Unique blend f features. Advantages ver cmpeting methds.

4 MICROELECTRONICS & PCBs Ultra high speed drilling f via hles. Autmated prcessing f wafers and bards. LPKF Tl pictures curtesy f Exitech Limited.

5 DISPLAYS & PHOTOVOLTAICS Black matrix (LCDs) Tin Oxide (FPDs) All pictures curtesy f Exitech Limited.

6 PHOTONICS & OPTOELECTRONICS Optical fibre devices. Stripping, cutting, shaping & cleaving. Autmated r semiautmated prcesses. All pictures curtesy f Dr. Mike Osbrne, Optek Systems

7 MANUFACTURING OPTIONS Wide range f laser ptins: applicatin specific prcess develpment necessary. Manufacturing requirements include issues such as part handling, cmpatibility with nn laser steps and packaging. Experience gained in ne industry can pen up ptins fr ther manufacturing tasks. Sme ptential high vlume manufacturing ptins fr bitech prducts likely t benefit frm develpments made in phtnics industries, e.g. pick and place systems multi axis alignment & handling ultra high precisin visin and metrlgy

8 MICROTITRE PLATES Micrtitratin ( micrtitre ) plates cmmn in analytical bimedical and bichemical fields. Multiple wells (6, 24, 96, 384, 6144) in each plate allw fr parallel mnitring f different prcesses autmated handling and diagnsis f micrtitre plates is rutine. New requirements in bilgical testing require electrkinetics use f electrical fields t manipulate, characterise and analyse cells. Require electrkinetic plates cmpatible with standard micrtitre type systems new diagnstics, existing platfrms.

9 DESIGN OF ELECTROKINETIC MICROTITRE PLATES Micrscpe slide with 6 wells (75mm x 25mm substrate) Grey clur dentes electrde material Va Vb 400µm Vc Vc Electrdes with lead uts fr edge cnnectrs Detail shwing quadrature plynmial electrdes Electrdes energised with sinusidal vltages t prduce nn unifrm r rtating AC fields.

10 DESIGN OF ELECTROKINETIC MICROTITRE PLATE WELLS Well is required ver each active electrde regin Glass HC Glass ITO cated glass Plymer CL Plymer Adhesive Cnstraining chamber (CL) Cnfines cells within effective vlume f electric fields (~40nL). Hlding chamber (HC) Fr dispensing f fluid cntaining cells (~50µL). Active electrde regin

11 FABRICATION OF ELECTRODES Glass substrate bicmpatible, strng, ptically transparent. ITO electrdes gd cnductin, allw ptical imaging and lighting. Tw stage patterning prcess using excimer laser. Stage 1: active electrde regin prduced by mask scanning. Stage 2: cnnecting electrdes prduced by direct writing. ITO remval: 248nm, 1.5J/cm 2, 5 shts. Active electrdes prduced in ~10sec. Laser machined ITO plynmial electrdes, als shwing utline f cntainment chamber.

12 FABRICATION OF CHAMBERS Cntainment Chamber plymer sheet with dual adhesive layers. Hlding Chamber glass slide. Hles in chambers made using Ti:sapphire laser: 800nm, 5kHz, 120fs, 20µm spt size. Cvering layers aligned ver active electrde areas and pressurebnded using adhesive. ASSEMBLED PLATE Laser machined 6 well device shwing electrdes fr edge cnnectrs at bttm and 6 wells at tp.

13 OPERATION OF ELECTROKINETIC MICROTITRE PLATES Edge f plynmial electrde The crralling f latex micrbeads by negative dielectrphresis. Differential dielectrphresis shwing latex micrbeads crralled by negative dielectrphresis with simultaneus cllectin f yeast cells by psitive dielectrphresis.

14 HIGH VOLUME MANUFACTURING Electrkinetic multi well micrtitre plates can be made using laser micrmachining methds and standard manufacturing equipment: autmated laser prductin equipment. prduct specific plate designs (different electrdes & wells). autmated handling f cver plates. autmated alignment, bnding and electrical testing. High speed laser and handling prductin lines already in peratin wrldwide (e.g. ink jet printers, prduct marking, CD prductin etc.). N practical limitatins t high vlume prductin f plates.

15 SUMMARY An electrkinetic micrtitre multi well plate has been prduced using laser micrmachining prcesses and tested. Prductin f such micrtitre plates using high vlume manufacuring methds will be typical fr emerging applicatins, especially in bitech fields. Laser manufacturing cntinues t expand int new applicatin areas. Mature prcesses already exist fr high precisin prductin and new nes are cntinually being develped.

16 CONTACT DETAILS: Dr. Nadeem Rizvi General Manager, UK LMC E: lmc.c.uk T: lmc.c.uk