Modern Optics. Analytical Potential. 3 rd Generation of MIRA FE SEMs. High brightness Schottky emitter for high-resolution/highcurrent/

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2 Modern Optics High brightness Schottky emitter for high-resolution/highcurrent/ low-noise imaging Unique three-lens Wide Field Optics TM design offering a variety of working and displaying modes Proprietary Intermediate Lens (IML), which works as an aperture changer, changing the effective final aperture electromagnetically. Real time In-Flight Beam Tracing TM for performance and beam optimization, integrated with the well-established software Electron Optical Design. It also includes direct and continuous control of the beam and beam current. Extraordinary resolution with powerful optional In-Beam Detector Fully automated electron optics set-up and alignment Fast imaging rate Unique live stereoscopic imaging using advanced 3D Beam Technology opens up the micro and nano-world for an amazing 3D experience and 3D navigation. Analytical Potential 3 rd Generation of MIRA FE SEMs This new generation of MIRA field emission scanning electron microscopes provides users with the advantages of the latest technology, such as new improved high-performance electronics for faster image acquisition, an ultra-fast scanning system with compensation for static and dynamic image aberrations or built-in scripting for user-defined applications, all the while maintaining the best price to performance ratio. The MIRA series was designed with respect to a wide range of SEM applications and needs in today s research and industry. Its excellent resolution at high beam currents has proved to be advantageous for analytical applications such as EBSD, WDX, etc. MIRA3 field emission scanning electron microscopes are manufactured in configurations with LM, XM and GM chambers. All MIRA chambers (LM, XM and GM) provide superior specimen handling using a full 5-axis motorized compucentric stage and ideal geometry for EDX and EBSD. Option of extra-large chambers (XM, GM) with robust stage able to accommodate large samples Numerous interface ports with optimized analytical geometry for EDX, WDX and EBSD as well as for attaching many other detectors First-class YAG scintillator-based detectors Selection of optional detectors and accessories Full operating vacuum can be obtained quickly and easily with powerful turbomolecular and dry fore vacuum pumps, electron gun pumping with an ion pump Investigation of non-conductive samples in variable pressure mode versions, excelent results in the investigation of magnetic samples Several options for chamber suspension type ensure effective reduction of ambient vibrations in the laboratory. PERFORMANCE IN NANOSPACE

3 Rapid Maintenance Keeping the microscope in peak condition is now easy and requires a minimum of microscope downtime. Every detail has been carefully designed to maximize microscope performance and minimize operator effort. Automated Procedures Automatic set-up of the microscope and many other automated operations are characteristic features of the equipment. There are many other automated procedures which reduce the operator s tune-up time significantly, enable automated manipulator navigation and automated analyses. Built-in scripting language (Python) enables remote access to most software features, including complete microscope remote control, stage control, image acquisition, processing and analysis. Scripting enables users to define their own automatic procedures. User-Friendly Software Multi-user environment is localized in many languages. Four levels of user expertise/rights, including an EasySEM mode for quick routine investigations Image management and report creation Built-in self-diagnostics for system readiness checks Network operations and remote access/diagnostics Software Tools Modular software architecture enables several extensions to be attached. Basic set of plug-ins, such as Measurement, Image Processing, Object Area available as standard Several optional modules or dedicated applications optimized for automatic sample examination procedures, such as Particles Basic/Advanced Analysis or 3D surface reconstruction, etc. Software Tools Image Processing and Operations Measurement Object Area Hardness Tolerance Multi-Image Calibrator Switch-Off Timer 3D Scanning Positioner EasySEM Scriptor Live Video Particles Basic Particles Advanced Image Snapper DrawBeam Basic DrawBeam Advanced Sample Observer TESCAN TRACE GSR EasyEDX Integration Software 3D Metrology (MeX) * Fig. Pollen grain measurement standard, option, * third-party dedicated software by Alicona Imaging GmbH Fig. Measurement tool

4 MIRA3 Configurations MIRA3 LMH WDX TOA EDX TOA 35 This large-chamber model with an extended motorized manipulator operates at high vacuum for the investigation of conductive samples with extraordinary imaging quality. EDX TOA WD 15 EBSD WDX TOA 30 MIRA3 LMU This variable-pressure FE SEM supplements all the advantages of the high vacuum model with extended facilities for low vacuum operation, enabling the investigation of non-conductive specimens in their natural uncoated state. WD 10 LM Chamber WDX TOA 30 EDX TOA top view - full configuration Internal size Door width Number of ports mm 148 mm BSE / CL Chamber suspension pneumatic or optional active vibration isolation WD 10 Specimen In-Beam SE Stage in LM Chamber Type compucentric top view - full configuration Movements 5-axis fully motorized X = 80 mm, Y = 60 mm, Z = 47 mm iguration BSE / CL In-Beam SE Specimen height Rotation = 360 continuous LVSTD Tilt = -80 to +80 maximum 81 mm (without rotation stage) In-Beam SE WDX TOA 35 /30 LVSTD IR Camera EBSD EDX TOA 35 WDX TOA 35 /30 SE position #1 LVSTD EDX TOA 35 /30 EBSD EDX TOA 35 SE position #2 SE position #1 EBSD EDX TOA EDX 35 /30 TOA 35 IR Camera 148 Door SE position #2 IR Camera 148 Door SE position #2 Fig. Filamentous blue-green alage (family Oscillatoriaceae) May cause water bloom in fresh water, SE detector, SEM HV 8kV

5 The XM and GM configurations extend its analytical capabilities, providing the ability to perform fine sample surface observations even with extra-large specimens. In today s microscopy there are many applications where breaking off a small piece of the sample is impossible or highly inconvenient, particularly in situations where further analysis of the object is needed or in e.g. forensic applications so as not to affect the evidence. In all these cases, accommodation of the whole object into the chamber is extremely desirable. MIRA3 XMH This extra-large chamber model with compucentric motorized manipulator operates at high vacuum for the investigation of conductive samples with extraordinary imaging quality. MIRA3 XMU This variable-pressure FE SEM supplements all the advantages of the high vacuum model with an extended facility for low vacuum operations, enabling the investigation of non-conductive specimens in their natural uncoated state. XM Chamber Internal size Door width Number of ports 12+ Chamber suspension 285 mm (width) x 340 mm (depth) 285 mm (width) x 320 mm (height) pneumatic or optional active vibration isolation Specimen Stage in XM Chamber Type Movements compucentric 5-axis fully motorized X = 130 mm, Y = 130 mm, Z = 100 mm Rotation = 360 continuous Tilt = -30 to +90 Specimen height maximum 145 mm

6 55 WDX TOA 35 Besides the ability to investigate the sample surface with extra-large specimens, the GM chamber extends the features of MIRA3 FE SEMs with the option of attaching many other detectors and accessories to the chamber from the outside (additional SE, BSE, LVSTD, EDX, EBSD) and also with the capability of accommodating various additional instruments, inside the chamber. EBSD EDX TOA 35 WD MIRA3 GMH This analytical giant-chamber model with compucentric motorized manipulator operates at high vacuum for the investigation of conductive samples with the possibility of supplementing scanning electron microscopy investigations with microanalyses and/or other methods. MIRA3 GMU 340 This variable pressure FE SEM supplements all the advantages of the high-vacuum model with an extended facility for low-vacuum operations, enabling the investigation of non-conductive specimens in their natural uncoated state. The giant analytical chamber enables scanning electron microscopy investigations to be supplemented with microanalyses and/or other methods. GM Chamber Internal size 340 mm (width) x 310 mm (depth) Door width 340 mm (width) x 320 mm (height) Number of ports 20+ Chamber suspension Integrated active vibration isolation system Specimen Stage in GM Chamber Type compucentric Movements 5-axis fully motorized X = 130 mm, Y = 130 mm, Z = 100 mm Rotation = 360 continuous Tilt = -30 to +90 Specimen height maximum 145 mm

7 MIRA3 Resolution In high-vacuum mode SE In high-vacuum mode In-Beam SE In low-vacuum mode LVSTD In high/low vacuum mode BSE Working vacuum Chamber High vacuum mode Chamber Low vacuum mode Gun vacuum Electron optics working modes High-vacuum mode Low-vacuum mode Magnification Maximum field of view Accelerating voltage Electron Gun Probe current LMH/XMH/GMH 1.2 nm at 30 kv 2.5 nm at 3 kv 1 nm at 30 kv 2 nm at 3 kv 2 nm at 30 kv (BSE) < 9 x 10-3 Pa* < 3 x 10-7 Pa Resolution, Depth, Field, Wide Field, Channelling Continuous from 3.5x to 1,000,000x in LM chamber 2x to 1,000,000x in XM chamber 2x to 1,000,000x in GM chamber High vacuum: 72/91/91 mm in basic configuration 57/78/78 mm with In-Beam SE 200 V to 30 kv High Brightness Schottky Emitter 1pA to 100 na 1.2 nm at 30 kv 2.5 nm at 3 kv 1 nm at 30 kv 2 nm at 3 kv 1.5 nm at 30 kv 3 nm at 3 kv 2 nm at 30 kv < 9 x 10-3 Pa* Pa < 3 x 10-7 Pa LMU/XMU/GMU * pressure < 5x10-4 Pa reachable Resolution, Depth, Field, Wide Field, Channelling Resolution, Depth Continuous from 3.5x to 1,000,000x in LM chamber 2x to 1,000,000x in XM chamber 2x to 1,000,000x in GM chamber High vacuum: 72/91/91 mm in basic configuration 57/78/78 mm with In-Beam SE Low vacuum: 15/20/20 mm in basic configuration 8.2/10.9/10.9 mm with In-Beam SE Scanning speed Focus window Scanning features Image size Microscope control Automatic procedures Remote control From 20 ns to 10 ms per pixel adjustable in steps or continuously Shape, size and position continuously adjustable Dynamic focus, Point & Line scan, Tilt correction, 3D Beam, Other shapes accessible using optional DrawBeam Software tool Up to 8,192 x 8,192 pixels in 16-bit quality, size is adjustable separately for live images (in 3 steps) and for saved images (in 10 steps), for square and rectangular 4:3 or 2:1 aspect ratios. All microscope functions are PC-controlled using trackball, mouse and keyboard via the program VegaTC using Windows TM platforms. Control panel and touchscreen optionally available. In-Flight Beam Tracing TM beam optimization, Spot Size and Beam Current Continual, WD (focus) & Stigmator, Contrast & Brightness, Scanning Speed (according to Signal- Noise Ratio), Gun On, Gun Off, Gun Centering, Column Centering, Vacuum Control, Compensation for kv, Look-Up Table, Auto-diagnostics Via TCP/ IP

8 Detectors LMH/XMH/GMH LMU/XMU/GMU SE ET type detector Retractable BSE detector Motorized R-BSE detector In-Beam SE detector LVSTD TE detector CL detector EBIC EDX * WDX * EBSD * * third-party products Accessories Probe current measurement Touch alarm Chamber view camera Active vibration isolation Peltier cooling stage Beam blanker Control panel Load Lock Water vapor inlet De-contaminator/plasma cleaner* standard, option, not available, * third-party products / / / / Requirements Installation requirements Environmental requirements Power 230 V/50 Hz or 120 V/60 Hz, 2200 VA No water cooling Compressed dry nitrogen for venting: kpa Compressed air: kpa Environment temperature: C Relative humidity: < 80 % Acoustic: < 60 dbc Vibration: For pneumatic suspension: < 5 µm/s below 30 Hz < 10 µm/s above 30 Hz For active isolation (option): < 10 µm/s below 30 Hz < 20 µm/s above 30 Hz Background magnetic field: synchronous < 3 x 10-7 T asynchronous < 1 x 10-7 T System dimensions: 2160 mm x 1185 mm GM mm x LM/XM mm x Room for installation: min. 3 m x 3 m minimum door width 0.9 m Wide Field Optics, In-Flight Beam Tracing and EasySEM are trademarks of TESCAN, a.s. Windows is a trademark of the Microsoft Corporation. We are constantly improving the performance of our products, so all specifications and external designs of instruments are subject to change without notice.

9 Footprint of the microscope (all dimensions in mm): MIRA LM/XM MIRA GM

10 Common Applications Materials Science Materials characterization of metals, ceramics, polymers, composites, coatings, metallurgy, metallography, fracture analysis, degradation processes, morphological analysis, steel cleanliness analysis, microanalysis, texture analysis, ferromagnetic materials, etc. Electro-technical Engineering Solar cell inspection, microelectronics inspection, PN junction visualization, lithography, etc. Forensic Investigations Gunshot residue analysis, bullet and cartridge investigation, tool mark comparison, analysis of hairs, fibers, textiles and papers, paints, ink and print characterization, line crossings, examination of counterfeit documents, etc. Fig. Semiconductor structure, SEM Mag. 5.0 kx, InBeam SE detector, SEM HV 10kV Fig. The same Semiconductor structure, SEM Mag kx, SE detector, SEM HV 10kV Fig. The same Semiconductor structure, SEM Mag x, InBeam SE detector, SEM HV 10kv

11 Common Applications Research Mineralogy, geology, paleontology, archeology, chemistry, environmental studies, particle analysis, applied physics, nanotechnolo gy, nanoprototyping, etc. Life Sciences Botany, parasitology, pharmaceutics, STEM histology, dental implants, etc. Fig. Observation of the growth of Mouse Embryonic Fibroblast (MEF; also called feeder cells) are required to support the growth of undifferentiated embryonic stem cells, SE detector, SEM HV 20kV Fig. Cross section of Filamentous blue-green alage (family Oscillatoriaceae), STEM detector, SEM HV 30kV Fig. Carbon nanotubes (CNTs), In-Beam detector, DEPTH mode, SEM HV 15kV, observation of the morphology and orientation of nanowires Fig. Etched structure of oriented precipitates in Ni based superalloy, SE detector, SEM HV 5kV Fig. An individual coccospheare of the unicellular algea Reticulofenestra haqii Backman (DNV locality Badenian, cca 14. Ma.), SE detector, SEM HV 15kV

12 PERFORMANCE IN NANOSPACE TESCAN, a.s. Libušina třída 21, Brno Czech Republic, EU tel fax Distributor TESCAN