The Informal Nature of Systems Engineering
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1 Abstract by Gerrit Muller University of South-Eastern Norway-NISE The Systems Engineering (SE) discipline is an integrating discipline. SE integrates and guides mono-disciplines, such as mechanical engineering, electrical engineering, and software engineering, to create reliable systems. The SE discipline comprehends multiple approaches: well defined formalized SE methods strong process focused common sense, based on human experience and intelligence A balance of these three approaches yields successful products. In this document we will discuss this balance and especially the, often underrated, informal side of SE. case Distribution Formal Informal SE This article or presentation is written as part of the Gaudí project. The Gaudí project philosophy is to improve by obtaining frequent feedback. Frequent feedback is pursued by an open creation process. This document is published as intermediate or nearly mature version to get feedback. Further distribution is allowed as long as the document remains complete and unchanged. status: planned Meet? conclusion
2 Presentation Outline case What is "Formal"? Exploring the Informal side of SE Where do Formal Methods and Systems Engineering Meet? conclusion 2 Gerrit Muller INSEcontents
3 Twinscan AT1100 case Formal Informal SE Meet? conclusion 3 Gerrit Muller INSEtwinscanPhoto
4 What is a waferstepper source reticle lens wafer 4 Gerrit Muller ASMLlithographyPrinciple
5 From stepping to scanning n n+1 stepper: wafer step static exposure of field reticle slit 250 mm/s vx vy vy expose step expose expose step expose t t scanner: dynamic exposure through slit 5 Gerrit Muller ASMLstepperVsScanner
6 Key specifications waferstepper imaging alignment 130 nm line width 45 nm overlay 10 nm critical dimension 6 Gerrit Muller ASMLkeySpecifications
7 Moore s law 1000 line width in nm Gerrit Muller ASMLmooresLaw
8 Overlay budget (1999) global alignment accuracy 6 nm off axis pos. meas. accuracy 4nm stage Al. pos. meas. accuracy 4 nm off axis Sensor repro 3 nm blue align sensor repro 3 nm reticule 15 nm lens matching 25 nm system adjustment accuracy 2 nm interferometer stability 1 nm process overlay 80 nm matched machine 60 nm process dependency sensor 5 nm single machine 30 nm matching accuracy 5 nm stage overlay 12 nm stage grid accuracy 5 nm metrology stability 5 nm position accuracy 7 nm alignment repro 5 nm frame stability 2.5 nm tracking error X, Y 2.5 nm tracking error phi 75 nrad tracking error WS 2 nm tracking error RS 1 nm 8 Gerrit Muller ASMLoverlayBudget
9 Everything influences overlay Overlay Influence Diagram. (Maarten Bonnema, ) Heat flow from LoS into IF beams and compartment Fiducial Stability Fiducial Calibration Reticle Heating Reticle Errors Illumination settings (NA ) Light Energy Reticle Clamping induced Distortion Chuck expansion P and T of Air, Turbulences : Fiducial Heat flow from SS into RS chuck and compartment Metroframe Temperature Drift -> Effect on Showers -> Effect on Position of mirrors and IF's Airmount Noise, Limited Vibration Isolation Metroframe vibration due to water cooling (lens and coolplates) RS Bal Mass LoS Motor Airmount s T stability in LS lightpath Baseframe SS Motor ATHENA Measurement Accuracy ATHENA Mounting Accuracy/Stability LS Disturbance of Horizontal WS Servo by LS setpoints Wafer Distortion due to Wafer table/chuck Wafer Expansion by input temperature offset Wafer Expansion by Exposure Z-sensors T at top element of Lens (Mag) P and T in Lens Compartment Athena Chuck deformation Reticle RS Chuck Acceler ometer s P&T correction of Lens Lens Acceler ometer s Wafer WS Chuck SS Motor Air Foot Chuck Dimensional Stability Lens Heating IF Ref-IF Accuracy of Lensmanipulators Lens Dynamics WS Balance Mass Z-mirror Ref-IF Airshower RS RS Sensorframe + IF Block Metroframe IF LoS Motor Heat flow from SS into WS chuck Airshower WS IF Block Gravity Compensator noise Inaccurate Lens acceleration Feedforward Sound TIS Measurement Fiducial Stability Fiducial Calibration Heat flow from LoS into IF beams Data Delay Metrology inaccuracy Metrology Errors Metrolog y Servo error Feedforward errors HP Inaccuracy HP Rack MO PAC/PA 9 Gerrit Muller ASMLoverlayInfluenceDiagram
10 What is Formal? Formal case Informal SE Meet? conclusion organizational regulations heterogeneous well known ISO 9000 well defined well known predictable reliable strength heterogeneous little experience unpredictable uncertain reasoning well defined highly specialized FM'2005 mathematical rigor 10 Gerrit Muller INSEformality
11 Process: Formal Documents PRS Product Requirement Spec SPS System Performance Spec TPS Test Performance Spec SDS System Design Spec product creation process EPS Element Performance Spec TPS Test Performance Spec EDS Element Design Spec EPS TPS EDS acceptance test ATP Acceptance Test Performance FAT Factory Acceptance Test SAT Factory Acceptance Test Change Control PR Problem Report CR Change Request TPD Technical Product Documentation 11 Gerrit Muller INSEformalDocuments
12 Formal in Mathematical sense example PieceWise Linear Systems example Hybrid Automata Examples of Hybrid Modeling Formalisms Björn Bukkems and Marieke Cloosterman Boderc Symposium Gerrit Muller INSEformalMethods
13 Fab Context of Waferstepper Formal case Meet? conclusion Informal SE reticule production reticule logistics semiconductor design maintenance wafer reticules devices operator utilization resists processing waferstepper fab layout fab cost model fab logistics tracks contamination fab infrastructure fab automation metrology matching SPC inspection and monitoring yield optimization wafer logistics 13 Gerrit Muller INSEcontextWaferstepper
14 Business Context value of performance (MHz) yield key driver trade-off CD control business models of the customer: design houses foundries vertical integration other players: equipments vendors system integrators lease companies fab designers consultants mask makers resist makers wafer makers OEM s: laser intimate partners: lens Limited number of customers; Many systems per customer 14 Gerrit Muller INSEbusinessContext
15 Human Context: Stakeholders "external" "internal" customer purchaser decision maker user operator maintainer other government customer's customer banks, insurance managers business manager marketing manager product manager operational manager project leader sales manager quality manager logistics manager line manager technology manager engineers system engineers experts manufacturing engineers customer support suppliers component manufacturer outsourced design 15 Gerrit Muller INSEstakeholders
16 Multitude of Disciplines cooling air showers vacuum clamping mirrors actuators motors measurement lasers C&T robotics interferometers capacitive sensors modes servo's hall sensors stiffness construction mechanics dynamics home sensors real time executives temperature sensitivity construction materials lithography measurement SW control digital infrastructure UV senistivity optical materials digital signal processing transmission imaging optics measurement gratings analog signal processing reflection lens gratings dose control preamplifiers coatings lasers lamps light sensor uniformity energy dose sensor bandwidth frequency pulse timing 16 Gerrit Muller INSEtechnologies
17 Complexity of Waferstepper Context yield value of performance CD control (MHz) key driver trade-off business models of the customer: design houses foundries vertical integration market, business other players: equipments vendors system integrators lease companies fab designers consultants mask makers resist makers wafer makers OEM s: laser intimate partners: lens Limited number of customers; Many systems per customer "external" customer purchaser decision maker user operator maintainer other government customer's customer banks, insurance "internal" managers business manager marketing manager product manager operational manager project leader sales manager quality manager logistics manager line manager technology manager stakeholders engineers system engineers experts manufacturing engineers customer support suppliers component manufacturer outsourced design reticle production reticle logistics semiconductor design maintenance fab context reticles devices wafer operator utilization resists processing waferstepper fab layout fab cost model fab logistics tracks metrology contamination fab infrastructure fab automation matching SPC inspection and monitoring yield optimization wafer logistics waferstepper multitude of disciplines temperature stiffness UV modes sensitivity senistivitytransmission motors construction construction reflection optical actuators materials materials coatings servo's lens uniformity C&T gratings mechanics imaging bandwidth lasers dynamics optics frequency robotics pulse lithography lamps timing mirrors interferometers energy air showers cooling vacuum clamping measurement lasers capacitive sensors hall sensors home sensors measurement dose control dose measurement sensor gratings light SW control sensor digital analog preamplifiers real time digital signal signal executives infrastructureprocessing processing 17 Gerrit Muller INSEcomplexity
18 Symptom: Delays appear during Integration component 1 scheduled closing date realized closing date component 2 component 3 integration and test component 4 delay Do you have any design issues for the design meeting? During integration numerous problems become visible The default answer is: No. 18 Gerrit Muller MSintegration
19 From Mono-Disciplinary to System case Formal Informal SE Meet? conclusion system process issues robustness evolvability cost performance reliability legend rather soft well defined but soft well defined multi-objective design methods performance and resource prediction hybrid methods multi-objective design methods single aspect design method VHDL YAPI Mechanical Engineering Electrical Engineering Software Engineering UML FM SE RMA multidisciplinary design monodisciplinary design 19 Gerrit Muller INSEmethodLayers
20 Exponential Pyramid, from requirement to bolts and nuts number of details system requirements design decisions parts connections lines of code research focus system multi- disciplinary mono- disciplinary 20 Gerrit Muller IALApyramid
21 Waferstepper Example source reticule overlay: CD control: productivity: 45nm 10nm 100Wph lens wafer 10 Mloc 21 Gerrit Muller ATpyramidExamples
22 Postulate engineering architecting formal Skills are much more important than skills of "formal" people: analytical structural firm of principle consistent engineering architecting formal methods 22 Gerrit Muller INSEpostulate
23 Multi-disciplinary Research Approaches number of details system multi-disciplinary mono-disciplinary field research: make implicit methods explicit N A' A N Borrow & Adapt approach: adapt existing mono-disciplinary method δ delta-approach: extend existing body of knowledge with well founded increments 23 Gerrit Muller INSEresearchMethods
24 Conclusion Formal case Informal SE Systems Engineering : heterogeneous, the art of ignoring details Meet? conclusion Formal Methods : systematic and accurate: works on well defined homogeneous problems SE uses FM-thinking: Borrow and Adapt Formal methods provides input to SE for specific niches SE sets the boundaries for the application of Formal Methods 24 Gerrit Muller INSEconclusion
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