Hard Disk Drive Industry Driving Areal Density and Lithography

Transcription

1 Hard Disk Drive Industry Driving Areal Density and Lithography September 18, 2008 Paul Hofemann Molecular Imprints

2 Global Demand for Digital Storage Worldwide population penetration Internet at 20% PC at 13% Cell phone at 13% Density demands growing 10 6 X s average 10 KB each Movies reaching 10 GB each China and India s middle class to grow 7-10X to 1.6 billion by 2020 Source: Samsung Presentation August 2008

3 HDD Offers the Best Capacity, Cost, Density Source: Samsung, August 2008, Santa Clara, CA

4 HDD Areal Density Industry Roadmap Areal Density (Gbit/in 2 ) 10,000 1, GMR - Longitudinal Recording TMR Today CPP Perpendicular Recording DTM BPM Heat Assisted Patterned media using imprint lithography TFH and PMR using evolutionary process equipment

5 The Road to 1 Tb/in 2 Areal Density and Beyond 10,000 BPM 25nm Pillars Areal Density (Gbit/in 2 ) 1, DTR 35nm Track Width

6 What is Different About This Transition? Requires lithography beyond the most aggressive International Technology for Semiconductors (ITRS) roadmap Introduces processes (e.g., litho and etch) that are not currently in the disk media production fabs Requires unprecedented collaboration and coordination amongst suppliers and customers

7 HDD Leading the ITRS Lithography Resolution Roadmap HDD TFH NAND FLASH Today Patt. Media and must accomplish this at less than 1/10 th the cost! Sources: ITRS Roadmap (FLASH) ; Tom Coughlin Assoc. May 08 (TFH)

8 Proposed Lithography Roadmap for Patterned Media A trillion bit features/in 2 must be printed at low cost in high volume manufacturing in a few short years!

9 Introduction to Molecular Imprints: S-FIL Imprint Lithography Molecular Imprints Imprio HD2200 Sub-20nm resolution today Limited by template resolution Double-sided at high throughput Imprint head modules can be clustered to scale to >1,000 dph Low cost of ownership Inkjet dispensed resist with ~zero waste Technology supports areal densities beyond 1 Tb/in 2

10 S-FIL Technology Inkjet Dispense

11 S-FIL Technology Template Contacts Resist

12 S-FIL Technology Capillary Forces Fill Template

13 S-FIL Technology Resist Exposure

14 S-FIL Technology Template Separation

15 15 Thin Uniform Residual Layer Thickness for Superior Etch Process Yield

16 Patterned Media Imprint Examples DTR - 50nm half pitch Servo Patterns BPM - 25nm half pitch Resist Pillars

17 High Throughput Double-Sided Patterning Robot Cassettes Process Module Templates Process Module GUI Imprio HD2200 Pilot-line Capable Note: Timing and sequencing is an illustration only

18 Molecular Imprints PM Lithography Roadmap Areal Density (Gb/In 2 Production) Imprio HD1100 R&D 60 dph single-sided sided system Early development Imprio HD2200 Pilot 180 dph double-sided system Improved system robustness High Volume Manufacturing Production 360 dph base system with cluster configurations for scalable throughput beyond 1,000 dph Improved yields, automation, RLT performance

19 Master and Working Replicate Templates Standard 6-inch round fused silica substrate Rotary e-beam generates master patterned template Imprint lithography transfers pattern to working replicates Commercial mask shops ideally suited for this role

20 Master and Working Replicate Templates One Master 10,000 Template Replicates 100 million disks Rotary E-beam Writer MII Template Replicator Imprio HD2200 One master by rotary-stage e- beam writer Replicate master into working replicas Each working replica template imprints 10,000 disks 20

21 How Small Can Imprint Lithography Print? Imprint lithography resolution is ultimately determined by the resolution on the template 2.4nm carbon nanotube is adhered to a template Imprint clearly shows the replication of the CNT feature Source J. A. Rogers F. Hua, Y. Sun, A. Gaur, M. A. Meitl, L. Bilhaut, L. Rotkina, J. Wang, P. Geil, M. Shim, and, Nanoletters, Vol. 4, No. 12, , 2004

22 Disk Media Manufacturing Process Flow Wash Sputter COC Lube Burnish Flight Test Manufacturing Flow Wash Planarization Imprint Coating Resist Strip Imprint Etch Today s Unpatterned Media: $4 to $6/disk Patterned Media Added Cost: $1 to $2/disk

23 Unprecedented Industry Coordination and Collaboration is Required Template Supply Other Materials Supplier Interaction Yield Mgmt New chemicals Std cassettes Std SMIF pods Automation protocol Coupled processes: Imprint coating Imprint lithography Etch Defect detection & classification gaps Implementation strategy (i.e., binning, process monitoring)

24 Unprecedented Industry Coordination and Collaboration is Required HDD Industry Must Standardize When Possible The industry cannot afford 7 dramatically different manufacturing solutions for 7 media manufacturers!

25 Opportunities for Industry Coordination Non-proprietary template pattern for process integration and tool development Advanced Pitch DTR, Skewed Servo Tracks Test Template Substrate handling Automation/material WIP protocols (i.e., template RFID tracking) Cassettes and SMIF pods Disk Carrier Template SMIF Yield management Identify and close tool gaps in defect detection and classification Optimized process tool specifications (perfection is expensive)

26 Next Year s Pilot Lines Will Be Busy! Many OEMs will be shipping 1 st generation process tools Process refinement and integration will require close collaboration Increased focus on integration, cost of ownership and yield More manufacturing personnel are getting involved good sign! HDD manufacturers picking areal density points for first pattern media products New litho/etch talent will be appearing in media fabs

27 Patterned Media Industry Adoption Forecast

28 Hard Disk Drive Industry Driving Areal Density and Lithography! Global demand for digital storage will continue to motivate the HDD industry s areal density progress Patterned media provides technical roadmap beyond 1 Tb/in 2 Imprint lithography enables remarkable sub-20nm resolution at extraordinary low cost Unprecedented collaboration and coordination will be necessary for a timely and efficient patterned media transition