Tunneling Field Effect Transistors for Low Power ULSI
|
|
- Hector Barnett
- 6 years ago
- Views:
Transcription
1 Tunneling Field Effect Transistors for Low Power ULSI Byung-Gook Park Inter-university Semiconductor Research Center and School of Electrical and Computer Engineering Seoul National University
2 Outline I. Introduction II. III. IV. Novel Injection Mechanisms for Sub-60 mv/dec. Subthreshold Swing Tunneling Field Effect Transistor (TFET) Advanced TFET Structures VI. Conclusions 2
3 Average Design Rule ( m) CMOS Scaling-Down 100 SIA Roadmap SIA Roadmap 97 ITRS (DRAM) 11 ITRS (MPU) 11 D.R. = 20e (Y-1960) q ~ 3 yrs : 2-1/2 q ~ 20 yrs : ITRS ( 11) 2024 : 7.4 nm (MPU L phy ) Year 2026 : 5.6 nm (MPU L phy ) 3
4 Power: Roadblock to CMOS Scaling 4
5 Power: Roadblock to 3D Integration q 3D Integration of Devices - Confrontation of scaling limit - 3D stacked arrays <H. Aochi, et al. SSDM 2008> q System in Package - Independent process optimization - Through silicon via (TSV) ** Heat generation is N times the single layer case!! 5
6 CMOS: Switching and Leakage Power Switching Power P 2 fcv DD log I D Leakage Power log I OFF P V DD I OFF 1/ SS Unavoidable Link Subthreshold Swing (SS) V G 6
7 Ideal Switch SS = 0 ln I D I OFF = negligible V DD << 1V ln I OFF V G 7
8 Origin of the 60 mv/dec. SS Limit q Thermal Carrier Injection: - Control of the energy barrier height by the bias voltage - Carrier energy distribution by the Boltzmann law q(v 0 -V) q(v 0 -V) q( V V )/ kbt I Ae 0 q( V log I log A k dv d(log I) kbt q log e B V ) T 0 log e ~ 60 mv/dec. at 300K 8
9 Outline I. Introduction II. III. IV. Novel Injection Mechanisms for Sub-60 mv/dec. Subthreshold Swing - Impact Ionization - Tunneling Tunneling Field Effect Transistor (TFET) Advanced TFET Structures VI. Conclusions 9
10 Various Approaches ** Some mechanisms that do not depend on thermal carrier injection. IMOS: injection by impact ionization TFET : injection by inter-band tunneling Mechanical Switch: injection by mechanical contact 10
11 Concept of Impact Ionization 11
12 Avalanche Multiplication 12
13 I-MOS Device Concept q I-MOS (Impact-Ionization MOS) was proposed first by K. Gopalakrishnan. (IEDM 2002) q It uses modulation of avalanche breakdown voltage of a gated p-i-n diode. n + Drain Gate p + Source N + Source Gate P + Drain L G L I t ox L I L G t ox Intrinsic Si Substrate Intrinsic Si Substrate <n-channel I-MOS> <p-channel I-MOS> 13
14 I-MOS Device Characteristics q Transfer Curves I D (A/ m) 10-3 V D = 1V 10-4 VD = 0.1V SS = 3.7mV/dec T = 300K L G = 70nm L I = 50nm W = 10 m t ox = 3nm V G (V) <n-channel I-MOS> I D (A/ m) 10-3 V D = -1V 10-4 VD = -0.1V SS = 8.9mV/dec T = 300K L G = 70nm L I = 50nm W = 10 m t ox = 3nm V G (V) <p-channel I-MOS> 14
15 Concept of Tunneling (1) 15
16 Concept of Tunneling (2) 16
17 Outline I. Introduction II. III. III. Novel Injection Mechanisms for Sub-60 mv/dec. Subthreshold Swing Tunneling Field Effect Transistor (TFET) - Device Structure and Operation - Fabrication and Characteristics Advanced TFET Structures VI. Conclusions 17
18 TFET Device Structure q p + source instead of n + source in n-channel MOSFET (n + source instead of p + source in n-channel MOSFET) q Induced tunnel junction between source and channel Gate Gate p + Source n + Drain n + Source p + Drain L G Si substrate Si substrate L G t ox t ox <n-channel TFET> <p-channel TFET> 18
19 TFET Device Operation q OFF state - Valence electron tunneling blocked q ON state - Valence electron tunneling allowed 19
20 TFET Device Fabrication (1) q Device Structure: - Basically the same as I-MOS except the lack of impact ionization region (L i = 0) - Thinner t ox 20
21 TFET Device Fabrication (2) q SEM Micrograph 21
22 TFET Device Characteristics q Transfer Curves <n-channel TFET> 22
23 Outline I. Introduction II. III. IV. Novel Injection Mechanisms for Sub-60 mv/dec. Subthreshold Swing Tunneling Field Effect Transistor Advanced TFET Structures - Smaller Bandgap Material - Stronger Field - Larger Injection Area IV. Conclusions 23
24 Silicon TFET Device Issues q Main Issue: - Low ON current due to the relatively large bandgap of silicon q Approaches: - Smaller bandgap material (Ge, graphene) - Stronger field - Larger injection area 24
25 Gate Gate Ge Source TFET q Ge source TFET - Ge region for source and part of the channel narrow bandgap - double gate field enhancement through stronger gate control Ultrathin body to utilize field-coupling effect (Critical dimension) Ge region with p-n junction across P+ Ge source N+ Ge channel Very lightly doped Si channel S/Channel Jct. with engineered tunneling barrier Long enough channel to suppress SCE N+ drain Bottom oxide BOX or p-type substrate 25
26 Gate-All-Around TFET (1) q GAA TFET Structure - field concentration - n-doping layer for field enhancement 26
27 Gate-All-Around TFET (2) 27
28 L-Shaped TFET q L-shaped TFET - tunneling toward gate - increase of tunneling area 28
29 Conclusions (1) q CMOS device scaling is faced with a big roadblock: power consumption. But, we cannot arbitrarily reduce the power supply voltage in CMOS circuits because of the exponential leakage current increase. q The leakage current can be drastically reduced by decreasing the subthreshold swing (SS) below 60 mv/dec. Thus, new injection mechanisms to decrease the subthreshold swing are actively pursued. q Utilizing impact ionization is one of the approaches (i-mos). Interband tunneling is another mechanism (TFET). q Tunneling Field Effect Transistor (TFET) is a promising low-power device based on inter-band tunneling mechanism. 29
30 Conclusions (2) q We have fabricated and characterized TFETs that show 52.8 mv/dec. subthreshold swing. q One major issue with silicon TFET devices is the low ON current due to the relatively large bandgap. q Various approaches to increase the ON current of TFETs are pursued: 1) Smaller bandgap material such as germanium is incorporated in the source. 2) Stronger field is induced in the source end of the channel by utilizing field concentration effect. 3) The injection area is increased by changing the device structure. 30
Atomic-layer deposition of ultrathin gate dielectrics and Si new functional devices
Atomic-layer deposition of ultrathin gate dielectrics and Si new functional devices Anri Nakajima Research Center for Nanodevices and Systems, Hiroshima University 1-4-2 Kagamiyama, Higashi-Hiroshima,
More informationSub-Threshold Region Behavior of Long Channel MOSFET
Sub-threshold Region - So far, we have discussed the MOSFET behavior in linear region and saturation region - Sub-threshold region is refer to region where Vt is less than Vt - Sub-threshold region reflects
More informationNAME: Last First Signature
UNIVERSITY OF CALIFORNIA, BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences EE 130: IC Devices Spring 2003 FINAL EXAMINATION NAME: Last First Signature STUDENT
More informationComparative Study of Silicon and Germanium Doping-less Tunnel Field Effect Transistors
IJSTE - International Journal of Science Technology & Engineering Volume 2 Issue 5 November 2015 ISSN (online): 2349-784X Comparative Study of Silicon and Germanium Doping-less Tunnel Field Effect Transistors
More informationMOSFET short channel effects
MOSFET short channel effects overview Five different short channel effects can be distinguished: velocity saturation drain induced barrier lowering (DIBL) impact ionization surface scattering hot electrons
More informationFUNDAMENTALS OF MODERN VLSI DEVICES
19-13- FUNDAMENTALS OF MODERN VLSI DEVICES YUAN TAUR TAK H. MING CAMBRIDGE UNIVERSITY PRESS Physical Constants and Unit Conversions List of Symbols Preface page xi xiii xxi 1 INTRODUCTION I 1.1 Evolution
More information2014, IJARCSSE All Rights Reserved Page 1352
Volume 4, Issue 3, March 2014 ISSN: 2277 128X International Journal of Advanced Research in Computer Science and Software Engineering Research Paper Available online at: www.ijarcsse.com Double Gate N-MOSFET
More informationSession 10: Solid State Physics MOSFET
Session 10: Solid State Physics MOSFET 1 Outline A B C D E F G H I J 2 MOSCap MOSFET Metal-Oxide-Semiconductor Field-Effect Transistor: Al (metal) SiO2 (oxide) High k ~0.1 ~5 A SiO2 A n+ n+ p-type Si (bulk)
More informationINTERNATIONAL JOURNAL OF APPLIED ENGINEERING RESEARCH, DINDIGUL Volume 1, No 3, 2010
Low Power CMOS Inverter design at different Technologies Vijay Kumar Sharma 1, Surender Soni 2 1 Department of Electronics & Communication, College of Engineering, Teerthanker Mahaveer University, Moradabad
More informationDepartment of Electrical Engineering IIT Madras
Department of Electrical Engineering IIT Madras Sample Questions on Semiconductor Devices EE3 applicants who are interested to pursue their research in microelectronics devices area (fabrication and/or
More informationDesign and Analysis of Double Gate MOSFET Devices using High-k Dielectric
International Journal of Electrical Engineering. ISSN 0974-2158 Volume 7, Number 1 (2014), pp. 53-60 International Research Publication House http://www.irphouse.com Design and Analysis of Double Gate
More informationWhy Scaling? CPU speed Chip size R, C CPU can increase speed by reducing occupying area.
Why Scaling? Higher density : Integration of more transistors onto a smaller chip : reducing the occupying area and production cost Higher Performance : Higher current drive : smaller metal to metal capacitance
More informationFin-Shaped Field Effect Transistor (FinFET) Min Ku Kim 03/07/2018
Fin-Shaped Field Effect Transistor (FinFET) Min Ku Kim 03/07/2018 ECE 658 Sp 2018 Semiconductor Materials and Device Characterizations OUTLINE Background FinFET Future Roadmap Keeping up w/ Moore s Law
More informationCONTENTS. 2.2 Schrodinger's Wave Equation 31. PART I Semiconductor Material Properties. 2.3 Applications of Schrodinger's Wave Equation 34
CONTENTS Preface x Prologue Semiconductors and the Integrated Circuit xvii PART I Semiconductor Material Properties CHAPTER 1 The Crystal Structure of Solids 1 1.0 Preview 1 1.1 Semiconductor Materials
More informationTunnel FET architectures and device concepts for steep slope switches Joachim Knoch
Tunnel FET architectures and device concepts for steep slope switches Joachim Knoch Institute of Semiconductor Electronics RWTH Aachen University Sommerfeldstraße 24 52074 Aachen Outline MOSFETs Operational
More informationECE 340 Lecture 37 : Metal- Insulator-Semiconductor FET Class Outline:
ECE 340 Lecture 37 : Metal- Insulator-Semiconductor FET Class Outline: Metal-Semiconductor Junctions MOSFET Basic Operation MOS Capacitor Things you should know when you leave Key Questions What is the
More informationPerformance Evaluation of MISISFET- TCAD Simulation
Performance Evaluation of MISISFET- TCAD Simulation Tarun Chaudhary Gargi Khanna Rajeevan Chandel ABSTRACT A novel device n-misisfet with a dielectric stack instead of the single insulator of n-mosfet
More informationSemiconductor TCAD Tools
Device Design Consideration for Nanoscale MOSFET Using Semiconductor TCAD Tools Teoh Chin Hong and Razali Ismail Department of Microelectronics and Computer Engineering, Universiti Teknologi Malaysia,
More informationFundamentals of Power Semiconductor Devices
В. Jayant Baliga Fundamentals of Power Semiconductor Devices 4y Spri ringer Contents Preface vii Chapter 1 Introduction 1 1.1 Ideal and Typical Power Switching Waveforms 3 1.2 Ideal and Typical Power Device
More informationSemiconductor Devices Lecture 5, pn-junction Diode
Semiconductor Devices Lecture 5, pn-junction Diode Content Contact potential Space charge region, Electric Field, depletion depth Current-Voltage characteristic Depletion layer capacitance Diffusion capacitance
More informationChannel Engineering for Submicron N-Channel MOSFET Based on TCAD Simulation
Australian Journal of Basic and Applied Sciences, 2(3): 406-411, 2008 ISSN 1991-8178 Channel Engineering for Submicron N-Channel MOSFET Based on TCAD Simulation 1 2 3 R. Muanghlua, N. Vittayakorn and A.
More informationCHAPTER 2 LITERATURE REVIEW
CHAPTER 2 LITERATURE REVIEW 2.1 Introduction of MOSFET The structure of the MOS field-effect transistor (MOSFET) has two regions of doping opposite that of the substrate, one at each edge of the MOS structure
More informationBeyond Transistor Scaling: New Devices for Ultra Low Energy Information Processing
Beyond Transistor Scaling: New Devices for Ultra Low Energy Information Processing Prof. Tsu Jae King Liu Department of Electrical Engineering and Computer Sciences University of California, Berkeley,
More informationSemiconductor Physics and Devices
Metal-Semiconductor and Semiconductor Heterojunctions The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is one of two major types of transistors. The MOSFET is used in digital circuit, because
More informationLecture #29. Moore s Law
Lecture #29 ANNOUNCEMENTS HW#15 will be for extra credit Quiz #6 (Thursday 5/8) will include MOSFET C-V No late Projects will be accepted after Thursday 5/8 The last Coffee Hour will be held this Thursday
More informationPower MOSFET Zheng Yang (ERF 3017,
ECE442 Power Semiconductor Devices and Integrated Circuits Power MOSFET Zheng Yang (ERF 3017, email: yangzhen@uic.edu) Evolution of low-voltage (
More informationUNIVERSITY OF CALIFORNIA AT BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences.
UNIVERSITY OF CALIFORNIA AT BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences Discussion #9 EE 05 Spring 2008 Prof. u MOSFETs The standard MOSFET structure is shown
More informationRecord I on (0.50 ma/μm at V DD = 0.5 V and I off = 100 na/μm) 25 nm-gate-length ZrO 2 /InAs/InAlAs MOSFETs
Record I on (0.50 ma/μm at V DD = 0.5 V and I off = 100 na/μm) 25 nm-gate-length ZrO 2 /InAs/InAlAs MOSFETs Sanghoon Lee 1*, V. Chobpattana 2,C.-Y. Huang 1, B. J. Thibeault 1, W. Mitchell 1, S. Stemmer
More informationDownloaded from
Question 14.1: In an n-type silicon, which of the following statement is true: (a) Electrons are majority carriers and trivalent atoms are the dopants. (b) Electrons are minority carriers and pentavalent
More informationVertical Nanowire Gate-All-Around p-type Tunneling Field-Effect Transistor With Si 0.8 Ge 0.2 /Si Heterojunction
2012 International Conference on Solid-State and Integrated Circuit (ICSIC 2012) IPCSIT vol. 32 (2012) (2012) IACSIT Press, Singapore Vertical Nanowire Gate-All-Around p-type Tunneling Field-Effect Transistor
More informationDesign of Gate-All-Around Tunnel FET for RF Performance
Drain Current (µa/µm) International Journal of Computer Applications (97 8887) International Conference on Innovations In Intelligent Instrumentation, Optimization And Signal Processing ICIIIOSP-213 Design
More informationLEAKAGE POWER REDUCTION TECHNIQUES FOR LOW POWER VLSI DESIGN: A REVIEW PAPER
International Journal Of Advance Research In Science And Engineering http:// LEAKAGE POWER REDUCTION TECHNIQUES FOR LOW POWER VLSI DESIGN: A REVIEW PAPER Raju Hebbale 1, Pallavi Hiremath 2 1,2 Department
More informationField-Effect Transistor (FET) is one of the two major transistors; FET derives its name from its working mechanism;
Chapter 3 Field-Effect Transistors (FETs) 3.1 Introduction Field-Effect Transistor (FET) is one of the two major transistors; FET derives its name from its working mechanism; The concept has been known
More informationFuture MOSFET Devices using high-k (TiO 2 ) dielectric
Future MOSFET Devices using high-k (TiO 2 ) dielectric Prerna Guru Jambheshwar University, G.J.U.S. & T., Hisar, Haryana, India, prernaa.29@gmail.com Abstract: In this paper, an 80nm NMOS with high-k (TiO
More informationEE70 - Intro. Electronics
EE70 - Intro. Electronics Course website: ~/classes/ee70/fall05 Today s class agenda (November 28, 2005) review Serial/parallel resonant circuits Diode Field Effect Transistor (FET) f 0 = Qs = Qs = 1 2π
More informationDrive performance of an asymmetric MOSFET structure: the peak device
MEJ 499 Microelectronics Journal Microelectronics Journal 30 (1999) 229 233 Drive performance of an asymmetric MOSFET structure: the peak device M. Stockinger a, *, A. Wild b, S. Selberherr c a Institute
More informationECE520 VLSI Design. Lecture 2: Basic MOS Physics. Payman Zarkesh-Ha
ECE520 VLSI Design Lecture 2: Basic MOS Physics Payman Zarkesh-Ha Office: ECE Bldg. 230B Office hours: Wednesday 2:00-3:00PM or by appointment E-mail: pzarkesh@unm.edu Slide: 1 Review of Last Lecture Semiconductor
More informationLecture 4. MOS transistor theory
Lecture 4 MOS transistor theory 1.7 Introduction: A MOS transistor is a majority-carrier device, in which the current in a conducting channel between the source and the drain is modulated by a voltage
More informationFET(Field Effect Transistor)
Field Effect Transistor: Construction and Characteristic of JFETs. Transfer Characteristic. CS,CD,CG amplifier and analysis of CS amplifier MOSFET (Depletion and Enhancement) Type, Transfer Characteristic,
More informationWeek 9a OUTLINE. MOSFET I D vs. V GS characteristic Circuit models for the MOSFET. Reading. resistive switch model small-signal model
Week 9a OUTLINE MOSFET I vs. V GS characteristic Circuit models for the MOSFET resistive switch model small-signal model Reading Rabaey et al.: Chapter 3.3.2 Hambley: Chapter 12 (through 12.5); Section
More informationSemiconductor Devices
Semiconductor Devices Modelling and Technology Source Electrons Gate Holes Drain Insulator Nandita DasGupta Amitava DasGupta SEMICONDUCTOR DEVICES Modelling and Technology NANDITA DASGUPTA Professor Department
More informationMOS Capacitance and Introduction to MOSFETs
ECE-305: Fall 2016 MOS Capacitance and Introduction to MOSFETs Professor Peter Bermel Electrical and Computer Engineering Purdue University, West Lafayette, IN USA pbermel@purdue.edu 11/4/2016 Pierret,
More informationCHAPTER 8 The PN Junction Diode
CHAPTER 8 The PN Junction Diode Consider the process by which the potential barrier of a PN junction is lowered when a forward bias voltage is applied, so holes and electrons can flow across the junction
More informationDigital Integrated Circuits EECS 312
14 12 10 8 6 Fujitsu VP2000 IBM 3090S Pulsar 4 IBM 3090 IBM RY6 CDC Cyber 205 IBM 4381 IBM RY4 2 IBM 3081 Apache Fujitsu M380 IBM 370 Merced IBM 360 IBM 3033 Vacuum Pentium II(DSIP) 0 1950 1960 1970 1980
More informationDigital Electronics. By: FARHAD FARADJI, Ph.D. Assistant Professor, Electrical and Computer Engineering, K. N. Toosi University of Technology
K. N. Toosi University of Technology Chapter 7. Field-Effect Transistors By: FARHAD FARADJI, Ph.D. Assistant Professor, Electrical and Computer Engineering, K. N. Toosi University of Technology http://wp.kntu.ac.ir/faradji/digitalelectronics.htm
More information3-D Modelling of the Novel Nanoscale Screen-Grid Field Effect Transistor (SGFET)
3-D Modelling of the Novel Nanoscale Screen-Grid Field Effect Transistor (SGFET) Pei W. Ding, Kristel Fobelets Department of Electrical Engineering, Imperial College London, U.K. J. E. Velazquez-Perez
More informationStudy of Pattern Area of Logic Circuit. with Tunneling Field-Effect Transistors
Contemporary Engineering Sciences, Vol. 6, 2013, no. 6, 273-284 HIKARI Ltd, www.m-hikari.com http://dx.doi.org/10.12988/ces.2013.3632 Study of Pattern Area of Logic Circuit with Tunneling Field-Effect
More informationInvestigation of Feasibility of Tunneling Field Effect Transistor (TFET) as Highly Sensitive and Multi-sensing Biosensors
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, VOL.17, NO.1, FEBRUARY, 2017 ISSN(Print) 1598-1657 https://doi.org/10.5573/jsts.2017.17.1.141 ISSN(Online) 2233-4866 Investigation of Feasibility of Tunneling
More informationCh5 Diodes and Diodes Circuits
Circuits and Analog Electronics Ch5 Diodes and Diodes Circuits 5.1 The Physical Principles of Semiconductor 5.2 Diodes 5.3 Diode Circuits 5.4 Zener Diode References: Floyd-Ch2; Gao-Ch6; 5.1 The Physical
More informationITRS MOSFET Scaling Trends, Challenges, and Key Technology Innovations
Workshop on Frontiers of Extreme Computing Santa Cruz, CA October 24, 2005 ITRS MOSFET Scaling Trends, Challenges, and Key Technology Innovations Peter M. Zeitzoff Outline Introduction MOSFET scaling and
More informationEECS130 Integrated Circuit Devices
EECS130 Integrated Circuit Devices Professor Ali Javey 11/6/2007 MOSFETs Lecture 6 BJTs- Lecture 1 Reading Assignment: Chapter 10 More Scalable Device Structures Vertical Scaling is important. For example,
More informationDavinci. Semiconductor Device Simulaion in 3D SYSTEMS PRODUCTS LOGICAL PRODUCTS PHYSICAL IMPLEMENTATION SIMULATION AND ANALYSIS LIBRARIES TCAD
SYSTEMS PRODUCTS LOGICAL PRODUCTS PHYSICAL IMPLEMENTATION SIMULATION AND ANALYSIS LIBRARIES TCAD Aurora DFM WorkBench Davinci Medici Raphael Raphael-NES Silicon Early Access TSUPREM-4 Taurus-Device Taurus-Lithography
More informationResonant Tunneling Device. Kalpesh Raval
Resonant Tunneling Device Kalpesh Raval Outline Diode basics History of Tunnel diode RTD Characteristics & Operation Tunneling Requirements Various Heterostructures Fabrication Technique Challenges Application
More informationSemiconductor Memory: DRAM and SRAM. Department of Electrical and Computer Engineering, National University of Singapore
Semiconductor Memory: DRAM and SRAM Outline Introduction Random Access Memory (RAM) DRAM SRAM Non-volatile memory UV EPROM EEPROM Flash memory SONOS memory QD memory Introduction Slow memories Magnetic
More informationElectronic Circuits I. Instructor: Dr. Alaa Mahmoud
Electronic Circuits I Instructor: Dr. Alaa Mahmoud alaa_y_emam@hotmail.com Chapter 27 Diode and diode application Outline: Semiconductor Materials The P-N Junction Diode Biasing P-N Junction Volt-Ampere
More informationBody-Biased Complementary Logic Implemented Using AlN Piezoelectric MEMS Switches
University of Pennsylvania From the SelectedWorks of Nipun Sinha 29 Body-Biased Complementary Logic Implemented Using AlN Piezoelectric MEMS Switches Nipun Sinha, University of Pennsylvania Timothy S.
More informationvalue of W max for the device. The at band voltage is -0.9 V. Problem 5: An Al-gate n-channel MOS capacitor has a doping of N a = cm ;3. The oxi
Prof. Jasprit Singh Fall 2001 EECS 320 Homework 10 This homework is due on December 6 Problem 1: An n-type In 0:53 Ga 0:47 As epitaxial layer doped at 10 16 cm ;3 is to be used as a channel in a FET. A
More informationLesson 5. Electronics: Semiconductors Doping p-n Junction Diode Half Wave and Full Wave Rectification Introduction to Transistors-
Lesson 5 Electronics: Semiconductors Doping p-n Junction Diode Half Wave and Full Wave Rectification Introduction to Transistors- Types and Connections Semiconductors Semiconductors If there are many free
More informationInAs Quantum-Well MOSFET for logic and microwave applications
AWAD June 29 th 2012 Accelerating the next technology revolution InAs Quantum-Well MOSFET for logic and microwave applications T.-W. Kim, R. Hill, C. D. Young, D. Veksler, L. Morassi, S. Oktybrshky 1,
More informationParameter Optimization Of GAA Nano Wire FET Using Taguchi Method
Parameter Optimization Of GAA Nano Wire FET Using Taguchi Method S.P. Venu Madhava Rao E.V.L.N Rangacharyulu K.Lal Kishore Professor, SNIST Professor, PSMCET Registrar, JNTUH Abstract As the process technology
More informationUNIT 3 Transistors JFET
UNIT 3 Transistors JFET Mosfet Definition of BJT A bipolar junction transistor is a three terminal semiconductor device consisting of two p-n junctions which is able to amplify or magnify a signal. It
More informationMOSFET Parasitic Elements
MOSFET Parasitic Elements Three MITs of the ay Components of the source resistance and their influence on g m and R d Gate-induced drain leakage (GIL) and its effect on lowest possible leakage current
More informationJournal of Electron Devices, Vol. 20, 2014, pp
Journal of Electron Devices, Vol. 20, 2014, pp. 1786-1791 JED [ISSN: 1682-3427 ] ANALYSIS OF GIDL AND IMPACT IONIZATION WRITING METHODS IN 100nm SOI Z-DRAM Bhuwan Chandra Joshi, S. Intekhab Amin and R.
More informationPerformance Comparison of CMOS and Finfet Based Circuits At 45nm Technology Using SPICE
RESEARCH ARTICLE OPEN ACCESS Performance Comparison of CMOS and Finfet Based Circuits At 45nm Technology Using SPICE Mugdha Sathe*, Dr. Nisha Sarwade** *(Department of Electrical Engineering, VJTI, Mumbai-19)
More informationCHAPTER 8 The PN Junction Diode
CHAPTER 8 The PN Junction Diode Consider the process by which the potential barrier of a PN junction is lowered when a forward bias voltage is applied, so holes and electrons can flow across the junction
More informationDrain. Drain. [Intel: bulk-si MOSFETs]
1 Introduction For more than 40 years, the evolution and growth of very-large-scale integration (VLSI) silicon-based integrated circuits (ICs) have followed from the continual shrinking, or scaling, of
More information15 Transit Time and Tunnel NDR Devices
15 Transit Time and Tunnel NDR Devices Schematics of Transit-time NDR diode. A packet of carriers (e.g., electrons) is generated in a confined and narrow zone (generation region) and injected into the
More informationMSE 410/ECE 340: Electrical Properties of Materials Fall 2016 Micron School of Materials Science and Engineering Boise State University
MSE 410/ECE 340: Electrical Properties of Materials Fall 2016 Micron School of Materials Science and Engineering Boise State University Practice Final Exam 1 Read the questions carefully Label all figures
More informationPrepared by: Dr. Rishi Prakash, Dept of Electronics and Communication Engineering Page 1 of 5
Microwave tunnel diode Some anomalous phenomena were observed in diode which do not follows the classical diode equation. This anomalous phenomena was explained by quantum tunnelling theory. The tunnelling
More informationReview Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination
Review Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination Current Transport: Diffusion, Thermionic Emission & Tunneling For Diffusion current, the depletion layer is
More informationStudent Lecture by: Giangiacomo Groppi Joel Cassell Pierre Berthelot September 28 th 2004
Student Lecture by: Giangiacomo Groppi Joel Cassell Pierre Berthelot September 28 th 2004 Lecture outline Historical introduction Semiconductor devices overview Bipolar Junction Transistor (BJT) Field
More informationOptimization of Double Gate Vertical Channel Tunneling Field Effect Transistor (DVTFET) with Dielectric Sidewall
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, VOL.17, NO.2, APRIL, 2017 ISSN(Print) 1598-1657 https://doi.org/10.5573/jsts.2017.17.2.192 ISSN(Online) 2233-4866 Optimization of Double Gate Vertical Channel
More informationHigh-Performance Si Nanowire FET with a Semi Gate-Around Structure Suitable for Integration
High-Performance Si Nanowire FET with a Semi Gate-Around Structure Suitable for Integration Soshi Sato 1, Hideyuki Kamimura 1, Hideaki Arai 1, Kuniyuki Kakushima 2, Parhat Ahmet 1, Kenji Ohmori 3, Keisaku
More informationFabrication and Characterization of Pseudo-MOSFETs
Fabrication and Characterization of Pseudo-MOSFETs March 19, 2014 Contents 1 Introduction 2 2 The pseudo-mosfet 3 3 Device Fabrication 5 4 Electrical Measurement and Characterization 7 5 Writing your Report
More informationTransport properties of graphene nanoribbon-based tunnel
Transport properties of graphene nanoribbon-based tunnel Mark Cheung School of Engineering and Applied Science, Department of Electrical and Computer Engineering Keywords: Monolithic Graphene, Low-Power,
More informationEE/COE 152: Basic Electronics. Lecture 3. A.S Agbemenu. https://sites.google.com/site/agbemenu/courses/ee-coe-152
EE/COE 152: Basic Electronics Lecture 3 A.S Agbemenu https://sites.google.com/site/agbemenu/courses/ee-coe-152 Books: Microelcetronic Circuit Design (Jaeger/Blalock) Microelectronic Circuits (Sedra/Smith)
More informationChapter 3: Basics Semiconductor Devices and Processing 2006/9/27 1. Topics
Chapter 3: Basics Semiconductor Devices and Processing 2006/9/27 1 Topics What is semiconductor Basic semiconductor devices Basics of IC processing CMOS technologies 2006/9/27 2 1 What is Semiconductor
More informationEEC 216 Lecture #8: Leakage. Rajeevan Amirtharajah University of California, Davis
EEC 216 Lecture #8: Leakage Rajeevan Amirtharajah University of California, Davis Outline Announcements Review: Low Power Interconnect Finish Lecture 7 Leakage Mechanisms Circuit Styles for Low Leakage
More informationFET. Field Effect Transistors ELEKTRONIKA KONTROL. Eka Maulana, ST, MT, M.Eng. Universitas Brawijaya. p + S n n-channel. Gate. Basic structure.
FET Field Effect Transistors ELEKTRONIKA KONTROL Basic structure Gate G Source S n n-channel Cross section p + p + p + G Depletion region Drain D Eka Maulana, ST, MT, M.Eng. Universitas Brawijaya S Channel
More informationChapter 2 : Semiconductor Materials & Devices (II) Feb
Chapter 2 : Semiconductor Materials & Devices (II) 1 Reference 1. SemiconductorManufacturing Technology: Michael Quirk and Julian Serda (2001) 3. Microelectronic Circuits (5/e): Sedra & Smith (2004) 4.
More informationSource/Drain Parasitic Resistance Role and Electric Coupling Effect in Sub 50 nm MOSFET Design
Source/Drain Parasitic Resistance Role and Electric Coupling Effect in Sub 50 nm MOSFET Design 9/25/2002 Jun Yuan, Peter M. Zeitzoff*, and Jason C.S. Woo Department of Electrical Engineering University
More informationCharacterization of Variable Gate Oxide Thickness MOSFET with Non-Uniform Oxide Thicknesses for Sub-Threshold Leakage Current Reduction
2012 International Conference on Solid-State and Integrated Circuit (ICSIC 2012) IPCSIT vol. 32 (2012) (2012) IACSIT Press, Singapore Characterization of Variable Gate Oxide Thickness MOSFET with Non-Uniform
More informationMOS TRANSISTOR THEORY
MOS TRANSISTOR THEORY Introduction A MOS transistor is a majority-carrier device, in which the current in a conducting channel between the source and the drain is modulated by a voltage applied to the
More informationA Literature Review on Leakage and Power Reduction Techniques in CMOS VLSI Design
A Literature Review on Leakage and Power Reduction Techniques in CMOS VLSI Design Anu Tonk Department of Electronics Engineering, YMCA University, Faridabad, Haryana tonkanu.saroha@gmail.com Shilpa Goyal
More informationPerformance investigations of novel dual-material gate (DMG) MOSFET with dielectric pockets (DP)
Science in China Series E: Technological Sciences 2009 SCIENCE IN CHINA PRESS www.scichina.com tech.scichina.com Performance investigations of novel dual-material gate (DMG) MOSFET with dielectric pockets
More informationField Effect Transistors (npn)
Field Effect Transistors (npn) gate drain source FET 3 terminal device channel e - current from source to drain controlled by the electric field generated by the gate base collector emitter BJT 3 terminal
More informationFinFET vs. FD-SOI Key Advantages & Disadvantages
FinFET vs. FD-SOI Key Advantages & Disadvantages Amiad Conley Technical Marketing Manager Process Diagnostics & Control, Applied Materials ChipEx-2014, Apr 2014 1 Moore s Law The number of transistors
More informationOptimization of Direct Tunneling Gate Leakage Current in Ultrathin Gate Oxide FET with High-K Dielectrics
Optimization of Direct Tunneling Gate Leakage Current in Ultrathin Gate Oxide FET with High-K Dielectrics Sweta Chander 1, Pragati Singh 2, S Baishya 3 1,2,3 Department of Electronics & Communication Engineering,
More informationElectrical Characterization of a Second-gate in a Silicon-on-Insulator Transistor
Electrical Characterization of a Second-gate in a Silicon-on-Insulator Transistor Antonio Oblea: McNair Scholar Dr. Stephen Parke: Faculty Mentor Electrical Engineering As an independent double-gate, silicon-on-insulator
More informationFinFET-based Design for Robust Nanoscale SRAM
FinFET-based Design for Robust Nanoscale SRAM Prof. Tsu-Jae King Liu Dept. of Electrical Engineering and Computer Sciences University of California at Berkeley Acknowledgements Prof. Bora Nikoli Zheng
More informationEFM Ec. a) Sketch the electrostatic potential inside the semiconductor as a function of position.
1.The energy band diagram for an ideal x o =.2um MOS-C operated at T=300K is shown below. Note that the applied gate voltage causes band bending in the semiconductor such that E F =E i at the Si-SiO2 interface.
More informationLEAKAGE POWER REDUCTION IN CMOS CIRCUITS USING LEAKAGE CONTROL TRANSISTOR TECHNIQUE IN NANOSCALE TECHNOLOGY
LEAKAGE POWER REDUCTION IN CMOS CIRCUITS USING LEAKAGE CONTROL TRANSISTOR TECHNIQUE IN NANOSCALE TECHNOLOGY Abhishek Sharma 1,Shipra Mishra 2 1 M.Tech. Embedded system & VLSI Design NITM,Gwalior M.P. India
More informationEJERCICIOS DE COMPONENTES ELECTRÓNICOS. 1 er cuatrimestre
EJECICIOS DE COMPONENTES ELECTÓNICOS. 1 er cuatrimestre 2 o Ingeniería Electrónica Industrial Juan Antonio Jiménez Tejada Índice 1. Basic concepts of Electronics 1 2. Passive components 1 3. Semiconductors.
More informationEC T34 ELECTRONIC DEVICES AND CIRCUITS
RAJIV GANDHI COLLEGE OF ENGINEERING AND TECHNOLOGY PONDY-CUDDALORE MAIN ROAD, KIRUMAMPAKKAM-PUDUCHERRY DEPARTMENT OF ECE EC T34 ELECTRONIC DEVICES AND CIRCUITS II YEAR Mr.L.ARUNJEEVA., AP/ECE 1 PN JUNCTION
More informationSemiconductor Process Reliability SVTW 2012 Esko Mikkola, Ph.D. & Andrew Levy
Semiconductor Process Reliability SVTW 2012 Esko Mikkola, Ph.D. & Andrew Levy 1 IC Failure Modes Affecting Reliability Via/metallization failure mechanisms Electro migration Stress migration Transistor
More informationEnabling Breakthroughs In Technology
Enabling Breakthroughs In Technology Mike Mayberry Director of Components Research VP, Technology and Manufacturing Group Intel Corporation June 2011 Defined To be defined Enabling a Steady Technology
More informationSolid State Devices- Part- II. Module- IV
Solid State Devices- Part- II Module- IV MOS Capacitor Two terminal MOS device MOS = Metal- Oxide- Semiconductor MOS capacitor - the heart of the MOSFET The MOS capacitor is used to induce charge at the
More informationIEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 52, NO. 1, JANUARY Impact Ionization MOS (I-MOS) Part I: Device and Circuit Simulations
IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 52, NO. 1, JANUARY 2005 69 Impact Ionization MOS (I-MOS) Part I: Device and Circuit Simulations Kailash Gopalakrishnan, Peter B. Griffin, and James D. Plummer,
More informationEECS130 Integrated Circuit Devices
EECS130 Integrated Circuit Devices Professor Ali Javey 11/01/2007 MOSFETs Lecture 5 Announcements HW7 set is due now HW8 is assigned, but will not be collected/graded. MOSFET Technology Scaling Technology
More informationImpact of Basal Plane Dislocations and Ruggedness of 10 kv 4H-SiC Transistors
11th International MOS-AK Workshop (co-located with the IEDM and CMC Meetings) Silicon Valley, December 5, 2018 Impact of Basal Plane Dislocations and Ruggedness of 10 kv 4H-SiC Transistors *, A. Kumar,
More information