Semiconductor Devices Lecture 5, pn-junction Diode
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1 Semiconductor Devices Lecture 5, pn-junction Diode
2 Content Contact potential Space charge region, Electric Field, depletion depth Current-Voltage characteristic Depletion layer capacitance Diffusion capacitance Transient Behavior Junction Breakdown
3 Contact potential, in Equilibrium and without applied voltage
4 Contact potential, in Equilibrium and without applied voltage Current density is =0 Einsteinrelation
5 Contact potential, in Equilibrium and without applied voltage
6 Contact potential, in Equilibrium and without applied voltage
7 Contact potential, in Equilibrium and without applied voltage
8 Space charge region, Electric Field Poisson s ekvation Only fixed charge is used!
9 Space charge region, Electric Field
10 Space charge region, Electric Field The area under E(x) x n0 N d =x p0 N a, W=x n0 +x p0 Contact potential expressed in doping level and depletion depth
11 Space charge region, depletion depth What happened with x p0 and x n0 if N a or N d is large?
12 Current-Voltage characteristic
13 Current-Voltage Characteristic Forward biased junction: Diffusion current increase. The drift currents are almost constant
14 Current-Voltage Characteristic Reverse biased junction: Diffusion current decrease. The drift currents are almost constant
15 Current-Voltage Characteristic, forward bias junctions
16 Current-Voltage Characteristic Generation of charge carrier in the depletion region as well as charges diffuse into the junction, swept through the depletion layer by the electric field, result into a leakage current of the device
17 Current-Voltage Characteristic, injection of minority carrier (forward bias) 1) Contact potential caused by a different concentration across the junction 2) With bias applied 1/2 gives
18 Current-Voltage Characteristic, injection of minority carrier (forward bias) p xno = pne qv kt p xno pn = pne qv kt pn Subtracting equilibrium hole and electron conc. L Diffusion length n D n n
19 Current-Voltage Characteristic, injection of minority carrier (forward bias) Hole diffusion current at point x n Hole current injected into the n-material Electron current injected into the p-material
20 Current-Voltage Characteristic, the diode equation. Total current at x n =x p =0 Voltage depended minority injection included
21 Current-Voltage Characteristic, the diode equation. Reversed bias! Increasing Vr gives: Shockley Equation Good agreement for Ge. Bad for Si
22 Current-Voltage Characteristic, the diode equation. The current is constant through the component The doping affect the injection The p-doping is higher than the n-doping which gives a bigger hole injection
23 Current-Voltage Characteristic, reverse biased junction
24 Current-Voltage Characteristic, reverse biased junction
25 Current-Voltage Characteristic, 2 order effect 1. Generation and recombination in the depletion volume 2. Ohmic losses
26 Current-Voltage Characteristic, 2 order effect Thermal generation of carrier in neutral region (a) Recombination center in the bandgap. In reverse bias mode the center act as a generations center, which affect the leakage current. (b)
27 Current-Voltage Characteristic, 2 order effect The diode equation is modified to take care of the effect of recombination. An ideality factor n with a value from 1 to 2, is therefore introduced. 1 is pure diffusion and 2 is pure recombination. A real diode is somewhere in-between. I 0 is modified to better explain the current when recombination/generation center affect the leakage current. I ' 0 A q D p p n N 2 i D qnw i g Minority carrier lifetime in neutral n-doped region (p + n-diode) Generation life-time in depletion region
28 Ohmic losses V V a
29 Depletion layer capacitance Def. of Capacitance 0 V bias
30 Depletion layer capacitance Equal amount of charge on each side, opposite charge Propagation of depletion region caused by the doping Differentiation gives the junction capacitance. The capacitance is voltage dependent and decrease with increased reverse bias Can be written as a simple plate capacitor
31 Depletion layer capacitance
32 Depletion layer capacitance
33 Depletion layer capacitance s Si: K s =12
34 Diffusion capacitance Long diodes, The diode is longer than the diffusion length for the minority carrier, no contribution to the capacitance Short diodes, the most silicon diodes behave as short diodes Storage length
35 Transient Behavior Injection of minority carrier, when the diode is forward biased. p + n-diode
36 Transient Behavior After injection of carrier, the diode is reversed biased. The diode conduct until all injected carrier have recombined.
37 Junction Breakdown Zener breakdown Avalanche breakdown
38 Junction Breakdown, zener n and p are doped high, which result in tunneling through the potential barrier Negative temp. coeff Vb T
39 Junction Breakdown, Avalanche An electron is accelerated in a high electric Field, which gives impact ionization. Positive temp coeff.
40 Junction Breakdown, PIN-diode
41 Junction Breakdown, avalanche in surface
42 Junction Breakdown, avalanche in surface High Electric Field SiO p Low doped n n +
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