STS Multiplex Deep Reactive Ion Etcher (DRIE)

Transcription

1 STS Multiplex Deep Reactive Ion Etcher (DRIE) Tool Configuration: Item List Notes HM ID: Manufacturer: Moedl: S2Q STS Multiplex ICP Description: Wafer Size: 150mm Vintage: 12/2000 Serial No: Page 1/8

2 Quantity: Tool Condition: Sales Conditin: Volts / HZ/Ph: 1 Set Used As is where is 208V / 60HZ 3Ph Chamber configuration: Deep Silicon Etch Process Package SOI Trench Etch Package Gasline: Valve MFC Filter (VCR) (Qty. 4x units included) ICP 240BF Source (ASE exc.psu and Matching Unit) Electrode Temperature Control (+5 to +40deg C) Multiplex ICP SC160M Process Chamber (MESC) Mechanical Wafer Clamp Electrode(tripod) with He Backside Cooling 300/30W (13.56MHz) RF Supply and Matching Unit 1kW (13.56MHz) RF Supply and Matching Unit Chamber parts for 1x150mm substrate (Mechanical Clamping) Turbo Pump: Leybold MAG900CT Dry Pump: Edwards iqdp80 (M) Process Chamber: ICP V2 unified ISO250 (inc. insulation spacers) SR with 160 adaptor Chamber Externals: ICP V2 (inc. Edwards D146 penning gauge + MKS 51A & SMC ZSE6B pressure switches + Edwards mT cap. man. gauge + NW16 bypass pump line) Chamber Insulation Jackets: None Lower Electrode: ICP WTC Tripod Lift Electrode Temp Monitoring: None Substrate Clamping/ Platen: ICP WTC Tripod 150mm Lower RF Enclosure/ MU: ICP V2 WTC H/F + L/F (SOI) Electrode Lift Stops: 96mm (136mm electrode spacing) HBC Assy: ICP V2 (inc. Tylan CDLD 10T cap. man gauge + Tylan FC sccm He cal. MFC) HBC Delay Unit: None Upper Electrode: With aperture mounting Upper Electrode Aperture: None Upper Electrode Source: ICP Balun Upper RF Enclosure/ MU: Balun 1kW (high cool) Chamber Lid: ICP Heated Page 2/8

3 Electrode Switching: None RF Generators: Upper: ENI ACG10B 1kW (13.56MHz) +Lower: ENI ACG3B 300/30W (13.56MHz) +LF5+pulse gen+switch gunit APC/ Hivac Valve: VAT Series 65 DN160 + PM7 Turbo Pump: Leybold MAG900CT (DN200 inc. Norcal NW40 foreline valve + MKS 750B 10T cap. man. + purge PS305259) Bypass Pumping: Automatic NW16 Heated Foreline: ICP Pumping Line: NW40 (1m) Backing Pump: Edwards iqdp80(m) Pump Acoustic Panels: None Backing Pump Interface: Edwards iqdp80 (STSCR287) Pump N2 Trip Level (l/min): See gas schematics Lower Electrode Cooling: Affinity RWA 012J Chamber Heating: Watlow 4x 700W cartridge heaters Upper Electrode Cooling: None Platen Chiller Temp Monitoring: Proteus flowswitch only Chiller Transformers: None Stacking Frame: None Gasbox: Mini 4 line (inc. 1x PFC1 module) Solid Source: None Vapour/ Liquid Delivery Unit: None Low Temp. Gas Interlock: None End Point Detector: None End Point Detector Options: None Chamber Lid Lift: None Chamber Cover Panels: ICP V2 Process Computer: None Computer Monitor: None E Rack Electronics Modules: ICP V2 (HCL1 +DIW +HCU3 +HCU5 +VAC3Y +2x AMC1 +HBC2) Warning Labels: English Substrate Lift Type: Tripod Platen Type: Domed Electrode Shield: Alumina, Round Clamp Type: Standard WTC Page 3/8

4 Gases: Gas Name MFC Size (sccm) Normal (Yes/No) C4F8(S) 200 Yes Viton G12 C SF6(S) 300 Yes Viton G12 C O2(S) 100 No Viton G12 C Ar 100 No Viton G12 C/P MFC No. Seal Type Line Type Gas Type (Clean/Process) Notes: G12, G15 & G16 gaslines have Inlet Valve G15 & G16 gaslines have Bypass & Purge line including Purge Valve G16 & G18 gaslines have NOValve Hardware Interlock (S) denoted 'Switched' Gasline, (SP) denotes 'Spare' Gasline Loadlock Configuration: Carousel Vacuum Loadlock Carousel Loadlock Parts for 2x 150mm Substrates Rotary Pump: Edwards E2M40F (Fomblin) Loadlock: MMPlex MkIV R/H (standard inc. SMC XLD softpump valve + Edwards APG pirani gauge + MKS 51A pressure switch) Loadlock Cable Kit: Loadlock Spatula: MMPlex carousel variable 2x 150mm Loadlock Pallet: None Loadlock Adaptor: MMPlex Carousel (inc. wafer sense laser & SMAC actuator) MACs Robot: None MACs Spatula: None Wafer Aligner: None Rectangular Gate Valve: VAT DN46 x 236 Thermal Break Kit: For VAT DN46 x 236 gate valve Compressed Air Backup: V2 high pressure vent Turbo Pump: None (Norcal NW40 angle valve) Backing Pump: Edwards E2M40F 208V 60Hz Backing Pump Interface: Edwards E2M40F (ST ) Pump N2 Trip Level (l/min): See Gas Schematics N2 Bleed: Yes Pumping Line: ISO40 (1m) Page 4/8

5 EQUIPMENT DATAS SHEET Photos: STS DRIE Etcher (front view) STS DRIE Etcher (side view) STS Affinity Chiller (front view) STS Affinity Chiller (back view) Page 5/8

6 STS Rack mount Cabinet Page 6/8

7 STS Half Rack mount Cabinet Page 7/8

8 STS Edwards Pumps Page 8/8