DuPont Reflections on Photovoltaics

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Ambrose Burke
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1 DuPont Reflections on Photovoltaics Steven C. Freilich Technology Director E. I. du Pont de Nemours and Co. CTO Electronics and Communication April 23, 2009

2 The Vision of DuPont 2 To be the world s most dynamic science company, creating sustainable solutions essential to a better, safer, healthier life for people everywhere.

3 3 Mega Trends Create Growth Opportunities Growth in developing countries Increased food production Greater safety and security Renewable energy and materials Increased total energy demand

4 DuPont Offering 4 An industry leader in several critical materials

5 Thin film PV requires unique technology solutions Objective Develop a flexible, protective front sheet for thin film modules with moisture barrier properties of glass Developing ~95% transmissive

5 5 Thin film PV requires unique technology solutions Objective Develop a flexible, protective front sheet for thin film modules with moisture barrier properties of glass Developing ~95% transmissive front sheet with good adhesion to encapsulant Very low moisture vapor transmission rate 85 o /85% humidity testing demonstrates stability of CIGS encapsulated with nm thick layer equivalent to glass polymer UB 20 nm New materials require substantial investment

6 6 Reduced Cost Through Enabling Roll-to-Roll Processing Objective Develop a non-conductive substrate film that can be roll-to-roll processed to manufacture thin film cells with higher efficiency using monolithic integration (with NREL). Substrate enabling cells with 5% higher efficiency (12-15%) >550 C Deposition temperature Scatterplot of Eff % vs Temp Eff % CIGS process Cu rich mid Cu rich start Uniform Derived from Shafaraman MRS 2001 Glass substrate Temp Efficiency increases through step-change in substrates

7 Partnering for Growth 7 Open Open Innovation Innovation External Partnerships Global Corporations National Labs Universities Start-up Companies DuPont s Technology Reservoir Market Knowledge Productization Integrated Solutions Customers Internal Internal Central Research Laboratories Strategic Business Unit Research Regional Technology Centers Open Innovation key to rapid development

8 8 Issues in a Fast-Moving Industry Rapid pace of change can make technology (and investment) obsolete Display industry experience is informative Heavy investment requiredtechnology/market uncertainty abounds Disincentive to invest further in innovation- focus more on incremental changes Market Share 100% 90% 80% 70% 60% 50% 40% 30% 20% 10% 0% Global Market Trends LCD OLED 1. LCD Juggernaut Immense investment Now China New cost reductions Motion blur solved? New backlights (LED, other?) CRT PDP 1" 3" 7" 12" 17" 22" 27" 32" 37" 42" 47" 52" 57" 60"+ 3. Hi-def hand-held Video/TV (phones & personal media) 5. Thinness everywhere RP 2. PDP pushing RP; LCD pushing PDP; Everybody pushing CRT 4. Hi-def low-cost flat-panel TV Government support can help de-risk R&D

9 9 Low (Mature) Tech rate of change Med (Growth) High (Embryonic) Government supported research Gov. Labs, Universities Industry CR&D Consortia Low Med High Market rate of change Government support can play role in managing risk

10 - Consortium 10 Very Efficient Solar Cells -Power for the Warfighter Permanent base power: Independence from the grid for essential base functions Expeditionary base power: Cuts fuel and resupply requirements Battery power charging Experienced World Class Team Comprehensive: from first principles through manufacturing Focus on integration and manufacturing capabilities Universities and industry with a common goal Bottom Line: Team goal to invent, develop and transfer to production new solar cell module Novel system architecture Integrates highest performance technology in each λ range DARPA does well with driving consortia and development support

lithography with high index fluid immersion EUV Nanoimprinting ITRS Technology Roadmap 2007 ITRS

11 Value of a Roadmap to Drive Innovation An Example from the Semiconductor Industry 11 For sub 65 nm HP, had options: 157 nm lithography 193 nm lithography with water immersion and double imaging 193 nm lithography with high index fluid immersion EUV Nanoimprinting ITRS Technology Roadmap 2007 ITRS Roadmap makes clear objectives, timing, and technology steps Roadmap allows failure to be addressed at R&D stages

12 12 Some closing thoughts Policy is kinetically, but not thermodynamically important Provide base load of market to incent the development phase Bonus and investment tax credits Support universities and gov. labs as feeders of people & technology; Help de-risk Valley of Death

Materials Science and Corporate Research

Materials Science and Corporate Research Steven C. Freilich Director, Materials Science (emeritus) DuPont Central Research & Development Materials Science and human development Handaxe ~ 1.66 million years