Progress due to: Feature size reduction - 0.7X/3 years (Moore s Law). Increasing chip size - 16% per year. Creativity in implementing functions.

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1 Introduction - Chapter 1 Evolution of IC Fabrication 1960 and 1990 integrated t circuits. it Progress due to: Feature size reduction - 0.7X/3 years (Moore s Law). Increasing chip size - 16% per year. Creativity in implementing functions. SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

2 Semiconductor Progress Introduction - Chapter 1 Decreasing: feature size (line widths, line spacing, layer depth, layer-to-layer tolerances), power per active component, operating voltage Increasing: chip size, wafer size, circuit density, circuit complexity, speed, and reliability Economics: virtuous economic and development cycle SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

3 Feature Size 100µm 10µm Device Scaling Over Time Era of Simple Scaling Introduction - Chapter 1 Cell dimensions 1µm 0.1µm 130 nm in 2002 Scaling + Innovation (ITRS) 10nm Transition Region 18 nm in 2018 Invention 1nm Quantum Effects Dominate Atomic dimensions Atomic Dimensions 0.1nm Year The era of easy scaling is over. We are now in a period where technology and device innovations are required. Beyond 2020, new currently unknown inventions will be required. SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

4 Introduction - Chapter 1 Year of Production Technology Node (half pitch) 250 nm 180 nm 130 nm 90 nm 65 nm 45 nm 32 nm 22 nm 18 nm MPU Printed Gate Length 100 nm 70 nm 53 nm 35 nm 25 nm 18 nm 13 nm 10 nm DRAM Bits/Chip (Sampling) 256M 512M 1G 4G 16G 32G 64G 128G 128G MPU Transistors/Chip (x10 6 ) ,000 Min Supply Voltage (volts) ITRS at (2003 version update) on class website. Assumes CMOS technology dominates over entire roadmap. 2 year cycle moving to 3 years (scaling + innovation now required) IBM demo of Å scale lithography. Technology appears to be capable of making structures much smaller than currently known device limits. SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

5 Linewidth vs. Fab Cost Introduction - Chapter Fab Cost ($M) Linewidth (nm) ) Fab Cost ($M) ) Linewidth (um) mm 150mm 200mm 300mm 450mm Advantages and Challenges Associated with the Introduction of 450mm Wafers :A position paper report submitted by the ITRS Starting Materials Sub-TWG, June SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

6 Introduction - Chapter 1 Moore s Law On April 19, 1965 Electronics Magazine published a paper by Gordon Moore in which he made a prediction about the semiconductor industry that has become the stuff of legend. The number of transistors incorporated in a chip will approximately double every 24 months. Known as Moore's Law, his prediction has enabled widespread proliferation of technology worldwide, and today has become shorthand for rapid technological l change. SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

7 Historical Perspective Introduction - Chapter 1 Invention of the bipolar transistor , Bell Labs. Shockley s creative failure methodology N N P P N N Grown junction transistor technology of the 1950s N P N P N N SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

8 Introduction - Chapter 1 History Bardeen, Brattain and Shockley Point Contact Transistor in 1947 at Bell Laboratory Followed by the bipolar transistor Integrated Circuit Development Jack Kilby demonstrated in 1958 Texas Instruments Robert Noyce similar time frame with Silicon Fairchild Semiconductor SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin by Prentice Hall Upper Saddle River NJ

9 Introduction - Chapter 1 SILICON VLSI TECHNOLOGY Fundamentals, Practice and Modeling By Plummer, Deal & Griffin Silicon Technology Leadership and the New Scaling Paradigm Mark Bohr, Intel Senior Fellow, Logic Technology Development April 18, by Prentice Hall Upper Saddle River NJ

10 MICROCHIP MANUFACTURING by S. Wolf Chapter 1: THE SEMICONDUCTOR INDUSTRY 2004 by LATTICE PRESS

11 Chapter 1: The Semiconductor Industry n WORLDWIDE ELECTRONICS INDUSTRY IN by LATTICE PRESS MICROCHIP MANUFACTURING 1-2 Sunset Beach CA

12 Chapter 1: n The Semiconductor Industry Electronics Manufacturing Facilities MICROCHIP MANUFACTURING 2004 LATTICE PRESS Sunset Beach CA 1-3

13 Chapter 1: The Semiconductor Industry n Integrated Circuit Manufacturing Overview MICROCHIP MANUFACTURING 2004 by LATTICE PRESS 1-4 Sunset Beach CA

14 Chapter 1: The Semiconductor Industry n The Components of the Semiconductor Industry MICROCHIP MANUFACTURING 2004 by LATTICE PRESS Sunset Beach CA 1-5

15 Chapter 1: n The Semiconductor Industry Vacuum Tubes and the Dawning of the Age of Electronics MICROCHIP MANUFACTURING 2004 by LATTICE PRESS Sunset Beach CA 1-6

16 Chapter 1: The Semiconductor Industry n The TRANSISTOR: The Age of Solid-State Electronics n Brattain, Bardeen, & Shockley (1947, ATT Bell Labs - Bipolar Transistor) MICROCHIP MANUFACTURING 2004 by LATTICE PRESS 1-7

17 Chapter 1: The Semiconductor Industry n The Age of Integrated Circuits Robert Noyce (Fairchild) The Inventors of the the Integrated Circuit (1961) MICROCHIP MANUFACTURING Jack Kilby (TI) 2004 by LATTICE PRESS Sunset Beach CA 1-8

18 Chapter 1: The Semiconductor Industry n The Growth of the Semiconductor Industry Scaling the MOSFET Moore s (Scaling) Law Moore predicted that there will be a feature-size reduction on ICs of 0.7X, every 3 years. Thus, the number of devices per chip should double every 3-years. MICROCHIP MANUFACTURING 2004 by LATTICE PRESS Sunset Beach CA 1-9

19 Chapter 1: The Semiconductor Industry n Summary of Key Concepts Integrated Circuits (ICs) are the basis of the 21 st -Century $1-Trillion Electronics Industry Basic inventions between 1945 and 1970 laid the foundation for today s silicon IC industry For more than 30 years, Moore s Law (a doubling of chip-complexity every 2-3 years) has held true Future projections suggest that these trends will continue at least to and likely beyond! MICROCHIP MANUFACTURING 2004 by LATTICE PRESS Sunset Beach CA 1-10

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