Zpulser LLC. Industry Proven HIPIMS/HPPMS Plasma Generators Based on MPP Technology.
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1 Zpulser LLC Industry Proven HIPIMS/HPPMS Plasma Generators Based on MPP Technology.
2 Zond/ Zpulser Zpulser is the sales/manufacturing division of Zond Inc. We manufacture unique pulsed dc generators for HIPMIS/HPPMS ( High Pulse Power Magnetron Sputtering) Applications based on Zond s Patents. Zpulser was established in 2005 Zond was established in US Patents issued, 2 EU Patents and 1 JP patent issued plus pending applications in the US and EU
3 Our Mission Is to build the simplest, most reliable and most cost effective HIPIMS/HPPMS industrial solution on the market. We achieved this goal by developing the most flexible and unique pulsed dc plasma generators which works with any magnetron and arc source to deliver high density plasma.
4 A Brief Pulsed Generator History The three main basic discharges are: DC, AC & RF DC yields the highest ionization <2% Pulsed DC was introduced to: To Prevent Arcing in Reactive Mode To achieve better film properties, denser, brighter ETC. It was proven that pulsed dc power produced better thin film/layers than conventional dc.
5 Zpulser s HIPMIS/HPPMS Based on MPP Technology MPP is modulated pulse plasma method using an advanced pulsed dc generator with active and passive voltage rise-time, amplitude and oscillation control plus an advanced arc suppression circuitry for magnetron and arc deposition processes. Fig. 1 MPP Voltage Pulse Fig. 2 MPP Voltage Pulse -Discharge Voltage -Discharge Current -Substrate Bias Current
6 HIPMIS/HPPMS Nano-Layer Pulse Capabilities Program different pulse shapes & have the software create the Pattern Pulse 001 Time on 1sec 266 Hz. A Pulse 002 Time on 2sec 100Hz. Pulse 001 Time on 1sec 266 Hz. A Figure 1: Method of sputtering films with different voltage pulse shapes. Pulse 002 Time on 2sec 100Hz.
7 HIPIMS/HPPMS Generators. Arbitrary Voltage pulse shapes output with arc protection circuitry for different processes MPP Generators Comprise of: 1. AC/DC unit 2. Pulser + Arc Suppression Circuitry 3. Advanced Real-time controller which monitors every pulse in real-time conditions 4. Easy to use pulse software to build arbitrary voltage pulse shapes.
8 Samples of MPP Pulses Magnetron Discharge -Discharge Voltage -Discharge Current -Substrate Bias Current Arc Discharge -Arc Discharge Voltage -Arc Discharge Current
9 Film Samples Using MPP Generators Courtesy of CSM TiAlN C Cu, TiN Al2O3
10 HIPIMS/HPPMS Advantages For Magnetrons 1- High throughput( Sputtering rate equal to DC rate) 2- High Sputtering voltage ( Up to 900V) 3- Advanced Arc suppression ( Reaction time <800ns) 4-Ability to adjust pulser output to generate metal ions to improve film/layer: a. Density b. Adhesion c. Uniformity d. Stress ( compressive vs tensile) e. Roughness f. Mechanical properties g. Electrical properties h. Optical properties 5-Yields the highest rate in oxide and nitride sputtering 6-The discharge can be used as gas activation source 7-nano-layer deposition for better stress control mainly for thick layer deposition>2um ( carbon)
11 HIPMIS/HPPMS Advantages For Arc Sources 1. High throughput 2. High Ionization 3. Reduced Macro-particle Generation 4. Ability to adjust pulser output to to improve film/layer: Density Adhesion Stress ( compressive vs tensile) Roughness Mechanical properties Electrical properties 5. Oxide and Nitride depositions 6. The discharge can be used as gas activation source
12 HIPIMS/HPPMS Generator Applications We believe that the future of thin film deposition will be achieved by I-PVD; therefore, if you are in any of the following markets: Semiconductor MEMS Data Storage Hard Coatings Tribological Coatings Solar Optical Protective Coatings Others Zpulser Generators will improve your current process and/or will enable your future process development.
13 Product Road Map Developed Products: Axia ( Peak Voltage 1100V, Peak Current 250A, up to 12kW Average Power) Sputtering Solo ( Peak Voltage 1100V, Peak Current 550A, up to 22kW Average Power) Sputtering Vesta ( DC/ Pulsed DC Bias supplies up to 1000V) Coming Soon Cyprium High Voltage ( ~1700V, 50us Pulser with voltage rise time control and voltage oscillation (40%-100%)) Q Arcus ( Peak Current 250A up to 2000A, Up to 20kW) Arc Deposition Q4 2011
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