DC & PULSE Power Supplies for Plasma Process
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1 Worldwide Sales & Service Support DC & PULSE Power Supplies for Plasma Process DC & PULSE Atmospheric Pressure Plasma Arc Ion Plating Cleaning & Bias Ion Beam OLED Heating , SK Ventium, Gosan-Ro 166, Gunpo, Gyeonggi-Do, KOREA Tel Fax Homepage : sales@entech.biz Copyright EN Technologies Inc While EN Technologies Inc. puts its best efforts to provide accurate and complete information, there may be errors in the content. EN Technologies Inc. shall not be liable for any actions taken in reliance thereon.
![Sharp] 2009 - Single PPM certified 2005 - ISO 9001](/docs-images/76/74271150/images/2-14.jpg "certified 2003 - Established EN OLED, Flexible")
2 With solid and proven product portfolio, EN Technologies Inc. offers market-leading power generation solutions and services for various applications TOP GLASS AR(Anti-Reflection) AF(Anti-Fingerprint) TOUCH PANEL ITO & Metal Sputter Reactive Sputter We are the preferred provider of power supplies across Asia. With our accumulated experiences in extensive local applications and engineering support, we thrive to fulfill our customers needs with robust, reliable, and specialized products and services. DC : Pulsed DC : EnerPulse Pulsed DC : EnerPulse DC : Bipolar Pulsed DC : EnerPulseDuo OLED, TFT-LCD, Oxide TFT Pulsed DC : EnerPulse ITO & Metal Sputter Organic & Metal Heating DC : DC for OLED Heating : Neos CASE Supplied Bipolar Pulsed DC Power Supplies for Solar Cell application of Hanwha Q-Cell - Supplied DC Power Supplies to equipment manufacturer for Samsung Electronics EMI Coating Multi Coating for color Pulsed DC : EnerPulse DC : Bipolar Pulsed DC : EnerPulseDuo metal mobile case application Established Customer Support Center in Shanghai, China ISO Certified Received Presidential Award for Entrepreneurship - Supplied DC Power Supplies to major FPD manufacturers [Samsung Display, LG Display, Japan Display, Sharp] Single PPM certified ISO 9001 certified Established EN Technologies Inc. OLED, Flexible Touch Panel, Optical Lens, ITO Glass, Automotive Wheels & Headlamps, DLC Coating Parts, TiN Coating, CIGS Solar Cell 03
3 Information Feature Arc Management DC Uni-Polar Pulse Bi-Polar Pulse Arc Ion Plating Cleaning & Bias Ion Beam Atmospheric OLED Features Arc Management Excellent Arc Control System Arc Energy Less than 0.2mJ/kW To minimize arc effect, EN Technologies arc suppression technology applies reverse voltage within 200ns and drops current value to 0 within 2.5μs at arcing to enable users to create thin film and yield High Performance Apply Stable Topology with Drooping Characteristics Generate stable plasma at ignition. Allow fast detection and stable output control at arcing. Enable users to control constant power, constant current, and constant voltage Voltage Arc Suppression Current Arc Suppression Less than 0.2mJ/kW arc energy is obtained to minimize the damages caused by arc during sputtering process Adopt topology to minimize the capacitance dv/dt Sensitivity Level Wide Operating Range Wide Operating Range Wide range of operating power curve is applied to high voltage and high current and inductance of internal energy storage Apply reverse voltage within 200ns at arcing Current value drops to 0 within 2.5μs Stable absorption the inductance energy of output cable dv/dt Arc Suppression User-friendly Arc Suppression Waveform Various interfaces such as Analog/Digital input/output, RS-232/485, Fieldbus, and Ethernet allow users to integrate systems easily Test conditions : Al Target (5 20 ) Power supply : 20 (20kW DC) Process pressure : ~ Torr Gas : Ar Parallel Operation High-capacity Maximum of 12 units (1 Master+11 Slave) can operate in parallel Idc [25A/div] Idc [25A/div] Vdc [500V/div] Vdc [200V/div] Worldwide Sales & Service Support 24-hour Customer Service We can immediately assist our customers with optimized solutions 24 hours a day, 7 days a week Arc Energy without Arc Suppressor Arc Energy with Arc Suppressor 04 EN Technologies Inc. 05
4 Information Feature Arc Management DC Uni-Polar Pulse Bi-Polar Pulse Arc Ion Plating Cleaning & Bias Ion Beam Atmospheric OLED DC Power Supplies for Magnetron Sputter Product Current Voltage 60 generates Arc energy less than 0.2mJ/kW 5/10/ /10D Vacuum Chamber MFC Semiconductor wafer sputtering TFT LCD Plasma Target Ar Gas OLED LTPS sputter metal & TCO deposition Thin film for solar cells Mobile phone cases 60 Vacuum Pump DC Power Supply Magnetron Sputter ITO deposition for touch panels Automotive wheels and headlamps Ion nitriding BIPV, data storage, FCCL DC (1Ch) 30 30H 60 5D DC (2Ch) 10D Input 3Ø 208V/ 220V/380V 3Ø 208V/ 220V/380V 3Ø 220V/380V 3Ø 380V/440V 3Ø 440V 3Ø 440V 3Ø 380V 3Ø 380V Output voltage (Ignition) 800V(1500V) 1200V(1500V) 900V(1500V) 800V(1500V)/Ch. Parallel Operation Max output current Output power 12.5A DC 5kW 25A DC 10kW 50A DC 20kW 75A DC 30kW 55A DC 30kW 150A DC 60kW 12.5A/Ch. 25A/Ch. DC 5kW+5kW DC 10kW+10kW Maximum parallel operation of 12EA (Master 1EA+Slave 11EA) Arc energy Less than Less than 0.5mJ/kW 0.2mJ/kW RS-232 / RS-485 (options : DeviceNet, ProfiBus) Less than 0.5mJ/kW Maximum output of 480kW ( 60: maximum parallel operation of 8EA) Weight[kg] x655(d) x655(d) 309(H)x483(W) x782(d) 80 x655(d) 32 x655(d) 32 Cable Duct + 129mm subject to change without notice 06 EN Technologies Inc. 07
5 Information Feature Arc Management DC Uni-Polar Pulse Bi-Polar Pulse Arc Ion Plating Cleaning & Bias Ion Beam Atmospheric OLED Pulsed DC Power Supplies for Single Magnetron Product EnerPulse Vacuum Chamber Vacuum Pump Plasma Target Pulsed DC Power Supply MFC Ar N2 O2 Semiconductor wafer sputtering Oxide TFT LCD & Color filter OLED LTPS sputter metal & TCO deposition Thin film for solar cells Mobile phone cases ITO deposition for touch panels Automotive wheels and headlamps Ion nitriding BIPV, data storage, FCCL EnerPulse 5/10/10LV/10M EnerPulse 20 PulseGen 20/30/40 Pulsed DC waveform to maximize ionization EnerPulse 5 EnerPulse 10 EnerPulse 10LV EnerPulse 10M EnerPulse 20 Pulse 20 (ES20+PG20) Pulse 30 (ES30+PG30) Pulse 40 (2xES20+PG40) Input 3Ø 208V/220V/380V 3Ø 208V/220V/380V 3Ø 380V 3Ø 380V 3Ø 220V/380V/440V 3Ø 220V/380V 3Ø 380V/440V 3Ø 220V/380V 1000V 700V > Ignition Voltage 1500V 1500V 1500V 1500V 1200V 1500V 1500V 1500V Output Output Power 800V, 6.25A / 400V, 12.5A 5kW 800V, 12.5A / 400V, 25A Pulsed DC 10kW 650V, 15.4A / 300V, 33.3A 10kW 800V, 12.5A / 400V, 25A 10kW 650V, 30A / 400V, 50A 20kW 800V, 25A / 400V, 50A 20kW 800V, 37.5A / 400V, 75A 30kW 800V, 50A / 400V, 100A 40kW Output Frequency 20 ~ 150 khz 5~350kHz 40 ~ 100 khz 40 ~ 80 khz Reverse Time DC mode, 1.0µs~10µs DC mode, 1.0µs~5µs Arc Energy Less than 1mJ/kW RS-232 / RS-485 (Option : DeviceNet, ProfiBus) Benefits Rapid increase of current induced by change in reignition voltage : 700V >1000V Adjustable reignition voltage : V x700(d) _PG _PG _PG Weight[kg] *(30.5) EN Technologies Inc. Cable Duct + 129mm subject to change without notice 09
6 Information Feature Arc Management DC Uni-Polar Pulse Bi-Polar Pulse Arc Ion Plating Cleaning & Bias Ion Beam Atmospheric OLED Bipolar Pulsed DC Power Supplies for Dual Magnetron & PECVD Current Product EnerPulse Duo Voltage MFC Vcr2 Vp2 Vcr1 Vp1 Plasma Ar N2 O2 Target T-on T-off Vacuum Pump Power Supply * Vp : Nominal pulse voltage * Vcr : Clamped pulse peak voltage (max.1200v) - Improved ionization and ignition performance - Vp1 + dv, dv = 100~300V (default 100V) - Clamping voltage width varies depending on condition of chamber EnerPulse 5 /10 Duo EnerPulse 20 Duo PulseGen 20/30 Duo EnerPulse 5 Duo EnerPulse 10 Duo EnerPulse 20 Duo DMS 20 DMS 30 Input 3Ø 380V 3Ø 380V 3Ø 440V 3Ø 220V/380V 3Ø 380V/440V Output 800V, 6.25A / 400V, 12.5A 800V, 12.5A / 400V, 25A 600V, 33.3A / 400V, 50A 800V, 25A / 400V, 50A 800V, 37.5A / 400V, 75A Output Power Bipolar Pulsed DC 5kW Bipolar Pulsed DC 10kW Bipolar Pulsed DC 20kW Bipolar Pulsed DC 20kW Bipolar Pulsed DC 30kW Output Frequency 20 ~ 50 khz 20 ~ 40kHz Reverse Time DC mode, 0.5µs~10µs DC mode, 0.5µs~2µs DC mode, 0.5µs~3µs Arc Energy Less than 1mJ/kW Less than 3mJ/kW RS-232 / RS-485 (Option : DeviceNet, ProfiBus) x700(d) _PGD _PGD Weight[kg] Dual Magnetron Sputter PECVD *Wave On : 1ms ~ 72ms (Full-time output without Wave function when this parameter set OFF.) / Period : 10ms ~ 80ms / Extra Wave : 0ms(OFF) ~ 75ms Cable Duct + 129mm subject to change without notice 10 EN Technologies Inc. 11
![Enhanced low voltage arc control EN Voltage [V] 1600 1400 1200 1000 800 Voltage limit :](/docs-images/76/74271150/images/7-4.jpg "1000V Enhanced abnormal discharge protection 600 400 200 0 10.0 20.0 30.0 40.0 50.0 60.")
![0 Current [A] 30B Hercules 10(BLV)/20(S) EnerPulse 5/10BHV 30B EnerPulse 16BHV](/docs-images/76/74271150/images/7-5.jpg "Advantages DC Pulsed DC Hercules 10BLV Hercules 10 Hercules 20 Hercules 20S 30B")
7 Information Feature Arc Management DC Uni-Polar Pulse Bi-Polar Pulse Arc Ion Plating Cleaning & Bias Ion Beam Atmospheric OLED DC Power Supply for Arc Ion Plating DC & Pulse Power Supplies for Ion Cleaning & Bias Arc Power Supply Cleaning & Biasing Surface treatment Other Bias Power Supply Enhanced Process Control Wide operating range Enhanced low voltage arc control EN Voltage [V] Voltage limit : 1000V Enhanced abnormal discharge protection Current [A] 30B Hercules 10(BLV)/20(S) EnerPulse 5/10BHV 30B EnerPulse 16BHV Advantages DC Pulsed DC Hercules 10BLV Hercules 10 Hercules 20 Hercules 20S 30B EnerPulse 5BHV EnerPulse 10BHV EnerPulse 16BHV Customized Functions High speed control of current using DSP Technology Built-in auto trigger circuit Protect target by preventing abnormal discharge with low voltage detection circuit Enhance durability by preventing the accumulation of dust/ particles Easy to install with compact design and high power density Reduced noise with built-in EMI filter Self-diagnosis (protection, limit) Coating for tools and molds DLC coating Automotive and decorative parts Metal mobile phone cases 12 EN Technologies Inc. Arc Works 200 Input 3Ø 220V/380V Output Power 10kW Output Voltage 50V / Trigger 130V Output Current 200A RS-232/ (H)x218.6(W)x608.5(D) Weight[kg] 17 subject to change without notice Input 3Ø 380V 3Ø 208V/380V 3Ø 208V/220V/380V 3Ø 208V/380V 3Ø 380V 3Ø 220V/380V 3Ø 380V Ignition 1500V 1500V 1500V 1500V 1400V Output 100V, 100A 1200V, 8.3A / 300V, 33.3A 1200V, 16.7A / 250V, 80A 800V, 25A / 400V, 50A 1000V, 30A / 500V, 60A 1400V, 5A / 1000V, 6.5A 1400V, 10A / 1000V, 13A 1150V, 17.7A / 530V, 35A Output Power DC 10kW DC 20kW DC 30kW Pulsed DC 5kW Pulsed DC 10kW Pulsed DC 16kW Output Frequency Reverse Time 20 ~ 120 khz 1.5µs~40µs Arc Energy Less than 1mJ/kW Less than 0.5mJ/kW Less than 1mJ/kW RS-232 / RS-485 (Option : ProfiBus, DeviceNet) RS-232 / RS-485 Weight[kg] Cable Duct + 129mm subject to change without notice 13
![Weight[kg] 24.5 132(H)x257(W)x531(D) RS-232 / RS-485 x590(d) x627(d) x627(d) Weight[kg] 8.5 28 37.](/docs-images/76/74271150/images/8-9.jpg "5 37.5 Cable Duct + 129mm 14 EN Technologies Inc.")
8 Information Feature Arc Management DC Uni-Polar Pulse Bi-Polar Pulse Arc Ion Plating Cleaning & Bias Ion Beam Atmospheric OLED DC Power Supply for Ion Beam Quasi Pulse Power Supplies for Atmospheric Pressure Plasma Vacuum Chamber MFC Ar Gas Nitrogen Precurson Argon Power Supply Ion Gun Plasma Ar Gas Power Supply Torch Oxygen Plasma Target DBD Type Vacuum Pump Power Supply Surface treatment with closed drift ion source Plasma Vp Large T=1/f Time Middle Torch Type Controlable Power Density Waveform Forte I-302 Input 3Ø 220V, 380V Output power 6kW Output voltage 3000V Genius J-1000 Genius 2 Genius 6 Genius 10 Output current 2A Arc energy Less than 0.5mJ/kW Torch Genius J-1000 DBD Genius 2 Genius 6 Genius 10 RS-232/485 (Option : ProfiBus, DeviceNet) Input Output Voltage 1Ø 220V 10kVpeak 3Ø 220V 10kVpeak / 15kVpeak Output Power Output Frequency Quasi Pulsed DC 1kW 40 ~ 60kHz Quasi Pulsed DC 2kW Quasi Pulsed DC 6kW 20 ~ 60 khz Quasi Pulsed DC 10kW Weight[kg] (H)x257(W)x531(D) RS-232 / RS-485 x590(d) x627(d) x627(d) Weight[kg] Cable Duct + 129mm 14 EN Technologies Inc. subject to change without notice Cable Duct + 138mm subject to change without notice 15
9 Information Feature Arc Management DC Uni-Polar Pulse Bi-Polar Pulse Arc Ion Plating Cleaning & Bias Ion Beam Atmospheric OLED DC Power Supplies for OLED Heating Process Chamber Product Line-Up NEOS Series Deposition Monitor Effusion Cell Organic (R, G, B) Material NEOS-750/1500 (Input : 1Ø / 100~265V) Deposition Controller Temperature Controller Power Supply Vacuum Pump NEOS-2000/3000 (Input : 1Ø, 3Ø / 220V) Evaporation of Point & Linear Source Application NEOS-200/400 (Input : 1Ø / 100~265V) Option1 NEOS-5000/10K (Input : 3Ø / 220V, 380V) Option2 Point Source Linear Source Model Maximum Voltage(V) Power(W) Type NEOS Evaporation of AMOLED, W-OLED & OLED lighting Evaporation of MOCVD Evaporation of CIGS solar cells Battery charging NEOS NEOS NEOS ¹/ 6 U 1U Module NEOS ,500 1U Features Voltage and current control Up to 50kW Low noise & ripple RS-232 & RS-485 NEOS ,000 2U NEOS ,000 2U NEOS ,000 3U NEOS-10K 10,000 3U 19 Standard Rack 16 EN Technologies Inc. 17
10 Power Supplies for Plasma In-line Sputter System for Touch panel 18 EN Technologies Inc. 19
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