ASCENT AP (ADVANCED PULSING) POWER SUPPLIES

Size: px

Start display at page:

Download "ASCENT AP (ADVANCED PULSING) POWER SUPPLIES"

Bruce Gregory
5 years ago
Views:

30 kw (15 kw) Voltage 1000 VDC Average Current 75 A (38

1 (ADVANCED PULSING) POWER SUPPLIES UNPRECEDENTED POWER CONTROL FOR SINGLE- AND DUAL-MAGNETRON SPUTTERING Power 30 kw (15 kw) Voltage 1000 VDC Average Current 75 A (38 A) Frequency 0, 5 to 150 khz 2018 Advanced Energy Industries, Inc.

Ascent AP (Advanced Pulsing) Power Supplies AE disrupted the dual-magnetron sputtering paradigm by introducing bipolar pulsed-dc technology, providing unprecedented plasma control where only limited

2 Ascent AP (Advanced Pulsing) Power Supplies AE disrupted the dual-magnetron sputtering paradigm by introducing bipolar pulsed-dc technology, providing unprecedented plasma control where only limited control previously existed. Ascent AP power supplies further extend your ability to optimize output by introducing additional control parameters in a compact solution for dual- and now also single-magnetron sputtering. With patented pulsing technology, the Ascent AP solution proactively inhibits arcs, and its wide operational range unlocks a range of material options to extend process flexibility and material innovation. 2 advanced-energy.com

Product Highlights Advanced waveform customization for expanded access to power delivery parameters Patented pulsing technology for remarkable arc prevention, higher power levels, and increased

3 Product Highlights Advanced waveform customization for expanded access to power delivery parameters Patented pulsing technology for remarkable arc prevention, higher power levels, and increased throughput Compact, single-unit solution (up to 30 kw) Set point compensation technology for stable throughput Wide operational range to enable a variety of process materials Precise sputtering of dielectric and conductive films Single-magnetron and dual-magnetron configurations available Extended process control, flexibility, and innovation High film quality and throughput Repeatable, customizable films Higher power levels with reduced arc damage Easy integration and control advanced-energy.com 3

Single-Magnetron Sputtering of Reactive and Conductive Materials Use as a single-magnetron sputtering supply or as a bias supply Sputtering Charge Clearing Sputtering Charge Clearing 400 Plasma

4 Single-Magnetron Sputtering of Reactive and Conductive Materials Use as a single-magnetron sputtering supply or as a bias supply Sputtering Charge Clearing Sputtering Charge Clearing 400 Plasma voltage and current Only if Icable > 0 Voltage [V] Current [A] Tcross 1 Vrev Tcross 2 t I av I pk Vprocess Time (µsec) Waveform at the Plasma (Actual) V out /I out Vboost Waveform at the Generator's Output A patented boost circuit on the leading edge of the sputtering waveform accelerates delivery of power to the process compared to a sine wave generator. The reverse portion of the waveform maximizes control, allowing more definitive charge clearing during reverse cycle. 4 advanced-energy.com

5 Dual-Magnetron Sputtering of Reactive Materials and Bi-Material Co-Sputtering Control power delivery to each magnetron independently for increased deposition rates and target utilization. Side A Side B Side A Side B Ton (2) Vboost Vprocess Voltage [V] Currrent [V] I process Tcross 1 Tcross 2 t Time (µsec) Waveform at the Plasma (Actual) Vboost Vprocess Ton (1) V out /I out T=1/Freq Waveform at the Generator's Output Ascent SMS AP Power Supply Ascent DMS AP Power Supply Power 30 kw (15 kw) 30 kw (15 kw) Voltage 1000 VDC 1000 VDC Peak Current 100 A (50 A) N/A Average Current 75 A (38 A) 75 A (38 A) Frequency 0, 5 to 150 khz 0, 5 to 150 khz Reverse Time (Max) 15 μsec N/A Duty Cycle > 60% ON time 5 to 95% Reverse Voltage 300 VDC max N/A Pulse Configuration Unipolar Bipolar advanced-energy.com 5

6 advanced-energy.com

7 advanced-energy.com 7

8 ABOUT ADVANCED ENERGY Advanced Energy (AE) has devoted more than three decades to perfecting power for its global customers. AE designs and manufactures highly engineered, precision power conversion, measurement and control solutions for mission-critical applications and processes. AE s power solutions enable customer innovation in complex semiconductor and industrial thin film plasma manufacturing processes, demanding high and low voltage applications, and temperature-critical thermal processes. With deep applications know-how and responsive service and support across the globe, AE builds collaborative partnerships to meet rapid technological developments, propel growth for its customers and power the future of technology. For international contact information, visit advanced-energy.com. sales.support@aei.com Specifications are subject to change without notice. Not responsible for errors or omissions Advanced Energy Industries, Inc. All rights reserved. Advanced Energy, AE, Ascent, and Set Point Compensation are U.S. trademarks of Advanced Energy Industries, Inc. ENG-ASCENTAP

SOLVIX ARC AND BIAS SERIES

SOLVIX ARC AND BIAS SERIES CATHODIC ARC DEPOSITION WITH PRECISE PROCESS CONTROL AND SUPERIOR FILM QUALITY Arc Units 60, 100, 210, and 400 A Bias Units 3 to 30 kw Regulation Modes Current, power, and voltage 2018 Advanced Energy