Advanced Arc-Handling for HiPIMS-PS
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1 Advanced Arc-Handling for HiPIMS-PS Advanced ARC-Handling for HiPIMS-PS Gerhard Eichenhofer April 22, 2013 SVC TechCon 2013
2 is now
3 Advanced Arc-Handling for HiPIMS-PS Advanced ARC-Handling for HiPIMS-PS
4 Overview Why ARC Control for HiPIMS? Technology Explanation How Does It Work? Next-Generation HiPIMS Power Supplies Conclusion: Advanced Arc Handling Advanced ARC-Handling for HiPIMS-PS
5 Why Arc Control for HiPIMS?
6 Plasma Discharge Regimes Magnetron sputtering is in the region of the abnormal glow discharge Source: J.R. Roth Industrial Plasma Engineering, Volume 1
7 Ultra Fast Arc Handling Requirements: The power supply should: 1. recognize and handle arcs very fast 2. dissipate stored energy in the power-delivery system to eliminate damage to the work piece. Why? In HiPIMS applications, highly energetic pulses are present. As the arc current in HiPIMS applications is in the range of thousands of amps, the energy driving the arc is huge and most likely destructive to the substrate. Advanced ARC-Handling for HiPIMS-PS
8 Arc Energy Formula The energy driving the arc is given by the formula: W = ½ LI 2 Stored Energy in the Cable Example: current of 3500 A cable length of 10 m (1uH/m) W = ½ 10 µh x 3500 A 2 = 61.3 J Advanced ARC-Handling for HiPIMS-PS
9 R. Behrisch: Surface Erosion by Electrical Arcs (1986) Prevent Droplet & Thermionic Discharge Such high energy has two impacts on the process: Advanced ARC-Handling for HiPIMS-PS Projection of droplets on the substrate Hot spot created by this high-energy impact on the target can still be hot enough to emit thermionic electrons that eventually collapse to an arc at the next pulse of the HiPIMS By reducing the arc energy, both effects of droplet and thermionic discharge can be prevented.
10 Technology Explanation How Does it Work? Advanced ARC-Handling for HiPIMS-PS
11 What Happens If It Doesn t Work? Source: R. Behrisch: Surface Erosion by Electrical Arcs (1986) Uncontrolled Arc
12 This Happens, if It Doesn t Work! Uncontrolled arc Advanced ARC-Handling for HiPIMS-PS
13 Simpified Electrical Diagram Simplified Electrical diagram Arc Energy recovery system Cathode AC input Positive Output UDc Bus Power Supply Bridge T1 Cable Negative Output Advanced ARC-Handling for HiPIMS-PS
14 Normal Operation: No Arc Advanced ARC-Handling for HiPIMS-PS
15 Regular Run Mode No Arc T 1 Current - No Arc Reg. Run Mode (Normalised)
16 Voltage & Current at Regular Run Mode No Arc Reg. Run Mode (Normalised)
17 Arc (uncontrolled) Voltage -> Drops Current -> Rises
18 Arc Mode Arc t 1 -> ARC t 2 -> ARC-handling starts ARC-Mode t 1 t 2
19 Arc-Control, Fast Arc Current Decay An arc at 3500 A (threshold-value) Competitive technologies, other than the Solvix solution require > 300 µs 3500 A threshold value (user adjustable) Fast arc current decay in <4 µs, thanks to Solvix "ICE technology
20 Arc-Detection, Arc-Handling, Energy recovery, Voltage reversal Arc Energy recovery system 2 + T
21 Arc Mode Energy Recovery ARC-Mode t 2 t 3
22 Energy Recovery Normally lost energy is recovered back into the power supplies deposition process Technology first implemented for TCO applications, the ICE-technology Modified for the use in HiPIMS applications This technology significantly reduces the energy impact on the target! AC input Simplified Electrical diagram Arc Energy recovery system Positive Output Cathode UDc Bus Power Supply Bridge T 1 Cable Negative Output Advanced ARC-Handling for HiPIMS-PS
23 Next-Generation HiPIMS Solutions
24 HiPIMS Advantages & Disadvantages compared with DC-MS Advantages Disadvantages with courtesy of Fraunhofer IST Braunschweig Better film-properties, denser films High ionization-rate HiPIMS-PS can, in general, be integrated into existing DC-MS systems No (or very low) hysteresis..and many, many more!! Low deposition rate High cost Non-sophisticated arc management Arcing can destroy the substrate and the target Advanced ARC-Handling for HiPIMS-PS
25 Next-Generation Power Supply Requirements for HiPIMS Applications Ready-to-go HiPIMS platform Single box Plug and play, fully functional Easy to install, easy to integrate into existing coating systems Easy to operate All-in-one units Sophisticated arc management Advanced ARC-Handling for HiPIMS-PS
26 The SOLVIX by AE advantage vs Conventional Technology easy integration into existing systems, direct replacement with DC-PS All in One PS; incl. DC-PS, Capacitor Bank, Pulsing Unit no additional floor or cabinet space needed directly exchangeable, without magnetron modifications SOLVIX by AE HiPIMS-PS Control Conventional HiPIMS-PS-System DC-PS, Capacitor Bank, Pulsing Unit Control AC-Input Control Interconnect AC-Input Power-output AC-Input Plasma -Chamber Control Interconnect Plasma -Chamber AC-Input Power-output Advanced ARC-Handling for HiPIMS-PS
27 Solvix by AE Product Platform HIP 3 Designed for academic, institutional, and industrial R&D All-in-one power supply 5 kw, single-box system, 1000 V A Highly flexible, compact system Fast arc handling Burst option for pulse packages Proven product platform HiPIMS- PS 10 kw Designed for industrial applications Flexible tool Single-box, compact system Impulse current up to 3000 A Frequency up to 1500 Hz Triggering (synchronization) possible BIAS-PS 15 kw DC-P Substrate BIAS for arc evaporation, magnetron sputtering, and HiPIMS-Bias applications Also used for PECVD, pre-cleaning, ion etching, and more Wide operating range, DC and pulsed DC Fast arc-handling system Full synchronization with HiPIMS-PS possible
28 Voltage Current Curve I Peak 3000 A HiP 3 HiPIMS HPPMS10 kw (Industrial)
29 HiPIMS + Bias for HiPIMS PS to Plasma Chamber Connection PVD chamber HiPIMS-PS C Target Carrousel Bias PS for HiPIMS L C
30 Solvix by AE HiPIMS, HIP 3 Triggering M/S HiP 3 1 Ext. P- Gen Each PS has individual ARC handling HiP 3 4 Substrate HiP 3 2 Sync-mode valid for all Solvix HiPIMS-PS HiP 3 3 HiP 3 Bias
31 Solvix by AE HiPIMS, HIP 3 Synchronisation Master/Slave Bias Master HiPIMS-PS Slave HiPIMS-Bias
32 Solvix by AE HiPIMS, HIP 3 Synchronisation Master/Slave Bias Slave HiPIMS-PS Master HiPIMS-Bias
33 Conclusion
34 Advanced Arc Handling for HiPIMS Yes, it works! Advanced arc handling will prevent damage to the substrate Fast arc current decay thanks to the Solvix by AE "ICE technology Effective Power Supplies have < 4 µs arc handling at max current!
35 More Information: Visit AE in Booth #412 Enter to win a tablet April 23 & 24! AE World Headquarters 1625 Sharp Point Drive Fort Collins, CO sales.support@aei.com Advanced ARC-Handling for HiPIMS-PS
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