Glimpses of MEMS. G. K. Ananthasuresh. Mechanical Engineering Indian Institute of Science Bangalore, INDIA

Size: px
Start display at page:

Download "Glimpses of MEMS. G. K. Ananthasuresh. Mechanical Engineering Indian Institute of Science Bangalore, INDIA"

Transcription

1 Glimpses of MEMS Presented to ME237 class in Jan.-Apr. term of 2005 G. K. Ananthasuresh Mechanical Engineering Indian Institute of Science Bangalore, INDIA

2 2of 80 Any sufficiently advanced technology is indistinguishable from magic. Arthur C. Clark

3 What s in a name? 3of 80 Micro-Electro-Mechanical Systems (MEMS) Widely used in Americas. MicroSystems Technology (MST) Popular in Europe. Micromachines Used in Japan. Microscience Some people prefer to call it this way as they begin to explore scientific aspects of MEMS. NEMS When a feature becomes less than a micron and is respectably measured in nanometers.

4 What? How? Why? 4of 80 What are they? How small are they? How are they useful? How do they work? What are they made of? How are they made? How do you design them? What are the modeling and design issues and challenges for us?

5 Why MEMS? 5of 80 M C M $ Because C M $ MEMS Device and Application 1996 Sales (Millions of $$) 2003 Sales (Millions of $$) Inertial measurement: Accelerometers and gyros Microfluidics: Ink jet printers, mass flow, lab chip Optics: Optical switches, displays Pressure measurement: Automotive, medical, industrial RF Devices: Cell phones, devices for radar none Other Devices: Microrelays, sensors, disk heads Source: Systems Planning Corporation, 1999

6 Where is MEMS field today? 6of 80 What does this mean? 1. MEMS field is somewhat mature because people are asking routine questions about how to design them. 2. There must be something different about designing them. 3. There is a need to learn the basics of the field and be familiar with the jargon of the field. And so we begin

7 Standards for MEMS are emerging 7of 80 3 ASTM test methods in the round-robin testing stage. (from NIST National Institute of Standards and Technology)

8 What are they? 8of 80 MEMS are systems that integrate sensing actuation computation control communication power They are smaller more functional faster less power-consuming and cheaper!

9 How small are they? 9of 80 Nanotechnology Microsystems Meso Macrosystems 10 nm 1 um 100 um 10 mm 1 m 0 A 1 nm 0.1 um 10 um 1 mm 100 mm 10 m Atoms Molecules DNA Nanostructures Virus Smallest microelectronic features Bacteria Biological cells Dust particles Dia. of human hair MEMS Optical fibers Packaged ICs Packaged MEMS Lab-on-a-chip Plain old machines Humans Animals Plamts Planes, trains, and automobiles Micro-machining Nano-machining Macro-machining Precision machining

10 Why is it exciting? 10 of 80 Money matters aside Wavelength of visible light 400nm 700nm Micro-technology brings engineering to the size scale of the workshops of the biological world. The motions of micro-mechanical devices overlap with the wavelength of the visible light and thus allowing us to play with light in interesting and useful ways.

11 Why are they small? 11 of 80 Micro size is almost incidental. They are small because of the technologies used to make them. And it is economical to make them small when made in large volumes just like microelectronics. Of course, there are some MEMS devices that would not work if they are any bigger.

12 A bit of history 12 of 80 There is plenty of room at the bottom - A 1959 lecture by Richard Feynman Pioneered by Professor James Angell at Stanford University, researchers at Westinghouse in late 1960 s into 1970 s Infinitesimal Machinery - A 1983 lecture by Richard Feynman Formal identity ( MEMS ) to the field came in late 1980 s

13 Ink-jet printer head MEMS devices in 70 s 13 of 80 Bassous E., Taub H.H., Kuhn L. Ink jet printing nozzle arrays etched in silicon Appl. Phys. Lett. 31, 135 (1977) Micro mirrors for steering light Petersen K.E. "Micromechanical light modulator array fabricated on silicon" Appl. Phys. Lett. 31, (1977) Petersen K.E. Silicon torsional scanning mirror IBM J. Res. Dev. 24, (1980) Accelerometer Roylance L.M., Angell J.B. A batch fabricated silicon accelerometer IEEE Trans. on Electron Devices 26, (1979) Optical fiber connector Schroeder C.M. "Accurate silicon spacer chips for an optical fiber cable connector" Bell. Syst. Tech. J. 57, (1977) Microfluidic device Terry S.C., Jerman J.H., Angell J.B. A gas chromatograph air analyzer fabricated on a silicon wafer IEEE Trans on Electron Devices 26, (1979)

14 MEMS devices in late 70 s and early 80 s 14 of 80 Pressure sensors Clark S.K., Wise K.D. Pressure sensitivity in anisotropically etched thin diaphragm pressure sensors IEEE Trans. on Electron Devices TED-26, (1979) Ko W.-H., Hynecek J., Boettcher S.F. Development of a miniature pressure transducer for biomedical applications IEEE Trans. on Electron Devices T-ED26, (1979) Other types of sensors Kimura K. Microheater and microbolometer using microbridge of SiO2 film on silicon Elect. Lett. 17, (1981) Najafi K., Wise K.D., Mochizuki T. A high-yield IC-compatible multichannel recording array IEEE Trans on Electron Devices 32, (1985) Stemme G. A monolithic gas flow sensor with polyimide as thermal insulator IEEE Trans. on Electron Devices TED-33, (1986) Optical switching and multiplexing Gustafsson K., Hök B. Fiberoptic switching and multiplexing with a micromechanical scanning mirror Proc. 4th Int. Conf. on Solid-State Sensors and Actuators, Tokyo, June 3-5, P 212 (1987)

15 What is common to all of them? 15 of 80 A beam or a diaphragm A bulk-micromachined silicon, glass, etc. Electrical and electronic components for sensing a signal Micro-electro-mechanical systems (MEMS)

16 A 1979 micro-accelorometer 16 of 80 Top view Bulk micro machined; Piezoresistor -based sensing Side view Roylance L.M., Angell J.B. A batch fabricated silicon accelerometer IEEE Trans. on Electron Devices 26, (1979)

17 Widespread attention came with a micromotor 17 of 80 The excitement began only after a rotary motor, revolute (pin) joints, and prismatic (sliding) joints were demonstrated. At U. C. Berkeley, MIT, and Bell Labs The reason for the excitement was batchfabrication of assembled micro-mechanisms without assembly. Crucial development: sacrificial layer process using polysilicon as the structural layer.

18 Electrostatic micromotor 18 of 80 Sacrificial layer process to make a revolute joint MUMPs process (MCNC) Ravi Jain, undergraduate at Penn.

19 Early references on micromotors 19 of 80 Gears M. Mehregany, K.J. Gabriel, and W.S.N. Trimmer, "Micro Gears and Turbines Etched from Silicon," Sensors and Actuators, vol. 12, pp , Nov./Dec Revolute joints and linkages L.S. Fan, Y.C. Tai, R.S. Muller, "Integrated Movable Micromechanical Structures for Sensors and Actuators," IEEE Trans. on Electron Devices, Vol. ED-35, No. 6, pp , June M. Mehregany, K.J. Gabriel, and W.S.N. Trimmer, "Fabrication of Integrated Polysilicon Mechanisms," IEEE Trans. Electron Devices, vol. ED-35, no. 6, pp , June Micro rotary motors Y.C. Tai and R.S. Muller, "IC-processed Electrostatic Synchronous Motor," Sensors and Actuators, Vol. 20, No. 1&2, pp , Nov. 15, M. Mehregany, S.F. Bart, L.S. Tavrow, J.H. Lang, S.D. Senturia, and M.F. Schlecht, "A Study of Three Microfabricated Variable-Capacitance Motors," Sensors and Actuators, vol. A21 A23, pp , 1990.

20 What (more) are they? 20 of 80 Early on Solid state transducers And later Integrated systems MEMS sensors actuators are batch fabricated are economical have more functionality involve physical, chemical, biochemical phenomena at small scales act upon macro scale too Take leverage of the enormously successful VLSI technology

21 How are they useful? 21 of 80 Commercial successes Pressure sensors (Motorola and several others) Accelerometers (Analog Devices, Delphi, Motorola) Ink-jet printer heads (HP) Projection display with micro mirror array (TI) Portable clinical analyzers (Abbott) etc. Movable solids and fluids at microscale made possible lots and lots of sensors and actuators.

22 Portable Clinical Analyzer (PCA) 22 of 80 The i-stat Portable Clinical Analyzer used in conjunction with disposable cartridges for determination of a variety of parameters in whole blood. stores up to 50 patient records permits on-screen viewing of test results transmission of records to a data management system using infrared signals. all with couple of drops of blood under a minute at the point of care

23 Opto A remote gas sensor (a MOEMS device) 23 of 80 Source Sample Cell Reference Cell Filter Detector Modulation Source Traditional Correlation Spectroscopy Approach Polychromator: Honeywell-MIT-Sandia project Source Sample Cell Diffractive Element Detector Holographic Correlation Spectrometer θ d Modulation Source Filter Broadband Light In Polychromatic Spectrum Out Deflectable Micromirror Grating Elements C B A D C B A Si Wafer (Source for figures: Honeywell and S. D. Senturia) Individually Addressable Array of Driver Electrodes C

24 One more way to play with light 24 of 80 (a QualComm acquisition) Interference-modulation by electrostatic actuation of vertically moving membranes.

25 Truly digital sound using MEMS 25 of 80 Analog Advantages of DRS: Large dynamic range is not necessary. Digital Nonlinearity can be controlled distortion is minimized. Fault tolerance. Intensity control. Speaklets are combined to produce the sound effect. With low-pass filters, the sound is smoothened. Diamond et al., 2003

26 More applications 26 of 80 Inertial measurement devices Accelerometers, gyroscopes Mass data storage Opto-mechanical devices Projection displays, photonics, optics-on-a-chip Flow control Bio-chemical sensors/actuators lab-on-a-chip, drug delivery, bio-sensors Communication hardware Mechanical filters, RF-switches and relays, wireless MEMS Chemical microreactors ( plant-on-a-chip ) Power MEMS Micro engines, generators

27 Consumer electronic products 27 of 80 Accelerometers: In laptops, PDAs, camcorders, CD, DVD, and MP3 players Microphones, filters, switches, etc.: Cell phones Revenues in 2001: $124.3 M Projected revenues in 2006: $613.5 M (Marlene Bourne)

28 Toys! 28 of 80 Teaching a new dog some new tricks SONY AIBO dogs reportedly use microaccelerometers. Source: SmallTimes 9/10,2003

29 MEMS affecting the macro world 29 of 80 UCLA MEMS creating large effects an example

30 MEMS to power the macro world? 30 of 80 MIT Microengine (Source: Epstein, 2003) Power on a chip Demo engine with H 2 fuel Turbine-compressor test Detail of the DRIEetched blades

31 Outline 31 of 80 What are they? How small are they? How are they useful How do they work? Pressure sensor V Capacitive sensing Piezoresistive sensing

32 How do they work? 32 of 80 Accelerometer Side view V Top view

33 Many ways to do one thing. 33 of 80 Convective accelerometer No moving parts! Dao et al., 1996; Leung et al., 1997.

34 How do they work? 34 of 80 Texas Instrument s digital light processor InFocus digital projectors

35 How do they work? 35 of 80 TI s digital light processor (DLP) torsional beam Tiltable mirror torsional beam actuating electrode 1 actuating electrode 2 (Source:

36 What lies beneath TI s digital light processor (DLP) and deformable mirror display (DMD) 36 of 80 Anatomy of DLP/DMD Ant s leg on the DMD array

37 How do they work? 37 of 80 Lucent/Bell Labs two-axis micro-mirrors optical cross-connects

38 Lucent s optical cross-connect 38 of 80 Optical fibre bundle Micro-mirror array Micro-mirror array Optical fibre bundle

39 How do they work? 39 of 80 Ink-jet printer head paper orifice ejected ink droplet Weight: ng resistive heater drive air bubble Electronics are integrated to trigger the drive bubble

40 How do they work? 40 of 80 A mechanical relay Dielectric Signal output V Signal input

41 How do they work? 41 of 80 A normally closed fluidic valve Trapped fluid Glass Silicon Glass Flow (Redwood Microsystems)

42 Two commercial micro-valves 42 of 80 Redwood Microsystems s thermo-pneumatic normally closed valve A normally open valve;

43 How do they work? 43 of 80 A diaphragm pump Diaphragm V Passive inlet valve Passive outlet valve

44 Micro-cage with cantilevers 44 of 80 C. J. Kim, UCLA Bi-metal cantilevers curled due to residual stress. Opened with actuating the bottom membrane

45 Outline 45 of 80 What are they? How small are they? How are they useful How do they work? What are they made of? How are they made?

46 What are they made of? 46 of 80 Phase 1: Old materials and old processes Silicon, its oxide, nitride, and some metals IC-chip processing technology Lithography Thin film deposition (e.g., chemical vapor deposition CVD) Etching Doping Phase 2: Old materials and new processes Silicon, its oxide, nitride, glass, polysilicon, and some metals IC-chip processing techniques enhanced as micromachining techniques Sacrificial layer process Dissolved wafer process Wafer bonding LIGA Hexil Deep reactive ion etching Etc.

47 What are they made of (contd.) 47 of 80 Phase 3: New materials and old processes Polymers More metals Ceramics Silicon carbide Piezoelectric films Ferroelectric films Shape-memory materials, etc. e.g., PDMS George Whitesides at Harvard Phase 4: New materials and new processes Processes unconventional to the microelectronic field Processes that re-define the size of MEMS micro to meso or nano Deposition and etching for the new materials

48 How are they made? 48 of 80 Surface micromachining Deposition of thin films (mainly polysilicon) Etching using masks Layered construction Bulk-micromachining Carving features into bulk wafers by etching Wafer bonding Patterning individual wafers Wafer-to-wafer bonding LIGA, HEXIL, and other HARM processes DRIE Others: laser, micro EDM, etc.

49 Micromachining is not precision machining! 49 of 80 Precision machining Relative tolerance (feature to part size) is better than For micromachining, it is 10-2 to Roughly what we have for building houses. With micromachining, You can make it small, but not precisely.

50 Surface micromachining 50 of 80 Deposit or grow silicon dioxide Silicon wafer Pattern the oxide using a mask Deposit polysilicon Pattern polysilicon Sacrifice oxide layer by dissolving The sacrificial layer process to make released structures (Berkeley)

51 Isotropic etching Types of etching 51 of 80 With agitation Without agitation Anisotropic etching (111) plane (111) (100) silicon (110) silicon Slanted surfaces

52 Bulk micromachining 52 of 80 Etch using a mask Silicon wafer Boron doping using a mask Flip and bond to a glass Glass Dissolve undoped silicon Boron doped dissolved wafer process (Michigan)

53 Wafer bonding 53 of 80 Etch a cavity in a wafer Bond another wafer Thin down / polish and etch Released cantilever using MIT s wafer bonding process

54 Making an electrostatic micromotor using surface micromachining 54 of 80 Side view Top view After sacrificing oxide layers Rotor Stator poles Cronos MUMPs (formerly MCNC MUMPs)

55 Making a micromotor 55 of 80 Deposit poly0 Etch poly0 Deposit oxide1 Dimples in oxide1 Etch oxide1 Deposit poly1

56 Making a micromotor (contd.) 56 of 80 Etch poly1 Deposit oxide2 Cross-section up to this point Cronos MUMPs (formerly MCNC MUMPs)

57 Making the micromotor (contd.) 57 of 80 Etch oxide2 Deposit poly2 Etch poly2 Deposit and etch metal Cronos MUMPs (formerly MCNC MUMPs) Cross-section before sacrificing oxide layers

58 Finished micromotor 58 of 80

59 Micromotor after release 59 of 80 Cronos MUMPs (formerly MCNC MUMPs)

60 How much should we know about u-fab? 60 of 80 Being able to draw the process flow diagrams from a description. Visualizing a process from a crosssection.

61 Visualize device from a verbal description of the process 61 of 80 Being able to draw the process flow diagrams from a description. Shallow pits were etched into n-type substrates, and p-type deflection electrodes were diffused in the above pits, followed by fusion bonding of a second wafer above the first. The top wafer was then ground and polished down to a thickness of 6 um. A passivation layer was then formed on the top wafer and sensing piezoesistors were formed using ion implantation, after which contact holes for metallization to connect to the diffused deflection electrodes were etched. Bond pads and interconnect metallization were then deposited and patterned, followed by etching of the diaphragm from the back of the wafer. Finally, two slots were etched next to the beam to release it over the buried cavity. (Petersen et al., 1991) See

62 Process flow 62 of 80 Wire bond

63 Verbalize the process steps from a device cross section 63 of 80 verbalizing a process from a cross-section. How was this made? See

64 MEMS Foundries 64 of 80 You don t have to make them if you don t want to or can t. A successful MEMS foundry MUMPs (multi-user MEMS processes) MCNC (RTP) Cronos MUMPs Uniphase MEMSCAP A recent survey shows that there are about 360 commerical MEMS fabrication facilities with an average staff of % in USA, 38% in EU, 12 % in Japan, and 9% in Asia. MEMS is growing at a CAGR of 25%. Source: Yole Development, 2003.

65 Making elements of mechanisms 65 of 80 A surface micromachined hinge (Kris Pister, Berkeley) Substrate hinge

66 Floating hinges 66 of 80 Mask layout

67 Electrostatic comb drive 67 of 80 Misaligned comb capacitors align creating actuation. Folded-beam suspension Moving combs Shuttle mass anchor Fixed combs

68 Sandia s micro mechanical lock 68 of 80 Pin in a maze

69 Close-up of Sandia s micro lock 69 of 80

70 Merry go-around for mites 70 of 80 See Sandia s web site for animation

71 Sandia s SUMMiT process revolute joint 71 of 80 Pin Rotor Substrate

72 Deep etching 72 of 80 Deep RIE (reactive ion etching) to get vertical sidewalls over large depths of several hundred microns. E.g., SCREAM (Cornell) bulk-micromachining

73 SCREAM process Noel MacDonald, Cornell university 73 of 80 Deposit and pattern mask oxide Etch bottom sidewall oxide Deep RIE silicon etch Second deep RIE silicon etch Deposit sidewall oxide Isotropic silicon etch

74 Packaging! 74 of 80 Packaging access to and protection from the external macro world Packaging is a big problem with MEMS. Sometimes, it may be better not integrate sensor/actuator and electronics. Packaging serves Signal redistribution Mechanical support Power distribution Thermal management Fluidic fittings Etc. Some techniques Ball and wire bonding Flip-chip Sandia s process Research continues

75 Chip/package level integration of M and E of MEMS 75 of 80 Sandia s chip-level integrative process Mechanical Electronic Motorola s package-level integration Divide and rule! Unity is strength

76 Outline 76 of 80 What are they? How small are they? How are they useful How do they work? What are they made of? How are they made? How do you design them? What are the modeling and design issues and challenges for us?

77 Why do MEMS devices often pose with US coins? 77 of 80 In God We Trust

78 Modeling and design of MEMS What is different? 78 of 80 Integration of sensor, actuator, mechanism, processor, power, and communication makes system level tasks challenging -- common representation for multiple energy domains Device level too has multiple energy domains -- macromodels Component level -- coupled energy domain equations Mask level -- geometric modeling

79 Modeling and design of MEMS 79 of 80 System Representing as block diagrams of multi-domain subsystems Device Reduced order macro models of the components Component (physical) Multiple, coupled energy behavioral simulations Artwork of masks and process Defining mask geometry for the process steps Each level involves design There is analysis (forward) problem and synthesis (inverse) problem.

80 Books Further reading Principles of microfabrication Marc Madou Micromachined transducers: A source book Greg Kovacs Microsystem Design Steve Senturia MEMS: Advanced materials and fabrication methods National Research Council (NRC) committee report, 1997 An Introduction to Microelectromechanical Systems Engineering N. Maluf Microsensors J. W. Gardner Sensor Technology and Devices L. Ristic Transducers, Sensors, and Detectors R. G. Seippel Microactuators: Electrical, Magnetic, Thermal, Optical, Mechanical, Chemical, and Smart Structures M. Tabib-Azar Nano- and Microelectromechanical Systems: Fundamentals of Nano- and Microengineering S. E. Lyshevski 80 of 80 The world wide web

Glimpses of MEMS. G. K. Ananthasuresh. Mechanical Engineering Indian Institute of Science Bangalore, INDIA

Glimpses of MEMS. G. K. Ananthasuresh. Mechanical Engineering Indian Institute of Science Bangalore, INDIA Glimpses of MEMS Presented to Proficience #33 class in Jan.-May term of 2005 Lecture 1 G. K. Ananthasuresh suresh@mecheng.iisc.ernet.in Mechanical Engineering Indian Institute of Science Bangalore, INDIA

More information

MEMS in ECE at CMU. Gary K. Fedder

MEMS in ECE at CMU. Gary K. Fedder MEMS in ECE at CMU Gary K. Fedder Department of Electrical and Computer Engineering and The Robotics Institute Carnegie Mellon University Pittsburgh, PA 15213-3890 fedder@ece.cmu.edu http://www.ece.cmu.edu/~mems

More information

Introduction to Microdevices and Microsystems

Introduction to Microdevices and Microsystems PHYS 534 (Fall 2008) Module on Microsystems & Microfabrication Lecture 1 Introduction to Microdevices and Microsystems Srikar Vengallatore, McGill University 1 Introduction to Microsystems Outline of Lecture

More information

RF MEMS Simulation High Isolation CPW Shunt Switches

RF MEMS Simulation High Isolation CPW Shunt Switches RF MEMS Simulation High Isolation CPW Shunt Switches Authored by: Desmond Tan James Chow Ansoft Corporation Ansoft 2003 / Global Seminars: Delivering Performance Presentation #4 What s MEMS Micro-Electro-Mechanical

More information

EE C245 ME C218 Introduction to MEMS Design

EE C245 ME C218 Introduction to MEMS Design EE C245 ME C218 Introduction to MEMS Design Fall 2008 Prof. Clark T.-C. Nguyen Dept. of Electrical Engineering & Computer Sciences University of California at Berkeley Berkeley, CA 94720 Lecture 1: Definition

More information

EE C245 ME C218 Introduction to MEMS Design Fall 2010

EE C245 ME C218 Introduction to MEMS Design Fall 2010 Instructor: Prof. Clark T.-C. Nguyen EE C245 ME C218 Introduction to MEMS Design Fall 2010 Prof. Clark T.-C. Nguyen Dept. of Electrical Engineering & Computer Sciences University of California at Berkeley

More information

Industrialization of Micro-Electro-Mechanical Systems. Werner Weber Infineon Technologies

Industrialization of Micro-Electro-Mechanical Systems. Werner Weber Infineon Technologies Industrialization of Micro-Electro-Mechanical Systems Werner Weber Infineon Technologies Semiconductor-based MEMS market MEMS Market 2004 (total 22.7 BUS$) Others mostly Digital Light Projection IR Sensors

More information

EE C245 ME C218 Introduction to MEMS Design Fall 2007

EE C245 ME C218 Introduction to MEMS Design Fall 2007 EE C245 ME C218 Introduction to MEMS Design Fall 2007 Prof. Clark T.-C. Nguyen Dept. of Electrical Engineering & Computer Sciences University of California at Berkeley Berkeley, CA 94720 Lecture 1: Definition

More information

1 Introduction 1.1 HISTORICAL DEVELOPMENT OF MICROELECTRONICS

1 Introduction 1.1 HISTORICAL DEVELOPMENT OF MICROELECTRONICS 1 Introduction 1.1 HISTORICAL DEVELOPMENT OF MICROELECTRONICS The field of microelectronics began in 1948 when the first transistor was invented. This first transistor was a point-contact transistor, which

More information

Faculty Development Program on Micro-Electro-Mechanical Systems (MEMS Sensor)

Faculty Development Program on Micro-Electro-Mechanical Systems (MEMS Sensor) Faculty Development Program on Micro-Electro-Mechanical Systems (MEMS Report MEMS sensors have been dominating the consumer products such as mobile phones, music players and other portable devices. With

More information

MEMS for RF, Micro Optics and Scanning Probe Nanotechnology Applications

MEMS for RF, Micro Optics and Scanning Probe Nanotechnology Applications MEMS for RF, Micro Optics and Scanning Probe Nanotechnology Applications Part I: RF Applications Introductions and Motivations What are RF MEMS? Example Devices RFIC RFIC consists of Active components

More information

Surface Micromachining

Surface Micromachining Surface Micromachining An IC-Compatible Sensor Technology Bernhard E. Boser Berkeley Sensor & Actuator Center Dept. of Electrical Engineering and Computer Sciences University of California, Berkeley Sensor

More information

Academic Course Description SRM University Faculty of Engineering and Technology Department of Electronics and Communication Engineering

Academic Course Description SRM University Faculty of Engineering and Technology Department of Electronics and Communication Engineering Academic Course Description SRM University Faculty of Engineering and Technology Department of Electronics and Communication Engineering EC0032 Introduction to MEMS Eighth semester, 2014-15 (Even Semester)

More information

MEMS Processes at CMP

MEMS Processes at CMP MEMS Processes at CMP MEMS Processes Bulk Micromachining MUMPs from MEMSCAP Teledyne DALSA MIDIS Micralyne MicraGEM-Si CEA/LETI Photonic Si-310 PHMP2M 2 Bulk micromachining on CMOS Compatible with electronics

More information

MEMS Sensors: From Automotive. CE Applications. MicroNanoTec Forum Innovations for Industry April 19 th Hannover, Germany

MEMS Sensors: From Automotive. CE Applications. MicroNanoTec Forum Innovations for Industry April 19 th Hannover, Germany MEMS Sensors: From Automotive to CE Applications MicroNanoTec Forum Innovations for Industry 2010 April 19 th Hannover, Germany Oliver Schatz, CTO 1 Engineering April 2010 GmbH 2009. All rights reserved,

More information

Introduction to MEMS. I) Course goals Information sources III) Course outline. Course Goals. Introduction to Micro/nano world.

Introduction to MEMS. I) Course goals Information sources III) Course outline. Course Goals. Introduction to Micro/nano world. Introduction to MEMS Instructor: Prof. T.S. Leu ( 呂宗行 ) Department of Aeronautics and Astranautics Course ID: P49170 Email: tsleu@mail.ncku.edu.tw Sep. 2014~Jan. 2015 Lecture hours: Office hours: Friday

More information

Micro-sensors - what happens when you make "classical" devices "small": MEMS devices and integrated bolometric IR detectors

Micro-sensors - what happens when you make classical devices small: MEMS devices and integrated bolometric IR detectors Micro-sensors - what happens when you make "classical" devices "small": MEMS devices and integrated bolometric IR detectors Dean P. Neikirk 1 MURI bio-ir sensors kick-off 6/16/98 Where are the targets

More information

Reducing MEMS product development and commercialization time

Reducing MEMS product development and commercialization time Reducing MEMS product development and commercialization time Introduction Fariborz Maseeh, Andrew Swiecki, Nora Finch IntelliSense Corporation 36 Jonspin Road, Wilmington MA 01887 www.intellisense.com

More information

Lecture: Integration of silicon photonics with electronics. Prepared by Jean-Marc FEDELI CEA-LETI

Lecture: Integration of silicon photonics with electronics. Prepared by Jean-Marc FEDELI CEA-LETI Lecture: Integration of silicon photonics with electronics Prepared by Jean-Marc FEDELI CEA-LETI Context The goal is to give optical functionalities to electronics integrated circuit (EIC) The objectives

More information

Wafer-level Vacuum Packaged X and Y axis Gyroscope Using the Extended SBM Process for Ubiquitous Robot applications

Wafer-level Vacuum Packaged X and Y axis Gyroscope Using the Extended SBM Process for Ubiquitous Robot applications Proceedings of the 17th World Congress The International Federation of Automatic Control Wafer-level Vacuum Packaged X and Y axis Gyroscope Using the Extended SBM Process for Ubiquitous Robot applications

More information

Micro and Smart Systems

Micro and Smart Systems Micro and Smart Systems Lecture - 39 (1)Packaging Pressure sensors (Continued from Lecture 38) (2)Micromachined Silicon Accelerometers Prof K.N.Bhat, ECE Department, IISc Bangalore email: knbhat@gmail.com

More information

EE C245 ME C218 Introduction to MEMS Design

EE C245 ME C218 Introduction to MEMS Design EE C245 ME C218 Introduction to MEMS Design Fall 2007 Prof. Clark T.-C. Nguyen Dept. of Electrical Engineering & Computer Sciences University of California at Berkeley Berkeley, CA 94720 Lecture 21: Gyros

More information

FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS IPMS. Application Area. Quality of Life

FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS IPMS. Application Area. Quality of Life FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS IPMS Application Area Quality of Life Overlay image of visible spectral range (VIS) and thermal infrared range (LWIR). Quality of Life With extensive experience

More information

Nanotechnology, the infrastructure, and IBM s research projects

Nanotechnology, the infrastructure, and IBM s research projects Nanotechnology, the infrastructure, and IBM s research projects Dr. Paul Seidler Coordinator Nanotechnology Center, IBM Research - Zurich Nanotechnology is the understanding and control of matter at dimensions

More information

Final Exam Topics. IC Technology Advancement. Microelectronics Technology in the 21 st Century. Intel s 90 nm CMOS Technology. 14 nm CMOS Transistors

Final Exam Topics. IC Technology Advancement. Microelectronics Technology in the 21 st Century. Intel s 90 nm CMOS Technology. 14 nm CMOS Transistors ANNOUNCEMENTS Final Exam: When: Wednesday 12/10 12:30-3:30PM Where: 10 Evans (last names beginning A-R) 60 Evans (last names beginning S-Z) Comprehensive coverage of course material Closed book; 3 sheets

More information

INTRODUCTION TO MICROMACHINING AND MEMS: A LECTURE AND HANDS-ON LABORATORY COURSE FOR UNDERGRADUATE AND GRADUATE STUDENTS FROM ALL BACKGROUNDS

INTRODUCTION TO MICROMACHINING AND MEMS: A LECTURE AND HANDS-ON LABORATORY COURSE FOR UNDERGRADUATE AND GRADUATE STUDENTS FROM ALL BACKGROUNDS INTRODUCTION TO MICROMACHINING AND MEMS: A LECTURE AND HANDS-ON LABORATORY COURSE FOR UNDERGRADUATE AND GRADUATE STUDENTS FROM ALL BACKGROUNDS Jack W. Judy and Paulo S. Motta Electrical Engineering Department,

More information

MEMS enable Sensors for sound Actuators to create sound Integrated electronics for processing sound signals Carrying out the necessary computations

MEMS enable Sensors for sound Actuators to create sound Integrated electronics for processing sound signals Carrying out the necessary computations Acoustic MEMS Presented to Proficience #33 class in Jan.-May term of 2005 Lecture 6b G. K. Ananthasuresh suresh@mecheng.iisc.ernet.in Mechanical Engineering Indian Institute of Science Bangalore, INDIA

More information

MICROFLEX Project: MEMS on New Emerging Smart Textiles/Flexibles

MICROFLEX Project: MEMS on New Emerging Smart Textiles/Flexibles MICROFLEX Project: MEMS on New Emerging Smart Textiles/Flexibles S Beeby, M J Tudor, R Torah, K Yang, Y Wei Dr Steve Beeby ESD Research Group Smart Fabrics 2011 5 th April 2011 Overview Introduce the MicroFlex

More information

An X band RF MEMS switch based on silicon-on-glass architecture

An X band RF MEMS switch based on silicon-on-glass architecture Sādhanā Vol. 34, Part 4, August 2009, pp. 625 631. Printed in India An X band RF MEMS switch based on silicon-on-glass architecture M S GIRIDHAR, ASHWINI JAMBHALIKAR, J JOHN, R ISLAM, C L NAGENDRA and

More information

A HIGH SENSITIVITY POLYSILICON DIAPHRAGM CONDENSER MICROPHONE

A HIGH SENSITIVITY POLYSILICON DIAPHRAGM CONDENSER MICROPHONE To be presented at the 1998 MEMS Conference, Heidelberg, Germany, Jan. 25-29 1998 1 A HIGH SENSITIVITY POLYSILICON DIAPHRAGM CONDENSER MICROPHONE P.-C. Hsu, C. H. Mastrangelo, and K. D. Wise Center for

More information

EE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2011 PROBLEM SET #2. Due (at 7 p.m.): Tuesday, Sept. 27, 2011, in the EE C245 HW box in 240 Cory.

EE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2011 PROBLEM SET #2. Due (at 7 p.m.): Tuesday, Sept. 27, 2011, in the EE C245 HW box in 240 Cory. Issued: Tuesday, Sept. 13, 2011 PROBLEM SET #2 Due (at 7 p.m.): Tuesday, Sept. 27, 2011, in the EE C245 HW box in 240 Cory. 1. Below in Figure 1.1 is a description of a DRIE silicon etch using the Marvell

More information

PROFILE CONTROL OF A BOROSILICATE-GLASS GROOVE FORMED BY DEEP REACTIVE ION ETCHING. Teruhisa Akashi and Yasuhiro Yoshimura

PROFILE CONTROL OF A BOROSILICATE-GLASS GROOVE FORMED BY DEEP REACTIVE ION ETCHING. Teruhisa Akashi and Yasuhiro Yoshimura Stresa, Italy, 25-27 April 2007 PROFILE CONTROL OF A BOROSILICATE-GLASS GROOVE FORMED BY DEEP REACTIVE ION ETCHING Teruhisa Akashi and Yasuhiro Yoshimura Mechanical Engineering Research Laboratory (MERL),

More information

Nanostencil Lithography and Nanoelectronic Applications

Nanostencil Lithography and Nanoelectronic Applications Microsystems Laboratory Nanostencil Lithography and Nanoelectronic Applications Oscar Vazquez, Marc van den Boogaart, Dr. Lianne Doeswijk, Prof. Juergen Brugger, LMIS1 Dr. Chan Woo Park, Visiting Professor

More information

Process Technology to Fabricate High Performance MEMS on Top of Advanced LSI. Shuji Tanaka Tohoku University, Sendai, Japan

Process Technology to Fabricate High Performance MEMS on Top of Advanced LSI. Shuji Tanaka Tohoku University, Sendai, Japan Process Technology to Fabricate High Performance MEMS on Top of Advanced LSI Shuji Tanaka Tohoku University, Sendai, Japan 1 JSAP Integrated MEMS Technology Roadmap More than Moore: Diversification More

More information

Optical MEMS pressure sensor based on a mesa-diaphragm structure

Optical MEMS pressure sensor based on a mesa-diaphragm structure Optical MEMS pressure sensor based on a mesa-diaphragm structure Yixian Ge, Ming WanJ *, and Haitao Yan Jiangsu Key Lab on Opto-Electronic Technology, School of Physical Science and Technology, Nanjing

More information

IWORID J. Schmitz page 1. Wafer-level CMOS post-processing Jurriaan Schmitz

IWORID J. Schmitz page 1. Wafer-level CMOS post-processing Jurriaan Schmitz IWORID J. Schmitz page 1 Wafer-level CMOS post-processing Jurriaan Schmitz IWORID J. Schmitz page 2 Outline Introduction on wafer-level post-proc. CMOS: a smart, but fragile substrate Post-processing steps

More information

Waveguide-Mounted RF MEMS for Tunable W-band Analog Type Phase Shifter

Waveguide-Mounted RF MEMS for Tunable W-band Analog Type Phase Shifter Waveguide-Mounted RF MEMS for Tunable W-band Analog Type Phase Shifter D. PSYCHOGIOU 1, J. HESSELBARTH 1, Y. LI 2, S. KÜHNE 2, C. HIEROLD 2 1 Laboratory for Electromagnetic Fields and Microwave Electronics

More information

SILICON BASED CAPACITIVE SENSORS FOR VIBRATION CONTROL

SILICON BASED CAPACITIVE SENSORS FOR VIBRATION CONTROL SILICON BASED CAPACITIVE SENSORS FOR VIBRATION CONTROL Shailesh Kumar, A.K Meena, Monika Chaudhary & Amita Gupta* Solid State Physics Laboratory, Timarpur, Delhi-110054, India *Email: amita_gupta/sspl@ssplnet.org

More information

Feature-level Compensation & Control

Feature-level Compensation & Control Feature-level Compensation & Control 2 Sensors and Control Nathan Cheung, Kameshwar Poolla, Costas Spanos Workshop 11/19/2003 3 Metrology, Control, and Integration Nathan Cheung, UCB SOI Wafers Multi wavelength

More information

CONTENTS. Foreword S. D. Senturia. M. E. Motamedi Acknowledgments

CONTENTS. Foreword S. D. Senturia. M. E. Motamedi Acknowledgments CONTENTS Foreword S. D. Senturia Preface M. E. Motamedi Acknowledgments xv xvii xix 1 Introduction 1 M. E. Motamedi 1.1 Integrated circuits and the evolution of micromachining 1 1.2 MEMS review 3 1.3 New

More information

A capacitive absolute-pressure sensor with external pick-off electrodes

A capacitive absolute-pressure sensor with external pick-off electrodes J. Micromech. Microeng. 10 (2000) 528 533. Printed in the UK PII: S0960-1317(00)13844-6 A capacitive absolute-pressure sensor with external pick-off electrodes J-S Park and Y B Gianchandani Department

More information

SAMPLE SLIDES & COURSE OUTLINE. Core Competency In Semiconductor Technology: 2. FABRICATION. Dr. Theodore (Ted) Dellin

SAMPLE SLIDES & COURSE OUTLINE. Core Competency In Semiconductor Technology: 2. FABRICATION. Dr. Theodore (Ted) Dellin & Digging Deeper Devices, Fabrication & Reliability For More Info:.com or email Dellin@ieee.org SAMPLE SLIDES & COURSE OUTLINE In : 2. A Easy, Effective, of How Devices Are.. Recommended for everyone who

More information

CMP for More Than Moore

CMP for More Than Moore 2009 Levitronix Conference on CMP Gerfried Zwicker Fraunhofer Institute for Silicon Technology ISIT Itzehoe, Germany gerfried.zwicker@isit.fraunhofer.de Contents Moore s Law and More Than Moore Comparison:

More information

Yoshihiko ISOBE Hiroshi MUTO Tsuyoshi FUKADA Seiji FUJINO

Yoshihiko ISOBE Hiroshi MUTO Tsuyoshi FUKADA Seiji FUJINO Yoshihiko ISOBE Hiroshi MUTO Tsuyoshi FUKADA Seiji FUJINO Increased performance requirements in terms of the environment, safety and comfort have recently been imposed on automobiles to ensure efficient

More information

CMUT and PMUT: New Technology Platform for Medical Ultrasound Rob van Schaijk

CMUT and PMUT: New Technology Platform for Medical Ultrasound Rob van Schaijk CMUT and PMUT: New Technology Platform for Medical Ultrasound Rob van Schaijk November 2018 MUT introduction Medical ultra-sound imaging Probes and transducers Linear array Sound waves in straight line

More information

Guided Wave Micro-Opto-Electro-Mechanical Sensors

Guided Wave Micro-Opto-Electro-Mechanical Sensors Guided Wave Micro-Opto-Electro-Mechanical Sensors Talabattula Srinivas Applied Photonics Laboratory, Department of Electrical Communication Engineering Indian Institute of Science, Bangalore 560012, India.

More information

DEVELOPMENT OF RF MEMS SYSTEMS

DEVELOPMENT OF RF MEMS SYSTEMS DEVELOPMENT OF RF MEMS SYSTEMS Ivan Puchades, Ph.D. Research Assistant Professor Electrical and Microelectronic Engineering Kate Gleason College of Engineering Rochester Institute of Technology 82 Lomb

More information

High-yield Fabrication Methods for MEMS Tilt Mirror Array for Optical Switches

High-yield Fabrication Methods for MEMS Tilt Mirror Array for Optical Switches : MEMS Device Technologies High-yield Fabrication Methods for MEMS Tilt Mirror Array for Optical Switches Joji Yamaguchi, Tomomi Sakata, Nobuhiro Shimoyama, Hiromu Ishii, Fusao Shimokawa, and Tsuyoshi

More information

Deformable Membrane Mirror for Wavefront Correction

Deformable Membrane Mirror for Wavefront Correction Defence Science Journal, Vol. 59, No. 6, November 2009, pp. 590-594 Ó 2009, DESIDOC SHORT COMMUNICATION Deformable Membrane Mirror for Wavefront Correction Amita Gupta, Shailesh Kumar, Ranvir Singh, Monika

More information

Sensitivity Analysis of MEMS Based Piezoresistive Sensor Using COMSOL Multiphysics

Sensitivity Analysis of MEMS Based Piezoresistive Sensor Using COMSOL Multiphysics See discussions, stats, and author profiles for this publication at: http://www.researchgate.net/publication/269222582 Sensitivity Analysis of MEMS Based Piezoresistive Sensor Using COMSOL Multiphysics

More information

MICROACTUATED MICRO-XYZ STAGES FOR FREE-SPACE MICRO-OPTICAL BENCH

MICROACTUATED MICRO-XYZ STAGES FOR FREE-SPACE MICRO-OPTICAL BENCH MCROACTUATED MCRO-XYZ STAGES FOR FREE-SPACE MCRO-OPTCAL BENCH L. Y. Lin*, J. L. Shen, S. S. Lee, G. D. Su, and M. C. Wu University of California at Los Angeles, Electrical Engineering Department 405 Hilgard

More information

Synthesis of Silicon. applications. Nanowires Team. Régis Rogel (Ass.Pr), Anne-Claire Salaün (Ass. Pr)

Synthesis of Silicon. applications. Nanowires Team. Régis Rogel (Ass.Pr), Anne-Claire Salaün (Ass. Pr) Synthesis of Silicon nanowires for sensor applications Anne-Claire Salaün Nanowires Team Laurent Pichon (Pr), Régis Rogel (Ass.Pr), Anne-Claire Salaün (Ass. Pr) Ph-D positions: Fouad Demami, Liang Ni,

More information

Microelectromechanical spatial light modulators with integrated

Microelectromechanical spatial light modulators with integrated Microelectromechanical spatial light modulators with integrated electronics Steven Cornelissen1, Thomas Bifano2, Paul Bierden3 1 Aerospace and Mechanical Engineering, Boston University, Boston, MA 02215

More information

Transistor was first invented by William.B.Shockley, Walter Brattain and John Bardeen of Bell Labratories. In 1961, first IC was introduced.

Transistor was first invented by William.B.Shockley, Walter Brattain and John Bardeen of Bell Labratories. In 1961, first IC was introduced. Unit 1 Basic MOS Technology Transistor was first invented by William.B.Shockley, Walter Brattain and John Bardeen of Bell Labratories. In 1961, first IC was introduced. Levels of Integration:- i) SSI:-

More information

UNIVERSITY OF UTAH ELECTRICAL ENGINEERING DEPARTMENT LABORATORY PROJECT NO. 3 DESIGN OF A MICROMOTOR DRIVER CIRCUIT

UNIVERSITY OF UTAH ELECTRICAL ENGINEERING DEPARTMENT LABORATORY PROJECT NO. 3 DESIGN OF A MICROMOTOR DRIVER CIRCUIT UNIVERSITY OF UTAH ELECTRICAL ENGINEERING DEPARTMENT EE 1000 LABORATORY PROJECT NO. 3 DESIGN OF A MICROMOTOR DRIVER CIRCUIT 1. INTRODUCTION The following quote from the IEEE Spectrum (July, 1990, p. 29)

More information

In Situ Measurement of Mechanical Properties of Polyimide Films Using Micromachined Resonant String Structures

In Situ Measurement of Mechanical Properties of Polyimide Films Using Micromachined Resonant String Structures 282 IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGY, VOL. 22, NO. 2, JUNE 1999 In Situ Measurement of Mechanical Properties of Polyimide Films Using Micromachined Resonant String Structures Yong-Jun

More information

Micromachined Integrated Optics for Free-Space Interconnections

Micromachined Integrated Optics for Free-Space Interconnections Micromachined Integrated Optics for Free-Space Interconnections L. Y. Lin, S. S. Lee, M C. Wu, and K S. J. Pister Electrical Engineering Dept., University of California, Los Angeles, CA 90024, U. S. A.

More information

NOISE IN MEMS PIEZORESISTIVE CANTILEVER

NOISE IN MEMS PIEZORESISTIVE CANTILEVER NOISE IN MEMS PIEZORESISTIVE CANTILEVER Udit Narayan Bera Mechatronics, IIITDM Jabalpur, (India) ABSTRACT Though pezoresistive cantilevers are very popular for various reasons, they are prone to noise

More information

Intro to MEMS. Lecture 1: Dong-Il Dan Cho. Seoul National University Nano/Micro Systems & Controls Laboratory

Intro to MEMS. Lecture 1: Dong-Il Dan Cho. Seoul National University Nano/Micro Systems & Controls Laboratory Lecture 1: Intro to MEMS School of Electrical l Engineering i and Computer Science, Seoul National University Nano/Micro Systems & Controls Laboratory Email: dicho@snu.ac.kr URL: http://nml.snu.ac.kr What

More information

MICROMACHINED INTERFEROMETER FOR MEMS METROLOGY

MICROMACHINED INTERFEROMETER FOR MEMS METROLOGY MICROMACHINED INTERFEROMETER FOR MEMS METROLOGY Byungki Kim, H. Ali Razavi, F. Levent Degertekin, Thomas R. Kurfess G.W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta,

More information

Silicon Light Machines Patents

Silicon Light Machines Patents 820 Kifer Road, Sunnyvale, CA 94086 Tel. 408-240-4700 Fax 408-456-0708 www.siliconlight.com Silicon Light Machines Patents USPTO No. US 5,808,797 US 5,841,579 US 5,798,743 US 5,661,592 US 5,629,801 US

More information

Des MEMS aux NEMS : évolution des technologies et des concepts aux travers des développements menés au LETI

Des MEMS aux NEMS : évolution des technologies et des concepts aux travers des développements menés au LETI Des MEMS aux NEMS : évolution des technologies et des concepts aux travers des développements menés au LETI Ph. Robert 1 Content LETI at a glance From MEMS to NEMS: 30 years of technological evolution

More information

Silicon on Insulator CMOS and Microelectromechanical Systems: Mechanical Devices, Sensing Techniques and System Electronics

Silicon on Insulator CMOS and Microelectromechanical Systems: Mechanical Devices, Sensing Techniques and System Electronics Silicon on Insulator CMOS and Microelectromechanical Systems: Mechanical Devices, Sensing Techniques and System Electronics Dissertation Defense Francisco Tejada Research Advisor A.G. Andreou Department

More information

CMOS-Electromechanical Systems Microsensor Resonator with High Q-Factor at Low Voltage

CMOS-Electromechanical Systems Microsensor Resonator with High Q-Factor at Low Voltage CMOS-Electromechanical Systems Microsensor Resonator with High Q-Factor at Low Voltage S.Thenappan 1, N.Porutchelvam 2 1,2 Department of ECE, Gnanamani College of Technology, India Abstract The paper presents

More information

Sensors & Transducers Published by IFSA Publishing, S. L., 2016

Sensors & Transducers Published by IFSA Publishing, S. L., 2016 Sensors & Transducers Published by IFSA Publishing, S. L., 2016 http://www.sensorsportal.com Out-of-plane Characterization of Silicon-on-insulator Multiuser MEMS Processes-based Tri-axis Accelerometer

More information

Design, Characterization & Modelling of a CMOS Magnetic Field Sensor

Design, Characterization & Modelling of a CMOS Magnetic Field Sensor Design, Characteriation & Modelling of a CMOS Magnetic Field Sensor L. Latorre,, Y.Bertrand, P.Haard, F.Pressecq, P.Nouet LIRMM, UMR CNRS / Universit de Montpellier II, Montpellier France CNES, Quality

More information

2007-Novel structures of a MEMS-based pressure sensor

2007-Novel structures of a MEMS-based pressure sensor C-(No.16 font) put by office 2007-Novel structures of a MEMS-based pressure sensor Chang-Sin Park(*1), Young-Soo Choi(*1), Dong-Weon Lee (*2) and Bo-Seon Kang(*2) (1*) Department of Mechanical Engineering,

More information

THERE has been a significant growth of optical fiber

THERE has been a significant growth of optical fiber JOURNAL OF LIGHTWAVE TECHNOLOGY, VOL. 17, NO. 1, JANUARY 1999 7 Free-Space Fiber-Optic Switches Based on MEMS Vertical Torsion Mirrors Shi-Sheng Lee, Member, IEEE, Long-Sun Huang, Chang-Jin Kim, and Ming

More information

High sensitivity acoustic transducers with thin p q membranes and gold back-plate

High sensitivity acoustic transducers with thin p q membranes and gold back-plate Ž. Sensors and Actuators 78 1999 138 142 www.elsevier.nlrlocatersna High sensitivity acoustic transducers with thin p q membranes and gold back-plate A.E. Kabir a, R. Bashir b,), J. Bernstein c, J. De

More information

History of MEMS Learning Module

History of MEMS Learning Module Southwest Center for Microsystems Education (SCME) University of New Mexico History of MEMS Learning Module This booklet contains five (5) units: History of MEMS Knowledge Probe (KP) History of MEMS Primary

More information

Hermetic Packaging Solutions using Borosilicate Glass Thin Films. Lithoglas Hermetic Packaging Solutions using Borosilicate Glass Thin Films

Hermetic Packaging Solutions using Borosilicate Glass Thin Films. Lithoglas Hermetic Packaging Solutions using Borosilicate Glass Thin Films Hermetic Packaging Solutions using Borosilicate Glass Thin Films 1 Company Profile Company founded in 2006 ISO 9001:2008 qualified since 2011 Headquarters and Production in Dresden, Germany Production

More information

FABRICATION OF CMOS INTEGRATED CIRCUITS. Dr. Mohammed M. Farag

FABRICATION OF CMOS INTEGRATED CIRCUITS. Dr. Mohammed M. Farag FABRICATION OF CMOS INTEGRATED CIRCUITS Dr. Mohammed M. Farag Outline Overview of CMOS Fabrication Processes The CMOS Fabrication Process Flow Design Rules Reference: Uyemura, John P. "Introduction to

More information

[Reddy, 2(9): September, 2013] ISSN: Impact Factor: 1.852

[Reddy, 2(9): September, 2013] ISSN: Impact Factor: 1.852 IJESRT INTERNATIONAL JOURNAL OF ENGINEERING SCIENCES & RESEARCH TECHNOLOGY Study on MEMS Fabrication Techniques and Applications S. Madhava Reddy *1 and A. Anudeep Kumar 2 *1 Associate Professor, Dept.

More information

BMC s heritage deformable mirror technology that uses hysteresis free electrostatic

BMC s heritage deformable mirror technology that uses hysteresis free electrostatic Optical Modulator Technical Whitepaper MEMS Optical Modulator Technology Overview The BMC MEMS Optical Modulator, shown in Figure 1, was designed for use in free space optical communication systems. The

More information

Introduction to Microeletromechanical Systems (MEMS) Lecture 12 Topics. MEMS Overview

Introduction to Microeletromechanical Systems (MEMS) Lecture 12 Topics. MEMS Overview Introduction to Microeletromechanical Systems (MEMS) Lecture 2 Topics MEMS for Wireless Communication Components for Wireless Communication Mechanical/Electrical Systems Mechanical Resonators o Quality

More information

A COMPARITIVE ANALYSIS ON NANOWIRE BASED MEMS PRESSURE SENSOR

A COMPARITIVE ANALYSIS ON NANOWIRE BASED MEMS PRESSURE SENSOR A COMPARITIVE ANALYSIS ON NANOWIRE BASED MEMS PRESSURE SENSOR Abstract S.Maflin Shaby Electronic and Telecommunication Enginering, Sathyabam University, Jeppiaar Nager, Chennai600119,India. maflinshaby@yahoo.co.in.

More information

64 Channel Flip-Chip Mounted Selectively Oxidized GaAs VCSEL Array

64 Channel Flip-Chip Mounted Selectively Oxidized GaAs VCSEL Array 64 Channel Flip-Chip Mounted Selectively Oxidized GaAs VCSEL Array 69 64 Channel Flip-Chip Mounted Selectively Oxidized GaAs VCSEL Array Roland Jäger and Christian Jung We have designed and fabricated

More information

INF 5490 RF MEMS. LN12: RF MEMS inductors. Spring 2011, Oddvar Søråsen Department of informatics, UoO

INF 5490 RF MEMS. LN12: RF MEMS inductors. Spring 2011, Oddvar Søråsen Department of informatics, UoO INF 5490 RF MEMS LN12: RF MEMS inductors Spring 2011, Oddvar Søråsen Department of informatics, UoO 1 Today s lecture What is an inductor? MEMS -implemented inductors Modeling Different types of RF MEMS

More information

Piezoelectric Sensors and Actuators

Piezoelectric Sensors and Actuators Piezoelectric Sensors and Actuators Outline Piezoelectricity Origin Polarization and depolarization Mathematical expression of piezoelectricity Piezoelectric coefficient matrix Cantilever piezoelectric

More information

Large-scale metal MEMS mirror arrays with integrated

Large-scale metal MEMS mirror arrays with integrated Large-scale metal MEMS mirror arrays with integrated electronics Thomas Bifano', Paul Bierden2, Steven Cornelissen1, Clara Dimas2, Hocheol Lee1, Michele Miller3, and Julie Perreault1 'Boston University,

More information

NanoFabrication Kingston. Seminar and Webinar January 31, 2017 Rob Knobel Associate Professor, Dept. of Physics Queen s University

NanoFabrication Kingston. Seminar and Webinar January 31, 2017 Rob Knobel Associate Professor, Dept. of Physics Queen s University NanoFabrication Kingston Seminar and Webinar January 31, 2017 Rob Knobel Associate Professor, Dept. of Physics Queen s University What is NFK? It s a place, an team of experts and a service. The goal of

More information

Robert G. Hunsperger. Integrated Optics. Theory and Technology. Sixth Edition. 4ü Spri rineer g<

Robert G. Hunsperger. Integrated Optics. Theory and Technology. Sixth Edition. 4ü Spri rineer g< Robert G. Hunsperger Integrated Optics Theory and Technology Sixth Edition 4ü Spri rineer g< 1 Introduction 1 1.1 Advantages of Integrated Optics 2 1.1.1 Comparison of Optical Fibers with Other Interconnectors

More information

How an ink jet printer works

How an ink jet printer works How an ink jet printer works Eric Hanson Hewlett Packard Laboratories Ink jet printers are the most common type of printing devices used in home environments, and they are also frequently used personal

More information

Lecture 0: Introduction

Lecture 0: Introduction Lecture 0: Introduction Introduction Integrated circuits: many transistors on one chip. Very Large Scale Integration (VLSI): bucketloads! Complementary Metal Oxide Semiconductor Fast, cheap, low power

More information

Fabrication and application of a wireless inductance-capacitance coupling microsensor with electroplated high permeability material NiFe

Fabrication and application of a wireless inductance-capacitance coupling microsensor with electroplated high permeability material NiFe Journal of Physics: Conference Series Fabrication and application of a wireless inductance-capacitance coupling microsensor with electroplated high permeability material NiFe To cite this article: Y H

More information

ECE 5745 Complex Digital ASIC Design Topic 2: CMOS Devices

ECE 5745 Complex Digital ASIC Design Topic 2: CMOS Devices ECE 5745 Complex Digital ASIC Design Topic 2: CMOS Devices Christopher Batten School of Electrical and Computer Engineering Cornell University http://www.csl.cornell.edu/courses/ece5950 Simple Transistor

More information

SMART SENSORS AND MEMS

SMART SENSORS AND MEMS 2 SMART SENSORS AND MEMS Dr. H. K. Verma Distinguished Professor (EEE) Sharda University, Greater Noida (Formerly: Deputy Director and Professor of Instrumentation Indian Institute of Technology Roorkee)

More information

Lecture 020 ECE4430 Review II (1/5/04) Page 020-1

Lecture 020 ECE4430 Review II (1/5/04) Page 020-1 Lecture 020 ECE4430 Review II (1/5/04) Page 020-1 LECTURE 020 ECE 4430 REVIEW II (READING: GHLM - Chap. 2) Objective The objective of this presentation is: 1.) Identify the prerequisite material as taught

More information

Lecture 020 ECE4430 Review II (1/5/04) Page 020-1

Lecture 020 ECE4430 Review II (1/5/04) Page 020-1 Lecture 020 ECE4430 Review II (1/5/04) Page 020-1 LECTURE 020 ECE 4430 REVIEW II (READING: GHLM - Chap. 2) Objective The objective of this presentation is: 1.) Identify the prerequisite material as taught

More information

Photolithography I ( Part 1 )

Photolithography I ( Part 1 ) 1 Photolithography I ( Part 1 ) Chapter 13 : Semiconductor Manufacturing Technology by M. Quirk & J. Serda Bjørn-Ove Fimland, Department of Electronics and Telecommunication, Norwegian University of Science

More information

MICROSYSTEMS AND RELIABILITY

MICROSYSTEMS AND RELIABILITY 24 Microsystems and Reliability MICROSYSTEMS AND RELIABILITY Titu-Marius I. Băjenescu, prof. Dr.eng. Elveția 1. INTRODUCTION The advancement of microdevices technologies (Figure 1) in recent decades has

More information

The Department of Advanced Materials Engineering. Materials and Processes in Polymeric Microelectronics

The Department of Advanced Materials Engineering. Materials and Processes in Polymeric Microelectronics The Department of Advanced Materials Engineering Materials and Processes in Polymeric Microelectronics 1 Outline Materials and Processes in Polymeric Microelectronics Polymeric Microelectronics Process

More information

Diffraction, Fourier Optics and Imaging

Diffraction, Fourier Optics and Imaging 1 Diffraction, Fourier Optics and Imaging 1.1 INTRODUCTION When wave fields pass through obstacles, their behavior cannot be simply described in terms of rays. For example, when a plane wave passes through

More information

Design of Micro robotic Detector Inspiration from the fly s eye

Design of Micro robotic Detector Inspiration from the fly s eye Design of Micro robotic Detector Inspiration from the fly s eye Anshi Liang and Jie Zhou Dept. of Electrical Engineering and Computer Science University of California, Berkeley, CA 947 ABSTRACT This paper

More information

Electrostatic actuation of silicon optomechanical resonators Suresh Sridaran and Sunil A. Bhave OxideMEMS Lab, Cornell University, Ithaca, NY, USA

Electrostatic actuation of silicon optomechanical resonators Suresh Sridaran and Sunil A. Bhave OxideMEMS Lab, Cornell University, Ithaca, NY, USA Electrostatic actuation of silicon optomechanical resonators Suresh Sridaran and Sunil A. Bhave OxideMEMS Lab, Cornell University, Ithaca, NY, USA Optomechanical systems offer one of the most sensitive

More information

Dr. Lynn Fuller, Ivan Puchades

Dr. Lynn Fuller, Ivan Puchades ROCHESTER INSTITUTE OF TECHNOLOGY MICROELECTRONIC ENGINEERING Bulk Micromachined Laboratory Project Dr. Lynn Fuller, Ivan Puchades Motorola Professor 82 Lomb Memorial Drive Rochester, NY 14623-5604 Tel

More information

Figure 1: Layout of the AVC scanning micromirror including layer structure and comb-offset view

Figure 1: Layout of the AVC scanning micromirror including layer structure and comb-offset view Bauer, Ralf R. and Brown, Gordon G. and Lì, Lì L. and Uttamchandani, Deepak G. (2013) A novel continuously variable angular vertical combdrive with application in scanning micromirror. In: 2013 IEEE 26th

More information

Optical beam steering using a 2D MEMS scanner

Optical beam steering using a 2D MEMS scanner Optical beam steering using a 2D MEMS scanner Yves Pétremand a, Pierre-André Clerc a, Marc Epitaux b, Ralf Hauffe c, Wilfried Noell a and N.F. de Rooij a a Institute of Microtechnology, University of Neuchâtel,

More information

Heterogeneous Technology Alliance. SOI MEMS Platform

Heterogeneous Technology Alliance. SOI MEMS Platform Heterogeneous Technology Alliance SOI MEMS Platform Added value of HTA SOI MEMS Platform to customers 23-Aug-11 Page 1 Attractive offering of HTA SOI MEMS Platform One-stop shop 1 Very extensive R&D resources,

More information

Triple i - The key to your success

Triple i - The key to your success Triple i - The key to your success The needs and challenges of today s world are becoming ever more demanding. Standards are constantly rising. Creativity, reliability and high performance are basic prerequisites

More information