Photo-resist Stripper
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1 Photo-resist Stripper TAIWAX MAXWAVE Co., Ltd, No. 999, Bayiu 1 st Rd., Guanyin Township, Taoyuan County Taiwan Evan Chen 2016
2 Outline Introduction The Characteristic of Negative and Positive Photoresists Resist Types Taimax s Products Cross Reference List Benefit and Material Compatibility Performance
3 The Characteristic of Negative and Positive Photoresists Photoresist Substrate Mask/reticle Photoresist Negative Photoresist Positive Photoresist Substrate Substrate Substrate UV light Exposure After Development
4 The Characteristic of Negative and Positive Photoresists Characteristic Positive Negative Component Poly(methyl glutarimide) (PMGI) Phenol formaldehyde resin (DNQ/Novolac) SU-8 Indene-Carboxylic-Acid (ICA) Adhesion to Silicon Fair Excellent Hydrophilic Benzoin/Acrylic (PMMA) Triazine/Novolac (3D X-link) Thick film/copolymer with polystyrene (PS) Hydrophobic Rubber: Azide/Isoprene (Xchain link) Relative Cost More Expensive Less Expensive Category Inorganic solvents: KOH based, NaOH based and etc organic solvents: TMAH based, NMP based, DMSO based and etc
5 Resist Types Targets: g-line(436nm for 0.5um technology) i-line(365nm for 0.3um) deep UV (248nm & 193nm for 0.25 & 0.18um) Positive (hydrophilic) DNQ/Novolak(phenol-formaldehyde) Negative Hydrophilic Benzoin/Acrylic (PMMA) (also dry-film) Triazine/Novolak (3D X-link) Thick Film Copolymer with polystyrene (PS) um thickness For solder bumping, metal lift-off, MEMS Hydrophobic Rubber: Azide/Isoprene (X-chain link)
6 Cross Reference List Taimax s product Photo-resist (PR) Note PRS-991 LD-300D1 NMP based PRS-219 Lift off -ENPI 202, ENPI 205 Aromatic Solvent + Alkyl Sulfonic Acid PRS-809 Lift off -N-Nof(AZ), EPG-516 (P) NMP based PRS-239 AZ-4620, TOK-HA 1300 Alkyl alcohol based High selectivity to Sn, Ag, Al, Cu and PI film PRS-615 DNR-L300D1 (N) NMP based High selectivity to Ag, Al and Cu PRS-240 AsahiCXA240, AsahiCX-A270, TOK50240, 50120, PW1000 Alkyl alcohol based High selectivity to Sn, Ag, Al, Cu and PI film PRS-701 CR-4000, AZ-4620 DMSO-based PRS-816 Eagle 2007 Lactic acid based PRS-777 TOK-31 NMP based High selectivity to AlCu, Al and Cu PRS-278 NP7-6000P, ENPI-202 and EP3200 DMSO-based High selectivity to GaAs, Al, ITO and Ti
7 Benefit and Material Compatibility Benefit A single-dose Short processing times: minutes Low etching rates on many sensitive metals such as Al, Ti, Ni, Au, Sn, Ag and TiW Suitable for use in immersion, batch spray, and single wafer tools Long bath life Material Compatibility 316LEP Stainless Steel Quartz Propylene (P.P.) Polytetrafluoroethyene (PTFE) Polyvinylidene fluoride (PVDF) High-density polyethylene (HDPE)
8 Stripping Capability for Dry Film in Bumping Process After stripping by PRS-240 (Dry film: AsahiCX-A270) After a comprehensive identification by scanning electron microscope (SEM), the dry film is completely removed by the PRS-240. Test condition is for 40 min at 70.
9 Stripping Capability for Wet Film in Bumping Process After stripping by PRS-239 (PR film: TOK HA-1300) After a comprehensive identification by scanning electron microscope (SEM), the wet film is completely removed by the PRS-239. Test condition is for 40 min at 60.
10 Stripping Capability for Wet Film in Bumping Process After stripping by PRS-701 (PR film: CR-4000) X X Fig wafers Fig wafers X After a comprehensive identification by scanning electron microscope (SEM), the wet film is completely removed by the PRS-701. Test condition is for 30 min at 60. Fig wafers
11 Stripping Capability for Wet Film in Semiconductor Industry After stripping by PRS-777 (PR film: TOK-31) 15000X 15000X 15000X 15000X Fig wafers Fig wafers Fig wafers 15000X 15000X 15000X Fig wafers Fig wafers Fig wafers Fig. 1. FE-SEM photograph of after PR stripping Test condition is for 20 min at 55.
12 Stripping Capability for Wet Film in LED Industry PR stripping by PRS-615 (PR film: TOK-31) X 2000X Fig. 1. Fig. 2 FE-SEM photographs of before PR stripping X 2000X Fig. 2 FE-SEM photographs of after PR stripping (Test condition is for 15min +15min at 85 )
13 If don t see what you are looking for, Taimax can custom-formulate something to meet your specific requirements. Thank you. TAIWAX MAXWAVE Co., Ltd, No. 999, Bayiu 1 st Rd., Guanyin Township, Taoyuan County Taiwan 2016
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