33mm MCPs (Chem 1, MgO, annealed), R3

Transcription

1 20cm MCPs (Chem, Al 2 O 3 ), Beneq , /46/77 tested & re- electroded Finished 00v as top MCP with input MHz Dropped from 9MΩ to 6MΩ over 50 hours use, asymptote ~5.5MΩ?? 20cm MCPs (Chem, Al 2 O 3 ), LSR Measured gain/v/r of , setup scrub with (top) Scrub ini]ated, resistance dropped, 9MΩ to 5MΩ 33mm MCPs (Chem, Al 2 O 3 ), various annealing, R /38/295/290 MCPs tested, gain, imaging, background /38 fully annealed, scrub as back MCP shows resistance drops 33mm MCPs (Chem, MgO, annealed), R3 Have 6ea (2 pairs) from ANL Set up one pair, and done imaging/gain/resistance/scrub tests Scrub/R monitoring, resistance dropped by factor of 2, gain up x!

2 33mm 3600 Block Tests Scrub Effects on Chem / Al 2 O 3 Gain The scrub of looks similar to other scrubs for Chem 2 Al 2 O 3 single MCPs, there is about a decade drop of gain in the process, which seems to level out aber about 0.05 C Cm - 2 is extracted. The scrub of looks similar to other scrubs for Chem 2 Al 2 O 3 single MCPs, there is about a decade drop of gain in the process, which seems to level out aber about 0.05 C Cm - 2 is extracted. 000 Scrub Gain vs. Voltage for Scrub Gain vs. Voltage for Gain 0.0 mc/cm^2-0pa input.3 mc/cm^2-85pa input 8.8 mc/cm^2-0pa input 22.0 mc/cm^2-92pa input mc/cm^2 - pa input 74.0 mc/cm^2-78pa input MCP Voltage Gain mc/cm^2-95pa input 2.0 mc/cm^2-0pa input 25.5 mc/cm^2-95pa input 39.7 mc/cm^2-89pa input MCP Voltage

3 33mm 3600 Block Tests - - Scrub Effects on Chem / Al 2 O 3 Resistance The scrub of /320 33mm as a boiom MCP with ~µa output shows a persistent and large resistance drop /320 scrubs begin at about 6 hours in, aber various tests were done. That ]me IS included in the graph R MCP (MΩ) & 320 Resistance vs. Time 38 Current Monitor 38 IV Data 320 Current Monitor 320 IV Data Opera]on Time (hour) 00 Resistance (MΩ) 0 C cm -2 The test of as a boiom MCP resistance- voltage before and aber scrubbing I-V 38 R(MΩ) 0 C cm-2 38 R(MΩ) C cm Voltage (v) 0 Resistance (MΩ) C cm -2

4 33mm 3600 Block Tests for Chem / MgO Gain- Resistance The ini]al gain of mm MCP Chem /MgO looks higher than the Chem Al 2 O 3 MCPs top/273 bofom are set up as a pair. We have scrubbed these. The gain is higher aber scrub but has peaked out and decreased a lifle. The ini]al metered 24/25MΩ resistance changes with ]me in scrub, down to 22/7.5 MΩ aber 0.0 C cm - 2, and 2.3/9.8 MΩ aber C cm : Gain vs. Voltage Gain mc/cm^2-52pa input.8 mc/cm^2-4pa input 28.6 mc/cm^2-48pa input MCP Voltage Gain Map Image, shows typical 3600 features

5 33mm 3600 Block Tests for Chem / MgO Gain- Resistance During scrub top/273 bofom resistances change with ]me in scrub. The meter values drop by a factor of two, I-V 25 Resistance (MΩ) R(MΩ) 0 C cm R(MΩ) 0 C cm R(MΩ) 0.03 C cm R(MΩ) 0.03 C cm Voltage (v)

6 3600/4020 Block Tests Usage & Scrub Effects on Chem / Al 2 O 3 Resistance The test of as a top MCP 8. This has ~MHz input ions from the vac gauge, with 00v applied to the MCP bias. Resistance monitoring began aber about 5 hours of various imaging tests were done. Warmup ]me is NOT included in the graph. R MCP (MΩ) Resistance versus Time Opera]on Time (hour) Gain The gain of MCP Chem /Al 2 O 3 looks just like the 33mm MCPs with the same composi]on. Not Shown aber 0.00 C Cm - 2 the curve is iden]cal. Gain vs. Voltage of mc/cm^2-450pa input MCP Voltage

7 4020-3/3600-8, 8 Scrub Tests for Chem / Al 2 O 3 Gain 9 Hours of scrubbing done dropped from 5.97 MΩ to 5.6 MΩ, dropped from 8.8 MΩ to 4.9 MΩ. Full imaging tests show no fundamental changes in performance or background, 20 Resistance (MΩ) 5 3 R(MΩ) 0 C cm-2 8 R(MΩ) 0 C cm-2 3 R(MΩ) 0.00 C cm-2 8 R(MΩ) 0.00 C cm Voltage (v)

8 Glass Grooved Sidewall, Window Seal Test Inspec]on of the seal shows no anomalies in the dimensions of the window seal Most likely that the design / amount of indium was not sufficient for full wemng Added indium to gap, will now do a vacuum bake to re- flow indium and test seal Seal is being baked over the next 2 days then will be inspected and leak tested Seal with extra In added

9 Tube Process with #7 brazed assembly Ini]al metrology of #7 has been done, and the body has been trimmed Internal space varies by less than and the seal surface is flat to < Full cleaning procedure done Indium fill done, Vacuum bake next, starts today Metal X shims being laser cut, ceramic tubes and X ceramics ready to go. Gefer posi]oning baselined, will be inside metal X shims #7 body in- process