PRESENTATION OF METALLURGICAL SUPPLIES A METALLOGRAPHY WORLD CORPORATION POLISHING CLOTH'S
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1 PRESENTATION OF METALLURGICAL SUPPLIES A METALLOGRAPHY WORLD CORPORATION POLISHING CLOTH'S
2 PREMIUM POLISHING CLOTH SAMPLE CARD AVAILABLE Quick reference guide cross compares to Struers & Buehler Cloth REQUEST A COPY ONLINE
3 PSA Pressure Sensitive Adhesive PREMIUM POLISHING CLOTH PROPRIETARY REVOLUTIONIZING BACKING RESISTANT TOWARDS: Alcohol-based slurries Glycol-alcohol based liquids Oil/petroleum distillate-based slurries Water-based slurries, and Water/glycol-based slurries and lubricants Designed to work with Struers Fuga magnetic fixation system FMB Flexible Metalic Backside Metallography World Corporation s unique metallic backing FMB is a flexible metallic backside, suitable for any kind of polishing cloths, slurries or lubricants and adaptable to any magnetic plate. FMB is available with our complete range of polishing cloths. Also in any diameter up to 980mm can be requested for special order. SG Special Grip Stainless steel plate with special grip surface. Used for rough polishing with the special grip plate for extra support of staying on your magnetic plate
4 CLOTH SELECTION GUIDE COARSE INTERMEDIATE FINE SOME EXAMPLES STEEL: META-TEXPAN P 9 µm diamond-suspension META-TRIDAC 3 µm diamond-suspension META-FLOC 1 µm diamond-suspension TITAN and TITAN-ALLOYS: META-TEXPAN P 9 µm diamond-suspension META-CHEM 60 nm Silica-suspension FIBER RE-INFORCED CERAMIC: META-TRIDAC 3 µm diamond-suspension META-FLOC 1 µm diamond-suspension META-CHEM 50 nm Silica-suspension Aluminum Cast Iron Ceramic Ceramic Thermal Spray Copper Generic Bulk Mount Generic Thin Section Hard Steels Heat Treated Steels High Temperature Solder in Ceramic Metallic Thermal Spray Micro-Electronic Material Nickel Base Alloys Non Populated PCB Polymers Silicon in Micro-Electronics Sintered Carbides Soft Steels Stainless Steel Titanium
5 CROSS COMPARE APPLICATION WITH SLURY
6 OUR CLOTH & TECHNICAL NOTES META-TEXPAN firm, dense and uniform non woven polishing cloth Fine-grinding of soft materials and pre-polishing of hard materials diamond, 3µ and > META-TEXPAN W high density, laminated polishing cloth with a plain surface Pre-polishing of hard materials diamond, 3µ and > META-TEXPAN P high density, laminated polishing cloth with a perforated surface Fine-grinding, pre-polishing and polishing of hard materials diamond, 1µ to 45µ META-TEXPAN T thick, high density laminated polishing cloth with a plain surface. Fine-grinding, pre-polishing and polishing of hard materials diamond, 1µ to 45µ
7 OUR CLOTH & TECHNICAL NOTES META-NYPLAN Very hard and extremely flat polishing cloth, tightly woven from very fine polyester fibers Fine-grinding of soft materials and prepolishing of hard materials diamond, 3µ and > META-TRIDAC Woven artificial silk polishing cloth produced with an internal barrier film Pre-polishing of soft materials and polishing of all materials. Excellent flatness diamond, 1µ to 9µ META-VERSAT woven artificial silk polishing cloth mounted on a rigid and heavy barrier foil Pre-polishing of soft materials and polishing of all materials. Good flatness and good surface quality diamond, 1µ to 9µ META-POLIMOL Woven polishing cloth made of 100% pure wool Polishing of soft materials diamond, 1µ to 6µ
8 OUR CLOTH & TECHNICAL NOTES META-PLUS soft, flocked polishing cloth made of absorbent viscose fibers on a PVC backing Final polishing of hard materials diamond, < 3µ META-MESTANAP soft, flocked polishing cloth made of absorbent viscose fibers on a woven cotton substrate Final polishing of all materials diamond, Aluminum oxide, colloidal silica, < 3µ META-FLOC Extra soft, flocked polishing cloth made of absorbent fibers on a woven cotton substrate Final polishing of all materials diamond, Aluminum oxide, colloidal silica, < 1µ META-MICRO Very soft, flocked polishing cloth made of absorbent viscose fibers on a woven Final polishing of hard materials diamond, < 3µ cotton substrate
9 OUR CLOTH & TECHNICAL NOTES META-CHEM buffed polyurethane with microscopic voids, laminated to a non woven substrate Final chemo-mechanical polishing of all materials Aluminum oxide, colloidal silica, < 3µ META-CHEM / PERFORATED Perforated version to ensure a regular dispersion of the slurry Final chemo-mechanical polishing of all materials, large specimens Aluminum oxide, colloidal silica, < 3µ META-CHEM / EMBOSSED embossed version to ensure a regular dispersion of the slurry Final chemo-mechanical polishing of all materials, large specimens Aluminum oxide, colloidal silica, < 3µ CHEMOPAD W/SR buffed polyurethane impregnated nonwoven cloth with an open-porous pore structure Final chemo-mechanical polishing of hard materials Cerium oxide, colloidal silica, < 3µ
10 OUR CLOTH & TECHNICAL NOTES META-FALL dense and very uniform non woven polishing cloth from 100% polyester fibers impregnated with PU Final polishing of all materials diamond > 1µ, Aluminum oxide, colloidal silica, > 0,02µ META-PALL dense and very uniform non woven polishing cloth from 100% polyester fibers impregnated with PU Pre-polishing of all materials diamond > 1µ, Aluminum oxide, colloidal silica, > 0,02µ META-CHEMO GP dense polishing cloth, with mainly horizontal orientated fine fibers, impregnated with a polyurethane. General polishing, flat glass, borosilicate, Aluminum oxide, Cerium quartz, oxide, diamond META-CHEM B non-woven polyester dipped with porous polyurethane. Final polishing Aluminum oxide, Cerium oxide, diamond
11
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