Technicalnote. Aluminum Application Guide

Transcription

1 Technicalnote Aluminum Application Guide CLEANING AND SURFACE PREPARATION IN THE PRESENCE OF ALUMINUM Mallinckrodt Baker, Inc. produces the J.T.Baker brand of high purity chemicals for cleaning and surface preparation in a wide range of electronics manufacturing processes. The J.T.Baker line of microelectronic chemicals includes photoresist strippers and residue removers used in various applications, including: integrated circuits, flat panel displays, and MEMS. Integrated Circuits (Al, SiO 2 ) FEOL BEOL Far-BEOL Flat Panel Displays Packaging MEMS PRS Series ALEG Series REZI Series PRODUCTS Our diverse line of performance products offers the versatility needed to meet the toughest challenges in cleaning processes. Whether you're removing bulk photoresist on a rework process or post etch process, or residual polymer after a post ash process, Avantor Performance Materials can help. The PRS series of formulated products are high performance organic solvents developed to maximize the removal and complete dissolution of bulk photoresist from a patterned wafer or flat panel surface. Specifically designed for wet bench applications, the PRS series is also highly effective in batch spray applications. A versatile series of formulated high performance organic solvents and semi-aqueous components, the ALEG product line is suitable for both bulk photoresist removal and post ash residue and polymer removal. Specifically designed for wet bench applications, the ALEG series also has proven to be effective in batch spray applications. An environmentally friendly line of residue removers that are greater than 80% aqueous, REZI products are formulated to deliver the most effective removal of etch/ash residues and sidewall polymers from metal and via structures. They are specifically designed for use in wet bench and single wafer tool applications. T E C H N I C A L N O T E 1

2 OPERATING GUIDELINES Avantor Performance Materials recognizes the diverse cleaning challenges presented by the different segments of the Microelectronics industry. The general operating guidelines below offer a starting point to begin evaluating the use of J.T.Baker performance products in your specific application. Process Equipment Selection Guidelines : Bulk Photoresist Removal Wet Bench Batch Spray Single Wafer Tool Untreated Baker PRS -3000, 65ºC Process Equipment Selection Guidelines : Ash Residue Removal Wet Bench Batch Spray Single Wafer Tool Untreated Baker ALEG -380, 85ºC PROCESS INFORMATION Suggested Bath Recipe Bath or Batch Spray 60º tp 85º C 5-20 min DI Rinse (No intermediate rinse required) Dry T E C H N I C A L N O T E 2

3 Suggested Spray Recipe for a Three Manifold Semitool Step # Step Name Time (min) RPM M1 M2 M3 Drain 1 RPMSTAB 0:10 50 C1 2 T2DRAIN 0:10 50 T2 C1 3 T2RECL T2 T2 4 T1TOT2 0:10 50 T1 T2 5 PURGE1 0:05 50 N2 T2 6 RINSE1 1:00 50 CDI C2 7 PURGE1 0:05 50 N2 IW 8 RINSELO 1: CDI IW 9 RINSEHI 2: CDI IW 10 PURGE2 0: N2 IW 11 DRYHI 1: N2 IW 12 DRYLO 6: N2 IW Suggested SEZ Single Wafer Spray Recipe Step # Step Name Flow (L/min) RPM Time (s) 1 Chemical No Chem DI water N Various SUGGESTED SEZ SINGLE WAFER SPRAY RECIPE PRS Products Compatibility Information PRS-1000 PRS-2000 PRS-3000 Temperature Substrate Etch Rates 85 C (A/min) 85 C (A/min) 85 C (A/min) Cu <0.2 SiN <0.5 <0.5 <0.5 Al <0.5 <0.5 <0.5 Ti <0.4 <0.4 <0.4 TiN <0.5 <0.5 <0.5 W < TEOS (PECVD) < <0.5 GaAs <1 6 X Cr <1 <1 Pb/Sn Mo <1 ITO <1 T E C H N I C A L N O T E 3

4 ALEG Products Compatibility Information ALEG-310 ALEG-355 ALEG-370 ALEG-380 ALEG-445 ALEG-625 Temperature Substrate Etch Rates Cu C (A/min) 85 C (A/min) 60 C (A/min) 85 C (A/min) 85 C (A/min) 45 C (A/min) SiN 0.3 <0.5 < <1@ 45 C, <1@ 65 C SiC 0 X X < Ta 0.1 TaN 0.01 Al <0.5 Ti <0.4 <0.1 <0.5 <0.1 <0.5 <1 TiN <0.5 <0.1 <0.5 <0.1 <0.5 <1 W 0.3 < <0.5 <1 TEOS (PECVD) <1 <0.5 < <0.5 <1 GaAs <1 18 < X Si X X <0.5 <0.1 <0.5 X Au <0.1 Ag 75 C Mo 2.2 ITO REZI Products Compatibility Information REZI-28 REZI-38 (neat) REZI-38 (20:1) REZI-39 REZI-68 Temperature Substrate Etch Rates 45 C (A/min) 45 C (A/min) 25 C/45 C (A/min) 45 C (A/min) 45 C (A/min) Cu 3 25 C 45 C 25 C 45 C C 45 C SiN <1 <1 25 C 45 C <0.5 <0.5 SiC <1 <1@ 20 C <1@ 45 C 25 C 45 C 0.8 <0.5 Ta C 45 C 0 TaN 0 25 C 45 C 0.01 Al C 45 C C 45 C Ti < C 45 C < TiN < C 45 C C 45 C W 23 C C 45 C C 45 C TEOS (PECVD) <1@ 23 C <1@ 45 C <1 45 C <0.5 <1@ 25 C <1@ 45 C GaAs Mo ITO APPLICATION SUPPORT Avantor Performance Materials highly qualified Applications Engineers are available to help you implement a total process solution utilizing J.T.Baker chemistries in your existing tools or a new facility. Evaluations can be conducted at your manufacturing site or at one of several Avantor Performance Materials application laboratories. For additional information, contact us at JTBAKER ( ) or at You can also us at micro.mbi@tycohealthcare.com. T E C H N I C A L N O T E 4

5 About Avantor Performance Materials formerly Mallinckrodt Baker Avantor Performance Materials, formerly Mallinckrodt Baker, manufactures and markets high-performance chemistries and materials around the world under two well-known and respected brand names, J.T.Baker and Mallinckrodt Chemicals. These products are widely used in biotechnology and pharmaceutical production; in the manufacturing of semiconductors, fl at panel displays and photovoltaic cells; and in research, academic and quality control laboratories. Based in Phillipsburg, New Jersey (USA), Avantor is owned by an affi liate of New Mountain Capital, LLC. For additional information please visit or follow Ordering, Information and Assistance: Customer Service and Technical Service toll free: or fax: On the Web: Our Web site features ASK AVANTOR, which includes live chat capabilities with customer service representatives. Mailing Address: Avantor Performance Materials, Inc. 222 Red School Lane Phillipsburg, NJ Phillipsburg, NJ 9001: 2000 & 14001: 2004 Paris, KY 9001: 2000 Mexico City, Mexico 9001: 2000 Deventer, Holland 9001: 2000 & 14001: 2004 Selangor, Malaysia 9001: 2000 Worldwide Locations China: J.T. Baker Chemical Products Trading (Shanghai) Co., Ltd. Site A 14/F Xin Mei Union Square 999 Pudong South Road Pudong New Area Shanghai, China Tel: Fax: sales.jtbs@covidien.com Europe: Avantor Performance Materials, B. V. Teugseweg 20, 7418 AM Deventer, The Netherlands Tel: Fax: jtbaker.nl@covidien.com India: J.T. Baker India Private Limited , Chintamani Plaza, Andheri Kurla Road Chakala, Andheri (East), Mumbai Tel: Fax: sales.jtbi@covidien.com Lit # MICROAPPALUMINUM Malaysia: Mallinckrodt Baker Sdn. Bhd. A , 12th Floor, Kelana Brem Tower 1, Jalan SS7/15 (Jalan Stadium), Kelana Jaya Petaling Jaya, Selangor, Malaysia Tel: Fax: sales.mbm@covidien.com Mexico: Mallinckrodt Baker S. A. de C. V. Plomo 2 Fracc. Industrial Esfuerzo Nacional Xalostoc CP Ecatepec, Estado de Mexico, Mexico Tel: Fax: mbi@covidien.com North America: Avantor Performance Materials, Inc. 222 Red School Lane Phillipsburg, NJ Tel: Korea: Mallinckrodt Baker International Inc. 8th Floor, Wooduck Building Yeoksam 1-dong, Gangnam-gu Seoul, Korea, Tel: Fax: sales.mbik@covidien.com 2010 Avantor Performance Materials, Inc. All rights reserved. Mallinckrodt is a trademark of Mallinckrodt Inc. Other trademarks are owned by Avantor Performance Materials, Inc. or its affiliates unless otherwise noted.