IMPACT Roundtable Lithography + DfM

Transcription

1 IMPACT Roundtable Lithography + DfM Andy Neureuther Electrical Engineering & Computer Science September 24, 2008 neureuth@eecsberkeley.edu University of California Berkeley San Diego Los Angeles 1

2 IMPACT UC Discovery Industry Team Thanks! University IMPACT Lithography/DfM of California Berkeley Roundtable San 2 Diego Los Angeles

3 Roundtable Objectives understand litho challenges in industry understand research capabilities in universities guide research in the IMPACT program what are issues that are relevant and timely to industry and academic in nature what would you work on if you were a Grad Student? IMPACT Lithography/DfM Roundtable 3

4 Scope Litho and related DfM approaches for 22 nm for 2011 Primarily near term DUV for 22 nm with some discussion of monitors and sources of variation at 45 nm and 32 nm EUV and next Roundtable Ground Rules Scope and Rules No proprietary material. No comments pro or con on specific products of others No recording or official notes Will post a summary of suggestions for IMPACT research Where speakers agree, post PPT for IMPACT internal sharing IMPACT Lithography/DfM Roundtable 4

5 Agenda 1:00 PM - 1:10 PM Round Robin Self-Introductions 1:10 PM - 2:50 PM Litho Challenges (Industry) 8 min each plus audience volunteers Emphasis on issues that are relevant and timely to industry and also academic in nature 2:50 PM - 3:10 PM Research Capabilities (Universities) 4 min each Emphasis on survey of interests, student team, and IMPACT thrusts 3:10 PM 3:30 PM Break and One-on-One Dialog 3:30 PM 4:30 PM Bringing Challenges and Capabilities Together 4:30 PM 5:00 PM Capturing Suggestions and Perspective IMPACT Lithography/DfM Roundtable 5

6 Speakers Industry Lars Liebmann, IBM, ASIC Chandu Gorla, Flash Memory, San Disk Vivek Singh, Microprocessors, Intel Frank Schellenberg, Fabless/Foundry glue, Mentor Graphics Zhenhai Zhu, Double Patterning, Cadence Huixiong Dai, thin-films for pattern transfer, AMAT Mamoru Miyawaki, Exposure tools, Canon Bob Socha, Exposure tools, ASML Stan Stokowski, Inspection, KLA-T University of California Andrew Kahng, UCSC DfM tools Puneet Gupta, UCLA DfM tools Kameshwar Poolla, UCB Algorithms Costas Spanos, UCB variability and assignment of causes Andy Neureuther, UCB fast-cad, electrical test, EM IMPACT Lithography/DfM Roundtable 6

7 What DfM issues remain uncovered in IMPACT Lithography/DfM Roundtable 7 Questions & Challenges Complexity management; Automating systematic pre-compensation What are the fundamental issues that require new theoretic techniques; algorithms What manufacturing variation characterization issues remain uncovered in Monitoring; Analyzing; Feeding back into design? What process technology issues remain uncovered in modeling lithography physics; visualizing processing effects; quantifying complex trade-offs in imaging, alignment and pattern transfer Where should universities be more out-of-the-box to help create breakthroughs? System approach to complexity management; Assessing advantages of what if technology changes; Technology innovation itself

8 IMPACT Lithography/DfM Roundtable Thanks to All Speakers for preparing comments Technologists for your comments and interactions Students for doing the hard work! SanDisk for hosting and Starleigh Arce for local arrangements Changrui Yin for web site posting and reservations Reminder: IMPACT Workshop, Wed. October 29 th at the AMD Commons Building, Santa Clara IMPACT Lithography/DfM Roundtable 8