State-of-the-art thin film X-ray optics for synchrotrons and FEL sources. Frank Hertlein Incoatec GmbH Geesthacht, Germany

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1 State-of-the-art thin film X-ray optics for synchrotrons and FEL sources Frank Hertlein Incoatec GmbH Geesthacht, Germany

2 Incoatec: Innovative Coating Technologies Incoatec is founded with Bruker AXS in 2002 Own R&D activities and application lab over 12 years of experience in X-ray optics and over 18 years of experience in thin film technology 2/20 ACTOP-2008 October , Trieste Italy

3 Outline! Products & Services! Multilayer coating! Deposition of thin films! Characterization! Applications Total reflection optic for FEL Multi-stripe optic for Tomography Beamline! Conclusion 3/20 ACTOP-2008 October , Trieste Italy

4 Products & Services Multilayer mirrors Customized coatings for synchrotron mirrors and other applications Incoatec Microfocus Source I!S TM Upgrades of existing equipment 4/20 ACTOP-2008 October , Trieste Italy

5 Products: Incoatec Microfocus Source I!S High brilliance low-power microfocus source For Cu or Mo Air-cooled New type of 2D beam shaping Montel Optics: The Quazar TM Optics New easy-to-align housing, optional with motors Low maintenance Tube change as easy as for conventional sealedtubes 3 Years warranty High performance at only 30 W 5/20 ACTOP-2008 October , Trieste Italy

6 Products: Multilayer Mirrors XRD SCD XRF Synchro -tron Göbel Mirror Montel Mirror XRF - Multilayer Analysator Coating of Synchrotron Mirror up to 150 cm 6/20 ACTOP-2008 October , Trieste Italy

7 Products: X-ray Optics for Synchrotron Beamlines Typical mirror substrate materials: Fused Silica, Zerodur, Silicon, Special Carbon Coatings: for High Flux Beamlines like FEL at DESY Multilayer (Stripes) Coatings: optimized for the most different applications, dimensions and shapes Mirrors up to 150 cm length! Cooperation with GKSS: R&D for film and deposition technology We produce the coating for your optic as you like! 7/20 ACTOP-2008 October , Trieste Italy

8 Deposition by Magnetron Sputtering Magnetron Sputtering Argon Plasma Optimized deposition facilities for different sizes, gradients and precisions 8/20 ACTOP-2008 October , Trieste Italy

9 Deposition of Thin Films Magnetron Sputtering Monolayer, Multilayer, Graded- Multilayer, Stripe-Multilayer area for deposition: up to 150 x 12 x 12 cm or 6 diameter Target materials: for Totalreflection: C, SiC, Rh, Ru, Ir, Au, W, Cr,... ML-Reflector: W, WSi2, Ru, V, La, Mo, TiO2, Ni film thickness: single layer nm ML-Spacer: C, BN, B4C, Si, Precision: typical ±1%, up to ±0.1% 9/20 ACTOP-2008 October , Trieste Italy

10 Requirement for coating! good homogeneity over the whole mirror, up to 0.2%! exact d-spacing over the whole stack, with up to several hundred pairs! low roughness, better than 0.3 nm! sharp interfaces, none interdiffusion 10/20 ACTOP-2008 October , Trieste Italy

11 TEM-Picture of a multilayer coating Surface Pair pairs d = 1.4 nm Si-Substrate Pair 2-30 Perfect correspondence of the layer-thickness over 500 pairs 11/20 ACTOP-2008 October , Trieste Italy

12 Characterization with XRR Bruker D8 with 5 DOF motorized table Substrates up to 30 x 30 x 6 cm! 12/20 ACTOP-2008 October , Trieste Italy

13 Characterization with XRR Graded Multilayer Characterization with XRR 5,8 5,6 5,4 5,2 1.E+00 1.E-01 1.E-02 1.E-03 1.E-04 1.E-05 1.E-06 Tolerance ±1% 1.E-07 d-spacing (nm) 5,0 4,8 4, Reference value 4,4 4,2 Datapoint 4,0 3, Position (mm) d-spacing accuracy better 1%! 13/20 ACTOP-2008 October , Trieste Italy

14 Characterization with SFM / AFM Research & Development: C-Film (38 nm) on Silicon SFM Scanning Force Microscope AFM Atomic Force Microscope Scanning Force Microscopy (F. Felten, TUHH) Rq,rms = 0.24±0.02 nm 14/20 ACTOP-2008 October , Trieste Italy

15 Application I: Total reflection optics of carbon for FEL Reflectivity vs. Energy measured by B. Steeg, Hasylab Optics for FEL at Desy Substrate made by: Reflectivity o amorphous carbon layer, d=38 nm,! = 1.27 nm Coating made by: simulation by IMD for diamond, " = 3.5 g/cm 3 d=38 nm,! = 0 nm C-K Photon Energy (ev) R(E) ~ % at ev at grazing incidence of 2 deg 15/20 ACTOP-2008 October , Trieste Italy

16 Characterization of Total Reflection Optics XRR measurement with Cu-K " (8 kev) at different positions 150 cm Carbon Coating on Si-Substrate density: 2.2 g/cm 3 roughness: 0.5 nm thickness: 44.2 nm Measured by M. Störmer, GKSS SPIE proceeding /4 16/20 ACTOP-2008 October , Trieste Italy

17 Characterization of Total Reflection Optics Mean film thickness 44.2 nm 150 cm Carbon Coating on Si-Substrate Standard deviation 0.2 nm rms XRR at 27 positions Peak-to-Valley ~1 nm < 1 nm Homogeneity better 2 % Measured by M. Störmer, GKSS SPIE proceeding /4 17/20 ACTOP-2008 October , Trieste Italy

18 Application II: Multi-stripe X-ray Optics Tomography Beamline (M. Stampanoni, PSI-SLS) Substrate made by: Coating made by: Picture courtesy of M. Stampanoni, PSI-SLS Stripe A : [Ru/C] 100, d = 40!, " = 0.5, R > 80% for 10 < E < 22 kev Midspace: Si111, D orientation < 0.01,! = 0.1 nm, slope error 0.04 Stripe B : [W/Si] 100, d = 30!, " = 0.5, R > 80% for 22 < E < 45 kev 18/20 ACTOP-2008 October , Trieste Italy

19 Conclusion - Our profile Simulation of layer and optics properties - Flexible, on customer request Physical Vapour Deposition (PVD) methods for coatings - extreme precise coatings - large area coatings - with gradients / stripes / monolayer / multilayer Characterization of thin films We produce the optics as you like! Flexible in-house manufacturing for various wavelengths and applications 19/20 ACTOP-2008 October , Trieste Italy

20 Conclusion - Our costumers Zeiss APS / ANL JenOptik Desy / Hasylab Bessy University of Hamburg Swiss Light Source PSI SESO University Göttingen 20/20 ACTOP-2008 October , Trieste Italy

21 Thank you for your attention Incoatec GmbH Max-Planck-Str Geesthacht Germany Tel: +49(0) /20 ACTOP-2008 October , Trieste Italy