A novel High Average Power High Brightness Soft X-ray Source using a Thin Disk Laser System for optimized Laser Produced Plasma Generation
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1 A novel High Average Power High Brightness Soft X-ray Source using a Thin Disk Laser System for optimized Laser Produced Plasma Generation I. Mantouvalou, K. Witte, R. Jung, J. Tümmler, G. Blobel, H. Legall, B. Kanngießer and H. Stiel
2 Outline 1. Motivation 2. Laser system 3. LPP setups 1. Liquid jet technology 2. Rotating cylinder target
3 Outline 1. Motivation 2. Laser system 3. LPP setups 1. Liquid jet technology 2. Rotating cylinder target
4 1 Motivation: soft X-rays X-ray emission spectroscopy Grazing incidence for nm-resolution X-ray absorption spectroscopy L-edges of transition metals in solution Biological samples EUV metrology Reflectivity Foil thickness Imaging Microscopy in the water window Coherent imaging Holography 5 µm
5 1 Motivation: soft X-rays X-ray emission spectroscopy Grazing incidence for nm-resolution X-ray absorption spectroscopy L-edges of transition metals in solution Biological samples EUV metrology Reflectivity Foil thickness Imaging Microscopy in the water window Coherent imaging Holography 5 µm Goal: lab-based equipment
6 Outline 1. Motivation 2. Laser system 3. LPP setups 1. Liquid jet technology 2. Rotating cylinder target
7 2 Pump Laser High brilliance: 1. High single shot intensity 2. High repetition rate 3. Good beam quality & stability diode-pumped YAG-laser systems slab system thin disk laser system
8 2 Pump Laser High brilliance: 1. High single shot intensity 2. High repetition rate 3. Good beam quality & stability diode-pumped YAG-laser systems slab system thin disk laser system
9 2 Laser system pulse energy 220 mj pulse duration 10 ns repetition rate >100 Hz mean power > 15 W M 2 <1.2
10 2 Laser system pulse energy 220 mj pulse duration repetition rate mean power 10 ns ns >100 Hz > 15 W M 2 <1.2 Modification
11 2 Beam characteristics pulse energy / mj P av = 25 W P av ~ 50 W E Hz E Hz pump current / A Stable performance: ns Regenerative system: shorter pulse durations possible
12 Outline 1. Motivation 2. Laser system 3. LPP setups 1. Liquid jet technology 2. Rotating cylinder target
13 3.1 Liquid jet system Focused laser beam Nozzle Plasma Nitrogen cryojet Source size Slab laser 18x40µm Slab laser P L = 60 W Thin disk laser 18x21µm Thin disk laser P L = 10 W
14 3.1 Liquid jet system for EUV imaging and metrology: use water jet* instead of liquid nitrogen! Slab laser E (mj) τ (ps) P (W) ph/ s sr 6* *10 13 ph/s mrad 2 mm 2 8* *10 11 Thin disk laser (100 Hz) * H. Stiel, U. Vogt et al. SPIE, 4343, 535 (2001)
15 3.1 X-ray microscope Pinhole Vacuum pump Shutter XUV CCD camera Vacuum pump Multilayer condensor mirror Plasma source Pinholes + filter
16 3.1 X-ray microscope Pinhole Vacuum pump Shutter XUV CCD camera Vacuum pump Multilayer condensor mirror Plasma source Pinholes + filter
17 Outline 1. Motivation 2. Laser system 3. LPP setups 1. Liquid jet technology 2. Rotating cylinder target
18 3.2 Cylinder target Optimal heating for 2 nm Variable-line spaced grating spectrograph & Transmission grating spectrograph
19 3.2 EUV/XUV spectra intensity/ 10 6 cts/pixel s intensity/ 10 6 cts/pixel s I. Mantouvalou et al. Rev. Sci. Instum., 82, (2011)
20 3.2 EUV/XUV spectra intensity/ 10 6 cts/pixel s intensity/ 10 6 cts/pixel s I. Mantouvalou et al. Rev. Sci. Instum., 82, (2011)
21 3.2 VLSG spectrograph XUV: 1 nm region XUV: water window intensity / 10 6 counts / pixel * s Cu XX XX XXI XX XX wavelength / nm intensity / 10 6 counts / pixel * s Mo XXI XXII XIX XVIII XVII XVI XV wavelength/nm intensity / 10 6 counts / pixel * s EUV: 13.5 nm region Cu X XIII XIV wavelength / nm XV XUV 1 nm region XUV water window target Cu Mo Cu EUV 13 nm region ph/ s sr line 8* * *10 14 ph/s mrad 2 mm 2 line * *10 11
22 3.2 TG spectrograph Broadband source: Filter calibration XANES/NEXAFS Selection of suitable energy XUV XUV EUV EUV 1 nm region water window 13 nm region 6.5 nm region target Cu Mo Cu Cu ph/ s sr line 8* * * *10 14 ph/s mrad 2 mm 2 line * * *10 11
23 3.2 Current setup Laser in clean room environment Flexible design with two beamlines and changeable target material Control units Plasma chamber with beam propagation optics TG spectrograph Pinhole - setup
24 Summary 1. Diode-pumped thin disk laser system Compact and robust systems High average power High stability and beam quality Flexible pulse duration for optimized plasma heating 2. LPP sources: Liquid jet technology: Low debris, intense line emission, different liquids Cylinder target technology: Broadband & line emission, different metals, high CE
25 Collaborations 1. Laser system 2. X-ray microscope 3. BLiX LPP source 4. Funding
26 Thank you for your attention!
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