Cr, Co, Cu, Mo, Ag (others on request) Mean Reflectivity: R > 70%

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1 PARALLEL BEAM X-RAY OPTICS y Mirror length L Θ = f(x) b p/2 λ = 2d eff (x) sin Θ(x) eff x m Parallel beam width b=f(p,λ,l,,l,x m ) x Fabrication of high precision 6 mm parallel beam optics both on prefigured substrates (right) and on flat substrates, which are glued and bend after deposition (left) Generation of a monochromatic parallel beam in one dimension Spectral lines: Cr, Co, Cu, Mo, Ag (others on request) Mean Reflectivity: R > 7% Monochromasy: Kα 1 2 Divergence: φ.3 Mirror length: 2mm - 8mm (on customers request) X- ray source geometry: Line focus preferred Parallel beam width b: Geometry: dependent on spectral line, geometry and mirror length b=.8mm (Cu, 4mm, x m = 9 mm) distance source-mirror (middle pos.- x m ) standard mirror (4mm) x = 9mm m standard mirror (6mm) x = 1mm m DRESDEN GmbH

2 FOCUSSING X-RAY OPTICS Mirror length L y F 1 F 2 x m x Parallel beam and focussing X-ray optics with various geometries Generation of a monochromatic focussing beam in one dimension Spectral lines: Cr, Co, Cu, Mo, Ag (others on request) Mean reflectivity: R > 7% Monochromasy: Kα 1 2 Mirror length: 2mm - 8mm (on customers request) X-ray source geometry: Line focus preferred Width of focus b: dependent on spectral line, geometry and mirror length Geometry: customized DRESDEN GmbH

3 MONOCHROMATORS reflectivity [%] material system Ni/C energy [kev] Spectral range : 1 ev 1 kev Material systems: optimized on wavelength, on customers request Dimensions: up to 6 diameter, others on request Thickness homogeneity: d/d < 1% Applications: monochromators on laboratory X-ray X sources and on synchrotrons DRESDEN GmbH

4 KONVEX PARALLEL BEAM OPTICS Focussing Optics Konvex Parallel Beam Optics b F=F Generation of a compressed monochromatic parallel beam (width b) b in one dimension Outstanding Feature: Increase of the parallel beam photon flux in combination with a focusing optic by reduction of beam width b compared to conventional parallel beam optics Spectral lines: Cr, Co, Cu, Mo, Ag (others on request) Mean reflectivity: R > 7% Monochromasy: Kα 1 2 Mirror length: 2mm - 4mm (on customers request) X-ray source geometry: Line focus preferred Geometry: customized DRESDEN GmbH

5 COLLIMATING MONOCHROMATOR Two parallel beam optics, aligned on the same focal point Acceptance of parallel X-radiation X emitted by a point focus X-ray X source (e.g..3mm x.3mm rotating Mo anode) Result: monochromatic (Kα 1,2 ) parallel spot 1,2 axo-

6 BEAM COMPRESSOR Combination of focussing and collimating multilayer optics Emission of a parallel monochromatic beam Adjustable beam width b at sample position Result: monochromatic (Kα 1,2 ) parallel spot with a width b <.3 mm Application: microdiffractometry and -tomography axo-

7 TWIN MIRROR KIT Θ Setup of TWIN MIRROR arrangement Twin Mirror Kit left left: primary mirror housing, right: secondary mirror housing with beam tube and slit holder A new quality in X-ray diffractometry secondary parallel beam optics intensity / cps 6 4 a) TWIN MIRRORS Quartz triplet Cu Kα 1 Cu Kα Θ / intensity (cps) 1 a) TWIN MIRRORS iron ferrite Kα iron austenite Kα 1 1 intensity / cps 6 4 b) BRAGG-BRENTANO geometry Quartz triplet Cu Kα 1 Cu Kα Θ / steel sample: solid, polished Cu Better resolution than soller slits because of a more than two times lower angular acceptance ( Cu Kα : φ<.3 ) Transmission higher than 7% Increased S/N-ratio due to sample fluorescence suppression Fits best to primary parallel beam optics Parallel beam geometry: -simplified sample preparation -increased accuracy DRESDEN GmbH

8 TWIN MIRROR KIT Θ Setup of TWIN MIRROR arrangement Twin Mirror Kit left left: primary mirror housing, right: secondary mirror housing with beam tube and slit holder A new quality in in-house X-ray reflectometry TWIN MIRROR Arrangement intensity [cps] reflectometry (Cu K α) graded Ni/C-multilayer sample stage position H=+2µm H= H=-2µm Upgrade available for Cr Kα,, Co Kα,, Cu Kα,, Mo Kα,, Ag Kα Geometry on customer request No influence of sample displacement errors up to 2 µm on peak position and intensity Sample alignment within 1 seconds Dynamic range of more than 7 orders of magnitude Low divergence ( Cu Kα : φ<.2 ) Detectable thin film thicknesses between 2nm and 27nm DRESDEN GmbH

9 Application of Nanometer-Multilayer Optics for X-ray Analysis R. Dietsch */**, St. Braun *, Th. Holz **, A. Leson * *Fraunhofer Institute Material and Beam Technology (IWS), Winterbergstr. 28, D-1277 Dresden, Germany:.iws.fhg.de ** DRESDEN GmbH, Siegfried-Rädel-Str.31, D-189 Heidenau, Germany: w- High performance focusing and parallel beam multilayer X-ray optics Ni/C multilayer (d=3.2 nm) (TEM cross section) 1 nm Glued and prefigured focusing and parallel beam X-ray optics with various focal lengths and parallel beam widths, designed for Mo Kα-, Cu Kα-, Co Kα-radiation A new quality of in-house X-ray reflectometry - Twin mirror arrangement Θ highest intensity and low divergence superior Kβ- suppression sample fluorescence suppression no influence of sample surface position errors on peak position for reflectometry and diffractometry easy and fast sample alignment intensity [cps] reflectometry (Cu K α) graded Ni/C-multilayer sample stage position H=+2µm H= H=-2µm High brilliance collimating monochromator systems for intense sub-mm X-ray spots X-ray Pointer and Beam Compressor b Parabola 1 concave (1 ) b1 (7) Parabola 1 p 1 (2) (4 ) P x 1 (3) α x 2 p Parabola 2 convex F=F b (5) Parabola 2 p 2 (6) (7a) b 2 Sample (7) Beam Compressor FWHM : (2Θ) =.7 Collimating Monochromator sub-mm Reflectometry Thickness Gradient perpendicular to beam direction (Ni/C graded multilayer) (Beam Compressor spot.3mm x.6mm (Z x Y); Twin mirror arrangement) intensity [cps] 1 4 y 1 3 x Centre with 1 2 d = 3.66nm [ FUTURE POTENTIALS in Micro-Diffraction, Reflectometry X-Ray Micro-Lithography Micro-Tomography Single Crystal Diffractometry w Institut Werkstoff- und Strahltechnik

10 X-ray Pointer and Beam Compressor high brilliance collimating monochromator systems for intense sub-mm X-ray spots Reiner Dietsch*/**, Thomas Holz**.iws.fhg.de w- *Fraunhofer Institute Material and Beam Technology (IWS), Winterbergstr. 28, D-1277 Dresden, Germany ** DRESDEN GmbH, Siegfried-Rädel-Str.31, D-189 Heidenau, Germany Modules and Design Collimating Monochromator Parabola 1 p1 (2 ) (7) (1 ) (4 ) b1 x1 α (3) x2 (5) Glued and prefigured X-ray mirrors with different lengths and convex and concave parabolic shape designed for Mo, Cu, Co Kα-radiation Parabola 2 p2 Sample (6) Beam Compressor Two parallel beam optics aligned on the same focal point b2 (7 a) (7) Parabola 1 concave b Acceptance of parallel X-radiation emitted by a point focus X-ray source (e.g..3mm x.3mm rotating anode) P p F=F XRD-Application* Si powder sample *Ch. Baerlocher, ETH Zurich Illuminated area.3mm x.3mm 1 Intensität / cps 75 Mo rotating anode tube 5kV/9mA B b Parabola 2 convex Result: a monochromatic (Kα1,2) parallel spot A B Marresearch IP Detector A 23 Θ/ sample-detector distance 3mm 26 integrated intensities of rectangles A and B Si (111) Separation Kα1 and Kα2 reflection comparable resolution by means of parallel beam optics (A) and slits (B) FWHM: only 1 or 3 pixel, resp. sub-mm Reflectometry 16 Ni/C graded multilayer on 4 Si-wafer (inset) 4kV/4mA Cu fixed anode tube point fokus 1,2mm x.4mm Beam Compressor spot.3mm x.6mm (Z x Y) Geometry: Twin arrangement FUTURE POTENTIALS in FWHM : intensity [cps] Thickness Gradient perpendicular to beam direction 1 µ-diffraction, REFLECTOMETRY y 13 x X-RAY µ-lithography Centre with 12 µ-tomography d = 3.66nm 11 SINGLE CRYSTAL DIFFRACTOMETRY ] [ DRESDEN GmbH contact@ axo-. waxo- Institut Werkstoff- und Strahltechnik

11 Parallel beam X-ray optics for CrKα, CoKα, CuKα, MoKα, AgKα radiation Various parallel beam optics for single and twin mirror arrangements highest intensity and low divergence no influence of sample surface position errors on peak position for reflectometry and diffractometry superior Kβ suppression sample fluorescence suppression easy and fast sample alignment Selected results for twin mirror arrangement: cross intensity angle resolution Kβ - suppression intensity [1 8 cps] I > 1... cps 11 1 Cu Kα FWHM 4 2Θ= Θ-scan without sample I > 2.. cps intensity [1 6 cps] Cu Kα ω <.2 I :I CuKα1 CuKβ > 1.. : 1 FWHM ω= ω [degree] rocking-scan Si(4) silicon wafer intensity [cps] Kβ Cu W Lα Θ 2Θ scan Si(4) silicon wafer ω <.2 I :I MoKα1 MoKβ > 1. : 1 Kα 1,2 intensity [1 8 cps] 2 1 Mo Kα FWHM 2Θ=.21 intensity [1 6 cps] Mo Kα FWHM ω=.12 intensity [cps] Mo Kβ Kα 1, Θ-scan without sample ω [degree] rocking-scan Si(4) silicon wafer Θ 2Θ scan Si(4) silicon wafer DRESDEN GmbH w Fraunhofer Institute Material and Beam Technology

12 High-precision nm-coatings for EUV and X-ray Optical Applications St. Braun *, R. Dietsch, Th. Foltyn, Th. Holz 1, M. Moss, D. Weißbach and A. Leson IWS Dresden, Fraunhofer Institute Material and Beam Technology, Winterbergstr. 28, D-1277 Dresden, Germany 1 Dresden GmbH, Siegfried-Rädel-Str. 31, D-189 Heidenau, Germany * stefan.braun@iws.fraunhofer.de, Phone: 351/ , Fax: 351/25833 Preparation of nm Multilayers Pulsed Laser Deposition (PLD) Magnetron Sputter Deposition (MSD) Experimental setup: - UHV-chamber with 4 targets - Base pressure: 1-8 mbar range - Laser-target-interaction => Emission of a plasma plume - Target motion in y-direction => Pivoting of the plasma plume, connected with a uniformization in Y direction - Target-substrate dist.: 15mm - Maximum substrate size: 15mm - Substrate motion: linear in X-direction with any v-profile Schematical view of the targetsubstrate arrangement at the PLD. Experimental setup: - UHV-chamber with 4 sources - Base pressure: <2 1-8 mbar - Sputtering gas: Ar, stable process conditions at p Ar mbar - Target-substrate dist.: 5-1mm - Maximum substrate size: 15mm - Substrate rotation: ω R =.24-5 rpm - Substrat spin: ω S =235rpm - Typical deposition times: 1 period per minute Schematical view of the targetsubstrate arrangement at the MSD. Applications of nm Multilayers X-Ray Optics Göbel Mirrors Parabolic curved gradient multilayer EUV Optics Mo/Si Multilayer as EUV Reflectors Specifications: Bragg equation nλ=2dsinθ has to be fulfilled on the whole mirror surface Difference of set and actual d-value must be in the range of d=±.3nm.6nm on every surface point Particularly the deposition on pre-curved substrates is a challenge for every coating technology Beam Collimator b 1 Parallel X-ray beam polychromatic Slit x 1 X-ray point source Parabola 1 Slit Parabola 2 x 2 Slit b 2 Parallel X-ray beam monochromatic Sample Reflectance: R=71.4% (λ=12.5nm, α=22.5 ), R=7.1% (λ=13.3nm, α=1.5 ) Uniformity: 99.9% on substrates with 15mm diameter (σ Multilayer period =.3.5%, σ EUV Reflectance =.5.8%) Run-to-run Reproducibility: σ<.1% (pure Mo/Si), σ=.18% (Mo/Si with barrier layers).7.7 R max =71.4%.6.6 α= R EUV (s-pol.) λ / nm (α=1.5 ) EUV reflectance of interface-optimized Mo/Si multilayers with C und B 4 C barrier layers. Thermal Stability R max =7.1% λ=13.3nm FWHM=.516nm Introduction of C- und B 4 C Barrier layers => Improvement of thermal and long-term stability α / (λ=12.52nm) nanotechnologie 2 parallel beam optics aligned on the same focal point Acceptance of parallel X-ray radiation emitted by a point focus X-ray source Emission of a monochromatic parallel spot CC "Ultradünne funktionale Schichten" EUV reflectance depending on the annealing temperature. After thermal treatment at 2 C it remains R EUV >69%. Mo/Si multilayer with B 4 C barrier layers (d=.5nm) on both interfaces after annealing at 4 for 2 min.