Design and fabrication of stacked, computer generated holograms for multicolor image generation

Size: px
Start display at page:

Download "Design and fabrication of stacked, computer generated holograms for multicolor image generation"

Transcription

1 Design and fabrication of stacked, computer generated holograms for multicolor image generation Thomas Kämpfe, 1, * Ernst-Bernhard Kley, 1 Andreas Tünnermann, 1 and Peter Dannberg 2 1 Friedrich-Schiller-University Jena, Institute of Applied Physics, Max-Wien-Platz 1, Jena, Germany 2 Fraunhofer Institut Angewandte Optik und Feinmechanik, Albert-Einstein-Strasse 7, Jena, Germany *Corresponding author: kaempfe@iap.uni-jena.de Received 5 March 2007; revised 29 May 2007; accepted 1 June 2007; posted 6 June 2007 (Doc. ID 80545); published 23 July 2007 We present a diffractive optical element consisting of computer-generated holograms and dielectric multilayer mirrors in a stratified setup. Illuminated with a white laser beam, consisting of three single lasers with wavelengths of 635 nm, 543 nm, and 473 nm, this element enables the far field projection of arbitrary, multicolor images. Certain advantages of holographic image generation, e.g., the possibility of a large depth of focus and a very easy optical setup, are maintained with the new element Optical Society of America OCIS codes: , , , Introduction Diffractive optical elements in the form of computer generated holograms (CGHs) are generally used to influence the wave front of a propagating light beam in a very flexible way. In contrast to optically recorded holograms, which require a physically existing object to record the fringe pattern, a CGH is calculated in a computer and then fabricated by appropriate writing and structuring techniques, depending on the required feature size. One interesting area is the use of CGHs for the projection of static images onto a screen. Such a projection system can be realized with some unique properties (very large depth of focus, very simple, adjustment insensitive optical setup). It consists only of a laser, the CGH, and a focusing lens if necessary (Fig. 1). Therefore, this setup is especially interesting for very small handheld systems, like the known laser pointer caps. With the common setup and a single CGH the projection is usually limited to monochromatic images. To encode the red, green, and blue parts of a multicolor image, three separate elements can be used. Placing them side by side [1] in the optical setup results in a loss of depth of focus, since the three images emerge from separate /07/ $15.00/ Optical Society of America sources. A more complicate setup overcomes this limitation by merging the colors after the CGHs [2], yet this approach requires a laser setup adapted to the specific CGH layout. In this paper we want to develop elements that are capable of generating screenfilling, multicolor images from one white laser beam, consisting of three single lasers beams of red, green, and blue color. In this case there are widely known approaches to encode the specific information for the single wavelengths not in separated elements, but in the structure profile itself, as first proposed by Dammann [3] in the case of grating structures. With the optimal rotation angle method [4,5], even the creation of multicolor images from a single element, illuminated by an RGB laser beam is possible. However, this method is only suited for signals consisting of a limited number of points. Images filling the whole signal plane would be limited regarding the SNR and furthermore cause excessive computational effort. The introduction of a phase delay, increased significantly beyond 2, can be used to improve such a multi-wavelength element [6,7] but in this case the choice of wavelengths is limited and, especially for covering the typical RGB wavelengths, the required structure depth can be very high and thus make the fabrication more difficult if small pixel sizes are of interest. Another known possibility is the use of a stratified setup of CGHs, where the optical nearfield 5482 APPLIED OPTICS Vol. 46, No August 2007

2 Fig. 1. (Color online) Principle of monochromatic image generation by a CGH. Fig. 2. (Color online) Creation of a multicolor image from the three primary colors, using three laterally separated CGHs. of one hologram is directly influenced by the following CGH. Such stratified setups have already been analyzed and fabricated for periodic, grating like structures [8]. They also enable the encoding of arbitrary, wavelength-selective functions [9]. In contrast to conventional CGHs these elements are extremely sensitive to variations in the illumination angle and thus sacrifice one of the main advantages a projection setup with CGHs. Furthermore, they are very challenging for the fabrication, since they require almost pixel-exact adjustment of the stratified CGHs in the lateral direction. The herein proposed element is a new approach to a simple projection system based on CGHs that is realized as a stacked setup consisting of common surface relief phase holograms and dielectric multilayer mirrors. In the following we first describe the calculation method used for the monochromatic CGHs. Then design and fabrication of the stacked setup for color image generation are explained and optical measurements of the resulting images are given. 2. Design of the Computer Generated Hologram for the Monochromatic Case Binary phase only diffractive elements can be used to influence a coherent, monochromatic laser beam in such a way that during further propagation of the light a desired image is formed (Fig. 1). To calculate the required phase function we use an iterative approach based on the Gerchberg Saxton algorithm [10]. The Fraunhofer approximation is used for the simulation of the propagation between element and image plane, thus the image is calculated as the Fourier transform of the optical function of the CGH. This means that after a certain propagation length, necessary to reach the far field, the image only scales with the distance. Furthermore, we chose the lateral size of the phase function to be considerably smaller than the beam size and assumed plane wave illumination. This unit cell was then repeated several times to form the final CGH, having a size of about 1 cm 1 cm. These two approaches lead to a translation invariance of the image formation, i.e., the CGH can be moved through the laser beam without influencing the image. The setup is also very insensitive to the actual intensity distribution of the laser beam on the CGH as long as the laser spot in the image plane is sufficiently small. Therefore it is no problem to use, for example, stacked diode lasers with a rather inhomogeneous intensity profile. Due to the repetition of the unit cell, the CGH works as a beam splitter. The image is therefore composed of pixels having the size and shape of the undisturbed laser beam and thus stays sharp as long as the laser beam diameter is sufficient to sample the image in the corresponding plane. With a proper choice of parameters the projection onto strongly tilted or curved screens is possible. As a rule of thumb, at least about 3 3 repetitions of the unit cell must lay inside the laser beam diameter. This separates the image pixels enough to prevent large intensity modulations due to phase dislocations and at the same time retains a quite smooth appearance of the image. In our experimental setup we used 250 mw diode pumped solid state lasers for blue and green (473 nm and 532 nm) and a 300 mw stacked diode laser for red 635 nm. The beam diameter was for all three lasers about 3 mm which results in a unit cell of about 1 1 mm. The pixel number was then chosen according to the pixel size (see Section 4). Furthermore we used a Fourier lens after the CGH adapted to the screen distance (standard screen distance: 2 m) to achieve a laser spot small enough to sample the image. Of course this reduces the depth of focus. For a projection on tilted or curved screens one has to bear this limit in mind and probably chose a smaller image resolution, which would allow a smaller beam diameter and thus a larger depth of focus. It is very straightforward to use this rather simple optical setup to create a multicolor image by illuminating three elements for the primary colors, which are placed side by side. However, this sacrifices the large depth of focus to a far greater extent (Fig. 2). 3. New Approach to Create Color Images by Computer Generated Holograms Our approach is to place the elements directly behind each other, giving the separate primary color images almost the same source point. It is thus comparable with a multicolor volume hologram, yet it is created synthetically from single elements. The wavelength selectivity is achieved by dielectric multilayer mirrors, which are designed to reflect one of the RGB wavelengths and transmit the other two. These mir- 1 August 2007 Vol. 46, No. 22 APPLIED OPTICS 5483

3 Fig. 3. (Color online) Principle of a wavelength selective, reflective CGH. rors are applied to the diffractive elements, forming a wavelength selective, reflective CGH. If furthermore the structure is embedded so that both sides have only plane interfaces, the transmitted light does not suffer any phase modulation (Fig. 3). Therefore, a stacked setup, consisting of three of these CGHs designed for red, green, and blue, allows the encoding of three different optical functions for the three wavelengths (Fig. 4). The multilayer mirror, which is to be applied upon the CGHs, must be optimized with regard to two aspects: Firstly, in order to ensure a good efficiency of the resulting element, the reflectivity should be as high as possible for one of the RGB wavelengths (in the following called reflection wavelength ). Secondly, the two other wavelengths (in the following called transmission wavelengths ) should propagate through the element without being disturbed. This means the bandwidth of the reflection peak should be as small as possible and the reflectivity for the transmission wavelengths should be as close to zero as possible. The suppression of any reflection of the transmission wavelengths is the most important condition here, since even a small reflection would result in an additional image on the screen, wrong in size and in color. Normally, to design such an optical coating, one would choose a very thick coating with many layers, using the large number of degrees of freedom in the design for better wavelength selectivity. However, in our case the mirror is put upon a binary surface relief structure, whose shape should be maintained by the mirror to preserve the CGH s function for the reflected light. If the mirror gets thicker, the Fig. 5. Wavelength characteristic of dielectric multilayer mirrors of different total thicknesses, designed for reflection at 543 nm. edges get increasingly rounded, therefore, regarding the optical function of the CGH, a mirror as thin as possible is preferable. As a further constraint due to adhesion problems in the final, quite complex stacked element, only a limited number of materials is available for the dielectric layers. We chose SiO 2 n 1.46 and TiO 2 n 2.5 as layer stack materials. The wavelength characteristics that can be achieved by a layer stack of 4.6 m, 2.5 m, and 1.5 m thickness, optimized for reflection at 543 nm and transmission at 473 nm and 635 nm, is shown in Fig. 5. The important parameter (suppression at 473 nm and 632 nm), depends very much on the actual layer system (small changes in layer thickness due to fabrication tolerances shift the sidelobes) and no significant improvement is possible by using the thicker systems. Since the bandwidth and the peak reflectivity of the thinnest system is still sufficient, we decided to use the 1.5 m thick layer system for the element of the green part of the image. For the red and blue part an edge filter can be applied. For these filters even fewer layers are required to get the same suppression behavior as for the green part. Therefore, layer systems of 1.1 m and 1.0 m total thickness were chosen. The calculated and the measured wavelength characteristics of the multilayer mirrors, realized with these parameters, are shown in Fig. 6. Fig. 4. (Color online) Principle of stacked setup, creating a reflective RGB-CGH. Fig. 6. (Color online) Calculated and measured wavelength characteristics of the dielectric multilayer mirrors, used for the stacked, wavelength selective CGH APPLIED OPTICS Vol. 46, No August 2007

4 4. Fabrication of the Stacked Computer Generated Hologram As basic material for the wavelength selective CGH as shown in Fig. 3, a UV hardening polymer was used, because it is possible to structure it by UV molding and also apply a dielectric filter onto it. Additionally, the polymer can be applied upon already fabricated wavelength selective CGHs and further processed to form a stacked setup as in Fig. 4. A. Fabrication of the Computer Generated Hologram Masters by Electron-Beam Lithography The phase function of the CGH was realized as a binary surface relief structure in a fused silica substrate. We used an electron-beam writer SB350 OS (Vistec Electron Beam GmbH) for writing the phase information into resist, which after developing acts as an etching mask for the underlying chromium layer. Then, this chromium mask was transferred by reactive ion beam etching into the fused silica substrate, where the height was chosen to realize a step for the reflected light of the corresponding wavelength and the refractive index of the UV polymer. To evaluate the influence of the feature size on the stacked setup, we created the phase function with pixel sizes of 0.5, 0.7, 1.0, 2.0, 4.0, and 8.0 m. For the unit cell of about 1 1 mm (see Section 2) we chose a pixel number of , , , , , and pixels respectively. Therefore the appearance of the images is comparable, only the resolution and the aperture angle changes. There are several fabrication tolerances that influence the resulting height structure. Most critical are an inadequate e-beam dose during the lithography, which will result in a change in the fill factor (that is, the ratio between the lateral size of and zero pixels), and a limited accuracy in the reactive ion beam etching time, which will result in a different step height of the binary structure. In our case we achieved for the several fabricated elements a fill factor accuracy of about 5% for the smallest pixel size and a depth accuracy of about 5 nm, which corresponds to a relative error of the step height of about 5%. However, within the thin element approximation, small deviations of this kind mainly cause a slight increase in the zeroth order efficiency, but do not significantly influence the optical function. Since the effects caused by distortions of the profile due to the coating process is much greater, the tolerances during the CGH fabrication are in our case not critical for the final result. B. Replication into the Polymer Layer In this process, the surface of the substrate (which may already be a reflection coated CGH) was covered with a thin polymer layer and subsequently structured by a replication process. Thus the planarization of the previous and the generation of the next CGH in the stack were accomplished simultaneously. The compatibility of the two processes replication and dielectric filter generation (in our case by ionizedplasma assisted evaporation, APS) can be critical due to low adhesion, different coefficients of thermal expansion, or limited polymer stability. We succeeded with an approach consisting of UV molding of thin polymer layers, inorganic organic hybrid polymer material, optimized curing, and a special dielectric APS coating design and process [11]. UV molding is a reliable technology, which is well established, i.e., in the generation of large quantities of temperature stable micro optical elements [12]. In particular the replication assures that the quality of the fused silica master element can be transferred to a high number of polymer-on-glass elements. The UV molding was carried out in an MA6 mask aligner (SUSS MicroTec) with embossing hardware using the fused-silica CGH master as stamper and fused silica as well as borofloat B33 glass wafers as substrates [13]. After the parallel orientation of stamper and wafer to each other (wedge error compensation), the UV resin (Zipcone UA Gelest, Inc.) was dispensed, master and substrate were laterally and axially aligned, and the polymer film was then cured by a UV dose of 1 J cm 2 at 365 nm and subsequently separated from the master. Maximum stability against the following APS coating step was achieved by low polymer thickness of 10 m and by full UV cure with no oxygen present, followed by a thermal curing step for 30 min at 160 C. After dielectric coating, the top layer SiO 2 was treated with an adhesion promoting silane, so the whole cycle could be repeated. Whereas single layer AR coated UV polymer elements were thoroughly tested concerning mechanical and thermal stability [11], these tests have still to be carried out for the generated stacks, but up to now no defects due to the repeated hardbake procedure at 165 C and the plasma load during the APS coating process were found. In addition, we could demonstrate the separation of a wafer with stacked elements on a dicing saw (DAD341 Disco), showing the capability of a parallel fabrication of elements on a wafer scale. Fig. 7. SEM image of a cross section of the stacked, wavelength selective CGH. 1 August 2007 Vol. 46, No. 22 APPLIED OPTICS 5485

5 Fig. 8. Detail of Fig. 7, showing the influence of layer growth on the surface relief profile (CGH with 0.7 m pixel size). Fig. 9. Ratio of the transmittance in a structured area T s to the transmittance in an unstructured area T u, measured for the red CGH. Due to the shift invariance of the Fourier transform and the independent manner, in which the single color phase functions are applied to the incoming beam, the CGHs only have to be aligned regarding rotation, but not translation. In Fig. 7 SEM pictures of cross sections of the stacked element can be seen, showing the different layer systems. The layer growth during the APS coating has a significant influence on the surface relief structure: the edges of the structure are rounded and the fill factor (ratio of lateral size of pixels at and at zero level) is changed (Fig. 8). 5. Characterization We fabricated several CGHs for just one of the primary colors (according to Fig. 3) as well as several CGHs for all three colors (stack in Fig. 4) to be able to investigate both the optical behavior of a wavelength selective CGH on its own and the capability of the stacked setup to create multicolor images. A. Influence of the Mirror Structuring on the Optical Function While measuring the reflection and the transmission behavior of the structured mirrors we encountered variations due to fabrication related variations in the thicknesses of the layers of the mirror that overlay the intended measurements (comparison between structured and unstructured regions, influence of front backside measurements). Therefore we had to stick to measurements at the same point on the substrate or at very closely neighboring points 1 mm to get reliable data. Bearing these restrictions in mind we carried out several optical measurements summarized in Fig. 9 and Table 1. However, due to the holographic nature of the image generation, these fluctuations do not create significant disturbances in the created images, compared with conventional monochromatic transmission-type CGH. For comparison of front and backside illumination we measured the ratio between all diffracted light in reflection and all reflected light (including zeroth order) for elements with a pixel size of 1 m (Table 1). This is not the efficiency for the diffraction of the light into the desired signal (because stray light, mirror images, and higher order images are included here) but it nevertheless can serve as a measure for the influences of the layer coating on the diffraction properties of the CGH. We found that of the reflection wavelength (bold numbers in Table 1) is significantly lower for frontside illumination. This is due to the changes in fill factor and depth of the structure during the growth of the layer system (Fig. 8) that both increase the zeroth order efficiency. For the two transmission wavelengths the element does not have the right depth for maximal diffraction efficiency anyway; therefore a change in fill factor and depth can cause an increase as well as a decrease of (regular numbers in Table 1). Thus no side can be generally preferred, but in our case backside illumination is slightly advantageous. To estimate the influence of the pixel size we compared the ratio of the totally transmitted intensity T in a structured T s and an unstructured T u area (Fig. 9). For smaller pixel sizes, the part of the mirror that is located in the vicinity of the pixel edges and is therefore bended and disturbed in its optical function (Fig. 8) gets bigger in relation to the whole mirror size. Therefore, decreasing the pixel size results in a higher transmission of the reflection wavelength and a lower transmission of the transmission wavelength (Fig. 9, example for red CGH). Since we assume no significant absorption inside the element this means Fig. 10. (Color online) Optical setup for the stacked, wavelength selective CGH for multicolor image generation APPLIED OPTICS Vol. 46, No August 2007

6 Table 1. Total Reflective Diffraction Efficiency in % (All Reflected Light Minus Reflected Zeroth Order) of One-Color Elements for Front Backside Illumination Element s Reflection Wavelength, Illumination Direction Red Illumination (635 nm) Illumination Wavelength Green Illumination (543 nm) Blue Illumination (473 nm) 635 nm, frontside ill nm, backside ill nm, frontside ill nm, backside ill nm, frontside ill nm, backside ill that the desired image from the reflection wavelength will get darker and the unwanted images from the transmission wavelengths will get brighter with decreasing pixel size. B. Analysis of the Created Multicolor Images The single, wavelength selective CGHs (as in Fig. 3) were illuminated with the three primary colors. The resulting pictures were sharp and showed a noiselevel comparable to a conventional transmission-type CGH. This means the structured multilayer mirror is able to realize the optical function of the CGH very well despite the rounding of the pixels. The visible wrong color images (Fig. 11) have different intensities, which is partly due to the different residual suppression of the transmission wavelengths, which the fabricated multilayer mirrors are actually able to achieve. Also the sizes of these ghost images are different due to different diffraction angles of the primary colors, meaning they appear dimmer or brighter even if they carry about the same energy. Altogether the blue element works best (intensity of green image 5%, red image 1%), followed by the green element (blue image 10%, red image 1%) and the red element (green image 25%, blue image 10%). For the stacked element we expect two possible wrong color images from the topmost layer, since it is illuminated with all three colors. The second layer should produce only one visible wrong color image, since the color from the topmost layer is already reflected, while the last element should not produce any distorting image, since the main parts of the other two colors are already reflected. With respect to the images from the single elements (Fig. 11) we used the sequence red-green-blue, with red being the lowermost element. It was illuminated according to Fig. 10. As expected, colored images are created (Fig. 12). The wrong color images appear only very faint but are still visible, especially if they appear in dark areas of the image. To measure the achievable depth of focus we chose a fixed Fourier lens of 1.4 m focus distance and place the image screen 2 m and 0.7 m from the CGH. In contrast to the laterally separated CGHs (Fig. 2) that were used in the same optical setup, no color displacement is visible with the stacked element (Fig. 12). Fig. 11. Monochromatic images created from an RGB laser beam. Fig. 12. Photographs of a color images, created by a wavelength selective, reflective CGH. Magnified detail illustrates large depth of focus without color separation. 1 August 2007 Vol. 46, No. 22 APPLIED OPTICS 5487

7 6. Conclusion We designed and realized stratified CGHs for the creation of screen filling, multicolor images, based on combining dielectric multilayer mirrors with phase only CGHs. The typical, adjustment insensitive optical setup is preserved and the resulting image quality is comparable to the monochromatic case. There is no color displacement as in the case of laterally separated CGHs and thus the complete depth of focus, provided by the optical setup, can be used. The concept of the stacked element is not limited to binary elements. Also multilevel elements (e.g., 4 or 8 height level elements) can be used, which will result in a better overall image quality (lower noise level) and better efficiency (no mirror image). Further investigations are necessary to improve the color separation in order to avoid any residual wrong color images. To this end a more detailed investigation of the reflection properties of structured multilayer mirrors will be necessary. Another approach is the encoding of the wavelength selectivity by a contact holographic step, which transfers the optical function of regular CGHs into thickfilm holograms. This idea is comparable to the herein proposed setup, yet it might be more compatible for large-scale production, and will be tackled in a forthcoming paper. The authors would like to thank MSO Jena GmbH for help with the selection process of the multilayer coating, H. J. Fuchs, H. Schmidt, and W. Gräf for the fabrication of the CGH master, and C. Otto for preparing the elements for the SEM pictures. This work was funded by the Deutsche Forschungsgemeinschaft within the project 3D Micro- and Nanostructured Optics. References 1. H. H. Suh, Color-image generation by use of binary-phase holograms, Opt. Lett. 24, (1999). 2. J. R. Fienup and J. W. Goodman, New ways to make computer generated color holograms, Nouv. Rev. Opt. Appl. 5(5), (1974). 3. H. Dammann, Color separation gratings, Appl. Opt. 17, (1978). 4. J. Bengtsson, Kinoform design with an optimal-rotation-angle method, Appl. Opt. 33, (1994). 5. J. Bengtsson, Kinoforms designed to produce different fan-out patterns for two wavelengths, Appl. Opt. 37, (1998). 6. I. Barton, P. Blair, and M. R. Taghizadeh, Dual-wavelength operation diffractive phase elements for pattern formation, Opt. Express 1, (1997). 7. Y. Ogura, N. Shirai, J. Tanida, and Y. Ichioka, Wavelengthmultiplexing diffractive phase elements: design, fabrication, and performance evaluation, J. Opt. Soc. Am. A 18, (2001). 8. G. Nordin, R. Johnson, and A. Tanguay, Jr., Diffraction properties of stratified volume holographic optical elements, J. Opt. Soc. Am. A 9, (1992). 9. S. Borgsmüller, S. Noethe, C. Dietrich, T. Kresse, and R. Männer, Computer-generated stratified diffractive optical elements, Appl. Opt. 42, (2003). 10. R. W. Gerchberg and W. O. Saxton, A practical algorithm for the determination of phase from image and diffraction plane pictures, Optik 35, (1972). 11. U. Schulz, U. B. Schallenberg, and N. Kaiser, Antireflective coating design for plastic optics, Appl. Opt. 42, (2003). 12. H. Rudmann and M. Rossi, Design and fabrication technologies for ultraviolet replicated micro-optics, Opt. Eng. 43, (2004). 13. P. Dannberg, R. Bierbaum, L. Erdmann, A. Krehl, A. Braeuer, and E. B. Kley, Micro-optical elements and their integration to glass and optoelectronic wafers, Microsys. Technol. 6, (1999) APPLIED OPTICS Vol. 46, No August 2007

Computer Generated Holograms for Optical Testing

Computer Generated Holograms for Optical Testing Computer Generated Holograms for Optical Testing Dr. Jim Burge Associate Professor Optical Sciences and Astronomy University of Arizona jburge@optics.arizona.edu 520-621-8182 Computer Generated Holograms

More information

Diffractive optical elements for high gain lasers with arbitrary output beam profiles

Diffractive optical elements for high gain lasers with arbitrary output beam profiles Diffractive optical elements for high gain lasers with arbitrary output beam profiles Adam J. Caley, Martin J. Thomson 2, Jinsong Liu, Andrew J. Waddie and Mohammad R. Taghizadeh. Heriot-Watt University,

More information

Virtual input device with diffractive optical element

Virtual input device with diffractive optical element Virtual input device with diffractive optical element Ching Chin Wu, Chang Sheng Chu Industrial Technology Research Institute ABSTRACT As a portable device, such as PDA and cell phone, a small size build

More information

Major Fabrication Steps in MOS Process Flow

Major Fabrication Steps in MOS Process Flow Major Fabrication Steps in MOS Process Flow UV light Mask oxygen Silicon dioxide photoresist exposed photoresist oxide Silicon substrate Oxidation (Field oxide) Photoresist Coating Mask-Wafer Alignment

More information

Part 5-1: Lithography

Part 5-1: Lithography Part 5-1: Lithography Yao-Joe Yang 1 Pattern Transfer (Patterning) Types of lithography systems: Optical X-ray electron beam writer (non-traditional, no masks) Two-dimensional pattern transfer: limited

More information

Micro- and Nano-Technology... for Optics

Micro- and Nano-Technology... for Optics Micro- and Nano-Technology...... for Optics 3.2 Lithography U.D. Zeitner Fraunhofer Institut für Angewandte Optik und Feinmechanik Jena Printing on Stones Map of Munich Stone Print Contact Printing light

More information

Confocal Imaging Through Scattering Media with a Volume Holographic Filter

Confocal Imaging Through Scattering Media with a Volume Holographic Filter Confocal Imaging Through Scattering Media with a Volume Holographic Filter Michal Balberg +, George Barbastathis*, Sergio Fantini % and David J. Brady University of Illinois at Urbana-Champaign, Urbana,

More information

The range of applications which can potentially take advantage of CGH is very wide. Some of the

The range of applications which can potentially take advantage of CGH is very wide. Some of the CGH fabrication techniques and facilities J.N. Cederquist, J.R. Fienup, and A.M. Tai Optical Science Laboratory, Advanced Concepts Division Environmental Research Institute of Michigan P.O. Box 8618, Ann

More information

EUV Plasma Source with IR Power Recycling

EUV Plasma Source with IR Power Recycling 1 EUV Plasma Source with IR Power Recycling Kenneth C. Johnson kjinnovation@earthlink.net 1/6/2016 (first revision) Abstract Laser power requirements for an EUV laser-produced plasma source can be reduced

More information

Lithography. 3 rd. lecture: introduction. Prof. Yosi Shacham-Diamand. Fall 2004

Lithography. 3 rd. lecture: introduction. Prof. Yosi Shacham-Diamand. Fall 2004 Lithography 3 rd lecture: introduction Prof. Yosi Shacham-Diamand Fall 2004 1 List of content Fundamental principles Characteristics parameters Exposure systems 2 Fundamental principles Aerial Image Exposure

More information

Exposure schedule for multiplexing holograms in photopolymer films

Exposure schedule for multiplexing holograms in photopolymer films Exposure schedule for multiplexing holograms in photopolymer films Allen Pu, MEMBER SPIE Kevin Curtis,* MEMBER SPIE Demetri Psaltis, MEMBER SPIE California Institute of Technology 136-93 Caltech Pasadena,

More information

BEAM SHAPING OPTICS TO IMPROVE HOLOGRAPHIC AND INTERFEROMETRIC NANOMANUFACTURING TECHNIQUES Paper N405 ABSTRACT

BEAM SHAPING OPTICS TO IMPROVE HOLOGRAPHIC AND INTERFEROMETRIC NANOMANUFACTURING TECHNIQUES Paper N405 ABSTRACT BEAM SHAPING OPTICS TO IMPROVE HOLOGRAPHIC AND INTERFEROMETRIC NANOMANUFACTURING TECHNIQUES Paper N5 Alexander Laskin, Vadim Laskin AdlOptica GmbH, Rudower Chaussee 9, 89 Berlin, Germany ABSTRACT Abstract

More information

Be aware that there is no universal notation for the various quantities.

Be aware that there is no universal notation for the various quantities. Fourier Optics v2.4 Ray tracing is limited in its ability to describe optics because it ignores the wave properties of light. Diffraction is needed to explain image spatial resolution and contrast and

More information

Analysis and optimization on single-zone binary flat-top beam shaper

Analysis and optimization on single-zone binary flat-top beam shaper Analysis and optimization on single-zone binary flat-top beam shaper Jame J. Yang New Span Opto-Technology Incorporated Miami, Florida Michael R. Wang, MEMBER SPIE University of Miami Department of Electrical

More information

Micro- and Nano-Technology... for Optics

Micro- and Nano-Technology... for Optics Micro- and Nano-Technology...... for Optics 3.2 Lithography U.D. Zeitner Fraunhofer Institut für Angewandte Optik und Feinmechanik Jena Printing on Stones Map of Munich Stone Print Shadow Printing Photomask

More information

PICO MASTER 200. UV direct laser writer for maskless lithography

PICO MASTER 200. UV direct laser writer for maskless lithography PICO MASTER 200 UV direct laser writer for maskless lithography 4PICO B.V. Jan Tinbergenstraat 4b 5491 DC Sint-Oedenrode The Netherlands Tel: +31 413 490708 WWW.4PICO.NL 1. Introduction The PicoMaster

More information

USE OF COMPUTER- GENERATED HOLOGRAMS IN OPTICAL TESTING

USE OF COMPUTER- GENERATED HOLOGRAMS IN OPTICAL TESTING 14 USE OF COMPUTER- GENERATED HOLOGRAMS IN OPTICAL TESTING Katherine Creath College of Optical Sciences University of Arizona Tucson, Arizona Optineering Tucson, Arizona James C. Wyant College of Optical

More information

Microlens array-based exit pupil expander for full color display applications

Microlens array-based exit pupil expander for full color display applications Proc. SPIE, Vol. 5456, in Photon Management, Strasbourg, France, April 2004 Microlens array-based exit pupil expander for full color display applications Hakan Urey a, Karlton D. Powell b a Optical Microsystems

More information

Sensitive measurement of partial coherence using a pinhole array

Sensitive measurement of partial coherence using a pinhole array 1.3 Sensitive measurement of partial coherence using a pinhole array Paul Petruck 1, Rainer Riesenberg 1, Richard Kowarschik 2 1 Institute of Photonic Technology, Albert-Einstein-Strasse 9, 07747 Jena,

More information

A process for, and optical performance of, a low cost Wire Grid Polarizer

A process for, and optical performance of, a low cost Wire Grid Polarizer 1.0 Introduction A process for, and optical performance of, a low cost Wire Grid Polarizer M.P.C.Watts, M. Little, E. Egan, A. Hochbaum, Chad Jones, S. Stephansen Agoura Technology Low angle shadowed deposition

More information

Figure 7 Dynamic range expansion of Shack- Hartmann sensor using a spatial-light modulator

Figure 7 Dynamic range expansion of Shack- Hartmann sensor using a spatial-light modulator Figure 4 Advantage of having smaller focal spot on CCD with super-fine pixels: Larger focal point compromises the sensitivity, spatial resolution, and accuracy. Figure 1 Typical microlens array for Shack-Hartmann

More information

Half-tone proximity lithography

Half-tone proximity lithography Half-tone proximity lithography Torsten Harzendorf* a, Lorenz Stuerzebecher a, Uwe Vogler b, Uwe D. Zeitner a, Reinhard Voelkel b a Fraunhofer Institut für Angewandte Optik und Feinmechanik IOF, Albert

More information

Optical Waveguide Types

Optical Waveguide Types 8 Refractive Micro Optics Optical Waveguide Types There are two main types of optical waveguide structures: the step index and the graded index. In a step-index waveguide, the interface between the core

More information

Lecture 5. Optical Lithography

Lecture 5. Optical Lithography Lecture 5 Optical Lithography Intro For most of microfabrication purposes the process (e.g. additive, subtractive or implantation) has to be applied selectively to particular areas of the wafer: patterning

More information

Exercise 8: Interference and diffraction

Exercise 8: Interference and diffraction Physics 223 Name: Exercise 8: Interference and diffraction 1. In a two-slit Young s interference experiment, the aperture (the mask with the two slits) to screen distance is 2.0 m, and a red light of wavelength

More information

Lab-level and low-cost fabrication technique for polymer based micro-optical elements and holographic structures

Lab-level and low-cost fabrication technique for polymer based micro-optical elements and holographic structures Lab-level and low-cost fabrication technique for polymer based micro-optical elements and holographic structures Maik Rahlves a, Maher Rezem a, Christian Kelb a, Kristian Boroz a, Dina Gödeke a, Sebastian

More information

Optical transfer function shaping and depth of focus by using a phase only filter

Optical transfer function shaping and depth of focus by using a phase only filter Optical transfer function shaping and depth of focus by using a phase only filter Dina Elkind, Zeev Zalevsky, Uriel Levy, and David Mendlovic The design of a desired optical transfer function OTF is a

More information

LOS 1 LASER OPTICS SET

LOS 1 LASER OPTICS SET LOS 1 LASER OPTICS SET Contents 1 Introduction 3 2 Light interference 5 2.1 Light interference on a thin glass plate 6 2.2 Michelson s interferometer 7 3 Light diffraction 13 3.1 Light diffraction on a

More information

Copyright 2004 Society of Photo Instrumentation Engineers.

Copyright 2004 Society of Photo Instrumentation Engineers. Copyright 2004 Society of Photo Instrumentation Engineers. This paper was published in SPIE Proceedings, Volume 5160 and is made available as an electronic reprint with permission of SPIE. One print or

More information

Photonics and Optical Communication

Photonics and Optical Communication Photonics and Optical Communication (Course Number 300352) Spring 2007 Dr. Dietmar Knipp Assistant Professor of Electrical Engineering http://www.faculty.iu-bremen.de/dknipp/ 1 Photonics and Optical Communication

More information

1. INTRODUCTION ABSTRACT

1. INTRODUCTION ABSTRACT Experimental verification of Sub-Wavelength Holographic Lithography physical concept for single exposure fabrication of complex structures on planar and non-planar surfaces Michael V. Borisov, Dmitry A.

More information

OPTICAL technologies are believed to play an increasingly

OPTICAL technologies are believed to play an increasingly 2136 JOURNAL OF LIGHTWAVE TECHNOLOGY, VOL. 26, NO. 14, JULY 15, 2008 Efficient Planar-Integrated Free-Space Optical Interconnects Fabricated by a Combination of Binary and Analog Lithography Richard Heming,

More information

Hermetic Packaging Solutions using Borosilicate Glass Thin Films. Lithoglas Hermetic Packaging Solutions using Borosilicate Glass Thin Films

Hermetic Packaging Solutions using Borosilicate Glass Thin Films. Lithoglas Hermetic Packaging Solutions using Borosilicate Glass Thin Films Hermetic Packaging Solutions using Borosilicate Glass Thin Films 1 Company Profile Company founded in 2006 ISO 9001:2008 qualified since 2011 Headquarters and Production in Dresden, Germany Production

More information

Supplementary Figure 1: Optical Properties of V-shaped Gold Nanoantennas a) Illustration of the possible plasmonic modes.

Supplementary Figure 1: Optical Properties of V-shaped Gold Nanoantennas a) Illustration of the possible plasmonic modes. Supplementary Figure 1: Optical Properties of V-shaped Gold Nanoantennas a) Illustration of the possible plasmonic modes. S- symmetric, AS antisymmetric. b) Calculated linear scattering spectra of individual

More information

Chapter 17: Wave Optics. What is Light? The Models of Light 1/11/13

Chapter 17: Wave Optics. What is Light? The Models of Light 1/11/13 Chapter 17: Wave Optics Key Terms Wave model Ray model Diffraction Refraction Fringe spacing Diffraction grating Thin-film interference What is Light? Light is the chameleon of the physical world. Under

More information

Section 2: Lithography. Jaeger Chapter 2. EE143 Ali Javey Slide 5-1

Section 2: Lithography. Jaeger Chapter 2. EE143 Ali Javey Slide 5-1 Section 2: Lithography Jaeger Chapter 2 EE143 Ali Javey Slide 5-1 The lithographic process EE143 Ali Javey Slide 5-2 Photolithographic Process (a) (b) (c) (d) (e) (f) (g) Substrate covered with silicon

More information

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. The lithographic process

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. The lithographic process Section 2: Lithography Jaeger Chapter 2 Litho Reader The lithographic process Photolithographic Process (a) (b) (c) (d) (e) (f) (g) Substrate covered with silicon dioxide barrier layer Positive photoresist

More information

A Laser-Based Thin-Film Growth Monitor

A Laser-Based Thin-Film Growth Monitor TECHNOLOGY by Charles Taylor, Darryl Barlett, Eric Chason, and Jerry Floro A Laser-Based Thin-Film Growth Monitor The Multi-beam Optical Sensor (MOS) was developed jointly by k-space Associates (Ann Arbor,

More information

CHAPTER 7. Waveguide writing in optimal conditions. 7.1 Introduction

CHAPTER 7. Waveguide writing in optimal conditions. 7.1 Introduction CHAPTER 7 7.1 Introduction In this chapter, we want to emphasize the technological interest of controlled laser-processing in dielectric materials. Since the first report of femtosecond laser induced refractive

More information

Wavelength Stabilization of HPDL Array Fast-Axis Collimation Optic with integrated VHG

Wavelength Stabilization of HPDL Array Fast-Axis Collimation Optic with integrated VHG Wavelength Stabilization of HPDL Array Fast-Axis Collimation Optic with integrated VHG C. Schnitzler a, S. Hambuecker a, O. Ruebenach a, V. Sinhoff a, G. Steckman b, L. West b, C. Wessling c, D. Hoffmann

More information

Integrated micro-optical imaging system with a high interconnection capacity fabricated in planar optics

Integrated micro-optical imaging system with a high interconnection capacity fabricated in planar optics Integrated micro-optical imaging system with a high interconnection capacity fabricated in planar optics Stefan Sinzinger and Jürgen Jahns An integrated free-space optical interconnection system with 2500

More information

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. EE143 Ali Javey Slide 5-1

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. EE143 Ali Javey Slide 5-1 Section 2: Lithography Jaeger Chapter 2 Litho Reader EE143 Ali Javey Slide 5-1 The lithographic process EE143 Ali Javey Slide 5-2 Photolithographic Process (a) (b) (c) (d) (e) (f) (g) Substrate covered

More information

Imaging Systems Laboratory II. Laboratory 8: The Michelson Interferometer / Diffraction April 30 & May 02, 2002

Imaging Systems Laboratory II. Laboratory 8: The Michelson Interferometer / Diffraction April 30 & May 02, 2002 1051-232 Imaging Systems Laboratory II Laboratory 8: The Michelson Interferometer / Diffraction April 30 & May 02, 2002 Abstract. In the last lab, you saw that coherent light from two different locations

More information

Filters for Dual Band Infrared Imagers

Filters for Dual Band Infrared Imagers Filters for Dual Band Infrared Imagers Thomas D. Rahmlow, Jr.* a, Jeanne E. Lazo-Wasem a, Scott Wilkinson b, and Flemming Tinker c a Rugate Technologies, Inc., 353 Christian Street, Oxford, CT 6478; b

More information

Waveguiding in PMMA photonic crystals

Waveguiding in PMMA photonic crystals ROMANIAN JOURNAL OF INFORMATION SCIENCE AND TECHNOLOGY Volume 12, Number 3, 2009, 308 316 Waveguiding in PMMA photonic crystals Daniela DRAGOMAN 1, Adrian DINESCU 2, Raluca MÜLLER2, Cristian KUSKO 2, Alex.

More information

Solution of Exercises Lecture Optical design with Zemax Part 6

Solution of Exercises Lecture Optical design with Zemax Part 6 2013-06-17 Prof. Herbert Gross Friedrich Schiller University Jena Institute of Applied Physics Albert-Einstein-Str 15 07745 Jena Solution of Exercises Lecture Optical design with Zemax Part 6 6 Illumination

More information

Examination Optoelectronic Communication Technology. April 11, Name: Student ID number: OCT1 1: OCT 2: OCT 3: OCT 4: Total: Grade:

Examination Optoelectronic Communication Technology. April 11, Name: Student ID number: OCT1 1: OCT 2: OCT 3: OCT 4: Total: Grade: Examination Optoelectronic Communication Technology April, 26 Name: Student ID number: OCT : OCT 2: OCT 3: OCT 4: Total: Grade: Declaration of Consent I hereby agree to have my exam results published on

More information

Testing Aspheric Lenses: New Approaches

Testing Aspheric Lenses: New Approaches Nasrin Ghanbari OPTI 521 - Synopsis of a published Paper November 5, 2012 Testing Aspheric Lenses: New Approaches by W. Osten, B. D orband, E. Garbusi, Ch. Pruss, and L. Seifert Published in 2010 Introduction

More information

Integrated Focusing Photoresist Microlenses on AlGaAs Top-Emitting VCSELs

Integrated Focusing Photoresist Microlenses on AlGaAs Top-Emitting VCSELs Integrated Focusing Photoresist Microlenses on AlGaAs Top-Emitting VCSELs Andrea Kroner We present 85 nm wavelength top-emitting vertical-cavity surface-emitting lasers (VCSELs) with integrated photoresist

More information

Micropolarizer Array for Infrared Imaging Polarimetry

Micropolarizer Array for Infrared Imaging Polarimetry Brigham Young University BYU ScholarsArchive All Faculty Publications 1999-01-01 Micropolarizer Array for Infrared Imaging Polarimetry M. W. Jones Gregory P. Nordin nordin@byu.edu See next page for additional

More information

plasmonic nanoblock pair

plasmonic nanoblock pair Nanostructured potential of optical trapping using a plasmonic nanoblock pair Yoshito Tanaka, Shogo Kaneda and Keiji Sasaki* Research Institute for Electronic Science, Hokkaido University, Sapporo 1-2,

More information

Compact ellipsometer employing a static polarimeter module with arrayed polarizer and wave-plate elements

Compact ellipsometer employing a static polarimeter module with arrayed polarizer and wave-plate elements Compact ellipsometer employing a static polarimeter module with arrayed polarizer and wave-plate elements Takashi Sato, 1 Takeshi Araki, 1 Yoshihiro Sasaki, 2 Toshihide Tsuru, 3 Toshiyasu Tadokoro, 1 and

More information

The spectral colours of nanometers

The spectral colours of nanometers Reprint from the journal Mikroproduktion 3/2005 Berthold Michelt and Jochen Schulze The spectral colours of nanometers Precitec Optronik GmbH Raiffeisenstraße 5 D-63110 Rodgau Phone: +49 (0) 6106 8290-14

More information

Measurement and alignment of linear variable filters

Measurement and alignment of linear variable filters Measurement and alignment of linear variable filters Rob Sczupak, Markus Fredell, Tim Upton, Tom Rahmlow, Sheetal Chanda, Gregg Jarvis, Sarah Locknar, Florin Grosu, Terry Finnell and Robert Johnson Omega

More information

Low aberration monolithic diffraction gratings for high performance optical spectrometers

Low aberration monolithic diffraction gratings for high performance optical spectrometers Low aberration monolithic diffraction gratings for high performance optical spectrometers Peter Triebel, Tobias Moeller, Torsten Diehl; Carl Zeiss Spectroscopy GmbH (Germany) Alexandre Gatto, Alexander

More information

Infrared broadband 50%-50% beam splitters for s- polarized light

Infrared broadband 50%-50% beam splitters for s- polarized light University of New Orleans ScholarWorks@UNO Electrical Engineering Faculty Publications Department of Electrical Engineering 7-1-2006 Infrared broadband 50%-50% beam splitters for s- polarized light R.

More information

Lecture 7. Lithography and Pattern Transfer. Reading: Chapter 7

Lecture 7. Lithography and Pattern Transfer. Reading: Chapter 7 Lecture 7 Lithography and Pattern Transfer Reading: Chapter 7 Used for Pattern transfer into oxides, metals, semiconductors. 3 types of Photoresists (PR): Lithography and Photoresists 1.) Positive: PR

More information

On-chip Si-based Bragg cladding waveguide with high index contrast bilayers

On-chip Si-based Bragg cladding waveguide with high index contrast bilayers On-chip Si-based Bragg cladding waveguide with high index contrast bilayers Yasha Yi, Shoji Akiyama, Peter Bermel, Xiaoman Duan, and L. C. Kimerling Massachusetts Institute of Technology, 77 Massachusetts

More information

Characteristics of point-focus Simultaneous Spatial and temporal Focusing (SSTF) as a two-photon excited fluorescence microscopy

Characteristics of point-focus Simultaneous Spatial and temporal Focusing (SSTF) as a two-photon excited fluorescence microscopy Characteristics of point-focus Simultaneous Spatial and temporal Focusing (SSTF) as a two-photon excited fluorescence microscopy Qiyuan Song (M2) and Aoi Nakamura (B4) Abstracts: We theoretically and experimentally

More information

CHAPTER 2 POLARIZATION SPLITTER- ROTATOR BASED ON A DOUBLE- ETCHED DIRECTIONAL COUPLER

CHAPTER 2 POLARIZATION SPLITTER- ROTATOR BASED ON A DOUBLE- ETCHED DIRECTIONAL COUPLER CHAPTER 2 POLARIZATION SPLITTER- ROTATOR BASED ON A DOUBLE- ETCHED DIRECTIONAL COUPLER As we discussed in chapter 1, silicon photonics has received much attention in the last decade. The main reason is

More information

Influence of dielectric substrate on the responsivity of microstrip dipole-antenna-coupled infrared microbolometers

Influence of dielectric substrate on the responsivity of microstrip dipole-antenna-coupled infrared microbolometers Influence of dielectric substrate on the responsivity of microstrip dipole-antenna-coupled infrared microbolometers Iulian Codreanu and Glenn D. Boreman We report on the influence of the dielectric substrate

More information

Project Staff: Timothy A. Savas, Michael E. Walsh, Thomas B. O'Reilly, Dr. Mark L. Schattenburg, and Professor Henry I. Smith

Project Staff: Timothy A. Savas, Michael E. Walsh, Thomas B. O'Reilly, Dr. Mark L. Schattenburg, and Professor Henry I. Smith 9. Interference Lithography Sponsors: National Science Foundation, DMR-0210321; Dupont Agreement 12/10/99 Project Staff: Timothy A. Savas, Michael E. Walsh, Thomas B. O'Reilly, Dr. Mark L. Schattenburg,

More information

Supporting Information

Supporting Information Electronic Supplementary Material (ESI) for Materials Horizons. This journal is The Royal Society of Chemistry 2017 Supporting Information Nanofocusing of circularly polarized Bessel-type plasmon polaritons

More information

Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses

Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses Appl Phys A (2010) 101: 225 229 DOI 10.1007/s00339-010-5824-8 Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses J.J.J. Kaakkunen J. Bekesi J. Ihlemann P. Simon Received:

More information

Supporting Information: Experimental. Demonstration of Demagnifying Hyperlens

Supporting Information: Experimental. Demonstration of Demagnifying Hyperlens Supporting Information: Experimental Demonstration of Demagnifying Hyperlens Jingbo Sun, Tianboyu Xu, and Natalia M. Litchinitser* Electrical Engineering Department, University at Buffalo, The State University

More information

Optical Components for Laser Applications. Günter Toesko - Laserseminar BLZ im Dezember

Optical Components for Laser Applications. Günter Toesko - Laserseminar BLZ im Dezember Günter Toesko - Laserseminar BLZ im Dezember 2009 1 Aberrations An optical aberration is a distortion in the image formed by an optical system compared to the original. It can arise for a number of reasons

More information

Application Bulletin 240

Application Bulletin 240 Application Bulletin 240 Design Consideration CUSTOM CAPABILITIES Standard PC board fabrication flexibility allows for various component orientations, mounting features, and interconnect schemes. The starting

More information

AP B Webreview ch 24 diffraction and interference

AP B Webreview ch 24 diffraction and interference Name: Class: _ Date: _ AP B Webreview ch 24 diffraction and interference Multiple Choice Identify the choice that best completes the statement or answers the question.. In order to produce a sustained

More information

4-2 Image Storage Techniques using Photorefractive

4-2 Image Storage Techniques using Photorefractive 4-2 Image Storage Techniques using Photorefractive Effect TAKAYAMA Yoshihisa, ZHANG Jiasen, OKAZAKI Yumi, KODATE Kashiko, and ARUGA Tadashi Optical image storage techniques using the photorefractive effect

More information

Asphere testing with a Fizeau interferometer based on a combined computer-generated hologram

Asphere testing with a Fizeau interferometer based on a combined computer-generated hologram 172 J. Opt. Soc. Am. A/ Vol. 23, No. 1/ January 2006 J.-M. Asfour and A. G. Poleshchuk Asphere testing with a Fizeau interferometer based on a combined computer-generated hologram Jean-Michel Asfour Dioptic

More information

Lithography. Development of High-Quality Attenuated Phase-Shift Masks

Lithography. Development of High-Quality Attenuated Phase-Shift Masks Lithography S P E C I A L Development of High-Quality Attenuated Phase-Shift Masks by Toshihiro Ii and Masao Otaki, Toppan Printing Co., Ltd. Along with the year-by-year acceleration of semiconductor device

More information

StarBright XLT Optical Coatings

StarBright XLT Optical Coatings StarBright XLT Optical Coatings StarBright XLT is Celestron s revolutionary optical coating system that outperforms any other coating in the commercial telescope market. Our most popular Schmidt-Cassegrain

More information

Diffractive optical elements based on Fourier optical techniques: a new class of optics for extreme ultraviolet and soft x-ray wavelengths

Diffractive optical elements based on Fourier optical techniques: a new class of optics for extreme ultraviolet and soft x-ray wavelengths Diffractive optical elements based on Fourier optical techniques: a new class of optics for extreme ultraviolet and soft x-ray wavelengths Chang Chang, Patrick Naulleau, Erik Anderson, Kristine Rosfjord,

More information

Diffraction, Fourier Optics and Imaging

Diffraction, Fourier Optics and Imaging 1 Diffraction, Fourier Optics and Imaging 1.1 INTRODUCTION When wave fields pass through obstacles, their behavior cannot be simply described in terms of rays. For example, when a plane wave passes through

More information

Radial Polarization Converter With LC Driver USER MANUAL

Radial Polarization Converter With LC Driver USER MANUAL ARCoptix Radial Polarization Converter With LC Driver USER MANUAL Arcoptix S.A Ch. Trois-portes 18 2000 Neuchâtel Switzerland Mail: info@arcoptix.com Tel: ++41 32 731 04 66 Principle of the radial polarization

More information

PicoMaster 100. Unprecedented finesse in creating 3D micro structures. UV direct laser writer for maskless lithography

PicoMaster 100. Unprecedented finesse in creating 3D micro structures. UV direct laser writer for maskless lithography UV direct laser writer for maskless lithography Unprecedented finesse in creating 3D micro structures Highest resolution in the market utilizing a 405 nm diode laser Structures as small as 300 nm 375 nm

More information

Sub-50 nm period patterns with EUV interference lithography

Sub-50 nm period patterns with EUV interference lithography Microelectronic Engineering 67 68 (2003) 56 62 www.elsevier.com/ locate/ mee Sub-50 nm period patterns with EUV interference lithography * a, a a b b b H.H. Solak, C. David, J. Gobrecht, V. Golovkina,

More information

Laser Beam Splitting. By Diffractive Optics. Michael A. Golub

Laser Beam Splitting. By Diffractive Optics. Michael A. Golub Laser Beam Splitting By Diffractive Optics Michael A. Golub Recent advances in diffractive optics theory and technology have made beam splitting a valuable resource for optical designers. Programmable,

More information

R.B.V.R.R. WOMEN S COLLEGE (AUTONOMOUS) Narayanaguda, Hyderabad.

R.B.V.R.R. WOMEN S COLLEGE (AUTONOMOUS) Narayanaguda, Hyderabad. R.B.V.R.R. WOMEN S COLLEGE (AUTONOMOUS) Narayanaguda, Hyderabad. DEPARTMENT OF PHYSICS QUESTION BANK FOR SEMESTER III PAPER III OPTICS UNIT I: 1. MATRIX METHODS IN PARAXIAL OPTICS 2. ABERATIONS UNIT II

More information

LIQUID CRYSTAL LENSES FOR CORRECTION OF P ~S~YOP

LIQUID CRYSTAL LENSES FOR CORRECTION OF P ~S~YOP LIQUID CRYSTAL LENSES FOR CORRECTION OF P ~S~YOP GUOQIANG LI and N. PEYGHAMBARIAN College of Optical Sciences, University of Arizona, Tucson, A2 85721, USA Email: gli@ootics.arizt~ii~.e~i~ Correction of

More information

Synthesis of projection lithography for low k1 via interferometry

Synthesis of projection lithography for low k1 via interferometry Synthesis of projection lithography for low k1 via interferometry Frank Cropanese *, Anatoly Bourov, Yongfa Fan, Andrew Estroff, Lena Zavyalova, Bruce W. Smith Center for Nanolithography Research, Rochester

More information

Physics 197 Lab 8: Interference

Physics 197 Lab 8: Interference Physics 197 Lab 8: Interference Equipment: Item Part # per Team # of Teams Bottle of Bubble Solution with dipper 1 8 8 Wine Glass 1 8 8 Straw 1 8 8 Optics Bench PASCO OS-8518 1 8 8 Red Diode Laser and

More information

Integrated Photonics based on Planar Holographic Bragg Reflectors

Integrated Photonics based on Planar Holographic Bragg Reflectors Integrated Photonics based on Planar Holographic Bragg Reflectors C. Greiner *, D. Iazikov and T. W. Mossberg LightSmyth Technologies, Inc., 86 W. Park St., Ste 25, Eugene, OR 9741 ABSTRACT Integrated

More information

TL2 Technology Developer User Guide

TL2 Technology Developer User Guide TL2 Technology Developer User Guide The Waveguide available for sale now is the TL2 and all references in this section are for this optic. Handling and care The TL2 Waveguide is a precision instrument

More information

A novel tunable diode laser using volume holographic gratings

A novel tunable diode laser using volume holographic gratings A novel tunable diode laser using volume holographic gratings Christophe Moser *, Lawrence Ho and Frank Havermeyer Ondax, Inc. 85 E. Duarte Road, Monrovia, CA 9116, USA ABSTRACT We have developed a self-aligned

More information

PROJECT. DOCUMENT IDENTIFICATION D2.2 - Report on low cost filter deposition process DISSEMINATION STATUS PUBLIC DUE DATE 30/09/2011 ISSUE 2 PAGES 16

PROJECT. DOCUMENT IDENTIFICATION D2.2 - Report on low cost filter deposition process DISSEMINATION STATUS PUBLIC DUE DATE 30/09/2011 ISSUE 2 PAGES 16 GRANT AGREEMENT NO. ACRONYM TITLE CALL FUNDING SCHEME 248898 PROJECT 2WIDE_SENSE WIDE spectral band & WIDE dynamics multifunctional imaging SENSor ENABLING SAFER CAR TRANSPORTATION FP7-ICT-2009.6.1 STREP

More information

Flat Top, Ultra-Narrow Band Pass Optical Filters Using Plasma Deposited Hard Oxide Coatings

Flat Top, Ultra-Narrow Band Pass Optical Filters Using Plasma Deposited Hard Oxide Coatings Flat Top, Ultra-Narrow Band Pass Optical Filters Using Plasma Deposited Hard Oxide Coatings Alluxa Engineering Staff September 2012 0 1 0.1 1 cav 2 cav 3 cav 4 cav 5 cav 0.01 0.001 635 636 637 638 639

More information

High Performance Thin Film Optical Coatings Technical Reference Document 09/13. Coatings Capabilities. Heat Control - Hot Mirror Filters

High Performance Thin Film Optical Coatings Technical Reference Document 09/13. Coatings Capabilities. Heat Control - Hot Mirror Filters Heat Control - Hot Mirror Filters A hot mirror is in essence a thin film coating applied to substrates in an effort to reflect infra-red radiation either as a means to harness the reflected wavelengths

More information

Advances in holographic replication with the Aztec structure

Advances in holographic replication with the Aztec structure Advances in holographic replication with the Aztec structure James J. Cowan TelAztec, LLC, 15 A Street Burlington, MA 01803, USA Abstract Holograms that are predominantly in use today as replicable devices

More information

Realization of Polarization-Insensitive Optical Polymer Waveguide Devices

Realization of Polarization-Insensitive Optical Polymer Waveguide Devices 644 Realization of Polarization-Insensitive Optical Polymer Waveguide Devices Kin Seng Chiang,* Sin Yip Cheng, Hau Ping Chan, Qing Liu, Kar Pong Lor, and Chi Kin Chow Department of Electronic Engineering,

More information

The manuscript is clearly written and the results are well presented. The results appear to be valid and the methodology is appropriate.

The manuscript is clearly written and the results are well presented. The results appear to be valid and the methodology is appropriate. Reviewers' comments: Reviewer #1 (Remarks to the Author): The manuscript titled An optical metasurface planar camera by Arbabi et al, details theoretical and experimental investigations into the development

More information

Department of Mechanical and Aerospace Engineering, Princeton University Department of Astrophysical Sciences, Princeton University ABSTRACT

Department of Mechanical and Aerospace Engineering, Princeton University Department of Astrophysical Sciences, Princeton University ABSTRACT Phase and Amplitude Control Ability using Spatial Light Modulators and Zero Path Length Difference Michelson Interferometer Michael G. Littman, Michael Carr, Jim Leighton, Ezekiel Burke, David Spergel

More information

3B SCIENTIFIC PHYSICS

3B SCIENTIFIC PHYSICS 3B SCIENTIFIC PHYSICS Equipment Set for Wave Optics with Laser 1003053 Instruction sheet 06/18 Alf 1. Safety instructions The laser emits visible radiation at a wavelength of 635 nm with a maximum power

More information

A high-resolution fringe printer for studying synthetic holograms

A high-resolution fringe printer for studying synthetic holograms Publication : SPIE Proc. Practical Holography XX: Materials and Applications, SPIE#6136, San Jose, 347 354(2006). 1 A high-resolution fringe printer for studying synthetic holograms K. Matsushima a, S.

More information

Effects of spherical aberrations on micro welding of glass using ultra short laser pulses

Effects of spherical aberrations on micro welding of glass using ultra short laser pulses Available online at www.sciencedirect.com Physics Procedia 39 (2012 ) 563 568 LANE 2012 Effects of spherical aberrations on micro welding of glass using ultra short laser pulses Kristian Cvecek a,b,, Isamu

More information

Exp No.(8) Fourier optics Optical filtering

Exp No.(8) Fourier optics Optical filtering Exp No.(8) Fourier optics Optical filtering Fig. 1a: Experimental set-up for Fourier optics (4f set-up). Related topics: Fourier transforms, lenses, Fraunhofer diffraction, index of refraction, Huygens

More information

SUPPLEMENTARY INFORMATION

SUPPLEMENTARY INFORMATION SUPPLEMENTARY INFORMATION doi:0.038/nature727 Table of Contents S. Power and Phase Management in the Nanophotonic Phased Array 3 S.2 Nanoantenna Design 6 S.3 Synthesis of Large-Scale Nanophotonic Phased

More information

CHAPTER 5 FINE-TUNING OF AN ECDL WITH AN INTRACAVITY LIQUID CRYSTAL ELEMENT

CHAPTER 5 FINE-TUNING OF AN ECDL WITH AN INTRACAVITY LIQUID CRYSTAL ELEMENT CHAPTER 5 FINE-TUNING OF AN ECDL WITH AN INTRACAVITY LIQUID CRYSTAL ELEMENT In this chapter, the experimental results for fine-tuning of the laser wavelength with an intracavity liquid crystal element

More information

Monolithically integrated InGaAs nanowires on 3D. structured silicon-on-insulator as a new platform for. full optical links

Monolithically integrated InGaAs nanowires on 3D. structured silicon-on-insulator as a new platform for. full optical links Monolithically integrated InGaAs nanowires on 3D structured silicon-on-insulator as a new platform for full optical links Hyunseok Kim 1, Alan C. Farrell 1, Pradeep Senanayake 1, Wook-Jae Lee 1,* & Diana.

More information

EE143 Fall 2016 Microfabrication Technologies. Lecture 3: Lithography Reading: Jaeger, Chap. 2

EE143 Fall 2016 Microfabrication Technologies. Lecture 3: Lithography Reading: Jaeger, Chap. 2 EE143 Fall 2016 Microfabrication Technologies Lecture 3: Lithography Reading: Jaeger, Chap. 2 Prof. Ming C. Wu wu@eecs.berkeley.edu 511 Sutardja Dai Hall (SDH) 1-1 The lithographic process 1-2 1 Photolithographic

More information