FOCUSED ION BEAM SYSTEMS. Basics and Applications

Transcription

1 FOCUSED ION BEAM SYSTEMS Basics and Applications The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a TwoBeam system a single system that can function as an imaging, analytical, and sample modification tool. Presenting the principles, capabilities, challenges, and applications of the FIB technique, this edited volume comprehensively covers the state-of-the-art in ion beam technology including the TwoBeam system. The basic principles of ion beam and two-beam systems, their interaction with materials, etching, and deposition are all covered, as well as in-situ materials characterization, sample preparation, three-dimension reconstruction, and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic, and magnetic devices, this self-contained working knowledge of the full range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering, and nanotechnology. For color versions of selected figures, please go to the resources link at www. cambridge.org/ Nan Yao holds several positions at Princeton University, New Jersey. He is director of the Imaging and Analysis Center, Senior Research Scholar at the Institute for the Science and Technology of Materials, and a senior lecturer in Materials Science and Engineering.

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3 FOCUSED ION BEAM SYSTEMS Basics and Applications Edited by NAN YAO Princeton University, New Jersey

4 cambridge university press Cambridge, New York, Melbourne, Madrid, Cape Town, Singapore, São Paulo, Delhi, Mexico City Cambridge University Press The Edinburgh Building, Cambridge cb2 8ru, UK Published in the United States of America by Cambridge University Press, New York Information on this title: / Cambridge University Press 2007 This publication is in copyright. Subject to statutory exception and to the provisions of relevant collective licensing agreements, no reproduction of any part may take place without the written permission of Cambridge University Press. First published 2007 First paperback edition 2010 A catalogue record for this publication is available from the British Library isbn Hardback isbn Paperback Cambridge University Press has no responsibility for the persistence or accuracy of URLs for external or third-party internet websites referred to in this publication, and does not guarantee that any content on such websites is, or will remain, accurate or appropriate. Information regarding prices, travel timetables, and other factual information given in this work is correct at the time of first printing but Cambridge University Press does not guarantee the accuracy of such information thereafter.

5 Contents List of contributors page vii Preface xi 1 Introduction to the focused ion beam system 1 Nan Yao 2 Interaction of ions with matter 31 Nobutsugu Imanishi 3 Gas assisted ion beam etching and deposition 67 Hyoung Ho (Chris) Kang, Clive Chandler, and Matthew Weschler 4 Imaging using electrons and ion beams 87 Kaoru Ohya and Tohru Ishitani 5 Characterization methods using FIB/SEM DualBeam instrumentation 126 Steve Reyntjens and Lucille A. Giannuzzi 6 High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling 146 E. L. Principe 7 Fabrication of nanoscale structures using ion beams 187 Ampere A. Tseng 8 Preparation for physico-chemical analysis 215 Richard Langford 9 In-situ sample manipulation and imaging 250 T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani v

6 vi Contents 10 Micro-machining and mask repair 268 Mark Utlaut 11 Three-dimensional visualization of nanostructured materials using focused ion beam tomography 295 Derren Dunn, Alan J. Kubis, and Robert Hull 12 Ion beam implantation of surface layers 318 Daniel Recht and Nan Yao 13 Applications for biological materials 337 Kirk Hou and Nan Yao 14 Focused ion beam systems as a multifunctional tool for nanotechnology 355 Toshiaki Fujii, Tatsuya Asahata, and Takashi Kaito Index 391

7 Contributors Tatsuya Asahata SII Nano Technology Inc., Japan Clive Chandler FEI Company, 5350 NE Dawson Creek Drive, Hillsboro, OR Derren Dunn IBM Microelectronics, Hopewell Junction, NY Toshiaki Fujii SII NanoTechnology Inc., Japan Lucille A. Giannuzzi FEI Company, 5350 NE Dawson Creek Drive, Hillsboro, OR Hyoung Ho (Chris) Kang IBM Microelectronics, East Fishkill, New York, NY Kirk Hou Princeton University, Princeton Institute for the Science and Technology of Materials, 70 Prospect Avenue, Princeton, NJ Robert Hull University of Virginia, Department of Materials Science and Engineering, 116 Engineers Way, Charlottesville, VA Nobutsugu Imanishi Kyoto University, Department of Nuclear Engineering, Ayameikeminami, Nara, , Japan Tohru Ishitani Naka division, Hitachi High-technologies Corporation, Ichige 882, Hitachinaka, Ibaraki, , Japan vii

8 viii List of contributors Takashi Kaito SII NanoTechnology Inc., Japan T. Kamino Hitachi Science Systems, Ltd., 11-1 Ishikawa-cho, Hitachinaka-shi, Ibarakiken, , Japan Alan J. Kubis University of Virginia, Department of Materials Science, 116 Engineers Way, Charlottesville, VA Richard Langford University of Manchester, Materials Science Centre, School of Materials, Grosvenor Street, Manchester M1 7HS, UK T. Ohnishi Hitachi High-technologies Corporation, 882, Ichige, Hitachinaka-shi, Ibaraki-ken, , Japan Kaoru Ohya The University of Tokushima, Department of Electrical and Electronic Engineering, Faculty of Engineering, Minamijosanjima 2-1, Tokushima, , Japan E. L. Principe Carl Zeiss SMT Inc., Nano Technology Systems Division, 555 Twin Dolphin Drive, Redwood City, CA Daniel Recht Princeton University, Princeton Institute for the Science and Technology of Materials, 70 Prospect Avenue, Princeton, NJ Steve Reyntjens FEI Company, Achtseweg Noord 5, 5651 GG Eindhoven, The Netherlands Ampere A. Tseng Arizona State University, Department of Mechanical and Aerospace Engineering, Tempe, Arizona Mark Utlaut University of Portland, Department of Physics, Portland, OR Matthew Weschler FEI Company, 5350 NE Dawson Creek Drive, Hillsboro, OR

9 List of contributors ix T. Yaguchi Hitachi Science Systems, Ltd., 11-1 Ishikawa-cho, Hitachinaka-shi, Ibarakiken, Japan Nan Yao Princeton University, Princeton Institute for the Science and Technology of Materials, 70 Prospect Avenue, Princeton, NJ 08540

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11 Preface In the past few years, scientists have begun to gain the exquisite of controlling the arrangement of matter on the nanometer scale (1 nm ¼ 10 9 m), a new field called nanotechnology, consequently, has started to emerge. As the foundation of nanotechnology, nanostructured materials take on an enormously richer variety of properties and promise exciting new advances in micromechanical, electronic, and magnetic devices as well as in molecular fabrications. The structure composition processing property relationships for these sub-100 nm-sized materials can only be understood by employing the new generation microscopes such as the focused ion beam system in corporate with simultaneous operation of electron beam and in-situ analysis. This book will highlight the principles and vast capabilities of this technique and their applications in this fast-growing nanotechnology field and the challenges in the twenty-first century. xi