Optics for EUV Production NXE 3100 NXE 3300 Olaf Conradi, Peter Kuerz, Ralf Arnold, Thure Boehm, Joachim Buechele, Manfred Dahl, Udo Dinger, Hans-Juergen Mann, Stephan Muellender, Martin Lowisch, Oliver Natt, Wolfgang Seitz, Franz-Josef Stickel, Thomas Stein, Bernd Thüring, Gero Wittich, Ralf Wichard, Christoph Zaczek, Winfried Kaiser
Agenda 1 2 3 4 5 Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 2
Agenda 1 2 3 4 5 Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 3
EUV program at 2004 2006 2009 2011 MET (Micro Exposure Tools) ADT (NA=0.25) (α-demo Tool) Starlith 3100 (NA=0.25) Starlith 3300 (NA=0.33) Strong commitment to EUV technology: a continuous EUV development program is established since more than 15 years at Carl Zeiss 4
The optical train Introduction λ 13.5 nm NA 0.25 / 0.33 Field 26 x 33 mm² Mag 4x intermediate focus field facet mirror illuminator reticle projection optics plasma source pupil facet mirror collector wafer 5
Agenda 1 2 3 4 5 Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 6
NXE 3100 Six complete systems shipped to ASML 7
NXE 3100 Six illumination systems qualified Parameter Measured Pupil Transmission Uniformity (un-corrected) Telecentricity [Tx/Ty] (wafer level) Ellipticity [E90/E45] Example: Uniformity (uncorrected) field normalized normalized intensity intensity 100.0 100.0 80.0 80.0 60.0 60.0 uncorrected ±1% 40.0 40.0 corrected: < ±0.5% 20.0 20.0 0.0 0.0-15 -10-5 0 5 10 15-15 -10-5 0 5 10 15 field field position position [mm] [mm] 8
NXE 3100 Six projection optics qualified wave front aberrations rms [nm] 1.6 1.4 1.2 1.0 0.8 0.6 prototype lens RMS(Z5-Z37) RMS(spherical) RMS(coma) RMS(ast) RMS(3-foil) Lens 2 to 6 are very similar 0.4 0.2 0.0 tools 9
NXE 3100 Flare is well in Specification for all delivered systems 10 8 flare [%] 6 4 2 0 tools 10
Agenda 1 2 3 4 5 Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 11
NXE 3300 - Prequalification Illuminator already shipped to ASML 12
NXE 3300 - Off-axis illumination enables lossless setting changes annular dipole x dipole y 13
NXE 3300 - Facet Performance - PF Reflectivity Mean reflectivity of pupil facets is well above design target. acceptance range 14
NXE 3300 - Facet Performance - PF Reflectivity Peak wavelength is well centered around design target. acceptance range 15
Illuminator qualification spilt up in geometric and energetic alignment geometric alignment example 3100 example 3100 energetic alignment 16
and are ready for qualification visible metrology cabin EUV qualification chamber ready for illuminator qualification 17
NXE 3300 - Functional tests on first illuminator with a limited number of field facets annular dipole x dipole y First switching of field facets as functional test of illuminator 18
Agenda 1 2 3 4 5 Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 19
NXE 3300 Projection optics design for NA 0.33 3100 3300 Enabling for for higher higher NA: NA: Larger Larger mirror mirror sizes sizes Slit width 26mm MAG = 4x CRAO = 6 significantly steeper aspheres NA 0.25 NA 0.33 schematic designs for illustration only. Full field 6 mirror designs can be extended to NA 0.33 20
NXE 3300 Projection Optics Surface figure in Specification achieved surface quality rms = 0.1 nm residual error [nm] residual error internal target 21
NXE 3300 Projection Optics First mirrors are well in flare specification and more than 60 mirrors in production! 0.30 MSFR [nm rms] 0.25 0.20 0.15 0.10 ADT 3100 3300 0.05 0.00 Dez 03 2004 Dez 04 2005 Dez 05 2006 Dez 2007 06 Dez 07 2008 Dez 08 2009 Dez 2010 09 Dez 2011 10 Dez 11 [year] MSFR 3100 average 102 pm 3100 Champion 59 pm First 3300 mirrors 78 pm 52 pm First results on 3300 mirrors well below the 6% flare Specification - 4% (below a 2µm line) can be expected 22
NXE 3300 Projection Optics Coating Results of first POB mirrors Wavelength matching: Δλ: 0,2% (target: 0.2%) Reflectivity: R: target + 1.2% Homogeneity ΔR max : 0.28% @ 5 (target. 0.4%) 23
Agenda 1 2 3 4 5 Introduction 3100 Update 3300 Illumination System 3300 Projection Optics Summary 24
We see design solutions for high NA systems enabling 11 nm resolution and beyond NA 0.25 0.33 0.4x 0.7 6 mirrors central obscured 8 mirrors unobscured central obscured 27 nm NXE:3100 16 nm NXE:3300 11 nm 8 nm schematic designs for illustration only. 25
Summary 1 NXE 3100 Program six systems are delivered to ASML all key performance parameter are within specification optics fulfills requirements for 27 nm hp and enables R&D for the 22 nm node 2 NXE 3300 Projection Optics more than 60 mirrors in production 4% flare expected based on current mirror quality first mirrors successfully coated 3 NXE 3300 Illumination System pre-qualification Illuminator already shipped to ASML metrology tools ready for qualification of first system first tests on flexible fly s eye successful 26
ACKNOWLEDGEMENT Thanks to the EUV teams at ASML and Carl Zeiss SMT and our partners We gratefully acknowledge funding from the German Federal Ministry of Education and Research (BMBF) in the framework of the CATRENE program (13N10567, CT301 EXEPT ) 27
28