lund nanolab Welcome to A facility within the Nanometer Structure Consortium (nmc) at Lund University
»It s a dream come true. This is the lab I always dreamt of. I didn t know it would ever exist.«ivan Maximov, Process manager
Lund Nano Lab is the latest addition among Swedish research and development laboratories for semiconductor materials and devices. It is specifically built around fundamental research and device development based on nanostructures with nanowires as specialty. Key features Realization and analysis of structures in the nanometer range Integration between epitaxy and processing 300 m 2 cleanroom for cutting edge nanofabrication Academic research Available to external research groups and to industry and start-ups Industrial product development and prototype testing Strategically important areas Research on nanowire growth, materials science Studies on fundamental and device physics, electronics and photonics Nano bio, life sciences Nanoimprint lithography Growth and physics of novel materials Nanowire-based solid state lighting and solar cells Processing of nanoelectronic devices and circuits Lab access, commercial and academic Monthly access fee and hourly rate for machine usage Research collaboration Research projects within the Division of Solid State Physics Cleanroom safety introduction course and individual hands-on training available Customers can place their own employees in the lab
Fluorescence microscopy image of nerve cells cultured for 72 h on GaP nanowires. One of the unique features of the Lund Nano Lab is the close coupling between the manufacturing of the semiconductor structures by epitaxial growth and the pre- and post-processing of the nano structures and nanodevices. The lab is designed with a cleanroom staircase between epitaxy and nanoprocessing parts to simplify sample transfer and allow researchers from processing at levels 1 and epitaxy on level 2 to meet and discuss scientific issues. The close cooperation between the crystal growers, processing and characterization scientists, and physicists is a necessary prerequisite for a successful development of nanowire-based fundamental physics and device-oriented research. NANO-process lab floor 1 ISO 5 cleanroom standard ( class 100 ) Unidirectional air flow, FFU system and HEPA filters Temperature (T=20+ 0.5 ºC) humidity (40+ 5%) Three independent anti-vibration platforms NANO-epitaxy lab floor 2 ISO 7 cleanroom standard ( class 10 000 ) Conventional cleanroom floor, FFU system and HEPA filters Temperature control Connected with Berzelius cleanroom
Nano Imprint Lithography, NIL-patterned device with 250-nm-wide cantilevers. Nanotrees grown from nanowires. Nano-wire based light emitting diodes (LED). Fluorescence microscopy image of the axons from superior cervical ganglia on a 1 by 1 mm nanowire-patterned surface. InAs nanowire with InP barriers of different thicknesses. Measurement on a branched InAs nanowire. Vertical nanowire InAs transistors with 50 nm Lg and good DC characteristics (gm=0.8 S/mm, SS=80 mv/dec., 20 mv hysteresis). A selection of equipment available in Lund Nano Lab, all capable of up to 4-inch wafer processing. A complete list of equipment can be found here: http://booking.ftf.lth.se (click on "view equipment"). EBL Raith 150: high-resolution patterning ( 15 20 nm after lift-off), fabrication of nano-devices in III-Vs, Si, fabrication of Nanoimprint Lithography (NIL) stamps up to 6 in size. / NIL Obducat 6-inch imprinter: sub- 50 nm pattern transfer onto up to 6 inch samples, alignment with 1 µm accuracy, thermal and/or UV-imprint. / MJB 4 DUV mask aligner: optical lithography with resolution up to 500 nm, up to 4 inch wafers. / Atomic Layer Deposition ALD Savannah-100: layer-by-layer deposition of high-quality dielectric films (Al 3O 4, HfO 2 etc). / Sputterer AJA Orion 5: RF-and DC-sputtering/deposition of metals and dielectrics with high precision, deposition of multilayer structures. / Evaporator Pfeiffer Classic 500: Thermal evaporation of metals for e.g. lift-off applications, semi-automatic multilayer metal deposition. / Evaporator AVAC: thermal evaporation of metals and dielectrics. / E-beam evaporator AUTO306: e-beam evaporation of metals (e.g. W). / ICP-RIE, Oxford Instruments: low-energy plasma etching of III-Vs, fabrication of devices in III-Vs in combination with lithographic patterning. / Plasma asher Emitech and ozone cleaner system: Removal of organic residues, oxidation in O 2 plasma. / Rapid Thermal Processing oven RTP1200: formation of contacts, oxidation. FIB/SEM FEI Nova NanoLab 600: high resolution ( 1.1 nm) SEM, focused ion beam (FIB) milling, FIB and / e-beam deposition of Au, W, SiOx, and manipulator. / Field-emission SEM JSM6400F: resolution 5 nm, characterization of nano-structures. / Ellipsometer Wollram M2000VI: measurements of film thickness with high precision, optical properties. / Stylus profiler Dektak 6M: measurements of film thickness. / AFM Dimension 3100: characterization of nanostructures, AFM lithography. / MOCVD, Aixtron 200/4: growth of epitaxial GaAs, InP, antimonides, nanowires and epitaxial layers, device applications: lasers, detectors, HBTs, HEMT, solar cells. / MOCVD Thomas Swan CCS: growth of epitaxial nitride structures, nanowires and epitaxial layers, device applications: blue LEDs, power electronic devices.
The Nanometer Structure Consortium (nmc) at Lund University Since about 20 years, Lund University hosts a major interdisciplinary research environment in Nanoscience, ranging from materials science and quantum physics to applications in the areas of electronics, photonics and the life sciences. It is a center for the development of nanotechnology and fields of science and applications based on the unique properties and opportunities offered at the nanometer length scale. The greatest strength of the consortium lies in the unique combination of scientific and intellectual competence in areas covering physics, electronics, materials science and life sciences on the nanoscale. The common research goals, close interaction in joint projects and weekly meetings and seminars on key thematic areas provide for the best utilization of the consortium s competence and resources and enables us to take on important new challenges in science and technology. Another important feature is the joint research infrastructure, giving young scientists access to advanced resources, in terms of equipment as well as people, way beyond those normally available to junior or postdoctoral researchers. lab staff Ivan Maximov, PhD Mariusz Graczyk, MSc Lena Timby, BSc Georg Rydnemalm Cover image: SEM picture of an array of InP nanowires. Design and production: www.tintinblackwell.com, 2008. Cover Photographs: Marcel van Helvoort, Monkey Business Images Dreamstime.com Peter Ramvall, PhD Sujeeka Lindborg David Adolph, MSc Sören Jeppesen, MSc Highly skilled personnel. Lund Nano Lab is a part of the Division of Solid State Physics at Lund University. For further information please contact: Peter Ramvall (lab manager) phone: +46 703 999 957 peter.ramvall@ftf.lth.se http://www.nano.lth.se/lundnanolab Lund Nano Lab Solid State Physics Lund University, Box 118 SE-221 00 Lund, Sweden