The Development of the Semiconductor CVD and ALD Requirement

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The Development of the Semiconductor CVD and ALD Requirement 1

Linx Consulting 1. We create knowledge and develop unique insights at the intersection of electronic thin film processes and the chemicals industry 2. We help our clients to succeed through our: Experience in global electronics and advanced materials and thin film processing industries: Semi Packaging Nano Technology LCD PV Other Experience in the global chemicals industry Experience at Device Producers Experience at OEMs Global network and capabilities Advanced modeling capabilities 2

High Confidence Decision Support Services PLANNING Business Analysis M&A / Due Diligence Diversification / Expansion Planning IDEAS TO MARKET IP Development Value Chain Analysis Technology Assessment and Commercialization SINGLE CLIENT SERVICES OPERATIONS Cost Benchmarking Competitive Intelligence COO Models and Assessment Process Technology Assessment MARKETING & SALES Market Analysis/Monitoring Market Forecasting and Modeling Competitive Intelligence Customer Perceptions 3

Industry Analysis Reports Offered CMP Technologies and Markets Advanced Thin Films for FEOL and BEOL Applications Emerging Materials Opportunities for Advanced Semiconductor Devices Advanced Cleaning and Surface Preparation: Technologies and Markets Advanced Patterning Forecasting Semiconductor Industry Direct Consumables Model Advanced Materials and Chemicals for Photovoltaic Cells and Modules 4

Agenda Materials Market Landscape The Semiconductor Device Roadmap Deposition Materials Who Is Doing What? The Future 5

New Industry Structure, 2014 Business model changes required / desirable? WSPY, K 40,000 The new Silicon Valley 30,000 20,000 10,000 0 Broadband i-line Notes: 1. Bottom axis is on a percentage basis 2. Size of box is proportional to # wafer starts 3. Source: Semico and Linx estimates 248 nm >1 1 0.8 0.5 0.35 0.25 0.18 0.13 0.045 0.032 0.09 0.065 193 / 193i Discrete Analog Logic Adv Logic NOR NAND DRAM Materials innovations required 6

Further Evolution in 2018 WSPY, K 40,000 Silicon Valley extends 30,000 20,000 10,000 0 Notes: 1. Bottom axis is on a percentage basis 2. Size of box is proportional to # wafer starts 3. Source: Semico and Linx estimates >1 1 0.8 0.5 0.35 0.25 0.18 0.13 0.016 0.012 0.09 0.045 0.065 Discrete Analog Logic Adv Logic NOR NAND DRAM 7

Agenda Materials Market Landscape The Semiconductor Device Roadmap Deposition Materials Who Is Doing What? The Future 8

Logic Device Roadmap Prod n Year 2009 2011 2013 2015 2017 2019 2021 2023 Node 32/28 22/20 15/14 11 7 5 4 3 Integration Options Planar FDSOI MG MG MG MG MG FDSOI MG FDSOI Nanowires TFET Nanowires TFET III-V likely to replace channel material in later MG devices TFET can be Si for first generation and then transfer to alternative materials for second generation 9

Proposed Logic Sources: IMEC, Intel 10

Implementation of 3-D 12

Agenda Materials Market Landscape The Semiconductor Device Roadmap Deposition Materials Who Is Doing What? The Future 14

Market For Advanced Thin Films ($M) 16

Market For Advanced Thin Films ($M) 17

Agenda Materials Market Landscape The Semiconductor Device Roadmap Materials For Lithography The Lithography Decision Chain Who Is Doing What? The Future 18

Materials Market Process complexity is driving higher growth in materials demand than the wafer start growth The BOM component of semiconductor sales will increase over the next 5 years The vapor precursor segment outgrows all other segments dramatically 19

Opportunity Selection and Relationships with OEMs are Critical to Serve Fewer Customers Process PVD ECD CVD SOD ALD Key materials suppliers Nikko Praxair Honeywell Tosoh ATMI DEM BASF MLI Air Products ATMI Air Liquide Linde AZ Electronic Materials UP Chem Air Liquide Air Products Adeka Kojundo DEM SAFC Tri Chemical UP Chem Key OEMS AMAT NVLS AMAT (Semitool) AMAT ASM NVLS TEL TEL TEL Hitachi Kokusai ASM Emerging IPS, Genintech, etc. Key applications, 2008 Interconnect Barrier and Seed Interconnect metal Interconnect LKD Low-k Barrier STI & PMD Gapfill Capacitors Key applications, 2014 Interconnect Barrier and Seed Interconnect metal Caps Interconnect LKD Low-K Barrier Strain STI & PMD Gapfill STI & PMD Gapfill Capacitors Litho Spacers Spacers (non-litho) Barrier/seed Major Buying Centers TSMC Samsung Hynix Toshiba Elpida/ Taiwan Memory Micron Intel IBM 21

Major Developments after 2015 Development 450mm Wafers New Device Architectures Impact 450mm can have a tremendous impact by limiting the number of new fabs built. However, better cost economics can also expand overall semiconductor market growth. Not all suppliers, OEMs and Fabs can invest in this platform. Need to chose development partners carefully. Both non-planar transistors and new memory technologies will expand opportunities for thin film materials suppliers as well as such related processes as CMP, etch and clean. EUV Litho Can impact photo-ancillaries market, especially spacers used in double patterning. Summary However, as often seen in this industry, developments are often later than initially anticipated. We do not believe that 450, non-planar transistors and EUV will all be commercialized at the same time or half-pitch. 22

Agenda Materials Market Landscape The Semiconductor Device Roadmap Materials For Lithography The Lithography Decision Chain Who Is Doing What? The Future 23

Future Trends in Semiconductor MO Deposition The electronic materials supplier business model is being challenged. Consolidation drivers persist, but barriers to exit remain. The industry structure is changing, and segmenting further. A major growth segment for materials suppliers Invention is required to meet new integration schemes Collaboration with Customers and OEMs is important Precursors that cross multiple applications have long term viability Ta, Ge etc. will be needed in multiple generations Other materials will obsolete with new generations 24