PicoMaster 100. Unprecedented finesse in creating 3D micro structures. UV direct laser writer for maskless lithography

Similar documents
PICO MASTER 200. UV direct laser writer for maskless lithography

PICO MASTER. UV direct laser writer for maskless lithography

Heidelberg µpg 101 Laser Writer

Ion Beam Lithography next generation nanofabrication

MLA 150 (DLA) Presentation and examples. Théophane Besson, , Heidelberg Instruments GmbH 1

Products - Microarray Scanners - Laser Scanners - InnoScan 900 Series and MAPIX Software

Introduction of New Products

GEMSCRIPTOR DT-150-R

Zeta-300 3D OPTICAL PROFILER

PIMag Precision Linear Stage

OPTIV CLASSIC 321 GL TECHNICAL DATA

FemtoFAB. Femtosecond laser micromachining system. tel fax Konstitucijos ave. 23C LT Vilnius, Lithuania

Part 5-1: Lithography

contents TABLE OF The SECOM platform Applications - sections Applications - whole cells Features Integrated workflow Automated overlay

High-Power Femtosecond Lasers

PiezoMike Linear Actuator

Norsam Technologies, Inc. Ultra-High Density Analog and Digital Data Storage

High Power and Energy Femtosecond Lasers

UV LED ILLUMINATION STEPPER OFFERS HIGH PERFORMANCE AND LOW COST OF OWNERSHIP

Motion Solutions for Digital Pathology. White Paper

Difrotec Product & Services. Ultra high accuracy interferometry & custom optical solutions

MicroPG 101 Pattern Generator Standard Operating Procedure Draft v.0.2

EE-527: MicroFabrication

Demo Pattern and Performance Test

Bringing Answers to the Surface

FireFly Green. It is a self-contained laser that offers the user increased stability over a wide operating temperature and with a faster warm up time.

Zeta-20. Zeta3D OPTICAL PROFILER IMAGING THE IMPOSSIBLE

11Beamage-3. CMOS Beam Profiling Cameras

Fiber Optic Device Manufacturing

M-041 M-044 Tip/Tilt Stage

Automatic Testing of Photonics Components

V2018 SPINSTAND AND NEW SERVO-8 SYSTEM

Optical Microlithography XXVIII

Säntis 300 Full wafer cathodoluminescence control up to 300 mm diameter

Low-cost direct writing lithography system for the sub-micron range

Photolithography II ( Part 2 )

TECHNICAL DATA. OPTIV CLASSIC 322 Version 3/2013

Nanosurf easyscan 2 FlexAFM

High accurate metrology on large surface areas with low reflectivity

Innovative Mask Aligner Lithography for MEMS and Packaging

Motion Solutions for Digital Pathology

TECHNICAL DATA OPTIV CLASSIC 432

Coherent Laser Measurement and Control Beam Diagnostics

PRECISION CUTTING MICRACUT 202

Opto-Mechanical Equipment of KBTEM: Present Day and the Future

Figure 1 The Raith 150 TWO

BEAMAGE-3.0 KEY FEATURES BEAM DIAGNOSTICS AVAILABLE MODELS MAIN FUNCTIONS SEE ALSO ACCESSORIES. CMOS Beam Profiling Cameras

MEASUREMENT APPLICATION GUIDE OUTER/INNER

ZEISS Axiocam 503 color Your 3 Megapixel Microscope Camera for Fast Image Acquisition Fast, in True Color and Regular Field of View

Park NX-Hivac The world s most accurate and easy to use high vacuum AFM for failure analysis.

ADVANCED DIRECT IMAGING HIGH POWER UV LEDS. by ALTIX. ntone 186 C ntone cool gray 9C de produit : 40833

Development of scalable laser technology for EUVL applications

Systematic Workflow via Intuitive GUI. Easy operation accomplishes your goals faster than ever.

ERS KEY FEATURES BEAM DIAGNOSTICS MAIN FUNCTIONS AVAILABLE MODEL. CMOS Beam Profiling Camera. 1 USB 3.0 for the Fastest Transfer Rates

Mirtec MV-3 Series Desktop AOI Systems Now with 5 and 10 MP camera!

The End of Thresholds: Subwavelength Optical Linewidth Measurement Using the Flux-Area Technique

Information & Instructions

MICROCHIP MANUFACTURING by S. Wolf

Michigan State University College of Engineering; Dept. of Electrical and Computer Eng. ECE 480 Capstone Design Course Project Charter

High-Accuracy Surface Scanning Method

450mm patterning out of darkness Backend Process Exposure Tool SOKUDO Lithography Breakfast Forum July 10, 2013 Doug Shelton Canon USA Inc.

Cutting-edge Atomic Force Microscopy techniques for large and multiple samples

200W 500W, Air Cooled QUBE Fiber Lasers


Hybrid Surface Contour Measuring Machine FORMTRACER CS-5000

COMPACT Diode Laser System (Water-Cooled)

INDIAN INSTITUTE OF TECHNOLOGY BOMBAY

Rotary Encoder System Compact Model Range

Micro- and Nano-Technology... for Optics

Machine Vision Lyte-MV 2

Confocal NEXIV VMZ-K Series. CNC Video Measuring System CONFOCAL NEXIV. VMZ-K Series

Features. Applications. Optional Features

Zeta-20. 3D Optical Profiler

for CNC Lathe Mori Advanced Programming Production System User-friendly features and high reliability now standard for all machines.

Atomic Scale Patterning Made Easy

Operating Manual. itech IMPAXX Digital Monument Engraver

Agilent Cary 7000 Universal Measurement Spectrophotometer (UMS)

nanovea.com PROFILOMETERS 3D Non Contact Metrology

SUSS MA/BA Gen4 Series COMPACT MASK ALIGNER PLATFORM FOR RESEARCH AND LOW-VOLUME PRODUCTION

Acculase Green PWM. Direct Drive Green Laser Diode Module

PhE102-VASE. PHE102 Variable Angle Spectroscopic Ellipsometer. Angstrom Advanced Inc. Angstrom Advanced. Angstrom Advanced

Optical Microscope. Active anti-vibration table. Mechanical Head. Computer and Software. Acoustic/Electrical Shield Enclosure

EUVL Activities in China. Xiangzhao Wang Shanghai Inst. Of Opt. and Fine Mech. Of CAS. (SIOM) Shanghai, China.

Nanometer-level repeatable metrology using the Nanoruler

RAITH e-line OPERATING INSTRUCTIONS

Single Frequency DPSS Lasers

Advanced Stepper Lithography Technology to Enable Flexible AMOLED Displays. Keith Best Roger McCleary Elvino M da Silveira 5/19/17

_active vibration isolation desktop unit halcyonics_i4 series

k λ NA Resolution of optical systems depends on the wavelength visible light λ = 500 nm Extreme ultra-violet and soft x-ray light λ = 1-50 nm

DESIGN OF COMPACT PULSED 4 MIRROR LASER WIRE SYSTEM FOR QUICK MEASUREMENT OF ELECTRON BEAM PROFILE

Design Rules for Silicon Photonics Prototyping

CATALOG No. US FORMTRACER CS Hybrid Surface Contour Measuring Machine

Manufacturing Metrology Team

ML-7111A. 10W YVO 4 Laser Marker. Operation has been improved much easier! Features

Weeke Machining Center, Model BP-100 Optimat

2009 International Workshop on EUV Lithography

OPTICS IN MOTION. Introduction: Competing Technologies: 1 of 6 3/18/2012 6:27 PM.

Supporting Information 1. Experimental

Nanotechnology Solutions Partner

Laser Speckle Reducer LSR-3000 Series

Transcription:

UV direct laser writer for maskless lithography Unprecedented finesse in creating 3D micro structures Highest resolution in the market utilizing a 405 nm diode laser Structures as small as 300 nm 375 nm source available for more demanding applications Compact optical module: use a spare optical module for revolutionary machine downtime reduction User-friendly operation www.4picolitho.nl

Contents Unique opportunity for R&D The 375 nm optical module will allow the system to write lines down to 250 nm Introducing the ideal litho tool for R&D 3 - Applications 3 - Benefits 4 Optics 5 Top Side Alignment 6 Mechanics 7 Performance 8 Software 9 - PicoMaster Machine Controller and PicoMaster Project Manager 9 - User libraries 9 Options 10 - Vacuum pump 10 - Additional write modes 10 - Extra low resolution write mode 10-375 nm optical module instead of 405 nm 10 - Motorized Z adjustment 11 - Extra optical module 11 - Extended warranty 11 - Air conditioning unit 11 Installation requirements 12 About 4PICO Litho 13 Service and dealer information 14

Introducing the ideal litho tool for R&D Meet the smallest high quality laser beam spot available in the market The PicoMaster is a versatile UV laser writer with ultra-high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photo sensitive layers. The base system is a fully operating system. It includes a 405 nm optical module capable of writing structures as small as 300 nm in photo resist layers. This user friendly tool supports up to 4095 levels of grayscale or pure binary mode and allows for 3D optical structures, surface structures as well as mask projects. Real time laser controlled auto focus and laser intensity control ensure high quality imaging during the entire exposure process. Sample of grayscale mode image The control electronics are all mounted within the frame except for the control PC. This Microsoft Windows based desktop PC and all required software is included in the package. Applications - Research / Semiconductor - Photonic devices - Mask making - 3D Lithography - Diffractive optical elements - Microfluidics - Security / Holographics - Other Sample of binary mode image 3

Benefits State-of-the-art Unprecedented finesse in creating 3D micro structures Capabilities - Highest resolution in the market utilizing a long life time 405 nm diode laser. - Critical dimension of 300 nm. - Up to 4095 levels of grayscale or pure binary mode. - 375 nm source available for more demanding applications. - Raster mode as well as vector mode available. - Software controllable selection of write modes. - 4PICO Litho s proprietary light weight objective lens makes real time auto focus possible. - Supports substrates from 5x5mm 2 up to 4 x4 Operation - A modern Microsoft Windows based user interface allows for user-friendly operation. - Highly automated processing, one button operation. - Short preparation time required using PicoMaster Project Manager and PicoMaster Machine Controller applications. On the fly processing of jobs, minimum pre-processing required. - Up-to-date online manuals. - Remote internet support. Installation and maintenance - The is a compact tabletop system which requires minimum cleanroom surface. - Compact optical module: use a spare optical module for revolutionary machine downtime reduction. - Quick and easy installation: all major components, except for the operating PC and vacuum pump, are installed within the enclosure. - Minimal maintenance costs, no regular maintenance required. : the ideal Litho tool for R&D. 4

Optics Compact optical module for excellent stability & revolutionary short machine downtime The full optical path is contained in a small easily changeable module (optical module). By keeping the optical path as short as possible, the pointing stability is greatly increased compared to traditional optical setups. The optical module contains a long lifetime 405 nm GaN laser diode and beam shaping optics for the best spot shape. Together with 4PICO s proprietary high NA objective lens this results in the smallest high quality laser beam spot available on the market. Features: - Smallest high quality laser beam spot available in the market. - The integrated 650 nm red laser controlled autofocus system automatically corrects for height variations. - Intergrated Dose control. - Option: a 375 nm wavelength optical module can be supplied on request. - Option: for less demanding tasks a larger spot size can be selected by using a fully automated NA switch. This switch allows the system to use a larger spot for increased speed. Unique Smallest high quality focused laser beam spot available in the market Optical properties Laser source 405 nm, GaN laser diode. Lifetime >10.000 hours Write modes 0.3 µm, optional 0.6 µm and 0.9 µm FWHM. NA 0.85 Working distance 0.6mm Intensity Max. 3 mw in the spot. Software controllable. Grayscale control 4095 levels Autofocus Focus offset 800 Hz bandwidth, 650 nm red laser controlled -0.3 x +0.3 mm height variation with auto height tracking. Fast voice coil actuator for accurate real-time Z correction. Adjustable by software control. 5

Top Side Alignment Top side alignment The optical module is equipped with a high resolution camera for applications which require multiple layers. The camera images are processed by advanced imaging software. Automatic marker recognition makes it easy for the user to locate the markers. The user can teach any shape to be used as marker. When the marker cannot be found in the camera s field of view the software supports area scan to automatically search the marker in a larger area. Alignment and image compensation can be based on one, two or three markers. Specifications Top side alignment Alignment camera Monochrome 5.2 Mpixel. Pixel resolution 1 µm Close to perfection Automated marker recognition reduces operator errors Final alignment accuracy < 0.5 µm Correction algorithmes Position, Scale (max 5%), Skew, Rotation (Max +/-5 degrees) Rotation correction is performed by interpolated motion between scan and step axis. 6

Mechanics The is equipped with high precision axes for X and Y motion and one optional axis for Z motion. The scan axis (Y) incorporates a high precision dove tail air bearing which is driven by linear motors with nanometer resolution encoders. The step axes (X) uses a precision roller bearing with linear motor and high resolution optical encoder. This system allows for extreme low mechanical errors and fast scan movements. The optional motorized controlled Z-axis has a 12 mm stroke to support various substrate thicknesses. Substrates are clamped down by using a vacuum chuck. Vacuum chucks are easily exchangeable to support different substrate sizes. Benefit Maintenance free axes Mechanical properties Stroke Scan and Step Repeatability Resolution Scan speed Straightness axis Substrate thickness Substrate thickness variation Substrate size Exposable area Max. 115 mm < 20 nm RMS 2 nm Max 200 mm/s < 0.5 µm over 100 mm 0-4 mm manual adjustment. 12 mm with the optional motorized Z-axis installed. Max +/- 0.15mm Min. 5 x 5 mm, max. 125 x 125 mm. Max. 110 x 110 mm (speed dependent). 7

Performance Performance specifications CD 1 Line width uniformity Address grid Data rate Min. 300 nm < 50 nm Selectable. Standard: 20 nm in scan direction and 100 nm in step direction. 10Mhz 1 Critical Dimension of the PicoMaster strongly depends on process parameters, such as resist types and layer thickness. 300nm lines Writing speeds Write mode (µm) Normal Quality (mm²/min) Reduced Quality² (mm²/min) High resolution 0.3 1.4 2.1 Mid resolution 0.6 2.8 4.2 Low resolution 0.9 4.2 6.4 Extra low resolution 5 (example) 23 35 ² When exposing with reduced quality the line edge roughness will increase. 8

Software Screenshot of the visual Project Manager software. User friendly Minimum preparation time required using PicoMaster Project Manager and PicoMaster Machine Controller PicoMaster Machine Controller and PicoMaster Project Manager The Picomaster comes with two Windows based applications: PicoMaster Machine Controller and Project Manager. Project Manager allows the user to select features and combine images while PicoMaster Machine Controller processes these jobs and control the machine. Jobs are processed on the fly, reducing preparation time to the minimum. PicoMaster Machine Controller allows the operator to queue jobs, monitor progress and gives a high level of manual control features. Features of PicoMaster Machine Controller: - On the fly processing of jobs. - Job queuing. - Freely definable process and substrate recipes. - Extended history database. - Remote support. - User access control through login credentials or smart card. Supported formats Standard binary sources Offline conversion required Parameterization 3D sources User Algorithms Bitmaps, TIFF, GDSII CIF, DXF Basic shapes can be configured without source files. Grayscale bitmaps, Parametric. PicoMaster software supports user libraries. These libraries can be written in C# or VB.net. With these user libraries the user can create his own algorithm to calculate the laser intensity at each grid point. 9

Benefit : a compact system that requires minimal cleanroom surface Options Vacuum pump When a central vacuum system is not available, a vacuum pump can be supplied. The pump can be controlled by the PicoMaster system. Additional write modes The optical module can be fitted with an automatic Numerical Aperture switch. Standard the is fitted with a single spot for resolutions as small as 300 nm. For some applications this resolution is not required. The NA switch allows the user to select a lower resolution. This will enable increased writing speeds at lower resolutions. Additional write modes Standard included: high resolution 0.3 µm Mid resolution 0.6 µm Low resolution 0.9 µm Extra-low resolution Standard the comes with the highest resolution available in combination with a 405 nm laser source. Sometimes this is too small for the desired application. A second optical path with a low NA focus lens can be fitted to increase the spot size. Please contact us to discuss the required application. 375 nm Optical module instead of 405 nm The system can be equipped with a 375 nm optical module. This allows the user to use resists only suitable for I-line light sources. Additional the spot size is reduced to 270 nm. This will allow the system to write lines at even higher resolutions. 10

Convenient A standard 12-month warranty and an optional extended warranty Motorized Z stage Some applications require thick substrates. The motorized Z stage will allow the system to detect the surface of a wafer fully automatically. Operator interference for height adjustment based on the used substrate is not required. Mechanical properties motorized Z stage Stroke Resolution 1 µm Wafer thickness Max. 12 mm 0-10 mm Extra optical module The compact optical module is mounted to the step axis by just 3 bolts and a few electrical connections. Within 5 minutes the entire optical module can be swapped for a different module. When uptime is of critical importance, a spare optical module can be added. There is no need for optical alignment after an exchange. This unique feature introduces a revolutionary reduction of machine downtime! The extra optical module can be fitted with either a 405 nm or a 375 nm laser diode. Extended warranty Standard the system comes with a 12-month warranty. The warranty can be extended on a yearly base. The extended warranty includes software updates, telephone and remote support and all non-wear and tear parts. Air-conditioning unit For best results the temperature inside the should be maintained at constant environment conditions with a temperature range of +/- 0.5 C and a humidity range of 45-70%. It is strongly recommended to use a dedicated air conditioning unit to supply conditioned air to the. 11

Installation requirements The is best installed on a vibration isolated table capable supporting a minimum weight of 300 kg. Extra table surface is required for the operating computer. Dimensions¹ Front view Width Height Depth Weight Additional components Electrical connection Compressed air Vacuum Ethernet Conditioned air piping² Recommended environment 600 mm 750 mm 600 mm (not including optional air duct). 260 kg Desktop computer (included in delivery) 230V AC, max. 1 kw 5-7 Bar, Air quality according ISO8573-1:2010 class 3 or better. External For server connections and remote access. Ø 100 mm in and out Clean room ISO class 5 or better. Room Temperature 21 C +/- 1 C Room Humidity 45-70% RH 1 Specifications may change without notification. ² It is strongly recommended to use an air conditioner with recirculation option to maintain optimal process conditions within the PicoMaster. Top view 12

About 4PICO Litho 4PICO Litho is specialized in lithography equipment since 2004. The PicoMaster systems are a derivate of 4PICO s CD/DVD mastering system and built on 15 years of experience. The efficient multidisciplinary team of 4PICO Litho is based in Brainport Region and has access to high tech suppliers. All developments are done in-house. Innovation Brainport Region: A perfect ecosystem for innovation 13

State-of-the-art 4PICO Litho s demo samples are state-of-the-art Service and dealer information Samples Seeing is believing 4PICO Litho s demo samples are state-of-the-art. Send in your requirements for a sample. At all times at least 1 demo system is operational. 4PICO Litho has in-house metrology tools such as Microscope, AFM and SEM for analyzing the samples. Service Local service engineers, remote support and minimum maintenance will guarantee a smooth and worry-free operation. Dealer Questions regarding the and your application: please contact your local contact. 14

Your dealer Dealer name Dealer adress e-mail www. www.4picolitho.nl Jan Tinbergenstraat 4b 5491 DC Sint-Oedenrode The Netherlands +31(0)4 13 49 07 08 info@4pico.nl 15