High-precision narrow-band optical filters for global observation

Similar documents
High-precision narrow-band optical filters for global observation

Radiometric performance of Second Generation Global Imager (SGLI) using integrating sphere

Flat Top, Ultra-Narrow Band Pass Optical Filters Using Plasma Deposited Hard Oxide Coatings

Kazuhiro TANAKA GCOM project team/jaxa April, 2016

BARR ASSOCIATES, INC.

Spectrally Selective Photocapacitance Modulation in Plasmonic Nanochannels for Infrared Imaging

Filters for Dual Band Infrared Imagers

High Performance Thin Film Optical Coatings Technical Reference Document 09/13. Coatings Capabilities. Heat Control - Hot Mirror Filters

In their earliest form, bandpass filters

transmission and reflection characteristics across the spectrum. 4. Neutral density

Influence of dielectric substrate on the responsivity of microstrip dipole-antenna-coupled infrared microbolometers

Bandpass Edge Dichroic Notch & More

From the start the main activity of our company was the development and production of infrared illuminators.

Major Fabrication Steps in MOS Process Flow

TECHNICAL QUICK REFERENCE GUIDE MANUFACTURING CAPABILITIES GLASS PROPERTIES COATING CURVES REFERENCE MATERIALS

10.3 JAXA: GCOM-C/SGLI new developments

A process for, and optical performance of, a low cost Wire Grid Polarizer

Mirrors. Plano and Spherical. Mirrors. Published on II-VI Infrared

Development of a MEMS-based Dielectric Mirror

Lecture 04: Solar Imaging Instruments

Angela Piegari ENEA, Optical Coatings Laboratory, Roma, Italy

Discovering Electrical & Computer Engineering. Carmen S. Menoni Professor Week 3 armain.

IntroOptical Filters. Windows

NEC s EO Sensors and Data Applications

SELECTION GUIDE MULTIPLE-ORDER QUARTZ WAVEPLATES ZERO-ORDER QUARTZ WAVEPLATES DUAL-WAVELENGTH WAVEPLATES... 85

Dual band antireflection coatings for the infrared

How interference filters can outperform colored glass filters in automated vision applications

Angela Piegari ENEA, Optical Coatings Laboratory, Roma, Italy

Department of Astronomy, Graduate School of Science, the University of Tokyo, Hongo, Bunkyo-ku, Tokyo , Japan;

Bandpass Interference Filters

Micro-sensors - what happens when you make "classical" devices "small": MEMS devices and integrated bolometric IR detectors

Spectral and Polarization Configuration Guide for MS Series 3-CCD Cameras

Making NDVI Images using the Sony F717 Nightshot Digital Camera and IR Filters and Software Created for Interpreting Digital Images.

Optical Components for Laser Applications. Günter Toesko - Laserseminar BLZ im Dezember

WELCOME TO EO ISRAEL EVENT

Where Image Quality Begins

IL550 & IL560 Series Optical Monitors for The ULTIMATE in Thin Film Coating Precision, Accuracy & Control

Optical Coatings for Remote Sensing on FY-1 Meteorological

Optoliner NV. Calibration Standard for Sighting & Imaging Devices West San Bernardino Road West Covina, California 91790

MicroSpot FOCUSING OBJECTIVES

GSM OPTICAL MONITORING FOR HIGH PRECISION THIN FILM DEPOSITION

Absentee layer. A layer of dielectric material, transparent in the transmission region of

Generation of a Line Focus for Material Processing from an Array of High Power Diode Laser Bars R. Baettig, N. Lichtenstein, R. Brunner, J.

OPTICAL FILTERS. lasercomponents.com

MUSKY: Multispectral UV Sky camera. Valentina Caricato, Andrea Egidi, Marco Pisani and Massimo Zucco, INRIM

Choosing the Best Optical Filter for Your Application. Georgy Das Midwest Optical Systems, Inc.

Solutions for Lithium Ion Battery Manufacturing

LITHIUM ION BATTERY WEB GAUGING APPLICATIONS

Design and Fabrication of an Efficient Extreme Ultraviolet Beam Splitter

Integrated into Nanowire Waveguides

EAIST1005A0 Preliminary

Vixar High Power Array Technology

Filters. Edgepass Filters Introduction to Edgepass Interference Filters 96 Long Pass Interference Filters 97 Short Pass Interference Filters 97

Development of a fast EUV movie camera for Caltech spheromak jet experiments

StarBright XLT Optical Coatings

Laser-Produced Sn-plasma for Highvolume Manufacturing EUV Lithography

This writeup is adapted from Fall 2002, final project report for by Robert Winsor.

X-ray generation by femtosecond laser pulses and its application to soft X-ray imaging microscope

Optical Lithography. Here Is Why. Burn J. Lin SPIE PRESS. Bellingham, Washington USA

Bandpass filter arrays patterned by photolithography for multispectral

Optics & Light. See What I m Talking About. Grade 8 - Science OPTICS - GRADE 8 SCIENCE 1

Compact Dual Field-of-View Telescope for Small Satellite Payloads

EUV Plasma Source with IR Power Recycling

Simulation comparisons of monitoring strategies in narrow bandpass filters and antireflection coatings

Photonics and Optical Communication

Achievement of Arbitrary Bandwidth of a Narrow Bandpass Filter

Aberrations of a lens

PolarCam and Advanced Applications

Interference Filters & Special Filters. Description

Compact Visible Laser Module C February 2017

Potential benefits of freeform optics for the ELT instruments. J. Kosmalski

Thermopile Detector TPD 2T 0625 G7.2 G20 / 3142 Revision - Date: 2011/12/01

(PT-IC-BC) IR Visible Light Sensor

Hiroshi Murata and Yasuyuki Okamura. 1. Introduction. 2. Waveguide Fabrication

Compact Multispectral and Hyperspectral Imagers based on a Wide Field of View TMA

PowerMax-Pro Sensors. 100 mw to 150W FEATURES

3-5μm F-P Tunable Filter Array based on MEMS technology

Typical LED Characteristics

Lecture 7. Lithography and Pattern Transfer. Reading: Chapter 7

Nikon F2 Exposure Tool

The Products. 2.4 Filters and Windows Basic Principles

SPEC NO: DSAB8533 REV NO: V.19A DATE: AUG/16/2014 PAGE: 1 OF 7 APPROVED: WYNEC CHECKED:

The Importance of Wavelengths on Optical Designs

Custom & OEM Filter Design

ADVANCED MASK MAKING AT RIT. David P. Kanen 5th Year Microelectronic Engineer Student Rochester Institute of Technology ABSTRACT

Ion beam etch and deposition systems

Technical Data Sheet 0603 Package Infrared LED

Collimated Backlights BL-CL

Inverted-COR: Inverted-Occultation Coronagraph for Solar Orbiter

Design Thin Film Narrow Band-pass Filters For Dense Wavelength Division Multiplexing

Nmark AGV-HP. High Accuracy, Thermally Stable Galvo Scanner

CVI LASER OPTICS ANTIREFLECTION COATINGS

Ion Assisted Deposition Processes for Precision and Laser Optics

Update on JAXA GCOM-C. Hiroshi Murakami JAXA/EORC

EVERLIGHT ELECTRONICS CO.,LTD.

CONFIGURING. Your Spectroscopy System For PEAK PERFORMANCE. A guide to selecting the best Spectrometers, Sources, and Detectors for your application

Low Cost Very Large Diamond Turned Metal Mirror Contract No. NNX09CF40P (SBIR ) (MSFC)

Exercise 8: Interference and diffraction

How to Avoid Thermal Sensor Damage & Out of Tolerance Conditions

Manufacturing, testing and alignment of Sentinel-2 MSI telescope mirrors

Transcription:

High-precision narrow-band optical filters for global observation Transmittance (%) 1 8 6 4 2 Atsuo Kurokawa, Yasuhiro Nakajima, Shinji Kimura, Hiroshi Atake, Showa Optronics Co., Ltd. 3 4 5 6 7 8 9 wavelength (nm) Yoshihiko Okamura, Kazuhiro Tanaka, Japan Aerospace Exploration Agency Shunji Tsuida, Kenichi Ichida, Takahiro Amano, NEC TOSHIBA Space Systems, Ltd.

Back Ground Outline Optical Filter ilters on GCOM-C1 C1 Satellite Specification and Important Factor for VN Filters Benefits of High-Precision Band Pass Filter Preliminary Study of Manufacturing Filters Coating Methods Film Thickness Distribution and Coating Equipments Error of Center Wavelength (CWL) Uniformity Results and Discussion CWL Error & Error of CWL Uniformity Spectrum Shift Caused By Telecentric Error Controlling CWL Distribution Summary

Optical Filters on GCOM-C1 C1 satellite GCOM C1 C1 satellite VN filters (Optical filters) SGLI VNR unit SGLI IRS unit SGLI VNR VNR VN telescopes FOV=7deg, Swath=115km SGLI : Second Generation global Imager VNR : Visible & Near infrared Radiometer VN : Visible & Near infrared P : Polarimetry I R S : InfraRed Scanner SW : ShortWave infrared T : Thermal infrared

Specification and Important Factor for VN Filters Table. Main Specifications for pass band characteristics of VN filtersf Center Wavelength (CWL) Band width Transmittance(%) 1 1 5 5 Showa Optronics Co., Ltd. unit VN1 VN2 VN3 VN4 VN5 VN6 VN7,8 VN9 VN1,11 Nominal value nm 38. 412. 443. 49. 53. 565. 673.5 763. 868.5 Tolerance Uniformity nm ±1.5 ±1.6 ±.9 ±1. ±1.1 ±2.3 ±1.3 ±1.5 ±1.7 % ±.4 ±.4 ±.2 ±.2 ±.2 ±.4 ±.2 ±.2 ±.2 nmpp.7.7 1.1 1.2 1.3 1. 1.6 1.4 2.1 %PP.18.18.24.24.24.18.24.18.24 FWHM nm 1 1 1 1 2 2 2 12 2 Tolerance nm ±1. ±1. ±1. ±1. ±2. ±2. ±2. ±1. ±2. Intensity Spectrum of an observation target >.18%pp Wavelength Poor CWL uniformity 1 Intensity (a.u.) Transmittance(%) 1 1 5 5 Actual size of filters: 82mm 1mm.18%pp Wavelength Good CWL uniformity 1 Intensity (a.u.)

Benefits of High-Precision Band Pass Filter High-accurate Center Wavelength Optimized transmission band width High Signal-to-noise ratio Enable High-precision monitoring Increase accuracy of environmental change prediction Good Uniformity over the entire effective area of substrate increases filter size for large line sensors reduces the number of telescope maintaining FOV saves weight of satellite

Showa Optronics Co. Ltd. Back Ground Outline Optical Filters on GCOM-C C Satellite Specification and Important Factor for Filters Benefits of High-Precision Band Pass Filter Preliminary Study of Manufacturing Filters Coating Methods Film Thickness Distribution and Coating Equipments Error of Center Wavelength (CWL) Uniformity Results and Discussion CWL Error & Error of CWL Uniformity Spectrum Shift Caused by Telecentric Error Controlling CWL Distribution Summary

Coating Methods PLASMA SOURCE Electron Beam Physical Vapor Deposition (EB) Plasma Ion Assisted Deposition (PIAD) Dual Ion Beam Sputtering Deposition (IBSD) Packing density Spectral shift Internal stress Productivity EB Low Significant < 1MPa High PIAD High Negligible 25MPa High IBSD High Negligible > 35MPa Low

Film Thickness Distribution and Coating Equipments 85mm Z Z θ φ r Y Substrate P P Spherical holder Optimized shadow mask Evaporation source X a) The geometry diagram and pictures of the spherical holder with a shadow mask Substrate Flat holder tilt=22.5deg. tilt=deg. Spherical substrate holder Source Flat substrate holder Shadow masks to correct the CWL distribution 85mm θ φ = θ Optimized shadow mask r h Evaporation source Source Shadow masks to correct X Y the CWL distribution b) The geometry diagram and pictures of the flat holder with a shadow mask

Error of CWL Uniformity 15mm 1 5 mm -5 Error = % Error = 4.%pp -1-15mm-15-4 -3-2 -1 1 2 3 4-5mm mm 5mm c) +2.5% % c) Spherical holder with a shadow mask -2.5% 15mm 1 5 mm -5-1 Error = % Error =.5%pp -15mm-15-4 -3-2 -1 1 2 3 4-5mm mm 5mm d) d) Flat holder with a shadow mask +2.5% % -2.5% 3 telescopes were required almost similar performance 3 filters that have almost similar spectral characteristics are essential High-accurate CWL Optimized transmission band width Good CWL uniformity over the entire area of the substrate

Back Ground Outline Optical Filters on GCOM-C C Satellite Specification and Important Factor for Filters Benefits of High-Precision Band Pass Filter Preliminary Study of Manufacturing Filters Coating Methods Film Thickness Distribution and Coating Equipments Error of Center Wavelength (CWL) Uniformity Results and Discussion CWL Error & Error of CWL Uniformity Spectrum Shift Caused By Telecentric Error Controlling CWL Distribution Summary

CWL error (%) CWL error (%).1 -.1 Showa Optronics Co., Ltd. CWL Error & Error of CWL Uniformity.2.1..2 -.2 :Optical Monitor :Time Controlled VN1 VN2 VN3 VN4 VN5 VN6 VN7 VN8 VN9 VN1 VN11 CWL error of each band (measurement at center of a substrate) Error of of CWL uniformity (%) (%).2.2.15.15.1.1.5.5.. VN1 VN2 VN3 Spec=.18%pp :PIAD with Flat holder :IBSD VN4 VN5 VN6 VN7 VN8 VN9 VN1 VN11 Spec=±.2% Error of CWL uniformity along the longer direction of each band (area of 82mm 1mm) Error of CWL uniformity (%).2.15.1.5. -5-25 25 5 Position on the substrate (mm) Cross marks ; measurement points on the substrate CWL distribution along the length of the VN1 filter (area of 1mm 1mm)

Spectrum Shift Caused by Telecentric Error AOI= increasing AOI= AOI= increasing Filter Substrate Transmittance transmittance [%] (%) 1 9 8 7 6 5 4 3 2 1 wavelength 35 45 55 65 75 wavelength [nm] The wavelength spectrum shifts to shorter wavelength

Controlling CWL Distribution 3mm φ Error of CWL uniformity (%) The shape of the optimized Shadow mask.2.15.1.5. -5-25 25 5 Position on the substrate (mm) Control of CWL distribution

Back Ground Outline Optical Filters on GCOM-C C Satellite Specification and Important Factor for Filters Benefits of High-Precision Band Pass Filter Preliminary Study of Manufacturing Filters Coating Methods Film Thickness Distribution and Coating Equipments Error of Center Wavelength (CWL) Uniformity Results and Discussion CWL error & Relative CWL Uniformity Spectrum Shift Caused by Telecentric Error Controlling CWL Distribution Summary

Summary Narrow-band optical filters with CWL error of better than ±.1% CWL uniformity of better than.1%pp over an area of 1 mm 1 mm were achieved The possibility of compensating a spectrum shift due to a telecentric error of optical lens by controlling CWL distribution was demonstrated

Thank you for your time Transmittance (%) 1 8 6 4 1-22-1 Hakusan Midori-ku Yokohama 226-6 Japan a-kurokawa@soc-ltd.co.jp http://www.soc-ltd.co.jp 2 3 4 5 6 7 8 9 wavelength (nm)