D U A L S T E P H E I G H T. Calibration Standards

Similar documents
Zeta-300 3D OPTICAL PROFILER

Hermetic Packaging Solutions using Borosilicate Glass Thin Films. Lithoglas Hermetic Packaging Solutions using Borosilicate Glass Thin Films

Bringing Answers to the Surface

STMicroelectronics VL53L0B ToF Proximity Sensor

SEM Magnification Calibration & Verification: Building Confidence in Your Scale Bar

AKM AK8973 and AK Axis Electronic Compass

Bosch Sensortec BMI160 Low Power IMU

Advanced 3D Optical Profiler using Grasshopper3 USB3 Vision camera

Zeta-20. Zeta3D OPTICAL PROFILER IMAGING THE IMPOSSIBLE

Complete support to all your needs

Vol. Validation of FTIR Systems AIM-9000 Infrared Microscope Infrared Microscope. Convenience of a Wide-View Camera

200mm and 300mm Test Patterned Wafers for Bonding Process Applications SKW ASSOCIATES, INC.

EE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2011 PROBLEM SET #2. Due (at 7 p.m.): Tuesday, Sept. 27, 2011, in the EE C245 HW box in 240 Cory.

Zeta-20. 3D Optical Profiler

NEAR EYE DISPLAY (NED) SPECTRORADIOMETER SYSTEMS DATASHEET

CERTIFICATE OF ACCREDITATION

Specifying and Measuring Nanometer Surface Properties. Alson E. Hatheway

nanovea.com PROFILOMETERS 3D Non Contact Metrology

SIEVE CERTIFICATION SYSTEM

Uncertainty in measurements of micro-patterned thin film thickness using Nanometrological AFM - Reliability of parameters for base straight line -

Module 2: CMOS FEOL Analysis

Panasonic DMC-GH Mp, 4.4 µm Pixel Size LiveMOS Image Sensor from Panasonic LUMIX DMC-GH1 Micro Four Thirds Digital Interchangeable Lens Camera

ISO INTERNATIONAL STANDARD

Basic Functional Analysis. Sample Report Richmond Road, Suite 500, Ottawa, ON K2H 5B7 Canada Tel:

Applications of Maskless Lithography for the Production of Large Area Substrates Using the SF-100 ELITE. Jay Sasserath, PhD

Sensors and Metrology - 2 Optical Microscopy and Overlay Measurements

Goodix GF6648 Touch Fingerprint Sensor. Exploratory Analysis

Gamma Scientific Display Measurement Systems

of Temperatures and other Physical Parameters

Experiment 3 - IC Resistors

MAPPER: High throughput Maskless Lithography

Measurement of Microscopic Three-dimensional Profiles with High Accuracy and Simple Operation

Profile Measurement of Resist Surface Using Multi-Array-Probe System

Certificate of Calibration

Layout Analysis Floorplan

FORM ERROR AND HARDNESS PERFORMANCE OF ROCKWELL DIAMOND INDENTERS

Texas Instruments BQ29330 Battery Protection AFE from BQ20Z95DBT

Super High Vertical Resolution Non-Contact 3D Surface Profiler BW-S500/BW-D500 Series

Real-time non-contact wet or dry thickness measurement of pressure sensitive, water based, hot melt, laminating and other adhesives

Micro IRHD Laser revolution

PCTEST ENGINEERING LABORATORY, INC B Dobbin Road, Columbia, MD USA Tel / Fax

Supporting Information. for. Visualization of Electrode-Electrolyte Interfaces in LiPF 6 /EC/DEC Electrolyte for Lithium Ion Batteries via In-Situ TEM

SUPRA Optix 3D Optical Profiler

UV / VIS Spectrophotometer EMCLAB Instruments GmbH

Plan Optik AG. Plan Optik AG PRODUCT CATALOGUE

Standard Operating Procedure of Atomic Force Microscope (Anasys afm+)

ISO/IEC INTERNATIONAL STANDARD. Information technology Automatic identification and data capture techniques Bar code master test specifications

Certificate of Calibration

Etch, Deposition, and Metrology Options for Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production

Micro Precision Apertures

Color Chart for Thermally Grown SiO 2

PS-Range Stage Calibration Standards

450mm and Moore s Law Advanced Packaging Challenges and the Impact of 3D

8.0. High precision solutions for cleanliness analysis CLEMEX PSFILTER. Accurate measurement of particulates as small as 0.

Cal-Paks. Troemner UltraClass, ANSI/ASTM E617 Class 1 and OIML R 111 Class E2 and F1. Cal-Paks

The End of Thresholds: Subwavelength Optical Linewidth Measurement Using the Flux-Area Technique

A New Profile Measurement Method for Thin Film Surface

Calibration Laboratory Assessment Service CLAS Certificate Number Page 1 of 10

INTERNATIONAL STANDARD

CHAPTER 2 POLARIZATION SPLITTER- ROTATOR BASED ON A DOUBLE- ETCHED DIRECTIONAL COUPLER

Certified Reference Materials for UV, Visible, NIR and IR Molecular Spectroscopy

Practical Applications of Laser Technology for Semiconductor Electronics

ISO 2808 INTERNATIONAL STANDARD. Paints and varnishes Determination of film thickness. Peintures et vernis Détermination de l'épaisseur du feuil

Application Note #548 AcuityXR Technology Significantly Enhances Lateral Resolution of White-Light Optical Profilers

Point Autofocus Probe Surface Texture Measuring Instrument. PF-60 technical report

Advanced Plasma Technology. High precision film thickness trimming for the TFH industry. Roth & Rau AG September 2009

SCOPE OF ACCREDITATION TO ISO/IEC 17025:2017 & ANSI/NCSL Z

Manufacturer Part Number. Module 4: CMOS SRAM Analysis

Introduction INTRODUCTION DISCOVER THE NEXT GENERATION IN EDGE WELDED METAL BELLOWS

A Perspective on Semiconductor Equipment. R. B. Herring March 4, 2004

450mm silicon wafers specification challenges. Mike Goldstein Intel Corp.

Optical measurement of narrow holes

Marking Cutting Welding Micro Machining Additive Manufacturing

Precision Micro-Aperture Catalog

Machine Tool & Gear 1021 N. Shiawassee St. Corunna, MI Temperature Uniformity Survey Report

SPECTRAL IRRADIANCE DATA

Automatic hardness testing devices

LM Test Report for OSRAM SYLVANIA INC. 100 Endicott Street Danvers, MA 01923

CERTIFICATE OF ACCREDITATION ISO/IEC 17025:2017 ANSI/NCSL Z (R2002)

SCOPE OF ACCREDITATION TO ISO/IEC 17025:2005 & ANSI/NCSL Z

C-V AND I-V MEASUREMENT SYSTEMS WINDOWS SOFTWARE

PicoMaster 100. Unprecedented finesse in creating 3D micro structures. UV direct laser writer for maskless lithography

Fabrication of a submicron patterned using an electrospun single fiber as mask. Author(s)Ishii, Yuya; Sakai, Heisuke; Murata,

IESNA LM-79: Measurement and Test Report for Halco Lighting Technologies ATL 2940-A PACIFIC DRIVE. Dec 08, 2014

نﺎﻤﻟ آ ﻲﻧﺎﭙﻤﻛ يرﺎﺼﺤﻧا هﺪﻨﻳﺎﻤﻧ

IESNA LM-79: Measurement and Test Report for Jiawei Technology (USA) Limited Lincoln Ave.Hayward, CA USA.

MEDIT T-SERIES Power, Speed and Versatility for Your Lab

A Handheld Image Analysis System for Portable and Objective Print Quality Analysis

Non-Contact Capacitance Gauging Instrument & Series 2800 Capacitive Probes

Company synopsis. MSU series

M4 TORNADO PLUS. Innovation with Integrity. Super Light Element Micro-XRF Spectrometer. Micro-XRF

Silicon Light Machines Patents

What to do when the HSK interface between spindle and tool does not work?

771 Series LASER SPECTRUM ANALYZER. The Power of Precision in Spectral Analysis. It's Our Business to be Exact! bristol-inst.com

IESNA LM-79: Measurement and Test Report for EiKO Global, LLC. Sep 09, 2013 LED8WMR16/38/830-DIM. David Zhang BTR

The New Corvis ST. Evaluation of corneal biomechanical response, tonometry and pachymetry. Biomechanical Response

LM Test Report. for EiKO Global, LLC. 25W Floodlight Model: FLM-2C-N-U

EMT 251 Introduction to IC Design

FemtoFAB. Femtosecond laser micromachining system. tel fax Konstitucijos ave. 23C LT Vilnius, Lithuania

CERTIFICATE OF ACCREDITATION

Transcription:

D U A L S T E P H E I G H T Calibration Standards

S I M P L Y T H E B E S T PSI Standards Move into the future of step height calibration and ISO compliance with PSI Standards Process Specialties introduces its exclusive line of NIST traceable Dual Thickness Step Height Standards to IC manufacturers and metrology tool users worldwide. After two decades of manufacturing OEM standards for major U.S. metrology tool companies, Process Specialties brings this experience and skill to its growing product line of NIST traceable calibration standards. P R E C I S I O N is the gateway to perfection Archimedes All of our PSI Standards are the most uniform and innovative calibration standards available in the industry today. Having no affiliations with metrology tool companies or IC manufacturers, we are the only independent manufacturer of calibration standards in the semiconductor industry. You can count on PSI Standards to deliver the highest quality, most uniform and most trusted semiconductor metrology calibration standards available today.

The PSI Standards A D V A N T A G E PSI Standards are simply the best step height calibration standards in the semiconductor industry today... A New Way to Calibrate Step Height Process Specialties has introduced an exclusive line of Dual Step Height Standards to the semiconductor, FPD and nanotechnology industries. These standards are offered in a wide range of nominal thicknesses for the calibration, monitoring and standardization of all step height and AFM metrology tools. Exclusive Dual Thickness Technology The dual step height design from PSI offers the advantage of two NIST traceable, calibrated thickness steps on each standard. This allows the user to establish the linearity of tools in specific height ranges without the need to load or set up an additional standard. Diagnostic Features The dual thickness design incorporates valuable diagnostic features for stylus integrity, alignment and magnification. The features also have useful micro-rulers to assist in determining appropriate scan lengths. In addition, the standards incorporate on-wafer pattern recognition for autoloading and precise standard placement for the highest measurement repeatability. A Better Alternative PSI s dual thickness technology obsoletes other single, nominal step height standards and is a more practical and cost-effective alternative. With fewer standards to inventory and recertify, operating costs are reduced. The Dual Step Height Standards are available in precision SiO 2 for mechanical profilers and tools.

90 500 400 90 300 200 0 0-300 -200-0 0 0 200 300 Magnification grating and zoom box E X C L U S I V E Dual Thickness Technology This diagnostic feature is mm x mm, and one is located below each calibration area. The feature consists of sets of equal lines and spaces from 7 µm psi to 00 µm. In the upper right-hand corner of this diagnostic feature is a zoom box. This feature is provided as an aid for instrument camera magnification evaluation. It consists of concentric boxes from 50 00 µm in size. New Dual Thickness Technology Dual calibration areas After years of research and development, SHS - XXXnm psi The calibrated areas (two each) are located directly above the centerline of the standard and are spaced 50 microns apart. The left calibrated area contains the lower nominal thickness, and the area on the right contains the higher nominal thickness. Process Specialties now offers a revolutionary new step height calibration standard for the semiconductor and related industries. The Dual Step Height Standards are not only NIST traceable they are a leap forward in calibration standard technology. Incorporating two different calibrated thickness areas on the same standard, these standards allow the user to check and calibrate the linearity of step height 90 500 tools in specific thickness ranges without the 400 need to load or set-up an additional standard. 90 300 This reduces inventories and costs. 200 Stylus test feature This feature is located in the calibrated areas just to the left of the certified step height bars. The V-shaped feature is designed to test the stylus cleanliness, integrity and symmetry. To check the quality of the stylus, a scan across the feature is made. If the stylus is clean and undamaged, the trace will appear as three symmetrical pulses on the instrument. -300-200 -0 0 0 200 300 0 0 Certified feature Each calibrated area contains the calibrated and certified feature. This feature consists of two positive rectangular bars, 90 µm wide and µm wide. These different sizes allow for the use of styli with different size radii, various scan lengths and fields of view. The narrower µm rectangle/step facilitates the calibration of instruments with a relatively narrow field of view such as an AFM tool. The exact step height and specific information about the measurement conditions is contained in the Certificate of Calibration that accompanies each standard. (Please note, only the 90 µm and µm bars are certified. All other features, including scales and diagnostic features, are for reference only.)

D U A L S T E P H E I G H T Calibration Standards Dual Step Height Standards for mechanical profilers and AFM tools Model Number Nominal Thickness Nominal Thickness Thickness Left Range Thickness Right Range *SHOXX-00070-00170 7 nm 6 8 nm 17 nm 16 18 nm SHOXX-00450-00900 45 nm 44 46 nm 90 nm 88 92 nm SHOXX-01800-03800 180 nm 178 182 nm 380 nm 375 385 nm SHOXX-04700-09500 470 nm 465 475 nm 950 nm 940 960 nm * XX = 6 for 150 mm, 8 for 200 mm, 12 for 300 mm Available Dual Step Height Standards Process Specialties offers its DSHS calibration standards in 150 mm, 200 mm, and 300 mm sizes (300 mm by special order). PSI Dual Step Height Standards are designed for the calibration, standardization and monitoring of all mechanical profilers and AFM tools. In the chart at the right you will find the technical specifications for these standards in brief. More detailed specifications are available from Process Specialties USA or from our international representatives. PSI Standards Laboratory is ISO/IEC 17025 accredited by NVLAP, Lab Code 200669-0.

A H I S T O R Y O F Innovation Contact Us Founded by process engineers in 1988, Process Specialties has a long history of innovation in the semiconductor industry. In 1996 we were the first company in the world to introduce 300 mm production thermal oxide processing services to the semiconductor industry. In 1997 Process Specialties was the first company offering 300 mm PolySilicon processing. We also developed the world s first 300 mm production LPCVD Silicon Nitride process later that same year. For two decades ultra-uniform thin films, custom production processing, and R&D processing have been the focus of our business. Our thin films are trusted throughout the semiconductor industry, and they have often been called the industry standard. In fact, most major U.S. metrology tool companies use Process Specialties to manufacture their OEM standards. Now Process Specialties offers a line of NIST traceable calibration standards, PSI Standards. Come experience the highest quality standards, fastest delivery times, and the best customer service in the industry! PSI Standards Worldwide International representation Corporate HQ Process Specialties Inc. Tel: 800-533-8820 Outside U.S.: 209-832-1344 Fax: 209-832-1325 information@psi-standards.com www.psi-standards.com

www.psi-standards.com Process Specialties 1660 West Linne Road Tracy, California 95377