A Perspective on Semiconductor Equipment. R. B. Herring March 4, 2004

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Transcription:

A Perspective on Semiconductor Equipment R. B. Herring March 4, 2004

Outline Semiconductor Industry Overview of circuit fabrication Semiconductor Equipment Industry Some equipment business strategies Product development and life cycles

Semiconductor Industry 1948 Bell Labs invention of transistors Era of discrete transistor products 1963 Intel & TI develop integrated circuits Provided on-chip connection of transistors Building blocks for complex board products for large electronic systems 1970&80 s Challenges from Japan, Korea 1990 s Rise of Fabless Design Companies Rise of Foundry Companies Taiwan, Singapore, Malaysia, China

IC Technology Trend Log Scale INTEL Presentation SPIE 03/2003

Integrated Circuit Fabrication - simplified Oxidation or Film Deposition Cleaning Metrolog y Metrolog y Etching Lithography Metrolog y Cleaning

New Gate Processes for sub-100nm nodes Gate Dielectrics 180-130nm 130-100nm 100-70 nm Polysilicon Oxide Si substrate Thermal SiO2 Furnace 70-50 nm Polysilicon Oxide xxxxxxxxxxxxxxxxxxxxxxxxxxxx Si substrate Thermally Nitrided SiO2 Furnace 50-35nm Ge doped polysilicon Oxynitride Oxide Si substrate Oxide/Nitride Stack Mini-Batch Ge doped polysilicon High K Oxide Si substrate Metal gate High k Si substrate High-k Oxide/Nitride Stack ALD/Mini-Batch High-K Gates ALD

Semiconductor Equipment 1950 s Adapted the equipment from other industries 1960 s Internal eqpt. Development by major users Motorola, T.I., AT&T, IBM, Fairchild, Others 1970 s Rise of a dedicated equipment industry 1980 s Growth of number and size of companies Formation and growth of eqpt. companies in Japan 1990 s Consolidation by mergers 2000 s Continued consolidation Offshore subsidiaries of U.S., European based companies Formation of new companies in China, Korea, S.E. Asia

Equipment Types Deposition formation of surface films Lithography pattern transfer Etching cuts the pattern into a layer Cleaning removal of residue or contamination Metrology measurement of results Storage/ Transport management of lot tracking and robotic movements Host level fab management system

A Typical Vertical Furnace Small Batch Tool 3 feet wide 8 feet deep 10 feet high Load size: 25 Wafer size: 300-mm wafers

Basic Reaction Cycle of ALD Ⅰ. A(g) Introduction of A(g) onto the substrate surface Introduction of A(g) onto the substrate surface Ⅱ. A(S) Formation of an A mono-layer surface Formation of an A(s) monolayer surface Ⅲ. B(g) Introduction of B(g) onto A(s) surface Introduction of B(g) onto n A(s) surface Ⅳ. B(S) Formation of B(s) monolayer surface Formation of B(s) mono-layer surface

Side view of the ALD System Multi-chamber single wafer process

TOP View of the ALD Reactor Chamber

Business Strategies Applied Materials - Founded to be a chemical supplier to semiconductor fibs Entered equipment building as a way to generate cash flow Recognized the potential of being an equipment supplier Strategy changed in mid-70 s to become a company offering products in several areas Growth until today dominates tool selections except in photolithography tools

Business Strategies TEL (Tokyo Electron Limited) Initially a trading company in Japan Sales of US, European built equipment into Japan Joint Ventures for sales + customization of eqpt. Japanese designed products by mid-1980 s Dissolution of Joint Ventures Now global competitor with broad product line

Business Strategies Nikon, Cannon Focused on a single area patterning eqpt. Leverage experience in other optical products

Business Strategies ASML Grew out of development of an stepper type exposure tool at Philips Semiconductor Joint Venture of Philips with ASMI Focused on a single area patterning eqpt. Merger with Silicon Valley Group in 2000 Short term expansion into other equipment areas Return to single product focus

Product Development Cycle MRS Market Requirements Statement Design objectives and process objectives Build of one or more prototypes Design verification and improvement Product introduction Transfer to pilot / full production Support and Sustaining Activities End of Product Life Cycle Strategies

Product Development Cycle MRS Market Requirements Statement Marketing Dept. is the responsible group Defines goals of a new model/type eqpt. Defines performance and cost goals Needs to be tested with key customers Input for engineering designs

Product Development Cycle Functional Specifications Design Engineering Dept. is responsible Defines the design goals of a new model/type Defines the expected performance objectives Uses a lot of computer assisted design Stress analysis Computational flow dynamics and thermal modeling System throughput analysis Defines a budget for sub-system cost objectives Defines a reliability budget for sub-systems Needs to be aligned with the MRS Provides the input for engineering designs

Key Group Interactions During Product Development General Management and Finance Marketing and Sales Design Engineering Process Engineering and Mfg. Eng Materials and Manufacturing

Product Design Cycle Design is broken into major blocks Decisions made about use of existing blocks Process modules Controls Robotic handling Software Major new blocks broken into smaller areas Design broken into single designer team tasks Tasks get scheduled in order needed

Control of the Design Program manager Coordinates schedules Management program reviews Focus on schedules, costs, performance Engineering Design reviews Concept Detailed design Final design review

Control of the Design Engineering reviews should focus on Performance Reliability Cost

Building Prototypes Decisions about Design / Fabrication of design blocks Design & build internally Design internally / outsource fabrication Outsource design and fabrication Identify and qualify outside suppliers Jointly with manufacturing engineering and purchasing

Build of one or more prototypes Integration of new with existing blocks Process modules Controls Robotic handling Environmental controls (low O 2, low H 2 O) Software Integration to fab wide transport Testing of tool-host communications SEMI-S2 and other code compliance reviews

Design Verification with prototypes System level testing Performance of new with existing blocks Process development / recipe development Demonstrations meeting MRS objectives Customer demonstrations Mini-marathons Test for weak components Test sub-system reliability Implement reliability or performance fixes

Tools for Design Verification DOE (Design of Experiments) testing Highly efficient use of test time and resources SPC (Statistical Process Control) Testing for system performance repeatability Assessment of system reliability

Product introduction Needs Defined target market Defined performance guarantees Operation and maintenance manuals SEMI S-2 and other code reviews

Transfer to pilot production Release to full production Needs Completion of design documentation Commercial component specifications Component designs / drawing trees Assembly drawings / assembly plan Work instructions Supplier identification / qualification Personnel training At suppliers For final assembly and test

Support and Sustaining Activities Training of field installation staff Training in-factory support staff Training customer site maintenance staff Planning for spare parts logistics CIP (Continuous Improvement Programs) Fix identified problems Add performance enhancement Develop and release new options

End of Product Life Cycle Strategies Plan for - Replacement of aging models Phase out of existing models Last date for acceptance of new orders Support plan for existing customers Spare and consumable parts strategy Parts and support by a third party company?

Summary Equipment for the semiconductor industry Technically challenging A strong base of U.S. based companies Presents a lot of job opportunities in Various fields of engineering Management of Technology Technical marketing and sales