Présentationdes activitésdu LaboratoireHubert Curien

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1 Présentationdes activitésdu LaboratoireHubert Curien C. Mauclair, S. Landon, D. Pietroy, E. Baubeau, R. Stoian and E. Audouard Laboratoire Hubert Curien, Université J. Monnet, FR GISDON - Paris 26/06/2012

2 Outline Background Leitmotiv Spatial beam shaping Polarization modulation Temporal pulse shaping Physical insights: Pump-probe

3 Efficient collaboration of different actors Lab team R. Stoian Fundamental research Industry Impulsion team, H. Soder Technology transfer Femtosecond plateform PF team E. Audouard

4 The long way for innovation RESEARCH Process knowledge INDUSTRY TRANSFER Flexible workstations for First samples production Industrial workstation conception for dedicated applications

5 The long way for innovation RESEARCH Process knowledge INDUSTRY TRANSFER Flexible workstations for First samples production Dusser et al. Opt. Express 18, (2010)

6 Need for a strong collaborative work industry/research Easier if partners are located in the same area

7 National project Ultrafast Surface Design Unique laser processing equipment for research and Industry Laser sources Ti-Saphir 800 nm 150 fs 5 / 15 khz mj Ytterbium 1030 nm 400 fs 10 à 100 khz µj Fibre 1030 nm 10 ns 300 KHZ 2 mj Fibre ms x2 x3 Mise en forme des faisceaux Scanner Beam shaping Platines Switch Rack poudres Dispositif de focalisation Ultra fast opto mecanical settings

8

9 5 Laboratories & 3 Companies Tribology Interface behaviour Metal jet Adhesion Tribology Interface mechanics Lubricant & lubrication Friction, wear & solid lubrication Surface analysis Material characterization Tribology PVD / PECVD technologies Surface treatments Surface reactivity Ink jet Chemical analysis Laser processing Surface texturing Process simulation Material Assembling Surface characterization Surface Texturing Sol-gel & photoorganization Surface imaging

10 MRS Bull Itoh et al Impulsion fs en volume

11 Impulsion fs en volume MRS Bull Itoh et al Précision(absorption non linéaire) Usinage dans la masse Seuil de modification: limite diffraction Effets thermiques restreints(fs << ns) Nanostructuration ripples (laser)

12 Leitmotiv Control E(x,y,z,t) Control Modification Lens Target

13 Leitmotiv Control E(x,y,z,t) Lens Control Modification Target Lab-on-chip Nolte et al. App. Phys. A 77 (2003) Plastic 25µm Groenendijk M. Laser Technik Journal, 5 (2008) Stockage optique Tribology Hnatovsky et al. Phys. Rev. Lett. 106 (2011) Dusser et al. Opt. Express (2010) Glezer et al. Opt. Lett. Vol.21 (1996)

14 Outline Background Leitmotiv Spatial beam shaping Polarization modulation Temporal pulse shaping Physical insights: Pump-probe

15 Leitmotiv Control E(x,y,z,t) Control Modification Lens Target

16 Spatial beam shaping Wavefront modulation WF f Lens Target Intensity distribution y x

17 Spatial beam shaping Wavefront modulation WF Modulator f Lens Target Liquid cristal Intensity distribution WF governs: Propagation Intensity profile y x

18 Spatial beam shaping Wavefront modulation WF Modulator f Lens Target Liquid cristal WF governs: Propagation Intensity profile y Intensity distribution x

19 Spatial beam shaping Wavefront modulation WF Modulator f Lens Target Liquid cristal WF governs: Propagation Intensity profile y Intensity distribution x

20 Experimental Set-up Phase modulation Sample Shaped Illumination

21 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile Phase mask Intensity profile Sanneret al. Opt. Lett2004

22 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile Sanneret al. Opt. Lett2004

23 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile Surface function (plasmonic)

24 Spatial beam shaping Wavefront modulation IFTA algorithm Single static exposure ~700 spots Stainless steel Surface function (data marking)

25 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile µm 0 π a-sio 2 fs Focusing Objective objective x z y Distance [µm] ,4-0,2 0,0 0,2 0,4 0,6 0,8 1,0 Normalized Intensity +1-1 Mauclair et al. Opt. Express 2009

26 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile Focusing objective Focusing Objective Mauclair et al. Opt. Express 2009

27 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile 0 l o 10 HeNe Ti:Sa (cw) Distance (µm) µm ,4-0,2 0,0 0,2 0,4 0,6 0,8 1,0 Normalized Intensity Mauclair et al. Opt. Express 2009

28 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile Mauclair et al. Opt. Express 2009

29 Spatial beam shaping Wavefront modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile Gain de temps Mauclair et al. Opt. Express 2009

30 Spatial beam shaping Intensity modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile a-sio 2 BK7 60 fs Norm. Signal 1,0 0,8 0,6 0,4 0,2 Calc. amplitude PCM picture Norm. Signal 1,0 0,8 0,6 0,4 0,2 Calc. amplitude PCM picture 5µm Fluence (J/cm²) 0, Z (µm) 0, Z (µm) Mauclair et al. Opt. Lett. 2011

31 Spatial beam shaping Intensity modulation IFTA algorithm (Iterative Fourier Transform Algorithm) Phase mask for arbitrary intensity profile a-sio 2 BK7 60 fs Norm. Signal 1,0 0,8 0,6 0,4 0,2 Calc. amplitude PCM picture Norm. Signal 1,0 0,8 0,6 0,4 0,2 Calc. amplitude PCM picture 5µm Fluence (J/cm²) 0, Z (µm) 0, Z (µm) Mauclair et al. Opt. Lett. 2011

32 Spatial beam shaping Wavefront modulation Pre correction of aberration Phase mask depending on depth FO Aberrations Lentille Élongation spot BK7 Mauclair et al. Opt. Express 2008

33 Spatial beam shaping Wavefront modulation Pre correction of aberration Phase mask depending on depth Modulateur FO 2D FO FO précorrigé Aberrations Lentille Spot corrigé BK7 Cristaux liquides Mauclair et al. Opt. Express 2008

34 Spatial beam shaping Wavefront modulation Pre correction of aberration Phase mask depending on depth fs Mauclair et al. Opt. Express 2008

35 Spatial beam shaping Wavefront modulation Pre correction of aberration -STATE of the ART Phase mask depending on depth Booth et al. Opt. Express 2010

36 Outline Background Leitmotiv Spatial beam shaping Polarization modulation Temporal pulse shaping Physical insights: Pump-probe

37 Spatial beam shaping Polarization modulation Control of nanostructuration in the bulk Ripples orientation Mauclair et al. Opt. Express 2012

38 Spatial beam shaping Polarization modulation Control of nanostructuration in the bulk Ripples orientation STATE of the ART Hnatosvsky et al. Phys Rev. Lett. 2011

39 Outline Background Leitmotiv Spatial beam shaping Polarization modulation Temporal pulse shaping Physical insights: Pump-probe

40 Leitmotiv Control E(x,y,z,t) Control Modification Lens Target

41 Wollenhaupt et al., Springer Handbook of Lasers and Optics (2007)

42 Temporal beam shaping Control of energy deposition Modification volume Algo. Génétique masque Impulsions mises en forme fs feedback Boucle adaptative Expérience évaluation Opt. n>>0 Mermillod et al. App. Phys. Lett. 2009

43 Temporal beam shaping Control of energy deposition Modification volume Spheres with Single Pulse

44 Temporal beam shaping Control of nanostructuration in fused silica 2µm fs Mauclair et al. Opt. Express 2012

45 Temporal beam shaping Control of nanostructuration in fused silica Mauclair et al. Opt. Express 2012

46 Outline Background Leitmotiv Spatial beam shaping Polarization modulation Temporal pulse shaping Physical insights: Pump-probe

47 Physics behind? Non-Linear Schrödinger Equation Calculation of Electronic density 3ps pulse r [µm] 5 ELECTRON DENSITY [cm -3 ] 0-5 E IN =1.0 µj fs pulse r [µm] ELECTRON DENSITY [cm -3 ] z [µm]

48 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm Pompe Lent. Sonde Doublage

49 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm Pompe Lent. Sonde Doublage

50 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm Pompe Lent. Sonde Doublage

51 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm Pompe Lent. Sonde Doublage

52 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm Pompe Lent. Sonde Doublage

53 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm Pompe Lent. Sonde Doublage

54 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm 0 fs Pompe Lent. t=0 fs Sonde Doublage

55 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density CCD Laser femto 100fs, 800nm 200 fs Pompe Lent. t=200 fs Sonde Doublage

56 Physics Physics behind? behind? Pump probe set up Pictures of Electronic density Static picture 10µm 45µJ fs OTM + absorption Temporal resolution ~500fs>150fs carrier lifetime

57 Physics behind? Pump probe set up Pictures of Electronic density Control of energy deposition N e /N c 0,4 0,2 0,0 N e /N c Pulse envelope fs 160fs pulse 0, Delay (ps) 3ps pulse N e /N c 0,2 0,0 N e /N c Pulse envelope 3ps dbl. pulse 5µm Delay (ps) N e /N c 0,4 N e /N c 0,2 0,0 N e /N c Pulse envelope Delay (ps)

58 Post scriptum Write-rewrite Birefringence / Nanostructures in fused silica Taylor et al. Opt. Lett. (2207

59 Post scriptum Write-rewrite Our results in BK7

60 Post scriptum Write-rewrite Our results in TeO2

61 Conclusion Control E(x,y,z,t) control modification Parallel processing bulk & surface Aberration correction deep writing Polarization modulation nanostructures Pulse shaping localization of energy deposition Simulations means (NLSE) Pump probe physical insight, better control of interaction Write-Erase

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