IUM 2011, Bad Wörishofen, April 2011 Joseph Weilhammer

Transcription

1 EOSINT M IUM 2011, Bad Wörishofen, April 2011 Joseph Weilhammer

2 EOSINT M Agenda 1 EOSINT M 2 EOSINT M Material and process development PSW New Features 5 Software 6 EOSINT M 270 Dual Mode Upgrade 7 Process compatibility of M 270x and M 280 EOS 2011 Joseph Weilhammer Seite 2

3 EOSINT M Status of EOSINT M product line. EOS 2011 Joseph Weilhammer Seite 3

4 EOSINT M - Status EOSINT M business has been growing strongly EOSINT M (M280, M270 and M250) Status: 02/28/2011 Approx. 290 EOSINT M systems installed worldwide Approx. 270 of these are at customer sites Approx. 175 of these are EOSINT M 270 More than 25 customers have multiple EOSINT M installations Approx. 10 EOSINT M 280 are sold since December 2010 Hint: approx. 20 of these EOSINT M systems are installed at EOS in R&D, QA and in the EOS Technical Center worldwide (Germany, USA, Asia). EOS 2011 Joseph Weilhammer Seite 4

5 EOSINT M - applications e-manufacturing applications are gaining maturity especially in medical and aerospace. Examples of market and application status Dental restorations: more than 35 M270 systems sold for series production. CoCr SP2 is recertified according to the new Medical Device Directive 93/42/EEC. Tooling: more than 35 M270 systems sold for series production of moulds for injection molding and die casting Aerospace market: more than 45 M270 systems sold to end users like Airbus, Boeing and engine manufacturers. Several service providers are supplying parts to end users. DMLS being qualified for test beds and flying parts. Qualification/Certification: End users are currently qualifying DMLS for production. EOS 2011 Joseph Weilhammer Seite 5

6 EOSINT M Upgrade Strategy Innovation and investment Systems Software M250 Peripherals M250t PSW = upgradable M250t 2001 M270- I.M. Dual- M270 Ti Mode M280 Std/t Iepco EOSTYLE EOSTATE Erowa IPCM Glovebox Materials DM100 DM50 DM20 Tool steels DS50 DS20 DSH20 MS1 Stainless steels GP1 Co-superalloys MP1 PH1 316L Dental alloys SP1 SP2 Ti-based alloys Ti64 TiCP Ni-superalloys IN718 IN625 Al alloys AlSi10Mg EOS 2011 Joseph Weilhammer Seite 6

7 EOSINT M 280 Features & benefits EOS 2011 Joseph Weilhammer Seite 7

8 EOSINT M 280 Features & benefits EOSINT M W laser option Z axis stroke 325mm Improved process gas management ("laminar flow") Tidier process chamber Optional glove-box door (later) EOS 2011 Joseph Weilhammer Seite 8

9 EOSINT M 280 features & benefits 400W laser Feature 400W laser option Benefits Higher build speed and productivity At least for aluminium, better part quality and surface Due to very high heat conductivity of aluminium Laser Upgrade for M280 from 200W to 400W possible Parameter sets from M270 Dual Mode are compatible with M280/200W New Speed and TopSpeed parameter are available for M280/400W EOS 2011 Joseph Weilhammer Seite 9

10 EOSINT M 280 features & benefits Z axis stroke 325mm Features Z stroke 325mm Benefits Possibility to build on higher preforms than currently possible. Higher build height (+110mm) EROWA Powerchuck 150 DirectBase TS36P Enlarged building height for production of higher parts/jobs. Maximum build height can be achieved with a full dispenser hopper and well compacted powder in dispenser. Depending on part geometry, material and layer thickness a reduction of the standard recoating factor allows also dispense less surplus powder for recoating. Working with EROWA clamping system, allows now more than 210mm building height for high precise manufacturing applications. Offers optimal compromise between build height (289mm) and reference point accuracy/position-repeatability. Notes: Increased process chamber opening height of 372mm offers user friendly handling of big build-jobs. Also easily accessible with lifting trolley, e.g. for transport of clamping system-unit, hybrid mould-devices or any heavy load in or out of the process chamber. EOS 2011 Joseph Weilhammer Seite 10

11 EOSINT M 280 features & benefits Improved gas flow in process chamber Gas flow in process chamber LAS400N recirculation filter system delivers continuous gas flow with high volume rate 60% gas volume rate produce a laminar flow above powder bed Diffuser nozzle blows 40% of gas flow from rear wall Exhaust nozzle in front sucks in condensate and spatter EOS 2011 Joseph Weilhammer Seite 11

12 EOSINT M 280 features & benefits Improved gas flow in process chamber Gas flow in EOSINT M 270 Gas flow in EOSINT M 280 Blowing nozzle through back wall of process chamber Build area Removable suction nozzle by process chamber door EOS 2011 Joseph Weilhammer Seite 12

13 EOSINT M 280 features & benefits Improved gas flow in process chamber Gas flow in EOSINT M 280 higher flow velocity (~3 m/s) unidirectional atmosphere flow same conditions over whole platform Benefit more uniform and robust process effective smoke removal, also with 400W Blowing nozzle Build area clean lens, even after long jobs Removable suction nozzle EOS 2011 Joseph Weilhammer Seite 13

14 EOSINT M 280 features & benefits Improved gas flow in process chamber Benefits More uniform and robust process over the whole build envelope. Same conditions over whole platform. Enables higher productivity with 400W option. Improved gas flow is important, because high intensity laser vaporizes more powder to condensate and produce more spatter from melt pool. Reduced surface roughness, because spatter are sucked away and will be not sintered in the part surface area. Recoating speed could be increased %. Now up to 150mm/sec recoating speed is possible with laminar flow, because less spatter fall on top of sintered layer area. Note: recoating time is about 30% of total building time. Keeps optics window clean during very longer built jobs. Cleaner process chamber also when running smoky powders like IN718 or PH1. Safety - The reactive condensate will be sucked away immediately above melt pool. Minimal amount of condensate remains in the process chamber. EOS 2011 Joseph Weilhammer Seite 14

15 EOSINT M 280 features & benefits Improved Process Gas Management Features Pre-flooding of LAS 400N [1] Benefits Argon consumption 30-50% less compared to M270 IM td Fine-tuned, intelligent timed and automatic pre-flooding mode minimizes Ar consumption. Only 10min pre-flooding time before job start are now required to purge process chamber, LAS400N and pipes in parallel. Separate circuit for lens-cleaning [1] Dual Mode [1] Average Ar consumption during job is about 5-10 l/min. M280 is capable of processing all materials compatible with Ar or N2 gas atmospheres. Gas type is automatically selected by loading a parameter set, e.g. selecting MS1_Speed 1.0 automatically switches to nitrogen, selecting Ti64_Performance1.0 automatically switches to argon. Two connection for bottle gas [1] Machine is already equipped with a further gas connection, e.g. for N2 bottles. PSW software is capable of switching between gas types and thresholds. Relevant for R&D or process evaluation. [1] These features are also available for EOSINT M 270 Dual Mode EOS 2011 Joseph Weilhammer Seite 15

16 EOSINT M 280 features & benefits Tidier process chamber Benefits New, ergonomic and user friendly design of the process chamber: Stainless steel covers New recoater design Removable exhaust nozzle Integrated LED strips Modified door/lock Door-way height 372mm EOS 2011 Joseph Weilhammer Seite 16

17 EOSINT M 280 features & benefits Tidier process chamber Features Stainless steel covers Removable exhaust nozzle Modified door/lock Door-way height 372mm New recoater design LED stripes Door handle Benefits Stainless steel covers on side walls reduce dirty corners. Saves time between jobs. Cleaning from job 2 job takes only 5 min. Easy removable exhaust nozzle in front allows a user friendly cleaning and offers good access to process chamber. Reinforced door and door-lock design for optimal gas-tight sealing. Door-frame is already prepared for glove box door. Increased door-way offers user friendly handling of parts and powder. Recoater arm design with optimized profile and glossy faces reduce dust collecting effect also during very long build jobs. Powerful LED process chamber light. Now countersinked in the process chamber sealing. Ergonomic PA2202 black laser sintered and shot peened door handle. EOS 2011 Joseph Weilhammer Seite 17

18 EOSINT M 280 Material and process development EOS 2011 Joseph Weilhammer Seite 18

19 EOSINT M 280 Material and process development News and Plans IN625 - now available for M280 and M270 Dual Mode CoCr for dental partials R&D project started Hastalloy - still in pilot phase StainlessSteel 316L - release planned for Q4 / 2011 as a general version 316L; medical version 316L can follow later Speed and TopSpeed parameter sets for M280/400W, see next slides EOS 2011 Joseph Weilhammer Seite 19

20 EOSINT M 280 process development Parameter sets available for EOS MaragingSteel MS1 Parameter MS1_TopSpeed 1.0 (400W) MS1_Speed 1.0 (400W) MS1_Performance 2.0 (200W) MS1_Surface 1.0 (200W) Applications High productivity parameter set for tools and big parts. This parameter set offers an optimal compromise between production speed and surface quality. Performance offers high productivity with 40µm layers in 200W 20µm layers for parts or tools with best possible surface quality and detail resolution. Build time 11h 49min 19h 30min 27h 24min ca. 60h Notes: - TopSpeed and Speed parameter sets are available for EOSINT M 280/400W. - Performance and Surface parameter sets are available for EOSINT M 280/200W and EOSINT M 270 Dual Mode. - All these parameter sets produce fully-dense parts with comparable mechanical properties - see Material Data Sheets for further details. EOS 2011 Joseph Weilhammer Seite 20

21 EOSINT M 280 process development Parameter Sets for EOSINT M 280 M280 / 400W Layer thickness [µm] Volume rate [mm³/s] (Material Data Sheet) Higher productivity with 400W [%] MS1 Performance 2.0 (200W) 40µm 3,0 100% MS1 Speed 1.0 (400W) 40µm 5,7 190% MS1 TopSpeed 1.0 (400W) 80µm 7,7 257% MP1 Performance 1.0 (200W) 40µm 2,6 100% MP1 Speed 1.0 (400W) 40µm 5,5 212% IN718 Surface 1.0 (200W) 20µm 2,1 100% IN718 Speed 1.0 (400W) 40µm 6,0 286% Ti64 Performance 2.0 (200W) 30µm 3,8 100% Ti64 Speed 1.0 (400W) 60µm 8,2 216% AlSi10Mg Performance µm 4,8 100% AlSi10Mg Speed 1.0 (400W) 30µm 7,4 154% EOS 2011 Joseph Weilhammer Seite 21

22 EOSINT M 280 process development Parameter Sets for EOSINT M 280 M280 / 400W Layer thickness [µm] Volume rate [mm³/s] (Material Data Sheet) Higher productivity with 400W [%] IN625 Surface 1.0 (200W) 20µm 2,0 100% IN625 Speed 1.0 (400W) 40µm 5,5 275% Planned for Q2 / 11 GP1 Speed 1.0 (400W) PH1 Speed 1.0 (400W) 40µm 40µm Others to be added Planned for Q3 / L Speed 1.0 (200W) 316L Speed 1.0 (400W) [1] Volume rate is a theoretical exposure speed, e.g. for a simple test-cube. UpDown, contour, support exposure and also part orientation may have an big effect on total building time. EOS 2011 Joseph Weilhammer Seite 22

23 EOSINT M 2xx material development Material compatibility matrix (April 2011) Material M 270 ASD400 (1) M 270 Ti Version M 270 IM Std M 270 IM td M 270 Dual Mode M W M W M 270 Dental DM20 tbc MS1 () MP1 SP2 GP1 (3) PH1 (3) Ti64 (3) Ti64 ELI (3) cpti (3) AlSi10Mg () () () () (3) IN718 IN625 tbc 316L (2) tbc tbc tbc H (2) Pilot phase Pilot phase Pilot phase Pilot phase (1) Only few M270 system left running ASD400 (2) Under development (3) Release in Q Released () Parameter sets available Not released EOS 2011 Joseph Weilhammer Seite 23

24 PSW 3.5 Optional Features EOS 2011 Joseph Weilhammer Seite 24

25 PSW 3.5 Optional Features Developer Kit for M 270 Dual Mode and M 280 Expert Level Suitable for a wide range of materials which are able to be laser-sintered Equipped with multiple proved exposure strategies Include the exclusive EOS feature Edges ; realization of finest details Optional single or double exposures of contours as well as of edges EOS 2011 Joseph Weilhammer Seite 25

26 PSW 3.5 Optional Features Developer Kit - toolbox for R&D Standard exposure types for DMLS Stripes speed-optimized filling (hatching) of big layer areas UpDownStripes combination of Stripes for inner areas and UpDown for the horizontal upper and the lower surfaces Chess a stress reducing hatch type, e.g. for big layer areas, works with an especially for DMLS optimized chess-board pattern exposure type Contours for geometry optimized contour exposure Skin-Core differentiated parameters for outer (skin) and inner (core) area Sli_Hatch for exposure of support structures, e.g. Magics SG, EOSTYLE EOS 2011 Joseph Weilhammer Seite 26

27 PSW 3.5 Optional Features Developer Kit - EOS USP features included Standard exposure types for DMLS Edges offer production of finest details like sharp corners and fine structures via exposing single lines with minimum curing width Rot hatch exposure types, Stripes and Chess, can rotate hatch direction from layer to layer in 67 steps, which cause very uniform part properties in Y and Z direction 1 st Layer 2 nd Layer EOS 2011 Joseph Weilhammer Seite 27

28 PSW 3.5 Optional Features Laser Power Monitoring in PSW 3.5 Online: LPM is an online laser power monitoring during the job. It identifies and warns of any relevant deviation in the laser output power signal. Sensor: A sensor inside the IPG laser measures the laser power Period/settings: LPM can be done after every n-layer; operator can set period in PSW Measuring/hardware: Laser exposes a defined test exposure on a beam trap inside the process chamber Reporting: Provides QA documentation (via EOSTATE 1.2) of the laser power signal during each job Hint: final layout for output of LPM values tbc; e.g. graph and report-box in the EOSTATE job report. EOS 2011 Joseph Weilhammer Seite 28

29 PSW 3.5 Optional Features Offline laser power measurement Primes Pocket Monitor Simple and most accurate power meter Suitable for 200W and 400 W laser (works also for M250, P7xx and P3xx) PSW 3.5 offers a special test job (20sec test exposure) Measurement can be done from machine operator with closed process chamber door (Service Level 1, like changing filter or cleaning optic) PA2200 sintered holder for the pocket monitor is included in M280 standard accessory Pocket Monitor power meter available from Primes (not sold by EOS) Hint: order at Primes a configuration with long stand-by time (>20min) for the Pocket Monitor EOS 2011 Joseph Weilhammer Seite 29

30 PSW 3.5 Optional Features Reference point calibration - Part coordinate system Benefits Reference point calibration (since PSW 3.3) PSW offers a special exposure type PositionContourLx for single exposure on performs or reference-test-plates Zero point of the optical coordinate system can be aligned e.g. with the zero point of EROWA clamping system Adjustment can be done from machine operator with closed process chamber door (=Service Level 1, like changing filter or cleaning optic) Part coordinate system (new in PSW 3.5) Offers a part coordinate system in the center of bounding-box for each SLI file Individual scaling values are then possible for different parts/tools Palette Position reference, Erowa Powerchuck Preform EOS 2011 Joseph Weilhammer Seite 30

31 EOSINT M Optional Product Conf. EOS 2011 Joseph Weilhammer Seite 31

32 EOSINT M Optional Product Conf. EOSINT M 280 / 400W incl. building volume 250 x 250 x 325 mm EOSINT M 280 / 400W 400W laser option incl. N2 generator incl. laminar flow and Gas Mgmt. System Glove-box door option IPCM - M EROWA incl. Argon connection incl. connection for N2 bottles LPM - Laser Power Monitoring PSW 3.5 Offline Laser Measurement Reference point calibration 400W OEP MS1_TopSpeed 1.0 MS1_Speed 1.0 MP1_Speed 1.0 IN625_Speed 1.0 IN718_Speed 1.0 AlSi10Mg_Speed 1.0 Others to be added Basic Quality assurance unlimited EOSTATE 1.2 Developer Kit Controlling yearly license Machine Park Mgmt. EOS 2011 Joseph Weilhammer Seite 32

33 EOSINT M Optional Product Conf. EOSINT M 280 / 200W incl. building volume 250 x 250 x 325 mm EOSINT M 280 / 200W incl. N2 generator incl. Argon connection incl. laminar flow and Gas Mgmt. System Glove-box door option IPCM - M EROWA incl. connection for N2 bottles Developer Kit PSW 3.5 LPM - Laser Power Monitoring Offline Laser Measurement Reference point calibration 200W OEP MS1_Surface 1.0 MP1_Surface 1.0 GP1_Surface 1.0 PH1_Surface 2.0 IN718_Surface 1.0 IN625_Surface W OEP MS1_Performance 2.0 MP1_Performance 1.0 Ti64_Performance 2.0 GP1_Performance 1.0 DM20_Surface 1.0 Basic Quality assurance unlimited EOSTATE 1.2 Developer Kit Controlling yearly license Machine Park Mgmt. EOS 2011 Joseph Weilhammer Seite 33

34 EOSINT M availability Status M280 product was launched at Euromold 2010 Availability: now Options: 200W or 400W laser Further 400W parameter sets are currently in development (PH1, GP1, 316L) Glove-box door option end of 2011 (tbc) EOS 2011 Joseph Weilhammer Seite 34

35 EOSINT M 270 Dual Mode - upgrade EOS 2011 Joseph Weilhammer Seite 35

36 EOSINT M 270 Dual Mode - upgrade EOSINT M 270 IM Standard EOSINT M 270 IM tended EOSINT M 270 Dual Mode Details EOSINT M 270 Dual Mode combines the functionality of EOSINT M 270 Installation Modes Standard and tended in one machine and adds additional features Upgrades to M 270 Dual Mode are available, see next slide EOS 2011 Joseph Weilhammer Seite 36

37 EOSINT M 270 Dual Mode - upgrade Status Upgrade from M270 IM tended to M 270 Dual Mode includes Dual Mode hardware includes PSW 3.5 and Developer-Kit (unlimited) includes parameter sets from M270 IM td (Argon): Ti64, AlSi10Mg, IN718 Hint: OEPs for steel powders can be bought separately Upgrade for M 270 IM Standard need to be done in two steps 1st step: Upgrade from Std to td (depends on SI-no.) 2nd step: Upgrade from td to Dual Mode includes Developer-Kit (unlimited) includes parameter sets from M270 IM Std and td: Ti64, AlSi10Mg, IN718, MS1, MP1, GP1, PH1, DM20 EOS 2011 Joseph Weilhammer Seite 37

38 EOSINT M 270 Dual Mode - upgrade Upgrade adds various customer benefits Features All hardware features of M270 IM tended Benefits State of the art for DMLS; includes safety requirements for reactive materials (e.g. EOS Titanium Ti64) Dual Mode (N2-generator or Ar bottles) Automatic selection of gas type Separate circuit for lenscleaning gas flow Parameter sets and PSW features as options Machine is capable of processing all materials compatible with these gas atmospheres, without needing modification or service visit Operation mode is automatically selected by loading parameter set, e.g. selecting MS1_Surface automatically switches to nitrogen, selecting Ti64_Performance automatically switches to argon Keeps optics window cleaner for longer; reduced gas consumption Only buy what you need; see separate slide EOS 2011 Joseph Weilhammer Seite 38

39 EOSINT M 270 Dual Mode - Upgrade Features and benefits of PSW 3.5 for EOSINT M 270 Dual Mode Features PPP parameter sets Benefits Standardized processes corresponding to published Part Property Profiles (PPP) and suitable for production applications Developer Kit LPM (Laser Power Monitoring) [1] Laser power measurement routine [1] Possibility to modify exposure parameters and create customer-specific Identifies and warns of any relevant deviation in the laser output power signal. Provides QA documentation of the laser power signal during each job Enables easy and reliable measurement of the laser power in the process chamber (between jobs) using a Pocket Monitor power meter Reference point calibration [1] Compatibility with EOSTATE 1.2 Enables a separate part coordinate systems (for scaling etc.) to be applied to individual parts within a job Expanded logging, reporting and interfacing of quality data etc. [1] Availability date subject to confirmation EOS 2011 Joseph Weilhammer Seite 39

40 EOSINT M 270 Dual Mode - Upgrade EOSINT M 270 Dual Mode (200W ) incl. building volume 250 x 250 x 215 mm Gas Mgmt. System EOSINT M 270 Dual Mode incl. N2 generator incl. Argon connection incl. connection for N2 bottles IPCM - M EROWA 200W OEP MS1_Surface 1.0 MP1_Surface 1.0 GP1_Surface 1.0 PH1_Surface 2.0 IN718_Surface 1.0 IN625_Surface 1.0 DM20_Surface 1.0 PSW 3.5 Developer Kit LPM - Laser Power Monitoring Offline Laser Measurement Reference point calibration 200W OEP MS1_Performance 2.0 MP1_Performance 1.0 Ti64_Performance 2.0 GP1_Performance 1.0 Basic Quality assurance unlimited EOSTATE 1.2 Developer Kit Controlling yearly license Machine Park Mgmt. EOS 2011 Joseph Weilhammer Seite 40

41 Process compatibility of M270x and M280 EOS 2011 Joseph Weilhammer Seite 41

42 Process compatibility of M270x and M280 Details M270 Dual Mode has the same mechanics, optics, laser, exposure strategies and parameters as M270 I.M. Standard or tended processes are considered equivalent measured part properties are the same for equivalent parameter sets, as documented in new material data sheets M W has same optics but improved mechanics compared to M270 Dual Mode processes are similar but not identical EOS has compared the two processes via tensile properties and porosity materials tested so far show process improvement (robustness and strength) see example MS1 tensile properties on next slides M W processes have no previous equivalent and are newly qualified EOS 2011 Joseph Weilhammer Seite 42

43 Process compatibility of M270x and M280 Tighter tolerances Distribution of horizontal tensile properties of EOS MaragingSteel MS1 built in different positions and different jobs on EOSINT M 270, M W and M W frequency MPa Tensile strength, MPa MPa Yield strength, MPa avg. std.dev n avg. std.dev n M270 M W M W EOS 2011 Joseph Weilhammer Seite 43

44 Process compatibility of M270x and M280 High quality microstructure Micrographs of EOS MaragingSteel MS1, 300x magnification, samples etched with Kalling No. 2 reagent. Left: EOSINT M 270 MS1_Performance 2.0 (40µm layers) Right: EOSINT M W MS1_Speed 1.0 (40µm layers) EOS 2011 Joseph Weilhammer Seite 44

45 EOSINT M 280 produces highly uniform part properties everywhere in the build area Results Tensile strength of EOS MaragingSteel MS1 samples built on EOSINT M 280 with 200W laser, 40µm layers. Tensile testing according to ISO :2009 (B) Annex D Left: horizontal specimens Right: vertical specimens Note: each value is average from three measured samples. EOS 2011 Joseph Weilhammer Seite 45

46 EOSINT M 280 produces part with excellent mechanical properties Horizontal specimens Vertictal specimens Note: diagrams show three graphs from three measured samples. EOS 2011 Joseph Weilhammer Seite 46

47 EOSINT M EOS 2011 Joseph Weilhammer Seite 47