Micromachined Integrated Optics for Free-Space Interconnections

Similar documents
MICROACTUATED MICRO-XYZ STAGES FOR FREE-SPACE MICRO-OPTICAL BENCH

A novel tunable diode laser using volume holographic gratings

THERE has been a significant growth of optical fiber

64 Channel Flip-Chip Mounted Selectively Oxidized GaAs VCSEL Array

MEMS for RF, Micro Optics and Scanning Probe Nanotechnology Applications

Optical Coupling Analysis And Vibration Characterization For Packaging Of 2x2 MEMS Vertical Torsion Mirror Switches

MICROMACHINED INTERFEROMETER FOR MEMS METROLOGY

IST IP NOBEL "Next generation Optical network for Broadband European Leadership"

Optical beam steering using a 2D MEMS scanner

Flip chip Assembly with Sub-micron 3D Re-alignment via Solder Surface Tension

High-yield Fabrication Methods for MEMS Tilt Mirror Array for Optical Switches

CHIRPED FIBER BRAGG GRATING (CFBG) BY ETCHING TECHNIQUE FOR SIMULTANEOUS TEMPERATURE AND REFRACTIVE INDEX SENSING

Microelectromechanical (MEMS) Optical Beam Control

Application Bulletin 240

VERTICAL CAVITY SURFACE EMITTING LASER

Winter College on Optics: Fundamentals of Photonics - Theory, Devices and Applications February 2014

Single-/multi-mode tunable lasers using MEMS mirror and grating

4-Channel Optical Parallel Transceiver. Using 3-D Polymer Waveguide

EE119 Introduction to Optical Engineering Spring 2003 Final Exam. Name:

Laser Telemetric System (Metrology)

Index. Cambridge University Press Silicon Photonics Design Lukas Chrostowski and Michael Hochberg. Index.

Examination Optoelectronic Communication Technology. April 11, Name: Student ID number: OCT1 1: OCT 2: OCT 3: OCT 4: Total: Grade:

MEMS JUMPSTART SERIES: CREATING AN OPTICAL SWITCH NICOLAS WILLIAMS, PRODUCT MARKETING MANAGER, MENTOR GRAPHICS

Semiconductor Optical Communication Components and Devices Lecture 18: Introduction to Diode Lasers - I


Stereoscopic Hologram

Low Thermal Resistance Flip-Chip Bonding of 850nm 2-D VCSEL Arrays Capable of 10 Gbit/s/ch Operation

LOS 1 LASER OPTICS SET

Figure 1: Layout of the AVC scanning micromirror including layer structure and comb-offset view

Principles of Optics for Engineers

MEMS in ECE at CMU. Gary K. Fedder

MEMS Packaging for Micro Mirror Switches

Fiber Optic Communications

Deformable MEMS Micromirror Array for Wavelength and Angle Insensitive Retro-Reflecting Modulators Trevor K. Chan & Joseph E. Ford

E LECTROOPTICAL(EO)modulatorsarekeydevicesinoptical

Wafer-level Vacuum Packaged X and Y axis Gyroscope Using the Extended SBM Process for Ubiquitous Robot applications

Integrated Focusing Photoresist Microlenses on AlGaAs Top-Emitting VCSELs

plasmonic nanoblock pair

Mode analysis of Oxide-Confined VCSELs using near-far field approaches

Light source approach for silicon photonics transceivers September Fiber to the Chip

Wavelength Stabilization of HPDL Array Fast-Axis Collimation Optic with integrated VHG

Integrated Optoelectronic Chips for Bidirectional Optical Interconnection at Gbit/s Data Rates

Wuxi OptonTech Ltd. Structured light DOEs without requiring collimation: For surface-emitting lasers (e.g. VCSELs)

(12) Patent Application Publication (10) Pub. No.: US 2003/ A1

BMC s heritage deformable mirror technology that uses hysteresis free electrostatic

System demonstrator for board-to-board level substrate-guided wave optoelectronic interconnections

Introduction Fundamentals of laser Types of lasers Semiconductor lasers

Eric B. Burgh University of Wisconsin. 1. Scope

Challenges for On-chip Optical Interconnect

Figure 7 Dynamic range expansion of Shack- Hartmann sensor using a spatial-light modulator

Flip-Chip Integration of 2-D 850 nm Backside Emitting Vertical Cavity Laser Diode Arrays

High-efficiency, high-speed VCSELs with deep oxidation layers

Vixar High Power Array Technology

XY-stage for alignment of optical elements in MOEMS

Lasers Defect Correction in DRAM's Problem: very hard to make memory chips with no defects Memory chips have maximum density of devices Repeated

Optical Interconnection Network for Massively Parallel Processors Using Beam-Steering Vertical Cavity Surface-Emitting Lasers

Spontaneous Hyper Emission: Title of Talk

Surface Micromachining

Integrated micro-optical imaging system with a high interconnection capacity fabricated in planar optics

Advances in CO 2 -Laser Drilling of Glass Substrates

Monolithically-integrated long vertical cavity surface emitting laser incorporating a concave micromirror on a glass substrate

OPTICAL GUIDED WAVES AND DEVICES

Silicon Light Machines Patents

Convergence Challenges of Photonics with Electronics

Beam Shaping and Simultaneous Exposure by Diffractive Optical Element in Laser Plastic Welding

Polarization Experiments Using Jones Calculus

Use of Computer Generated Holograms for Testing Aspheric Optics

PHYS 3153 Methods of Experimental Physics II O2. Applications of Interferometry

EE119 Introduction to Optical Engineering Fall 2009 Final Exam. Name:

Assembly and Experimental Characterization of Fiber Collimators for Low Loss Coupling

CHAPTER 2 Principle and Design

White Paper Laser Sources For Optical Transceivers. Giacomo Losio ProLabs Head of Technology

Design Rules for Silicon Photonic Packaging at Tyndall Institute

CHAPTER 2 POLARIZATION SPLITTER- ROTATOR BASED ON A DOUBLE- ETCHED DIRECTIONAL COUPLER

Lecture 6 Fiber Optical Communication Lecture 6, Slide 1

3550 Aberdeen Ave SE, Kirtland AFB, NM 87117, USA ABSTRACT 1. INTRODUCTION

Diffraction, Fourier Optics and Imaging

Criteria for Optical Systems: Optical Path Difference How do we determine the quality of a lens system? Several criteria used in optical design

Generation of a Line Focus for Material Processing from an Array of High Power Diode Laser Bars R. Baettig, N. Lichtenstein, R. Brunner, J.

2D silicon-based surface-normal vertical cavity photonic crystal waveguide array for high-density optical interconnects

Photonic Signals. and Systems. An Introduction. NabeelA.Riza/Ph.D. Department of Electrical and Electronic Engineering University College Cork

Fast, Two-Dimensional Optical Beamscanning by Wavelength Switching T. K. Chan, E. Myslivets, J. E. Ford

RECENTLY, using near-field scanning optical

Single-mode Glass Waveguide Platform for DWDM Chip-to-Chip Interconnects

Polymer optical waveguide based bi-directional optical bus architecture for high speed optical backplane

Parallel Mode Confocal System for Wafer Bump Inspection

Will contain image distance after raytrace Will contain image height after raytrace

Grating-Stabilized Diode Laser (for 1064nm)

Grating-Stabilized Diode Laser (for 1064nm)

High-Power Semiconductor Laser Amplifier for Free-Space Communication Systems

Investigation of the Near-field Distribution at Novel Nanometric Aperture Laser

3-5μm F-P Tunable Filter Array based on MEMS technology

7. Michelson Interferometer

Imaging Systems Laboratory II. Laboratory 8: The Michelson Interferometer / Diffraction April 30 & May 02, 2002

Electronically tunable fabry-perot interferometers with double liquid crystal layers

Hybrid vertical-cavity laser integration on silicon

Surface Micromachined Devices for Microwave and Photonic Applications

External-Cavity Tapered Semiconductor Ring Lasers

Lecture 22 Optical MEMS (4)

SUPPLEMENTARY INFORMATION

Transcription:

Micromachined Integrated Optics for Free-Space Interconnections L. Y. Lin, S. S. Lee, M C. Wu, and K S. J. Pister Electrical Engineering Dept., University of California, Los Angeles, CA 90024, U. S. A. Abstract A novel surface micro-machined micro-optical bench (MOB) has been demonstrated. Free-space micro-optics such as micro-fresnel lenses, rotatable mirrors, beam-splitters and gratings are implemented on a single Si chip using IC-like microfabrication processes. Self-aligned hybrid integration with semiconductor lasers are also demonstrated for the first time. The MOB technology realizes a microoptical system on a single Si chip and has significant impact on free-space integrated optics, optical switching, optical data storage, and optoelectronic packaging. free-space. Using this new technique, threedimensional micro-optical components can be fabricated integrally on a single Si chip. The Si substrate serves as a micro-optical bench (MOB) on which micro-lenses, mirrors, gratings and other optical components are pre-aligned in the mask layout stage using computer-aided design and then constructed by microfabrication. Additional fine adjustment can be achieved by the on-chip micro-actuators and micropositioners such as rotational and translational stages. With hybrid integration of active optical devices, a complete optical system can be constructed on the MOB, as illustrated in Fig. 1. 1 Introduction Integrated optics has attracted intense attention since its proposal in 1969 [l]. It offers many advantages such as high functionality, reduced packaging cost of individual optoelectronic components, and improved performance by eliminating parasitic effects. To date, most of the research efforts in integrated optics emphasize on guided-wave approach [2,3]. On the other hand, free- SI Substrata space integrated optics offers many advantages over guided-wave approach such as high spatial bandwidth Fig. 1. The schematic diagram the (diffraction limit&), non-intedering optical routing, micromachined free-space micro-optical System on a three-dimensional optical interconnection, and optical sing1e si chip. signal processing capability (e.g., Fourier optics). However, it is more difficult to integrate free-space optics on a single substrate since most monolithically fabricated free-space optical elements lie on the surface of the substrate. Micromachining of silicon substrate has been applied to integrated optics and the realization of miniature optical bench since 1970 s [4]. Recently, surface micro-machined hinges and spring-latches [5] have been employed to achieve monolithic fabrication of three-dimensional micro-optics [6,7]. This technology opens a new area for integrated optics in A micro-fresnel lens standing perpendicular to the substrate has been successfully fabricated [6]. The lens has a diameter of 650 pm and an optical axis of 1 mm above the Si substrate, with focal length equal to 1 mm. Excellent collimating ability for this lens has been achieved and will be shown in Sec. 3A. The fabrication process of MOB is compatible with the ICprocess. The MOB offers a new approach for optoelectronic packaging, free-space optical interconnect, and single-chip micro-optical systems. 77 0-7803-2503-6 0 1995 IEEE

2 Fabrication other hand, thinner gold is desired for partially transmitting mirrors or beam splitters. The three-dimensional micro-optical system is constructed on a Si substrate by surface micromachining technique. The fabrication process integrating micro-optics with micro-hinges and springlatches is described in the following (see Fig. 2): First, a 2-pm-thick phosphosilicate glass (PSG-I) is deposited on the silicon substrate as the sacrificial material. It is followed by the deposition of a 2-pmthick polysilicon layer (poly- I ) on which the microoptics patterns such as Fresnel lenses, mirrors, beam splitters and gratings are defined by photolithography and dry etching. The hinge pins holding these threedimensional structures are also defined on this layer. Following the deposition and patterning of poly- I, another layer of sacrificial material (PSG-2) of 0.5 pm thickness is deposited. The supporting structures such as staples and spring latches are defined on the second polysilicon (poly-2) layer. The base of the staples and torsion springs are fixed on the Si substrate by opening contact holes through both PSG-2 and PSG-1 before the deposition of poly-2 layer. The poly-2 structures can also be contacted with poly-l by etching contact holes through PSG-2 only, as required in the rotatable mirror and grating to be described later. The microoptics plates are released from substrate by selectively removing the PSG material using hydrofluoric acid after fabrication. After the release etching, the polyplates with micro-optics patterns are free to rotate around the hinge pins. When the plate is lifted up, the top portion of the spring-latch slides into the slot on the plate, and snaps into the narrower part of the slot, thus preventing further motion of the plates. The torsion-spring connecting the spring-latch to the substrate creates the spring force, which tends to force the spring-latch back to the substrate, therefore locks the plate in its place. The length of the spring latch defines the angle between the plate and the substrate. After the three-dimensional micro-optical element is assembled, a layer of gold is coated on the lifted poly surfaces. In binary-amplitude Fresnel zone plates or micro-mirrors, a thick layer of gold is needed to completely block the light passing through the dark zones or to make a perfectly reflecting mirror. On the Hinge Pin p01y-1 Spdng-Latch - poly-z Fig. 2. The schematic structure of micromachined micro-optical element before assembly. 3 Results A. Figure 3 shows the SEM photograph of a threedimensional micro-fresnel lens after assemble. The diameter of this lens is 280 pm, with a designed optical axis of 254 pm for passive integration of an edge-emitting semiconductor laser, as will be shown in Sec. 3C. Because of the height of the lens plate, the angles between the lens plates and the substrate have some variations even though they are coarsely defined by the spring latches. Such variations are not tolerable in large optical systems. Therefore, a new set of lensmount is designed to precisely define the angles of the three-dimensional micro-optical elements. The lens mount consists of two folded polysilicon plates which are fabricated integrally with the micro-lens. The lens mount has a V-shaped opening at the top to guide the lens plate into a 2-~m-wide groove in the center. It can be made as tall as the lens itself, therefore, the anglc defined by the lens mount are much more precise. The lens mount also greatly improves the mechanical strength and stability of the micro-optical elements. The optical performance of the three-dimensional micro-fresnel lens has been tested by collimating a divergence beam emitted from a single mode fiber at h = 1.3 pm. The divergence of the optical beam with and without the collimating lens is compared in Fig. 4. The 78

intensity FWHM divergence angle is reduced from 5.0"to 0.33' by the lens. The collimated beam profile fits very well to the Gaussian shape (95% fit). Similar experiment has also been performed using a semiconductor edge-emitting laser with k = 1.3 pm as the light source. The intensity FWHM far-field angles of the semiconductor laser are 18' x 40" The collimated beam has an elliptical shape, as shown in Fig. 5, and the intensity FWHM measured at 5 cm behind the lens are 330 pm x 788 pm, which corresponds to divergence angles of 0.38" x 0.9'. Divisions: top = 15.62 um bottom = 100.0 um Fig. 5. Beam profile of the semiconductor laser (A = 1.3 pm) after collimated by the micro-fresnel lens. Fig. 3. SEM photograph of a micro-fresnel lens with precision lens-mount. 4000 1 I the first polysilicon layer, and the axis and hub are / 0 0 1 2 3 4 5 6 7 Distance from Fiber@" Fig. 4. Collimating performance of the threedimensional micro-fresnel lens. B. Rotational slages One unique feature of implementing micro-optical bench using surface micromachining is that micropositioners and micro-actuators can be monolithically integrated in the same fabrication processes. This allows the alignment of the optical systems to be fine adjusted, in addition to the coarse alignment done at the design stage using CAD layout tools. Using similar structures as the micromotors [8], rotational stages and linear micro-positioners can be realized. We have successfully integrated the three-dimensional microoptical elements with rotational stages using this process. Figure 6 shows the SEM photograph of a rotatable mirror. The rotatable plate is fabricated on defined on the second polysilicon layer. The fabrication process is similar to that described in Sec. 2, except that the optical elements are patterned on the second polysilicon layer so that the patterning of the rotatable plate won't be affected, and the bases of the poly-2 spring-latched and staples are now connected to poly-1 rotatable plate. The micro-hinges are defined on the rotating poly-i plate. The bottom of the poly-2 plate on which optical patterns are defined is connected to the micro-hinges by poly I-poly2 via holes. After the PSG material is selectively removed, the poly-i plate is free to rotate on the substrate plane. Thirty-six ticks are made on the substrate to indicate the rotation angle of the plate. as shown in Fig. 6 (due to the contrast of the photograph, only part of the ticks

are shown). The angle between adjacent ticks is 10'. The indicator on the lower part of the picture, originally pointing at the 0' tick, has been rotated counter-clockwise by 20" after the mirror is assembled, as shown on the picture. A diffraction grating integrated with the rotational stage is also successfully demonstrated using the same technology, as shown in Fig. 7. Fig. 6. A rotatable micro-mirror. The rotation stage has 0 been rotated by 20. Fig. 7. The diffraction grating integrated with a rotational stage. C. Self-ali-gned hvbrid integration with semiconductor Lasers To implement a complete micro-optical system on the MOB, it is necessary to incorporate active optical devices such as semiconductor lasers, light emitting diodes (LED) and photodetectors. Hybrid integration is necessary for active devices that cannot be made by Si micromachining (e.g., semiconductor lasers). Hybrid optical packaging on silicon which combines flip-chip mounting and silica waveguide interconnection has been proposed [9]. However. mosr of the optoelectronic packaging methods confine the optical components on the surface of the substrate, which is two-dimensional in nature and cannot be used for freespace integrated optics. The approach of MOB enables the hybrid integration of active optical devices with three-dimensional micro-optical elements in freespace. Stationary and movable micro-optical components are fabricated on Si substrate using surface micromachining technique. In this section, a novel, three-dimensional self-alignment structure fabricated integrally with the other micro-optics for the hybrid integration of active optical components will be described. in order to integrate the MOB with active optical devices such as semiconductor lasers, we have designed a set of self-alignment structures using the same two-layer polysilicon surface micromachining technology as described in Sec. 2. Figure 8(a) shows the schematic diagram of the self-aligned hybrid integration of an edge-emitting semiconductor laser with a micro-fresnel lens. The edge-emitting laser is mounted on its side for accurate positioning of the active emitting spot. There are also other possible schemes for mounting semiconductor lasers: Flip-chip mounting and upright (junction side up) mounting. Flip-chip mounting using indium solder balls can achieve an alignment accuracy of around 1 pm, however, the emitting spot is very close to the Si substrate and is much lower than the optical axis of the free-space optical system. The height of the optical axis in upright mounting scheme is defined by the laser substrate thickness, which usually has a tolerancc of more than 5 pm and is not suitable for MOB without employing additional adjustable optics. Since the laser chip size can be precisely defined by scribing, side mounting can place the emitting spot accurately on the optical axis. In our current design, it is placed at 254 pm above the Si substrate, which is suitable for the optical axis of MOB.

thickness (from 100 pm to 140 pi). After the alignment, conductive silver epoxy is applied between the laser and the contact pads for the electrical contact. Permanent fixing of the semiconductor laser is achieved by curing the silver epoxy. Potentially, the epoxy can be replaced by other three-dimensional micromechanic structures. Fig. 9. Top view photograph of the self-alignment structure before they are assembled.!b) Fig. 8. (a)scheniatic diagram and (b) SEM photograph of the self-aligned hybrid inregration of an edgeemitting laser with a micro-fresnel lens. Figure 8(b) shows the SEM photograph of the hybrid integration of the semiconductor laser with a micro-fresnel lens. The emitting spot of the edgeemitting laser is aligned to the center of the Fresnel lens by the self-alignment structures. Figure 9 is the top view photograph of the self-alignment structure before it is assembled. The edge-emitting laser is slided into the slot between two electric contact pads until the front facet hits the alignment block built on the MOB, which defines the longitudinal (x-direction, as shown on the picture) position of the emitting spot. The self-alignment plates can then be rotated up and the asymmetric wedge-shaped opening on the top gradually guides the active side (waveguide side) of the laser towards the flat edge of the wedges, which defines the transverse (y-direction) position of the emitting spot. This unique design allows us to accommodate lasers with a large variation of substrate Vertical cavity surface-emitting lasers (VCSEI>) possess unique characteristics for opricai Interconnect and many other appiications: low threshold current. circular far-field pattern, narrow beam divergence and two-dimensional arrays. The VCSEL is also particular suitable for integrating with the micro-lens using passive alignment because of its small nunierical aperture and, therefore, higher misalignment tolerance. In addition, two dimensional arrays of both VCSELs and micromachined lens can be easily fabricated. 'Therefore, the combination of verticai ihreedimensional micro-fresnel lens arrays with passively aligned VCSEL arrays are ideal for free-space optical interconnect and laser array packaging. We have demonstrated for the first time the hybrid integration of 8 x 1 arrays of VCSELs and micro- Fresnel lens using passively self-aligned mounting scheme. The schematic diagram of the hybrid integration and SEM picture of a micro-fresnel lens array and a VCSEL array are shown in Fig. 10(a) and (b), respectively. The VCSELs consist of AICaAsiGaAs hi4 DBR mirror pairs and InCaAs quantum wells active layer. designed for 0.98 pm XI

wavelength. The dimensions of the VCSEL array are 2 mm wide, 350 pm high and 125 pm thick. The optical axis is designed to match that of the lens array, and the spacing between individual VCSEL is 250 Fm. During the fabrication of lens arrays, the electric coniacts and alignment mounting blocks for the VCSEL array are monolithically defined on the SI substrate. Therefore, by proper design of the VCSEL dimensions. VCSEL can be mounted precisely in the designed position. The two alignment plates have asymmetric wedge-shaped opening similar to that in Fig. 9, which can push the VCSEL array forward so that the front surface of the VCSEL array is aligned with focal plane of the lens array. Laser Alignment and Supporting VCSEL Common Back \ 1 ontact Pad A Front Contact.. Pad (b) Fig. 10. (a) Schematic diagram and (b) SEM photograph of the self-sligned hybrid integration of the 8 x 1 VCSEE array and the 8 x I array of micro- Fresnel lens. 4 Conclusion In summary, a new surface-micromachined microoptical bench (MOB) for free-space integrated optics is proposed and successfully demonstrated. Various three-dimensional optical elements and micropositioners have been fabricated: micro-fresnel lenses with various size and focal lengths, rotatable micromirrors and diffraction gratings, beam splitters, lens mount. Self-aligned hybrid integration of active optical devices with MOB is also realized using novel threedimensional alignment structure. This new approach can drastically reduce the size, weight and cost of most optical systems, and have applications in free-space optical interconnection, optical switches, optical storage systems, and optoelectronic packaging. References 1. S. E. Miller, Integrated Optics: An Introduction, Bell Syst. Tech. J., Vol. 48, No. 7, pp. 2059-1068, 1969. 2. See for example, H. Nishihara, M. Haruna, and T. Suhara, Optical Integrated Circuits, McGraw-Hill, 1985. 3. T. L. Koch and U. Koren, Semiconductor photonics integrated circuits, J. Quantum Electronics, Vol. 27, pp. 641, 1991. 4. For a review, see K. E. Peterson, Silicon as a mechanical material, Proc. IEEE, Vol. 70, No. 5, pp. 420-457, 1982. 5. K. S. J. Pister, M. W. Judy, S. R. Burgett, and R. S. Fearing, Microfabricated hinges, Sensors and Actuators A, Vol. 33, pp. 249-256. 1992. 6. C. Y. Lin, S. S. Lee, K. S. J. Pister, and M. C. WE, Vertical three-dimensional micro-fresnel lenses fabricated by micromachining technique, Optical Fiber Communication Conference, Postdeadline paper PDl2, San Jose, CA, Feb. 20-25, 1994. 7. 0. Solgaard, M. Daneman, N. C. Tien, A. Friedberger, R. S. Muller, and K. Y. Lau, Micromachined alignment mirrors for active opto-electronic packaging, Conference on Lasers and Elecrro-Optics. Postdeadline paper CPD6, Anaheim, CA, May 8-13, 1994 8. L. S. Fan, Y. C. Tai, and R. S. Muller, IC-processed electrostatic micromotors, Sensors and Actuators, Vol. 20, pp. 41-47, 1989. 9. C. H. Henry, G. E. Blonder, and R. F. Kazarinov, Glass waveguide on silicon for hybrid optical packaging, J. Lightwave Tech., Vol. 7, No. 10, pp. 1530-1539, 1989