High-Power Femtosecond Lasers PHAROS is a single-unit integrated femtosecond laser system combining millijoule pulse energies and high average power. PHAROS features a mechanical and optical design optimized for industrial applications such as precise material processing. Market-leading compact size, integrated thermal stabilization system and sealed design allows PHAROS integration into machining workstations. The use of solid state laser diodes for pumping of Yb medium significantly reduces maintenance cost and provides long laser lifetime. Most of the PHAROS output parameters can be easily set via PC tuning the laser for a particular application in seconds. Tunability of laser output parameters allows PHAROS system to cover applications normally requiring different classes of lasers. Tunable parameters include: pulse duration (190 fs ps), Ambient temperature, C 40 Ambient temperature 6.0 3 Output power, RMS=0.12% 6.04 30 6.02 2 6.00 20.9 1.96.94.92 0 1 20 2 30 FEATURES 190 fs ps tunable pulse duration 2 mj maximum pulse energy 20 W output power 1 khz 1 MHz tunable base repetition rate Pulse picker for pulse-on-demand operation Rugged, industrial grade mechanical design Automated harmonics generators (1 nm, 343 nm, 27 nm, 206 nm) repetition rate (single pulse to 1 MHz), pulse energy (up to 2 mj) and average power (up to 20 W). Its deliverable power is abundant for most of material processing applications at high machining speeds. The built-in pulse picker allows convenient control of the laser output in pulse-on-demand mode. It comes along with an extensive external control interface dedicated for easy laser integration into larger setups and machining workstations. PHAROS compact and robust optomechanical design includes easy to replace modules with temperature stabilized and sealed housings ensuring stable laser operation across varying environments. PHAROS is equipped with an extensive software package, which ensures smooth hands-free operation. Beam direction, µrad 140 2 120 26 0 24 0 Temperature 22 60 Horizontal 20 40 Vertical 1 20 16-20 -40 0 14-60 0 PHAROS output power with power lock on under unstable environment 12 1 20 2 Temperature, C
Specifications Model Pharos-6W Pharos-W Pharos-1W Pharos-20W Pharos SP Pharos SP 1. Pharos 2mJ Max. average power 6 W W 1 W 20 W 6 W 6 W Pulse duration (assuming Gaussian pulse shape) < 290 fs < 190 fs < 300 fs Pulse duration range 290 fs ps 190 fs ps 300 fs ps Max. pulse energy > 0.2 mj / > 0.4 mj > 1.0 mj > 1. mj > 2 mj Beam quality TEM₀₀ ; M² < 1.2 TEM₀₀ ; M² < 1.3 Base repetition rate 1 khz 1 MHz ¹) Pulse selection Centre wavelength Single-Shot, Pulse-on-Demand, any base repetition rate division 2 nm ± nm Output pulse-to-pulse stability < 0. % rms ²) Power stability < 0. % rms over 0 h Pre-pulse contrast < 1 : Post-pulse contrast < 1 : 200 Polarization Beam pointing stability Linear, horizontal < 20 µrad/ C Oscillator output Optional, please see specifications of FLINT oscillators on page 14 1) Some particular repetition rates are software denied due to system design. 2) Under stable environmental conditions. SH ACF a.u. Pulse energy, µj 1.0 0. 0.6 0.4 0.2 0.0-100 - -00 0 00 100 Delay, fs 0 20.1 20.16 20.14 20.12 20. 20.0 Pulse duration of PHAROS Pharos 2 mj Pharos-SP 1. mj Pharos-SP 1 mj Pharos-20W 400 µj Pharos-W 200 µj Gaussian fit 223 fs 1 0 Repetition rate, khz Pulse energy vs base repetition rate Relative spectral intensity, a.u. Waist diameter, µm 1.0 0. 0.6 0.4 0.2 Spectral FWHM =.2 nm 0.0 1 20 2 30 3 40 Wavelength, nm 00 600 400 200 Spectrum of PHAROS 30 400 40 00 0 600 60 Z location, mm Typical PHAROS M² measurement data Typical PHAROS far field beam profile at 200 khz Typical PHAROS near field beam profile at 200 khz RMS < 0.03% 20.06 0 0 200 300 400 00 600 PHAROS long term stability graph
PhysiCAL dimensions (mm) Laser head Pump current, A 3 36 34 32 30 7 6 4 Rack for power supply and chiller 2009.0.04 2009..14 2009..26 20.01.2 20.03.23 20.0.26 2011.07.2 2011.09.20 2011.11.21 2012.01.2 2012.03.13 2012.06.2 2012.07.27 2013.01.22 2013.11.19 2014.03.19 2014.0.0 201.06.1 201..19 670 670 L 360 W 212 H 640 L 20 W 660 H Pump current, A 360 40 3 36 34 32 7 6 4 212 70 (4) (74) (272) 4 2030 16 30 nm output without H Utility requirements Electric 2009.06.1 20.01.21 20.07.27 20.09.14 2011.09.12 2011..24 2011.12.0 2012.02.1 2012.04.17 2012..2 2012..29 2013.01.2 2013..03 2013..04 2013.12.16 2014.02.0 2014.06.30 2014.07.03 2014.07.31 2014.0.06 2014.11.17 201.01.1 201.01.21 Output power of industrial PHAROS lasers operating 24/7 and current of pump diodes during the years Room temperature Relative humidity Auto 2H Auto 3H, 4H 1 nm 343, 27 nm 30 nm output with Auto H PHAROS laser drawing 1 V AC, 0 60 Hz, 20 A or 220 V AC, 0 60 Hz, A 1 30 C (air conditioning recommended) 20 0 % (non condensing)
Automated Harmonics Generators SPECIFICATIONS PHAROS laser can be equipped with optional automated harmonics modules. Selection of fundamental (30 nm), second (1 nm), third (343 nm), fourth (27 nm) or fifth (206 nm) harmonic output is available by software control. Harmonics generators are designed to be used in industrial applications where a single output wavelength is desired. Modules are mounted directly on the output of the laser and integrated into the system. Model 2H 2H-3H 2H-4H 4H-H Output wavelength (automated selection) 30 nm 1 nm 1 1 2 3 20 30 0 0 200 300 00 Repetition rate, khz Harmonics energy vs pulse repetition rate 30 nm 1 nm 343 nm 2.7 2.6 2. 2.4 2.3 2.2 2.1 2.0 0 0 1.6 1.4 1.2 1.0 1.4 1.46 30 nm 1 nm 27 nm 30 nm 27 nm 206 nm Input pulse energy 20 2000 μj 0 μj 20 μj 200 μj Pump pulse duration 190 300 fs Conversion efficiency Pump laser beam quality (M 2 ) Beam quality (M²) 400 μj pump Beam quality (M²) >400 μj pump * Max 1 W output. Pulse energy, µj 00 300 200 0 0 30 20 3 2 >0 % (2H) 1 nm: M² (pump) + 0.1 1 nm: M² (pump) + 0.2 PHAROS-SP 2H optimized for µj pump 3H optimized for µj pump 2H optimized for 200 µj pump 3H optimized for 200 µj pump 2H optimized for 0 µj pump 3H optimized for 0 µj pump >0 % (2H) >2 % (3H) >0 % (2H) > % (4H) * <1.2 / <1.3 depends on a model 1 nm: M² (pump) + 0.1 343 nm: M² (pump) + 0.2 1 nm: M² (pump) + 0.2 343 nm: M² (pump) + 0.3 FEATURES 1 nm, 343 nm, 27 nm and 206 nm Output selection by software Mounts directly on laser head and integrated into the system Rugged, industrial grade mechanical design 1 nm: M² (pump) + 0.1 27 nm: n/a 1 nm: M² (pump) + 0.2 27 nm: n/a > % (4H) * > % (H) n/a n/a RMS = 0.27% 0 10 200 20 300 3H output stability RMS = 0.23% 1.44 0 2 4 6 12 4H output stability
Industrial grade Optical Parametric Amplifier I-OPA is an optical parametric amplifier of white-light continuum pumped by the PHAROS laser. This OPA is focused on generating long-term stable output with reliable and handsoff operation. Manually tunable output wavelength extends the application possibilities of a single laser source, instead of requiring multiple lasers based on different technologies. In comparison to standard ORPHEUS line of devices, the I-OPA lacks only computer controlled wavelength selection. On the other hand, in-laser mounted design provides mechanical stability and eliminates the effects of air-turbulence, ensuring stable long-term performance and minimizing energy fluctuations. PHAROS i-opa model comparison table FEATURES Based on experience with ORPHEUS line Manually tunable wavelength Industrial grade design provides excellent long-term stability Very small footprint Bandwidth limited or short-pulse configurations available CEP option Model I-OPA I-OPA-F I-OPA-ONE I-OPA-CEP Based on OPA ORPHEUS ORPHEUS-F ORPHEUS-ONE Pump pulse energy 00 µj 400 µj 20 00 µj 10 00 µj Pulse repetition rate Up to 1 MHz Up to 0 khz Tuning range, signal 630 30 nm 60 900 nm 130 2060 nm Tuning range, idler 30 2600 nm 1200 200 nm 2060 400 nm 1400 200 nm Conversion efficiency signal+idler combined >12 % >12 % >1 % > % Pulse energy stability < 2% STD over 1 min. 60 90 nm 110 2000 nm 60 0 nm 130 2000 nm 100 300 nm 1400 2000 nm Pulse bandwidth 0 10 cm -1 200 600 cm -1 0 200 cm -1 ~10 cm -1 Pulse duration 10 20 fs 30 fs 0 fs 200 300 fs < 200 fs Applications Micro-machining Microscopy Spectroscopy 1) Better stability can be specified for a specific wavelength (e.g. < 1% STD at 00 nm). 2) Output pulse duration depends on wavelength and pump laser pulse duration. 3) I-OPA-F outputs broad bandwidth pulses which are compressed externally. Output power, mw Nonlinear microscopy Ultrafast spectroscopy 1200 10 900 00 700 600 00 400 300 200 0 I-OPA-ONE signal I-OPA-ONE idler I-OPA signal I-OPA idler 12 11 9 7 6 4 3 2 1 0 00 0 100 2000 200 3000 300 4000 400 Wavelength, nm I-OPA module energy conversion curves. Pump: PHAROS-W, 0 µj, 0 khz Micro-machining Mid-IR generation OPCPA front-end Pulse energy, µj
Comparison with other femtosecond and picosecond LASERS Laser technology Our solution HG or HIRO I-OPA-F I-OPA-ONE Pulse energy at 0 khz, using PHAROS-W laser Excimer laser (193 nm, 213 nm) H of PHAROS (20 nm) µj TH of Ti:Sa (266 nm) 4H of PHAROS (27 nm) µj TH of Nd:YAG (3 nm) 3H of PHAROS (343 nm) 2 µj SH of Nd:YAG (32 nm) 2H of PHAROS (1 nm) 0 µj 3 µj Ti:Sapphire (00 nm) OPA output (70 0 nm) µj Nd:YAG (64 nm) PHAROS output (30 nm) 0 µj Cr:Forsterite (1240 nm) OPA output (1200 1300 nm) µj Erbium (160 nm) OPA output (100 1600 nm) 3 µj 1 µj Thulium / Holmium (1.9 2.1 µm) OPA output (1900 2200 nm) 2 µj µj Other sources (2. 4.0 µm) OPA output 1 µj Note that the pulse energy scales linearly in a broad range of pump parameters. For example, a PHAROS-20W laser at 0 khz (400 µj energy) will increase the output power twice, and the pulse energy 4 times compared to the reference table above. The pulse duration at the output is <300 fs in all cases. The OPA output is not limited to these particular ranges of operation, it is continuously tunable as shown in energy conversion curves. 12 70 (39) 62 30 30 114 691 Idler Signal Residual OPA pump (1 nm or 30 nm) Optional Uncompressed Fundamental (for SHBC) Fundamental (30 nm) Pharos with I-OPA output ports 70 212 PHAROS with I-OPA-F and compressors for signal and ilder 430