MgO MTJ biosensors for immunomagnetic lateralflow

Similar documents
Compact size 3D magnetometer based on magnetoresistive sensors

Magnetic tunnel junction sensor development for industrial applications

Tunneling Magnetoresistance Devices with MgO barrier and CoFeB electrodes for Magnetic. Field

Magnetic Spin Devices: 7 Years From Lab To Product. Jim Daughton, NVE Corporation. Symposium X, MRS 2004 Fall Meeting

MAGNETORESISTIVE BIOSENSOR MODELLING FOR BIOMOLECULAR RECOGNITION

MAGNETORESISTIVE random access memory

Magnetic tunnel junction sensors with conetic alloy. Lei, ZQ; Li, GJ; Egelhoff Jr, WF; Lai, PT; Pong, PWT

Magnetic and Electromagnetic Microsystems. 4. Example: magnetic read/write head

Progress toward a thousandfold reduction in 1/ f noise in magnetic sensors using an ac microelectromechanical system flux concentrator invited

Magnetoresistive sensors with pico-tesla sensitivities

Shape Biased Low Power Spin Dependent Tunneling Magnetic Field Sensors

Architecture of a Portable System Based on a Biochip for DNA Recognition

Supplementary Figure 1 High-resolution transmission electron micrograph of the

S1. Current-induced switching in the magnetic tunnel junction.

Mayank Chakraverty and Harish M Kittur. VIT University, Vellore, India,

Detection of micrometric surface defects in titanium using magnetic tunnel junction sensors

A novel sensing algorithm for Spin-Transfer-Torque magnetic RAM (STT-MRAM) by utilizing dynamic reference

MAGNETO-DIELECTRIC COMPOSITES WITH FREQUENCY SELECTIVE SURFACE LAYERS

SQUID Test Structures Presented by Makoto Ishikawa

Lecture 0: Introduction

Fabrication and Usage of a Multi-turn µ-coil and a PR Channel Combined with a Dual-type GMR-SV Device

BLADE AND SHAFT CRACK DETECTION USING TORSIONAL VIBRATION MEASUREMENTS PART 1: FEASIBILITY STUDIES

IBM Research Report. Research Division Almaden - Austin - Beijing - Cambridge - Haifa - India - T. J. Watson - Tokyo - Zurich

High Power Pulsed Laser Diodes 850-Series

High-Speed Scalable Silicon-MoS 2 P-N Heterojunction Photodetectors

Status and Prospect for MRAM Technology

Tunable Color Filters Based on Metal-Insulator-Metal Resonators

III III a IIOI OlD IIO II II IIII uui IIO IIII uuu II uii IIi

Sensing Circuits for Resistive Memory

Eindhoven University of Technology MASTER. Current in plane tunneling spin tunneling from a different perspective. Huijink, R.

COMMERCIAL APPLICATIONS OF SPINTRONICS TECHNOLOGY

Compact size 3D magnetometer based on magnetoresistive sensors. Engineering Physics

MEMS in ECE at CMU. Gary K. Fedder

PERPENDICULAR FILM HEAD PROCESSING PERSPECTIVES FOR AREAL DENSITY INCREASES

420 Intro to VLSI Design

Impact of the light coupling on the sensing properties of photonic crystal cavity modes Kumar Saurav* a,b, Nicolas Le Thomas a,b,

High Power Pulsed Laser Diodes 850-Series

Magnetic current imaging with magnetic tunnel junction sensors: case study and analysis

Index. Cambridge University Press Silicon Photonics Design Lukas Chrostowski and Michael Hochberg. Index.

SAMPLE SLIDES & COURSE OUTLINE. Core Competency In Semiconductor Technology: 2. FABRICATION. Dr. Theodore (Ted) Dellin

REVISION #25, 12/12/2012

Nanofluidic Diodes based on Nanotube Heterojunctions

APPLICATION OF ABRASIVE WATER JET MACHINING IN FABRICATING MICRO TOOLS FOR EDM FOR PRODUCING ARRAY OF SQUARE HOLES

ANALYSIS AND DESIGN OF INDUCTIVE BIOSENSORS FOR MAGNETIC IMMUNO ASSAY

Long-distance propagation of short-wavelength spin waves. Liu et al.

A REVIEW ON MAGNETIC TUNNEL JUNCTION TECHNOLOGY

SUPPLEMENTARY INFORMATION

Product Information. Allegro Hall-Effect Sensor ICs. By Shaun Milano Allegro MicroSystems, LLC. Hall Effect Principles. Lorentz Force F = q v B V = 0

Transistor was first invented by William.B.Shockley, Walter Brattain and John Bardeen of Bell Labratories. In 1961, first IC was introduced.

Towards a Reconfigurable Nanocomputer Platform

Robert G. Hunsperger. Integrated Optics. Theory and Technology. Sixth Edition. 4ü Spri rineer g<

Exploration of Pinhole and Defect Density in Insulating Layer of Magnetic Tunnel Junctions

CHAPTER 2 POLARIZATION SPLITTER- ROTATOR BASED ON A DOUBLE- ETCHED DIRECTIONAL COUPLER

Application Note Model 765 Pulse Generator for Semiconductor Applications

EE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2011 PROBLEM SET #2. Due (at 7 p.m.): Tuesday, Sept. 27, 2011, in the EE C245 HW box in 240 Cory.

Three Terminal Devices

US A1 (19) United States (12) Patent Application Publication (10) Pub. N0.: US 2013/ A1 Zhou et a]. (43) Pub. Date: Aug.

Design and Analysis of Double Gate MOSFET Devices using High-k Dielectric

THE MEMS FLUX CONCENTRATOR: POTENTIAL LOW-COST, HIGHSENSITIVITY MAGNETOMETER

INTRAWEAPON WIRELESS COMMUNICATION

Three-terminal experiments on Si-MgO tunneling structures

Fabrication and magnetoelectric properties of magnetic tunnel junctions with high magnetoresistance and low resistance

Ian JasperAgulo 1,LeonidKuzmin 1,MichaelFominsky 1,2 and Michael Tarasov 1,2

Design Rules for Silicon Photonics Prototyping

EE4800 CMOS Digital IC Design & Analysis. Lecture 1 Introduction Zhuo Feng

MICROSTRUCTURING OF METALLIC LAYERS FOR SENSOR APPLICATIONS

Machine-Aligned Fabrication of Submicron SIS Tunnel Junctions Using a Focused Ion Beam

Influence of dielectric substrate on the responsivity of microstrip dipole-antenna-coupled infrared microbolometers

plasmonic nanoblock pair

Basic Principles, Challenges and Opportunities of STT-MRAM for Embedded Memory Applications

Lei, ZQ; Li, GJ; Lai, PT; Pong, PWT; Egelhoff Jr, WF

Control of Sputter Process for Improved Run-to-run Repeatability

NANOSTRUCTURED CuCo NANOWIRES. Fedosyuk V.M.

MEMS Wind Direction Detection: From Design to Operation

Broadband voltage rectifier induced by linear bias dependence in CoFeB/MgO magnetic tunnel junctions

Alternatives to standard MOSFETs. What problems are we really trying to solve?

MICROMACHINED INTERFEROMETER FOR MEMS METROLOGY

Future MOSFET Devices using high-k (TiO 2 ) dielectric

Synthesis of Silicon. applications. Nanowires Team. Régis Rogel (Ass.Pr), Anne-Claire Salaün (Ass. Pr)

STJ-100 TMR Magnetic Microsensor Dual In-line Package

Parameter Optimization Of GAA Nano Wire FET Using Taguchi Method

Application Information

Deliverable 3.1 Passive Components Fabrication

High End / Low Cost Pulsed Laser Diodes 905D1SxxUA-Series

NOISE IN MEMS PIEZORESISTIVE CANTILEVER

The Department of Advanced Materials Engineering. Materials and Processes in Polymeric Microelectronics

Supplementary Figure 1 Schematic illustration of fabrication procedure of MoS2/h- BN/graphene heterostructures. a, c d Supplementary Figure 2

A scanning tunneling microscopy based potentiometry technique and its application to the local sensing of the spin Hall effect

+1 (479)

E LECTROOPTICAL(EO)modulatorsarekeydevicesinoptical

Efficient Characterization and Testing of MRAM Devices. Parametric Testing for In-Line Monitoring

Envisioning the Future of Optoelectronic Interconnects:

Integrated Circuits: FABRICATION & CHARACTERISTICS - 4. Riju C Issac

WITH the widespread adoption of portable digital

Performance of a Resistance-To-Voltage Read Circuit for Sensing Magnetic Tunnel Junctions

New High Density Recording Technology: Energy Assisted Recording Media

Industrialization of Micro-Electro-Mechanical Systems. Werner Weber Infineon Technologies

2014, IJARCSSE All Rights Reserved Page 1352

New Type of RF Switches for Signal Frequencies of up to 75 GHz

HfO 2 Based Resistive Switching Non-Volatile Memory (RRAM) and Its Potential for Embedded Applications

Transcription:

MgO MTJ biosensors for immunomagnetic lateralflow detection Ricardo Jorge Penelas Janeiro Under supervision of Susana Isabel Pinheiro Cardoso de Freitas Dep. Physics, IST, Lisbon, Portugal Octrober 15, 2010 Abstract The fabrication of magnetoresistive (MR) sensors, with linear response is fundamental to the brand new applications of the magnetic sensors in the biological and biomedical context. The magnetoresistive sensors used were Magnetic Tunel Junctions (MTJ). Since the noise phenomenon is always a limitative factor in every detection system; to try to minimize this issue individual MTJs were connected in series with the purpose of gain in the devices detectivity. Keywords: Tunneling magnetoresistance (TMR) sensors, Mgo MTJ, noise, lateral flow, MTJ series. 1. Theoretical back ground Magnetoresistance Magnetoresistance is the property of a material to change the value of its electrical resistance when the value of the applied magnetic field changes. The magnitude of this effect can be expressed numerically as follows and is presented as a percentage: Magnetic tunel junction A magnetic tunnel junction is a structure constituted by two ferromagnetic layers separated by a insulator layer thin enough to allow the electrons tunneling. In the MTJ s structure the current flows 1

perpendicularly to the layer s plane (current perpendicular to plane geometry CPP geometry). Figure 1: Magnetic tunnel jucntion structure; the current flows perpendicularly to the planes. Like in the spin valve configuration one of the ferromagnetic layers is pinned proving a fixed reference while the other is free to move under an external field application. In the MTJs used in this work the pinned layer role is performed by a synthetic anti-ferromagnetic (SAF) structure, which is composed by two ferromagnetic layers separated by non-magnetic one. Hence, the anti-ferromagnetic layer is a exchange bias material and pines the ferromagnet 1 which pins the ferromagnet 2 by RKKY coupling, which competes with the ferromagnetic Neel coupling, several orders of magnitude inferior to RKKY coupling. This way a stronger pining is achieved than using just the inter layer exchange coupling. Figure 2: Coupling forces in the MTJ stack The FM2 is then free to rotate with the applied field, given the 2 states of resistance of the magnetic tunnel junction devices: when the magnetizations of the two ferromagnets are parallel the junction is in the low resistance state, and when the ferromagnets are in an anti-parallel configuration the junction is in the high resistance state. The TMR is defined as follows: Motivation and sensor design The work developed during this thesis is integrated in an international project which, as ultimate goal, has the intention of develop a new diagnostic tool for influenza virus detection based on an immunochromatographic assay with functionalized magnetic nanoparticles as markers of the virus and ultra sensitive field transducers for their detection and quantification. The concept of the working principle is like follows: first the testing sample containing the virus is put in contact with magnetic nanoparticles functionalized with a specific antibody to the particular virus strain. The fluid is then put in contact with a porus membrane strip; the fluid sample passes through the membrane until the virus attached to the magnetic markers are recognized by membrane immobilized antibodies; finally the presence of a particular virus strain is detected through the sensing of the magnetic fringe field created by the bound magnetic nanoparticles, using a magnetic sensor. 2

Figure3: Lateral flow recognition. Reader design The sensitive part of the system is a magnetoresistive sensor which will detect the field produced by the magnetic particles in the fringe. In order to the sensor identify the field created by the band with the particles it is necessary that the band passes close to sensor; sensor; this sweeping movement can be done using two different methods: 1- Is used a static MR sensor on chip and the test strip mounted on a plastic wheel is brought in contact with the sensor surface as it passes through it. 2- The second configuration uses also a static MR sensor mounted in a tape head and the immobilized particles are pressed and passes through the read head (like a magnetic tape passing over a read head). Figure 4: Wheel concept Figure 5: Picture of the real wheel device Sensor design For this project MTJ devices are used as sensors (not memories) it is required a linear response and a low noise level. These two factors have conditioned the MTJ samples design. For this project MTJ devices are used as sensors, and so it is required a linear response and a low noise level. These two 3

factors have conditioned the MTJ samples design. The sensors series are in a central position of the die sample and 2 contacts are at the sides so the stripe can be sweep freely and without any constrains over MTJ s (like wires bounding the contacts). In order get a linear response the free layer of the sensors have a large aspect ratio: each individual element is a rectangular pillar with 2 by 30 µm 2. Concerning the noise level the MTJs were arranged in arrays, constituting therefore series of MTJs so a lower detectivity could be achieved. Figure 6: Used mask. The sensors were connected in series to improve their detectivity, ie to reduce the minimum field that is possible to detect. The detectivity, D (, is defined as: where S v is the spectral noise density, and ΔV/ΔH the sensibility of the sensor The voltage noise for each MTJ element is: In this last equation the first term represents the white nose and the second term the 1/f noise, where is the electron charge, I the baising current, V the voltage between the sensor electrodes of an individual junction, T the temperature, k B the Boltzman constant, α the Hooge like parameter, A the junction s area and f the is the frequency. The white noise incorporates the thermal noise, which results from the random thermal motion of electrons, and the shot noise, which results from the current flowing trough discontinuities in the circuit, and is given by the Hooge model like expression. For N junctions in series, each junction with a resistance r, with a driven current I equal for all elements we have V = N R I. Therefore the noise voltage spectral density of such a series is given by: 4

The sensitivity is given by: decreasing with this factor. This is so because the square of the noise spectral density increases with N while the sensitivity (not the square of the sensitivity) increases with N. Finally returning to the detectivity expression when V<<k B T, the detectivity is then This last equation shows that for an array of N tunnel junctions the value of D decreases with, meaning that the minimum field which is possible to detect is 2. Microfabrication The samples were deposited in a Nordiko 2000 sputtering system and passivated with TiWN2, a protective layer which is also an antireflective layer useful for the optical lithography performed by direct write laser. During the patterning process 4 lithography steps are made: 1-botom contact definition; 2- pillar definition; 3- top contact definition; 4- definition of path ways for contact through the last oxide. After the first and second lithography steps an ion milling etch is performed. After the second etch is deposited a oxide layer to insulate the lateral sides of the pillar barrier, and after the 3 rd lithography 1500Å of aluminum are deposited. Finally after the last lithography 800Å of oxide are deposited. Figure 8: Microfabrication process Figure 7: Stack Deposited 5

ZarMTJ1 ZarMTJ2 ZarMTJ3 ZarMTJ4 ZarMTJ5 Mgo thickness 17Å 17 Å 12 Å 12 Å 12 Å CoFeB thickness 100 Å 15,5 Å 15,5 Å 30 Å 60 Å Table 1: Variations in the stack of several patterned samples 3. Results and conclusions During this work several samples were processed with different stacks, where some thicknesses of the MgO barrier and CoFeB of the free layer where tested (Table 1). The previous graphics are from ZarMJ1 and ZarmTJ3 samples and show the variation of the response depending the free layer thickness, which have the major impact in the sensitivity of the sample. 6

Figure 9: ZarMTJ1 - TMR vs number of junctions. A study of the behavior of a series based on their number of elements was done and can be seen in the previous graphic. Since it isn t reasonable to expect that all the junctions in a series are equal, the TMR and resistance values of one series should be some kind of a weighted average of their individual values. With this in mind, at the first sight the previous figure seems quite nice: a majority of series have more or less the same TMR value for 120, 240 or 360 individual elements, meaning that they are quite similar. While the work of characterization of the sensors was being done, one set of sensors was sent to another partner institution in the project with the goal of proceeds real applications measurements. Thus, sensors of the first generation (ZarMTJ1), were sent. The wheel device already explained was used and one example of the measurements is the next graphic. When the nanoparticles are trapped in the stripe they have a certain tendency to accumulate,themselves at the edge of the stripes. Thus, the boundaries of the stripes have a higher concentration of the nanoparticles, and will create a higher magnetic field in these regions of the stripes. Therefore, when the stripe is pulled over the sensors, because this nom-uniformity in the particles concentration over the stripe, two spikes appears close to the boundaries of the stripe. 7

Figure 10: Response of the sensors under magneto nanoparticles excitation. 8