Micro valve arrays for fluid flow control

Similar documents
United States Patent (19) 11) Patent Number: 5,621,555 Park (45) Date of Patent: Apr. 15, 1997 LLP 57)

(12) United States Patent (10) Patent No.: US 6,729,834 B1

A///X 2. N N-14. NetNNNNNNN N. / Et EY / E \ \ (12) Patent Application Publication (10) Pub. No.: US 2007/ A1. (19) United States

y y (12) Patent Application Publication (10) Pub. No.: US 2015/ A1 (19) United States (43) Pub. Date: Sep. 10, C 410C 422b 4200

Jacquard -harness of a weaving machine

(12) United States Patent (10) Patent No.: US 6,211,068 B1

(12) Patent Application Publication (10) Pub. No.: US 2003/ A1

(12) Patent Application Publication (10) Pub. No.: US 2006/ A1. Luo et al. (43) Pub. Date: Jun. 8, 2006

(12) United States Patent (10) Patent No.: US 6,957,665 B2

Method and weaving loom for producing a leno ground fabric

(12) United States Patent (10) Patent No.: US 6,566,979 B2

79 Hists air sigtais is a sign 83 r A. 838 EEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEEE

Double-lift Jacquard mechanism

(12) United States Patent (10) Patent No.: US 6,663,057 B2

(12) United States Patent (10) Patent No.: US 7,227,109 B2

(12) United States Patent (10) Patent No.: US 6,593,696 B2

(12) United States Patent (10) Patent N0.: US 6,475,870 B1 Huang et al. (45) Date of Patent: Nov. 5, 2002

Wednesday, February 20, 2002 United States Patent: 3,990,481 Page: 1. United States Patent 3,990,481 Graf November 9, 1976.

(12) Patent Application Publication (10) Pub. No.: US 2001/ A1

Double-embroidered lace

(12) United States Patent (10) Patent No.: US 6,543,599 B2

(12) United States Patent (10) Patent No.: US 6,616,442 B2

United States Patent (19)

Schaeff, LLP. 22 Filed: Nov. 2, 1998 (51) Int. Cl."... B21D 51/ U.S. Cl... 72/329; 72/ Field of Search... 72/327, 328, 329, 72/348

Attorney Docket No Date: 9 July 2007

Copperjacketed Core wire 30X

(12) United States Patent (10) Patent No.: US 6,770,955 B1

(12) United States Patent (10) Patent No.: US 6,337,722 B1

Warp length compensator for a triaxial weaving machine

Hsu (45) Date of Patent: Jul. 27, PICTURE FRAME Primary Examiner-Kenneth J. Dorner. Assistant Examiner-Brian K. Green

United States Patent (19.

Imaging Systems for Eyeglass-Based Display Devices

(12) United States Patent

(12) United States Patent (10) Patent No.: US 7.458,305 B1

United States Patent (19)

United States Patent (19)

(12) United States Patent (10) Patent No.: US 7,124,455 B2

(12) United States Patent

(12) United States Patent

EP A1 (19) (11) EP A1 (12) EUROPEAN PATENT APPLICATION. (43) Date of publication: Bulletin 2011/40

(12) United States Patent

75 Inventors: Onofre Costilla-Vela, Nuevo Leon; : R. SS II.

US 7,307,788 B2. Boettiger et al. Dec. 11, (45) Date of Patent: (10) Patent No.: (12) United States Patent (54) (75)

(12) United States Patent (10) Patent No.: US 6,938,485 B2

(12) United States Patent

(12) United States Patent (10) Patent No.: US 6,758,341 B1

United States Patent (19)

Triaxial fabric pattern

USOO A. United States Patent (19) 11 Patent Number: 5,195,677. Quintana et al. 45) Date of Patent: Mar. 23, 1993

USOO A United States Patent (19) 11 Patent Number: 5,955,771 Kurtz et al. (45) Date of Patent: Sep. 21, 1999

United States Patent

setref WL (-2V +A) S. (VLREF - VI) BL (Hito SET) Vs. GREF (12) United States Patent (10) Patent No.: US B2 (45) Date of Patent: Sep.

United States Patent (19)

SNN. United States Patent (19) 11 4,281,941 45) Aug. 4, Rottenkolber. Appl. No.: 85,271. temperature soldering. The stresses normally produced

(12) United States Patent (10) Patent No.: US 6,387,795 B1

High-speed wavefront control using MEMS micromirrors T. G. Bifano and J. B. Stewart, Boston University [ ] Introduction

(12) United States Patent

(51) Int Cl.: G03F 7/20 ( )

Publication number: A2. Int. CI.5: H01 L 29/ Meadowridge Drive Garland, Texas 75044(US)

(12) United States Patent (10) Patent No.: US 6,673,522 B2

(12) United States Patent

United States Patent (19)

(12) Patent Application Publication (10) Pub. No.: US 2005/ A1

(12) United States Patent

United States Patent (19) Sun

DEPARTMENT OF THE NAVY DIVISION NEWPORT OFFICE OF COUNSEL PHONE: FAX: DSN:

(12) Patent Application Publication (10) Pub. No.: US 2007/ A1

System and process for forming a fabric having digitally printed warp yarns

United States Patent (19)

58 Field of Search /4.5, 1.1, 44.7, Second machine recess therein for receiving and mounting a

United States Patent (19) Vitale

(12) United States Patent (10) Patent No.: US 6,452,105 B2. Badii et al. (45) Date of Patent: Sep. 17, 2002

(12) United States Patent

Exhibit 2 Declaration of Dr. Chris Mack

Hinged locking mechanism

United States Patent (19) Rannou et al.

(12) Patent Application Publication (10) Pub. No.: US 2007/ A1

(12) United States Patent

United States Patent (19)

US A United States Patent (19) 11 Patent Number: 6,046,485 Cole et al. (45) Date of Patent: Apr. 4, 2000

United States Patent (19) Morita et al.

United States Patent (19) Wahhoud et al.

United States Patent (19) Dassen et al.

United States Patent (19) Morris

!J; United States Patent WI [11] Patent Number: 4,471,697. McCormick et al. [45] Date of Patent: Sep. 18,1984. t3~3g~~ INITIATING 32pELLET

United States Patent (19) Ortloff et al.

Silk velvet textile and method of manufacturing the same

(12) Patent Application Publication (10) Pub. No.: US 2011/ A1

United States Patent Patent Number: 5,683,539 Qian et al. 45 Date of Patent: Nov. 4, 1997

(12) Patent Application Publication (10) Pub. No.: US 2004/ A1

(12) Patent Application Publication (10) Pub. No.: US 2017/ A1. Dong et al. (43) Pub. Date: Jul. 27, 2017

CLAIMS 1. A suspension board with circuit, characterized in that, it comprises a metal support layer, an insulating layer formed on the metal support

Romano et al. [45] Date of Patent: May 12, 1998

(12) United States Patent (10) Patent No.: US 8,187,032 B1

(12) Patent Application Publication (10) Pub. No.: US 2004/ A1. Wong et al. (43) Pub. Date: Feb. 19, 2004

(12) Patent Application Publication (10) Pub. No.: US 2005/ A1. Chen et al. (43) Pub. Date: Dec. 29, 2005

(12) Patent Application Publication (10) Pub. No.: US 2004/ A1

(12) United States Patent (10) Patent No.: US 6,815,941 B2. Butler (45) Date of Patent: Nov. 9, 2004

(12) United States Patent (10) Patent No.: US 6,272,015 B1

United States Patent (19) 11) Patent Number: 5,673,489 Robel 45) Date of Patent: Oct. 7, 1997

Transcription:

( 1 of 14 ) United States Patent 6,705,345 Bifano March 16, 2004 Micro valve arrays for fluid flow control Abstract An array of micro valves, and the process for its formation, used for control of a fluid flow and having a substrate with a plurality of apertures for directing the fluid to flow from one side to another. A micromechanically formed fluid seal surrounds each aperture along with a valve diaphragm associated with each seal and micromechanically formed to selectively open and close the aperture by making contact with the seal. Electrical contact is made to the valve diaphragms and substrate for selective valve closure or opening. A conduit leads a fluid flow to the underside of the array and a further conduit leads it away from the array after passing through the selectively opened diaphragms. Inventors: Bifano; Thomas (Mansfield, MA) Assignee: The Trustees of Boston University (Boston, MA) Appl. No.: 708887 Filed: November 8, 2000 Current U.S. Class: 137/597; 137/599.07; 251/129.01 Intern'l Class: F16K 011/22; F16K 011/24 Field of Search: 137/597,606,599.07 251/129.01 References Cited [Referenced By] U.S. Patent Documents 5536963 Jul., 1996 Polla 257/417. 5637458 Jun., 1997 Frankel et al. 435/6. 5767877 Jun., 1998 Mei et al. 347/54. 5901939 May., 1999 Cabuz et al. 251/129. 5941501 Aug., 1999 Biegelsen et al. 251/129. 6116863 Sep., 2000 Ahn et al. 417/322. 6120002 Sep., 2000 Biegelsen et al. 251/129. 6126140 Oct., 2000 Johnson et al. 251/129.

Primary Examiner: Hepperle; Stephen M. Attorney, Agent or Firm: Weingarten, Schurgin, Gagnebin & Lebovici LLP Goverment Interests STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT This invention was made with U.S. Government Support under Contract Number DAAG 55-97-1-0114, awarded by the Army Research Office. The Federal Government therefore has certain rights in the invention. Parent Case Text CROSS REFERENCE TO RELATED APPLICATIONS This application claims priority from U.S. Provisional Application No. 60/163,977, filed Nov. 8, 1999, which is incorporated herein by reference. Claims What is claimed is: 1. An array of micro valves for control of a fluid flow comprising: a substrate having a plurality of apertures for directing the fluid to flow from one side to an other; a micromechanically formed fluid seal surrounding each said aperture, an insulating layer separating each said seal from said substrate; a valve diaphragm associated with each said seal and micromechanically formed to selectively open and close said aperture by making contact with said seal; a conductive region of said substrate associated with each said aperture; said diaphragm having an electrical conductivity; a network of micromechanically formed conductors individually accessing each said diaphragm. 2. The array of claim 1 wherein said substrate is a semiconductor material. 3. The array of claim 2 wherein said semiconductor material is substantially silicon. 4. The array of claim 1 wherein each said seal is of substantially silicon. 5. The array of claim 4 wherein said insulating layer comprises silicon nitride. 6. The array of claim 1 wherein each said diaphragm is a semiconductor material.

7. The array of claim 6 wherein each said diaphragm is substantially of silicon. 8. The array of claim 7 wherein said diaphragm is a silicon diaphragm attached to said substrate to leave fluid passages between itself and said substrate when each said diaphragm is not in contact with said seal. 9. The array of claim 1 wherein said conductors are formed micromechanically. 10. The array of claim 9 wherein said conductors are substantially of silicon or a metalization. 11. A process for regulating the flow of a fluid medium comprising the steps of: providing an array according to claim 1; applying fluid to a first side of said array; collecting fluid from an opposite side of said array. 12. An array of micro valves for control of a fluid flow comprising: a substrate having a plurality of apertures for directing the fluid to flow from one side to an other; a micromechanically formed fluid seal surrounding each said aperture, each said seal being of substantially silicon, an insulating layer separating each said seal from said substrate; a valve diaphragm associated with each said seal and micromechanically formed to selectively open and close said aperture by making contact with said seal; a conductive region of said substrate associated with each said aperture; said diaphragm having an electrical conductivity; and a network of micromechanically formed conductors individually accessing each said diaphragm. 13. The array of claim 12 wherein said insulating layer comprises silicon nitride. Description FIELD AND BACKGROUND OF THE INVENTION In applications that include biomedical dosing, biochemical reaction systems, fluidic mixing, and fluidic regulation, the precise control of the flow of a fluid on a very small scale is desired. To accomplish this objective in the past, single valve systems have been provided where the valve opening is varied according to the rate of flow desired. These are not inherently linear, varying with the third power of the channel cross sectional height. In order to achieve the control required of such assemblies, complex control systems are required which can be costly compared to the fabrication costs of micro machined arrays. SUMMARY OF THE INVENTION The present invention provides for fluid flow regulation through an array of microvalves. Micro valves are fabricated using photolithography techniques on semiconductor material and produce extremely small dimension valves. In such a situation, it is important that the individual valves in the array have small leakage

in the shut state, have a linear flow relationship to both pressure differentials over a range of pressures and over the full array from one to all valves open. To accomplish this purpose, an array of micro valves, used for control of a fluid flow, has a substrate with a plurality of apertures for directing the fluid to flow from one side to another. A micromechanically formed fluid seal surrounds each aperture along with a valve diaphragm associated with each seal and micromechanically formed to selectively open and close the aperture by making contact with the seal. Electrical contact is made to the valve diaphragms and substrate for selective valve closure or opening. A conduit leads a fluid flow to the underside of the array and a further conduit leads it away from the array after passing through the selectively opened diaphragms. DESCRIPTION OF THE DRAWING The present invention is more fully described below in conjunction with the drawing of which: FIG. 1 is a top diagrammatic view of an array of micro valves according to the invention; FIG. 2 is a sectional view of a single micro valve according to the invention; FIG. 3 illustrates partially in section a fluid flow regulator according to the invention; and FIGS. 4A-4F illustrate the steps in the process of fabrication of the invention. DETAILED DESCRIPTION The present invention provides for fluid flow regulation through an array of microvalves. Micro valves are fabricated using photolithography techniques on semiconductor material and produce extremely small dimension valves. In such a situation, it is important that the individual valves in the array have small leakage in the shut state, have a linear flow relationship to both pressure differentials over a range of pressures and over the full array from one to all valves open. Such an array is illustrated in FIG. 1 where the array 10 is formed by micro mechanical construction on a substrate 12. Individual valves 14 are formed on the substrate 12, typically of a semiconductor like silicon, using micro mechanical techniques including photolithography to produce layers of desired semiconducting and insulating materials. The valves typically have a movable diaphragm or other actuable element that is electrostatically or otherwise attracted to the substrate 12 to close the valve which is, when not so attracted, in an open state. The valves are also advantageously individually controlled through the provision of a plurality of electrical conductors 16 formed on the substrate 12 separately connecting each valve actuable element to a bus 18. The bus is typically fed valve actuation signals from a CPU 20 that allows a selected number of the valves 14 in the array 10 to be opened or closed. In turn the flow of a fluid through the array is linearly controlled by the number of valves open. Valve spacing in the range of mm to fractions of mm are possible. FIG. 2 illustrates in cross section the construction of a typical valve 14 in the array 10. As shown there the valve has a substrate 12 with an aperture 22 for each valve in the array. The substrate upper surface has an insulating layer 24 thereon, also apertured in the place of the aperture 24. Surrounding the apertured insulating layer 24 and aperture 22 is a micromechanically formed sealing ring 26 which surrounds the aperture 22. Above the sealing ring 26 is a diaphragm which is normally offset from the sealing ring 26 but can be pulled down onto it forming a seal that blocks the flow of a fluid through the aperture 22. The diaphragm is formed in a layer 30 of semiconductor material by processes described below to leave a cavity 32 between the sealing ring 26 and diaphragm 28. The diaphragm 28 as shown is attached at only two opposite edges 34 to the substrate 12. The portions that face in and out of the page are open to allow any fluid flowing through the aperture 22 from the underside of the substrate 12 to continue on beyond the diaphragm 28 on the top side of the substrate 12. When the diaphragm 28 is pulled down into contact with the sealing ring 26, the flow is

stopped with a relatively low leakage. The substrate 12 and diaphragm 28 are typically semiconductor materials made sufficiently conductive to permit an electrostatic attraction voltage of a few volts to be applied thereto and pull the diaphragm down to seal the diaphragm 28 to the sealing ring 26. The layer 30 may be thinned to form the conductors 16 of FIG. 1 or separate metalizations used, all according to well known procedures of micro mechanical constructions. A completed array 10 on a substrate 12 is shown in FIG. 3 assembled into a conduit system having a an inlet passage 40 leading to an aperture 42 over which the array 10 is sealed, exposing the bottom surface to the conduit 40. The top surface of the array 10 opens into a top conduit 44 which exits to an output 46. A CPU 48 is connected to the substrate 12 and array 10 to provide selective valve operation. For valve diaphragm spacing up to about five microns (above which breakdown may become a problem) a few volts up to a few tens of volts of potential is sufficient. The voltage is a function of the pressure that the valve is to withstand in the fluid environment, and the diaphragm gap is a function of the flow rate per valve desired. Because the flow rate variation with the gap affects flow rate at the third power of gap spacing while the voltage varies at the second power, some flexibility is given in design to achieve desired parameters, constrained at the limit by the breakdown voltage. Valve dimensions in the range of 300-500 horizontal microns is typical. The process of formation of the array is illustrated in FIGS. 4A-4E, showing a representative single micro valve. A substrate 50 is provided in silicon or polysilicon on which the array is to be formed and is provided with or given a conductivity sufficient to support the electric potential necessary to cause valve closing as described above. An insulating layer 52 of typically silicon nitride is formed over the substrate to a thickness of, for example, half a micron. Over that is grown or deposited the ring seals 54 using photolithography processes of deposition, resist exposure and development and etching to leave the ring pattern. A sacrificial layer 56 of silicon dioxide, providing the diaphragm spacing, is next formed and patterned around the ring seals 54, typically to a thickness of half a micron. A layer 58 of polysilicon is then deposited over the silicon dioxide and silicon nitride and has or is given sufficient conductivity for the application of the valve actuating potential. In FIG. 4E the back surface of the substrate 50 is patterned and etched photolithographically to leave an aperture 60 through the substrate 50 of polysilicon and the silicon nitride 52. In the step of FIG. 4F, the sacrificial layer 56 of silicon dioxide is dissolved or etched. Finally, metalizations may be added to provide bonding pads 62 to each diaphragm formed by the layer 58. These can be contacted by wire bonds, or the metalizations can be applied to the substrate surface as shown in FIG. 1. The invention may be practiced in other forms and by other processing, in micromechanical, precision machining or other ultra small fabrication techniques. Accordingly its scope is limited only in accordance with the following claims. * * * * *