Romania and High Power Lasers Towards Extreme Light Infrastructure in Romania

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Romania and High Power Lasers Towards Extreme Light Infrastructure in Romania Razvan Dabu, Daniel Ursescu INFLPR, Magurele, Romania

Contents GiWALAS laser facility TEWALAS laser facility CETAL project Extreme Light Infrastructure project

CLARK MXR Laser CPA 2101 (2006) Er:glass fiber oscillator, frequency doubled - Laser wavelength: 1550 nm 775nm - Pulse duration ~200fsec - Repetition rate: 35MHz - Pulse energy ~43 pj - Average power ~1.5mW Ti:sapphire regenerative amplifier - Laser wavelength 775nm - Pulse duration ~ 200 fsec - Repetition rate 2kHz - Maximum pulse energy ~ 700 J - Average power ~ 1.4W

Femtosecond Laser and the Experimental Set-up for Micro-nanotechnologies (2007) Laser control Laser writing system for micro-structures Operator fs LASER Laser wavelength, 775 nm; E pulse = 0.7 mj; t p < 200 fs; f rep = 2 khz

GIWALAS Experimental Room (2010) Computer control unit Clark MXR fs laser Stretcher-amplifier-compressor for fs multi-pulse generation Green nanosecond pump laser Micro-processing workstation

TEWALAS Specifications Laser specifications Central wavelength Spectral bandwidth Pulse energy before compressor Pulse energy after compressor Compressed pulse duration Repetition rate Measured value 808 nm > 65 nm 600 mj 450 mj 25 ± 2 fs 10 Hz Pulse energy stabilization (RMS) 1.85% Nanosecond pre-pulses contrast 8x10-8

Critical Features of High Power Femtosecond Pulsed Lasers Pulse duration (spectral bandwidth, phase corrections) Intensity contrast (ASE, picosecond-nanosecond pre-pulses) Available focused intensity - Strehl ratio (high beam quality pump lasers, wavefront corrections with deformable mirrors)

Pulse spectrum narrowing during Ti:Sa amplification TEWALAS (a) TEWALAS laser spectra: (a) without active Mazzler; (b) optimized by Mazzler. Mauve line FEMTOLASERS oscillator (100 nm bandwidth); yellow line after the first multi-pass amplifier, bandwidths - (a) 40 nm, (b) 75 nm; white line - after the second multi-pass amplifier- bandwidths (a) 35 nm, (b) 65 nm. (b)

Correction of Spectral Phase Dispersion Using Acousto-Optical Programmable Dispersion Filter Temporal distortion of the amplified re-compressed pulse is produced by: - dispersion and phase distortions introduced by the laser amplifier system - spectral gain narrowing in Ti:sapphire amplifiers (a) TEWALAS: Pulse duration measurements using SPIDER (a) with Dazzler phase correction; (b) without phase correction. All cases: with spectrum correction by Mazzler (b)

Amplified spontaneous emission (ASE) and nanosecond intensity contrast ASE contrast measured with a 3-rd order auto-correlator (SEQUOIA) Measured intensity contrast: ASE < 10-9 Nanosecond @ 600mJ: 8x10-8 Nanosecond contrast

Femtosecond Laser Studies and Experiments Micro/nano-technologies (low energy, high repetition rate): -Thin films micro-processing by femtosecond laser ablation - Nano-processing in intensified laser field - Direct laser writing of micro/nanostructures by two-photon photopolymerization - Two-Photon Excited Spectroscopy R&D based on femtosecond lasers (high energy): - Multiple pulses generation in stretcher-compressor femtosecond laser systems - Simulations and experiments of coherent beam combination - Non-linear propagation of focused ultrashort pulses in air - Theoretical studies of high intensity laser field matter interaction

Direct Laser Writing (DLW) Workstations Microscope for 3D lithography and laser spectroscopy Experimental set-up using TEWALAS oscillator Workstation for Clark-MXR laser

Physics of Extreme Light at INFLPR - Prospects Next (possible) studies based on existing femtosecond lasers: Coherent combination of ultra-short pulses using interferometric methods X-ray generation using ultra-short laser pulses Collinear pump probe experiments THz radiation generation Plasma mirror studies Study of absorption and density gradients in laser-produced plasmas Diagnosis and characterization of laser beams and optical components for nanosecond & femtosecond high energy lasers Large bandwidth OPCPA (OPCPA at critical wavelength degeneracy)

Prospects of High Power fs Lasers at INFLPR 2005 2009 2010 2012 2015 2005 2006 2007 2008 2009 2010 2011 2012 2013 2014 2015 CPA 2101 CLARK MXR, USA (0.7 mj, 2 khz, 4 GW/200 fs) TEWALAS AMPL. TECH., FRANCE (400 mj, 10 Hz, 15 TW/25 fs) CETAL (30 J, 0.1-1 Hz, 1 PW/30 fs) ELI NP (2 x 250 J, 1 pulse/min, 2 x 10 PW/25 fs) High power femtosecond laser projects: 1-PW (CETAL project, 2010-2013) 10-PW (Extreme Light Infrastructure, Romanian Pillar for Nuclear Physics ELI-RO-NP, 2010-2015)

ELI-NP building

Possible solutions for a 10-PW laser A) OPCPA based laser system (910-nm central wavelength): Front-End very broad-band signal radiation at 910-nm central wavelength generated by chirp-compensated collinear OPA. High power OPCPA in large aperture DKDP crystals B1) Hybrid laser system at ~ 800 nm central wavelength: - Front-End based on OPCPA in nonlinear crystals (BBO, LBO) - High energy amplification in Ti:sapphire crystals or Basic solution for ELI-RO-NP laser B2) Ti:sapphire amplifiers at ~ 800 nm central wavelength : - Front-End based on Ti:sapphire amplification - High energy amplification in Ti:sapphire crystals C) Hybrid laser system with Front-End based on OPCPA in BBO crystals and high energy amplification in mixed silicate/phosphate Nd-doped glasses near 1 μm wavelength Alternative solution for ELI-RO-NP laser

Laser Architecture Figure 4. ELI-RO scheme. FE1, FE2 Font-End based on OPCPA or Ti:sapphire amplification. A1-A5 Ti:sapphire amplifiers.

Overview of ELI-NP Multi-PW Laser Laser experimenta area Technical areas Multi-PW laser

Overview of ELI-NP laser arm

Overview - GIWALAS facility - productive - TEWALAS facility - fully comissioned + productive - CETAL PW laser system on the track - Extreme Light Infrastructure feasibility study reviewed

Thank You for attention!