Title: Laser marking with graded contrast micro crack inside transparent material using UV ns pulse

Similar documents
Femtosecond laser microfabrication in. Prof. Dr. Cleber R. Mendonca

Laser direct writing of volume modified Fresnel zone plates

Fabrication of microstructures on photosensitive glass using a femtosecond laser process and chemical etching

Optical RI sensor based on an in-fiber Bragg grating. Fabry-Perot cavity embedded with a micro-channel

CHAPTER 7. Waveguide writing in optimal conditions. 7.1 Introduction

Laser Fabrication of Miniature Internal Thread in Glass Substrate

KNIFE-EDGE RIGHT-ANGLE PRISM MIRRORS

Rear Side Processing of Soda-Lime Glass Using DPSS Nanosecond Laser

Observation of Stress Wave and Thermal Stress in Ultrashort Pulse Laser Bulk Processing inside Glass

DEVELOPMENT OF CW AND Q-SWITCHED DIODE PUMPED ND: YVO 4 LASER

Micron and sub-micron gratings on glass by UV laser ablation

Structural Modification in Borosilicate Glass by Use of Femtosecond Fiber Laser at 1.56 µm

Femtosecond fiber laser direct writing of optical waveguide in glasses

JLMN-Journal of Laser Micro/Nanoengineering Vol. 12, No. 2, Akinao Nakamura 1, Masaaki Sakakura 1,2, Yasuhiko Shimotsuma 1, Kiyotaka Miura 1

Heriot-Watt University

k λ NA Resolution of optical systems depends on the wavelength visible light λ = 500 nm Extreme ultra-violet and soft x-ray light λ = 1-50 nm

101 W of average green beam from diode-side-pumped Nd:YAG/LBO-based system in a relay imaged cavity

Lithography. 3 rd. lecture: introduction. Prof. Yosi Shacham-Diamand. Fall 2004

True Three-Dimensional Interconnections

Drilling of Glass by Excimer Laser Mask Projection Technique Abstract Introduction Experimental details

AS a result of their promising prospect, micro- and nanooptics

High Average Power, High Repetition Rate Side-Pumped Nd:YVO 4 Slab Laser

High-speed Fabrication of Micro-channels using Line-based Laser Induced Plasma Micromachining (L-LIPMM)

Effects of spherical aberrations on micro welding of glass using ultra short laser pulses

FemtoFAB. Femtosecond laser micromachining system. tel fax Konstitucijos ave. 23C LT Vilnius, Lithuania

Laser Induced Damage Threshold of Optical Coatings

Femtosecond Laser Direct Writing of Optical Waveguides in Silicone Film

New Lasers Improve Glass Cutting Methods

Far infrared generation by CO 2 lasers frequencies subtraction in a ZnGeP 2 crystal.

Micromachining of complex channel systems in 3D quartz substrates using Q-switched Nd:YAG laser

30 MM CAGE CUBE MOUNTED TURNING PRISM MIRRORS

LASER TECHNOLOGY. Key parameters. Groundbreaking in the laser processing of cutting tools. A member of the UNITED GRINDING Group

plasmonic nanoblock pair

APPLICATION OF A POINT-DIFFRACTION INTERFEROMETER TO UNSTEADY SHOCK WAVE PHENOMENA

A CW seeded femtosecond optical parametric amplifier

Single-photon excitation of morphology dependent resonance

Low threshold power density for the generation of frequency up-converted pulses in bismuth glass by two crossing chirped femtosecond pulses

Sphere-to-Plate Glass Welding using Picosecond-Laser Radiation

PROCEEDINGS OF SPIE. 193nm high power lasers for the wide bandgap material processing

Digital multimirror devices for precision laser micromachining

Simultaneous measurement of two different-color ultrashort pulses on a single shot

LMT F14. Cut in Three Dimensions. The Rowiak Laser Microtome: 3-D Cutting and Imaging

Continuum White Light Generation. WhiteLase: High Power Ultrabroadband

SUPPLEMENTARY INFORMATION

Nanosecond Laser Processing of Soda-Lime Glass

Lasers à fibres ns et ps de forte puissance. Francois SALIN EOLITE systems

Femtosecond Pulsed Laser Direct Writing System for Photomask Fabrication

MicroSpot FOCUSING OBJECTIVES

Single frequency MOPA system with near diffraction limited beam

Fabrication of hollow optical waveguides in fused silica by three-dimensional femtosecond laser micromachining

Fabrication of Photorefractive Grating With 800 nm Femtosecond Lasers in Fe: LiNbO 3 and Rh:BaTiO 3 Crystals

Theoretical Approach. Why do we need ultra short technology?? INTRODUCTION:

Pulse Shaping Application Note

Fiber lasers and their advanced optical technologies of Fujikura

UV EXCIMER LASER BEAM HOMOGENIZATION FOR MICROMACHINING APPLICATIONS

Faraday Rotators and Isolators

ESCC2006 European Supply Chain Convention

Laser tests of Wide Band Gap power devices. Using Two photon absorption process

End Capped High Power Assemblies

Phase-sensitive high-speed THz imaging

Mitigation of Laser Damage Growth in Fused Silica with a Galvanometer Scanned CO2 Laser

REAL-TIME DETECTION OF OPTICAL DAMAGE INDUCED BY HIGH-POWER LASER PULSES

CVI LASER OPTICS ANTIREFLECTION COATINGS

High Rep-Rate KrF Laser Development and Intense Pulse Interaction Experiments for IFE*

Compensation of hologram distortion by controlling defocus component in reference beam wavefront for angle multiplexed holograms

LOPUT Laser: A novel concept to realize single longitudinal mode laser

Sensitivity enhancement of Faraday effect based heterodyning fiber laser magnetic field sensor by lowering linear birefringence

Laser Singulation of Thin Wafers & Difficult Processed Substrates: A Niche Area over Saw Dicing

dnx/dt = -9.3x10-6 / C dny/dt = -13.6x10-6 / C dnz/dt = ( λ)x10-6 / C

Section 2: Lithography. Jaeger Chapter 2. EE143 Ali Javey Slide 5-1

Parallel Digital Holography Three-Dimensional Image Measurement Technique for Moving Cells

Dicing of Thin Silicon Wafers with Ultra-Short Pulsed Lasers in the Range from 200 fs up to 10 ps

Laser-Diode Pumped Nd:Glass Slab Laser for Inertial Fusion Energy

The RhySearch LIDT Testing Facility at the NTB Buchs

EE-527: MicroFabrication

HEO 1080P APPLICATION NOTE

High-Power, Passively Q-switched Microlaser - Power Amplifier System

Integrated disruptive components for 2µm fibre Lasers ISLA. 2 µm Sub-Picosecond Fiber Lasers

Quantum-Well Semiconductor Saturable Absorber Mirror

The RSH Catalogue. Laser Optics & Lenses

SUPPLEMENTARY INFORMATION

Development of Ultrashort Pulsed VUV Laser and its Applications

High Power and Energy Femtosecond Lasers

Picosecond laser system based on microchip oscillator

Beam Shaping in High-Power Laser Systems with Using Refractive Beam Shapers

Role of ablation and incubation processes on surface nanograting formation

Confocal Imaging Through Scattering Media with a Volume Holographic Filter

Chapter Ray and Wave Optics

High-Energy 6.2-fs Pulses for Attosecond Pulse Generation

Overview of Commercially Available Femtosecond Lasers in Refractive Surgery

VELA PHOTOINJECTOR LASER. E.W. Snedden, Lasers and Diagnostics Group

High-power diode-end-pumped laser with multisegmented Nd-doped yttrium vanadate

PHY 431 Homework Set #5 Due Nov. 20 at the start of class

Diffractive Axicon application note

Spectral phase shaping for high resolution CARS spectroscopy around 3000 cm 1

H. Lubatschowski T. Ripken, U. Oberheide, C. Ziltz, G. Gerten. Femtosecond Laser Applications in the Huaman Lens

Nd:YSO resonator array Transmission spectrum (a. u.) Supplementary Figure 1. An array of nano-beam resonators fabricated in Nd:YSO.

Immersed transparent microsphere magnifying sub-diffraction-limited objects

AVIA DPSS Lasers: Advanced Design for Increased Process Throughput

Near-field optical photomask repair with a femtosecond laser

Transcription:

Cover Page Title: Laser marking with graded contrast micro crack inside transparent material using UV ns pulse laser Authors: Futoshi MATSUI*(1,2), Masaaki ASHIHARA(1), Mitsuyasu MATSUO (1), Sakae KAWATO(2), and Takao KOBAYASHI(2) 1 Industrial Technology Center of Fukui Prefecture 2 Graduate School of Engineering, University of Fukui Corresponding author: Futoshi MATSUI* Industrial Technology Center of Fukui Prefecture Postal address: 61-10 Kawaiwashiduka, Fukui, Fukui 910-0102 Phone: +81-776-55-0664 Fax: +81-776-55-0665 e_mail: futoshi_gov@fklab.fukui.fukui.jp 1

Title: Laser marking with graded contrast micro crack inside transparent material using UV ns pulse laser Authors: Futoshi MATSUI*(1,2), Masaaki ASHIHARA(1), and Mitsuyasu MATSUO (1), Sakae KAWATO(2), Takao KOBAYASHI(2) Keyword: laser-induced crack marking, high-contrast level, UV laser, borosilicate glass Abstract: We have developed an efficient laser-induced marking system using the UV (ultraviolet) ns (nanosecond) pulse laser for inscribing the laser-induced crack image inside transparent BK-7 glass plates. The crack area was found to be proportional to the total laser energy and number of laser shots and also related to the scattering intensity of the image points. The 16 steps or 4-bit contrast level could be recorded in one point and resolved by this method. This laser-induced crack marking technique with high-contrast level can be used for high quality, two and three-dimensional memory and image inside the transparent materials. 2

1. Introduction The laser marking on the surface of metals and semi-conductor materials are widely used in industry as an efficient laser processing technique. The laser-induced cracking inside transparent materials is also used for inscribing the image of objects [1], which is sometimes referred to as laser crystal art [2]. The laser marking inside the transparent materials is also useful in chemical and medical applications for protecting erosion, friction and correction of the marked surfaces. In this technique, the image contrast is controlled roughly by a crack number density using pulsed lasers and the image contrast level is limited to only one-bit (white and black) scale or so. In this research we report a new technique of the laser-induced crack marking for high contrast level imaging inside a glass by controlling the fluence of ns (nanosecond) pulse UV (ultraviolet) laser beam. More than 16-contrast level of scattering cracks was obtained and high quality and clear imaging was realized inside transparent glasses. 2. Crack formation and efficient laser processing A schematic of the laser-induced crack marking process inside transparent materials is shown in Fig. 1. By focusing the pulse laser beam, high intensity optical field is created near the focal point and generates high temperature and high shock wave pressure inside the transparent solid materials and induces cracks along the laser beam. The crack also expands toward transverse direction at 3

higher fluence of the laser energy. As a transparent material we used BK-7, borosilicate crown glass which has several advantages over silica glass in the laser induced crack marking. The BK-7 glass has absorption band edge wavelength of about 350nm and small absorption coefficient of α =2.81 10-2 cm -1 at the wavelength of 355nm of the third-harmonic beam of the Nd: YVO 4 laser. This close wavelength relation between the material absorption and the laser results in significantly lower laser-induced bulk damage threshold (LIDT) of the BK-7 glass than the silica glass by single photon absorption effect [3], and the UV 355nm third-harmonic beam is useful for efficient production of laser-induced cracks than using the fundamental beam at 1064nm or second-harmonic beam at 532nm wavelength. The ns (nanosecond) pulse laser for was used for marking BK-7 glasses. Fs (femtosecond) ultrashort pulse lasers are often used for micro processing [4,5]. Although it has high peak power enough to process wide band gap materials, the pulse energy and the average power are significantly lower than nanosecond lasers. In the case of laser marking application of transparent materials, large cracking volume is required and the nanosecond pulse laser is suitable for highly efficient laser marking processing. 3. Experimental system In the laser-induced crack marking system, the V pulse third-harmonic of Nd:YVO 4 laser at 4

355nm wavelength of 30 ns pulse width (Coherent, model AVIA 355-7000) was used as the laser source and the total block diagram is shown in Fig. 2. The pulse repetition frequency is selectable from 10kHz to 100kHz. The laser beam is scanned by galvanometer mirrors (GSI, model HMPM10) and focused by a 120mm-diameter f-θ lens with 106mm focal length. The scanning and focusing system has 16bit angle resolution and 1.2µm spatial resolution on a 75mm square transparent target material. The laser pulse repetition frequency, the number of laser shots and laser beam position are controlled by using a personal computer. The laser pulse energy is kept constant at 50 µj and the number of laser shots for single crack position is changed for controlling the crack size. The crack area was measured automatically by using a transmission camera and a micro-computer image processing system. 4. Experimental results In Fig. 3, the transmission microscope images of the laser-induced cracks observed along the laser beam direction are compared for single shot per point in Fig. 3 (a) and 16 laser shots per point in Fig. 3 (b). The spacing between the cracks is 150µm. It is shown that the crack size clearly increases by 16 laser shots. The images of the laser-induced cracks observed from transverse direction to the laser beam are shown in Fig. 3 (c) and (d), single and 16 shots respectively. The depth of the longitudinal crack along the laser beam was approximately 1.2mm. It is evident that the 5

longitudinal cracks are induced by single shot exposure and transverse cracks expand by increasing the number of shots or laser fluence. The area of the laser-induced cracks observed from longitudinal direction is plotted as a function of total laser energy or number of laser shots per point in Fig. 4. It is shown that the crack area is almost linearly proportional to the total laser energy or number of laser shots N. The scattering image and the transmission image of the laser-induced cracks observed from the longitudinal direction to the laser beam are compared in Fig. 5 (a) and (b). The scattering image was recorded by irradiating a halogen-lamp light from the transverse direction to the laser beam direction. It was checked the scattering intensity of the cracks is proportional to the crack area observed from the longitudinal direction. As an example of the laser-induced crack marking technique, 16 different contrast square images were marked in a BK-7 glass by changing the laser shots and the scattering images are shown in Fig.6. This result indicate each image contrast could be resolved and 16 step imaging contrasts can be demonstrated for high density two and three dimensional imaging inside the transparent glass. 5. Conclusion The efficient laser marking system has been realized using the UV ns pulse laser for inscribing the laser-induced crack image inside transparent BK-7 glass plates. The crack area was found to be 6

proportional to the total laser energy and the number of laser shots and also related to the scattering intensity of the image points. The 16 steps or 4-bit contrast level could be recorded and resolved by this marking method. This high-contrast level crack marking technique can be used for high-quality, two and three-dimensional memory and image inside the transparent materials. References [1] F. Dahmani, A. W. Schmid, J. C. Lambropoulos, and S. Burns, "Dependence of birefringence and residual stress near laser-induced cracks in fused silica on laser fluence and on laser-pulse number", Appl. Opt., Vol. 37, No. 33, pp.7772-7784 (1998) [2] H. Niino, A. Narasaki, T. Sato, Y. Kawaguchi, Micro-processing of transparent material using Laser ablation (in Japanese) Journal of Japan Laser Processing Society Vol.9, pp.10-14 (2002) [3] N. Kuzuu, K. Yoshida, K. Ochi, Y. Tsuboi, T. Kamimura, Laser-induced bulk damage of various types of silica glasses at 532 and 355nm Jap. J. Appl. Phys., Vol.43, pp.2547-2548 (2004) [4] A. Marcinkevičius, S. Juodkazis, M. Watanabe, M. Miwa, S. Matsuo, H. Misawa, and J. Nishii, "Femtosecond laser-assisted three-dimensional microfabrication in silica," Opt. Lett. 26, pp. 277-279 (2001) [5] N. Takeshima, Y. Kuroiwa, Y. Narita, S. Tanaka, and K. Hirao, "Fabrication of a periodic structure with a high refractive-index difference by femtosecond laser pulses," Opt. Express 12, pp.4019-4024 (2004) 7

Fig. 1 Laser-induced crack marking process Fig. 2 Experimental system of laser-induced crack marking Fig. 3 Microscope images of laser-induced cracks; (a) and (b) are transmission images observed along the laser beam direction, (c) and (d) are images observed from transverse the laser beam direction. The number of laser shots N=1 for (a)and (c), N=16 (b) and (d), respectively. Fig. 4 Crack area as a function of total laser energy or number of laser shots per point Fig. 5 The scattering image and the transmission image of the laser-induced cracks observed from the longitudinal direction to the laser beam Fig. 6 Scattering images of 16 different contrast squares marked in a BK-7 glass by changing the number of laser shots 8

Pulse laser beam Focusing lens Transparent solid material Laser-induced cracks Fig. 1 Laser-induced crack marking process Galvanometer mirrors F-θ focusing lens UV Laser Control signal Transparent Scanning material control Z axis stage PC Fig. 2 Experimental system of laser-induced crack marking 9

(a) (b) (c) (d) Fig. 3 Microscope images of laser-induced cracks; (a) and (b) are transmission images observed along the laser beam direction, (c) and (d) are images observed from transverse the laser beam direction. The number of laser shots N=1 for (a)and (c), N=16 (b) and (d), respectively. 10

Crack area [µm 2 ] 1500 1000 500 Number of laser shot : N 0 5 10 15 BK-7 glass λ = 355nm Single pulse energy:50µj 0 0 200 400 600 800 Total laser energy [µj] Fig. 4 Crack area as a function of total laser energy or number of laser shots per point (a) Scattering image (b) Transmission image Fig. 5 The scattering image and the transmission image of the laser-induced cracks observed from the longitudinal direction to the laser beam 11

Fig. 6 Scattering images of 16 different contrast squares marked in a BK-7 glass by changing the number of laser shots 12