Micro-Nanofabrication

Transcription

1 Zheng Cui Micro-Nanofabrication TECHNOLOGIES AND APPLICATIONS ^f**"?* ö Springer Higher Education Press -T O

2 Table of Content Preface About the Author Chapter 1 Introduction Micro-nanotechnologies and micro-nanofabrication technologies Classification of micro-nanofabrication technologies Organisation ofthebook 8 References 11 Chapter 2 Optical Lithography Principle of optical lithography Process of optical lithography Characteristics ofphotoresists Common features ofphotoresists Comparison of positive and negative photoresists Chemically amplified resists Special photoresists Design and fabrication of photomasks Resolution enhancement techniques Off-axis Illumination Spatial filtering Phase shift masks Optical proximity correction The limit of optical lithography Optical lithography ofthick photoresists Conventional thick photoresist SU-8 photoresist Grey-scale photolithography Computer Simulation of optical lithography Theory of partial coherent imaging Computer Simulation Software COMP ARE Comparing the quality of optical lithography 67 References 74

3 viii Table of Content Chapter 3 Electron Beam Lithography Principle of electron optics Electron beam lithography Systems Vector scan and raster scan Systems Shaped beam Systems Projection lithography Systems Microcolumn e-beam lithography Systems Pattern design and data format for e-beam lithography Issues in pattern design Intermediäre data format AutoCAD format Machine data format Electron beam resists and processes High resolution e-beam resists Chemically amplified resists Multilayer resists process Electron scattering and proximity effect Electron scattering in solid materials Proximity effect in e-beam lithography Approximation of point spread function Correction of proximity effect Computer Simulation of e-beam lithography Ultimate resolution of e-beam lithography E-beam lithography System Secondary electron scattering effect Resist process 133 References 135 Chapter 4 Focused Ion Beam Technology Liquid metal ion sources Focused ion beam Systems Ion scattering in solid materials Principle of focused ion beam processing Ionsputtering Ion beam assisted deposition Applications of FIB technology Inspecting and editing integrated circuits Repairing defects of optical masks Preparing TEM samples A versatile microfabrication tool Focused ion beam lithography Focused ion beam implantation 165 References 166

4 Table of Content ix Chapter 5 X-ray Lithography Principle of X-ray lithography X-ray lithography System X-ray source X-ray maskaligner and stepper X-ray mask X-ray resists High resolution X-ray lithography High aspect ration X-ray lithography (LIGA technology) X-ray source LIGA mask Thick resists and processes for LIGA Accuracy of LIGA patterning 192 References 195 Chapter 6 Etching Technology Wet chemical etching Anisotropie wet etching of Silicon Isotropie etching of Silicon Isotropie etching of Silicon dioxide Dry etching 1: reactive ion etching Dry etching 2: deep reactive ion etching Dry etching 3: ion sputtering etching Dry etching 4: reactive gas etching Dry etching 5: other physical etching techniques Laser micromachining Electrodischarge micromachining Powder blasting 230 References 234 Chapter 7 Replication Technology Nanoimprint lithography Step and flash nanoimprinting lithography Soft lithography Micromoulding ofplastics Hot embossing Micro inj ection moulding Casting Microstereolithography Other replication techniques DipPen nanolithography Nanosphere lithography Nanostencil lithography 262 References 264

5 x Table of Content Chapter 8 Applications of Micro-nanofabrication Technologies Very large scale integrated circuits Nanoelectronics Optoelectronics High density magnetic storage Micro-electro-mechanical Systems Biochips Nanotechnology 294 References 297 Index 301