Industrial, High Repetition Rate Picosecond Laser

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1 RAPID Indusrial, High Repeiion Rae Picosecond Laser High Power: RAPID is a very cos efficien, compac, diode pumped Nd:YVO4 picosecond laser wih 2 W average power a 1064 nm. Is 10 ps-pulses have high pulse energy (up o 30 µj) and high peak power of up o 3 MW. The excellen beam qualiy (M²<1.2) allows for focussing he beam ono very small areas o easily reach peak power densiies in he TW/cm² range sufficien for micromachining virually any maerial. Reliable, High Rep Rae Pulses: The ousanding repeiion rae of 500 khz ranslaes ino micromachining wih high hroughpu and ino cuing cos per par. A all repeiion raes he beam qualiy is excellen. Exernal TTL pulses can rigger single pulses or pulse sequences. Designed for hands-off operaion, he RAPID offers a maximum of reliabiliy. The sysem is hermeically sealed; he complee laser head is hermalized. Is compac design makes machine inegraion sraighforward. Laser funcions are PC-conrolled and accessible via RS232 inerface. Harmonics a 532 and 355 nm and addiional amplifier modules are opionally available. Feaures: Up o 500 khz repeiion rae, single pulse, programmable pulse sequences, TTL-rigger Picosecond pulses up o 30 µj, up o abou 3 MW peak power High power sabiliy in a spaially excellen beam, M²<1.2, a all rep raes Reliable, hands-off operaion, compac design, compuer conrol and inerface Low mainenance and low cos of ownership Single phase mains elecrical connecion ( V, Hz, <2 kva) No exernal cooling waer requiremen, easy machine inegraion Applicaions: Maerials processing wih high ablaion qualiy: Selecive drilling, cuing, srucuring, surface srucuring, specifically in semiconducor echnology. Meals, semiconducors, ceramics, glass and oher maerials have been micromachined in very high qualiy and efficienly in LUMERA LASER s applicaion lab wih ~10 ps pulses a energy densiies in he order of 1 J/cm². For arge areas of ~10x10 µm² his ranslaes o ~1 µj pulse energy. Increasing he pulse repeiion rae up o 500 khz increases he maerial removal rae linearly (wih consan pulse energy and geomery). Applicaions, in addiion o micromachining, include: R/D, NLO, THzgeneraion, ps-specroscopy, saellie ranging and cu 100 µm seel mask cu aluminum 15 µm maerial research. Specificaions RAPID Wavelengh Pulse duraion Average power Pulse energy Pulse energy sabiliy Pulse energy Repeiion rae Beam qualiy M2 Polarizaion Harmonics opions Elecric supply Conrol uni Laser head Beam posiion 1064 nm <15 ps 500 khz 30 khz, 4 khz <1% rms a 500 khz >200: khz, TTL-rigger, pulse on demand <1.2 p, 1000:1 532 nm (p), 355 nm (s) V, Hz, 2 kva W 553 x D 600 x H mm³; ~80 kg W 440 x D 888 x H 117 mm³, ~46 kg H 67+ mm; IR 127, SHG 97 mm from lef LUMERA LASER GmbH Telefon Fax Web Opelsraße 10 micro milling sapphire D Kaiserslauern info@lumera-laser.com LUMERA-LASER follows a policy of coninuous produc improvemen. This daa shee RAPID is subjec o change wihou noice.

2 2 Overview and Technical Background The RAPID is a 2 W picosecond laser generaing 10 ps pulse a 1064 nm wih a freely selecable pulse rae as high as 500 khz and pulse energies of more han 30 µj a repeiion raes 10 khz. I consiss of a mode-locked oscillaor, a fas elecro - opical pulse picker, an amplifier and (opional) a second and hird harmonic generaor. The laser head is a rugged monolihic aluminium srucure and is acively emperaure conrolled. The RAPID laser is inended for indusrial applicaions and as an OEM laser source. 2.1 Oscillaor The oscillaor is a diode-pumped passively mode-locked Nd:Vanadae laser generaing high average power picosecond pulses wih a repeiion rae of 50 MHz. Therefore he ime beween he picosecond pulses is 1/50 MHz = 20 ns. The ypical pulse widh is 8 ps and he average power is abou 3 W. The oscillaor is pumped by a fibre-coupled single bar laser diode. The fibre cable is conneced o he oscillaor via SMA fibre connecor FC Pulse Picking The fas elecro-opical pulse picker selecs a number of pulses ou of he picosecond pulserain o reduce he effecive pulse rae. The seleced pulses will be amplified in he nex sep o gain he required energy. The advanced LUMERA LASER pulse picker provides a choice of differen pulse paerns o be amplified: a) Single pulses a repeiion raes from 0 o 500 khz b) One group of pulses (seleced number, here 3, every 20 ns) repeaed from 0 o 500 khz c) Sequences of pulses (in 2 groups, variable delay, seleced number of pulse every 20ns in each group, here 2 and 1) repeaed wih khz a) b) c) Fig. 1 Illusraion of picked (black) pulse paerns ou of he 50 MHz pulse rain (gray) from he oscillaor. The user can choose beween single pulses (a), a group (b) and sequences (c) Lumera Laser GmbH; Opelsr. 10; D Kaiserslauern 5

3 A more deailed descripion of he pulse picker, including he advanced inernal and exernal riggering is given in a laer chaper 2.3. Amplificaion In order o ge higher energies he seleced pulses are amplified in a ransien amplifier. The amplifier use he same gain maerial as he oscillaor, neodymium doped Vanadae, which is well known for a high gain cross secion leading o a very high amplificaion. The amplificaion facor can exceed 500, depending on he repeiion frequency of he pulse sequence and he seing in he pulse sequence. The energy of a ps pulse is increased from 60 nj (~3W, 50 MHz) o a maximum of more han 30 µj for less hen 10 khz. Addiional amplificaion sages can be supplied opionally Second Harmonic Generaion The opional second harmonic generaion (frequency doubling) occurs in nonlinear opical crysals. I is a mehod o generae a new laser beam ou of a fundamenal beam wih half he wavelengh of he fundamenal beam. In general, he frequency doubling efficiency in a nonlinear crysal is a funcion of he inensiy of he fundamenal radiaion squared. Since ps pulses already have a relaive high peak power he requiremens for frequency doubling are no very resricive (as in he case of doubling cw radiaion). Here, frequency doubling has low sensiiviy o passive losses and phase mismaching due o angular or emperaure mismaching. The inensiy of he amplified ps-pulses can lead o conversion efficiencies as high as 50%. Anoher advanage is he suppression of he fundamenal background radiaion which has, due o he square law, a very low conversion efficiency compared o he amplified ps-pulses. Therefore he frequency doubled beam has even far less background radiaion han he1064nm radiaion. 2.5 Third Harmonic Generaion The opional hird harmonic is generaed by sum-frequency-mixing of he fundamenal IR beam and he green beam in a nonlinear crysal. This sum-frequency-mixing generaes a laser oupu in he UV (355 nm, one hird of he fundamenal a 1064 nm) wih conversion efficiencies beer han 20% vs. IR Lumera Laser GmbH; Opelsr. 10; D Kaiserslauern 6

4 Wih he ps - laser RAPID i is possible o generae programmed pulse sequences (of one or wo pulses groups, each group may conain several ps-pulses wih 20ns separaion). The pulses are picked by an elecro - opic modulaor (EOM) or Pockels-cell, which is driven by digial delay generaors. The following secion describes he background of he pulse - picker and he driver elecronics. The pulse-picker is an elecro - opic modulaor (EOM): A fas high volage (HV) pulse is applied o he elecro - opical crysal ( Pockels cell ). Pockels cells are characerized by fas response, since he Pockels effec is largely an elecronic effec. I produces a linear change in refracive index when an elecric field is applied. The direcion of polarizaion of he ligh leaving he crysal is roaed. If he half wave volage for he paricular crysal is applied, a phase shif of π occurs, equal o a polarisaion roaion of 90. If he half wave volage is applied, he Pockels cell acs as a half wave plae roaing s-polarized ligh ino p-polarized ligh. In conjuncion wih a polarizer he ligh inensiy is modulaed wih he applied HV repeiion frequency (Fig. 31: Principle physics of pulse picking). This can be done very fas (ypical rise ime 5 ns) and wih a repeiion frequency (up o 500 khz), limied by he driver. Fig. 31: Principle physics of pulse picking (a) Mode-locked pulse rain. Characerisic imes: τ pulse widh of ps-pulse, T ime beween pulse-sequences (1/T= repeiion frequency). (b) Mode-locked pulse rain and HV pulses. (c) Seleced ps pulses. Time beween seleced pulses is T2. (d) Polarisaion of mode-locked rain of ps pulses. (e) HV pulses versus ime. (f) Roaed polarisaion for seleced ps pulses Lumera Laser GmbH; Opelsr. 10; D Kaiserslauern 33

5 Ampliude vs. ime (a) τ T (b) (c) T2 Polarizaion vs. ime (d) (e) (f) Fig. 32: Principle of pulse picking; polarisaion and ampliude of pulses vs ime 2006 Lumera Laser GmbH; Opelsr. 10; D Kaiserslauern 34

6 A special feaure of he RAPID laser is a so called double-swich, which generaes wo HV - pulses in one cycle. These HV - pulses can creae a sequence of wo groups of laser pulses, named A and B. Each sequence is riggered eiher by one exernal signal (TTL- Signal inpu on BNC - connecor Gae ) or by he inernal rigger. The iming for he wo evens A and B can be se separaely, so ha he user can define he delays and he number of pulses in each group. The skech of his iming is shown in Fig. 33. Fig. 33: E.g. Generaing pulse groups A (3 pulses) and B (2 pulses) by one exernal riggering signal on Gae inpu. The wo differen groups are named A and B. In his example group A has hree pulses and B wo pulses. The ime beween he pulses in he group is always 20 ns, which is he ime beween he pulses from he seed-laser. Afer geing he Sar 1 signal, which can be caused by he inernal rigger or an exernal TTL rigger signal on Gae, he laser wais he Delay Group A/B ime ill i begins o emi he pulses. The number of pulses in he group can be choose independenly for A (1,2,3..) and B (0,1,2..). A rigger - ou for exernal applicaion is produced on BNC - connecors Sync A and Sync B for each group. One can se he ime delay for he sync A/B oupu relaively o he firs pslaser pulse in Group A/B (minimum Delay Group A +0.1µs). The Delay Group A/B ime, he number of pulses N A and N B in he Groups A/B and he Sync A/B ime can all be se in he LUMERA LASER Rep Rae Conrol sofware (Chaper 4.2.4) Lumera Laser GmbH; Opelsr. 10; D Kaiserslauern 35

7 6 Mechanical Layou of RAPID Fig. 55: Mechanical layou of laser head (RAPID, 2W Version) 2006 Lumera Laser GmbH; Opelsr. 10; D Kaiserslauern 51

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