Diode lasers for sensor applications. Bernd Sumpf Ferdinand-Braun-Institut Lichtenwalde, October 18, 2012

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1 Diode lasers for sensor applications Bernd Sumpf Ferdinand-Braun-Institut Lichtenwalde, October 18, 2012

2 Outline 1. Diode Lasers Basic Properties 2. Diode Lasers for Sensor Applications Diode lasers with internal grating Diode lasers in external cavities Diode lasers as pump sources for non-linear frequency conversion Hybrid integrated laser module for ps- and ns-pulses 3. Summary 18/10/2012 2

3 Diode lasers Features Wide spectral range: 0.34 nm µm FBH: 630 nm µm High wall-plug efficiency Easy excitation Direct Modulation Small size Mechanical robustness Lifetime (> 10 7 h) Tuneability Current Temperature External grating Al x Ga 1-x As Ga x In 1-x P Compound Semiconductors Zn x Cd 1-x S Al x Ga 1-x N InP x As 1-x Ga x In 1-x As PbS x Se 1-x Pb x Cd 1-x S Pb x Sn 1-x Se Wavelength / µm 18/10/2012 3

4 Laser diodes: High Output Power Laser diode Coal-fired power plant Surface of the sun P = 20 W 200 µm x 2 µm Power density p = 5 MW / cm MW Same power density in a 12 cm cable 6 kw / cm 2 18/10/2012 4

5 voltage U / V output power P / W Laser Diodes: High efficiency Efficiency 73% Light bulb: < 5% Energy-saving lamp: < 20% C = 73 % conversion efficiency c current I /A /10/2012 5

6 optical power P / arb. units Laser Diodes: Narrow spectral linewidth min 10-6 µm 1.0 T = 25 C P = 400 mw µm wavelength / µm 3 cm Paris 880 km Berlin 18/10/2012 6

7 Overview: Fabrication Process of a Laser Diodes Deposition of very thin crystalline layers on a GaAs substrate Epitaxy Structuring of devices on the wafer Processing Separation of single devices Cleaving Mounting of devices on heat sinks Housing of devices 18/10/2012 7

8 Schematic view of a high-power DFB laser HR coating Design epitaxial structure First epitaxy Manufacturing of the grating e.g. using holographic eposure Second epitaxy Process Facet coating Mounting Ridge waveguide (RW) W RW = µm n eff 3x10-3 AR coating R f < 10-3 Resonator length L = mm Bragg Grating Period = nm Coupling coefficient = 1 10 cm -1 grating active layer 18/10/2012 8

9 Power P / mw 940 nm DFB lasers for H 2 O absorption spectroscopy Transmission measurement Laser Medium - 0 Det. Tuneable Laser Lambert-Beers-Law I ( ) I0 exp ( ) L 500 T = 20 C Threshold current I th = 35 ma Slope efficiency S = 0.9 W/A Maximum output power P max 500 mw Dips in the characteristic due to water absorption Current I / ma 18/10/2012 9

10 Relative intensity / arb. units 940 nm DFB laser: Absorptions spectroscopy of water vapour 0.6 Spectra calculated based on Lambert-Beers-law 0.5 Laser at 50 C 0.4 Comparison of calculated spectra to the data from the HITRAN database 0.3 Laser at 20 C Excellent agreement 0.2 Continuous tuning over 5 nm at one temperature 0.1 HITRAN Wavelength / nm 18/10/

11 Diode lasers in external cavities for Raman spectroscopy Raman measurement Laser Raman R Det. Fixed frequency laser (e.g. 488 nm, 671 nm, 785 nm) Spectral emission width: 10 cm -1 Spectral stability 1 cm -1 Well-established contact free method for material analysis, food safety control, clinical diagnostic. Excitation in the visual spectral range Advantages: Higher Raman signals due to a -4 dependence Resonance Raman Stokes lines in the maximum of the sensitivity of CCDs Disadvantages: Possible fluorescence background Shifted excitation Raman difference spectroscopy Spectral distance for SERDS SERDS 10 cm -1 P Raman Raman 18/10/

12 671 nm microsystem light source Gain medium: Broad area laser w = 30 µm, 60 µm, 100 µm; L = 2 mm Output power up to 1.5 W Resonator Front facet of the diode laser and Reflection Bragg Grating Emission width below 100 pm (10 cm -1 ) Active adjustment necessary RBG BA-Laser FAC + SAC FAC + SAC RBG Microoptics SAC FAC Diode Laser with R r 0.1% and R f = 1% FAC Microoptics SAC Microoptical bench (13 mm x 4 mm) IEEE Phot. Tech. Lett. Vol. 20(19), pp (2008). CuW-Submount 18/10/

13 671 nm module application in Raman-Spectroscopy Ethanol as analyte (A): Raman-signals spectrally resolved Fluorescent interference introduced (B) Laser dye Cresyl violet Application of SERDS successful (C) A B C 18/10/

14 Diode lasers in external cavity for interferometry Absolute distance interferometry (ADI) with 10-6 accuracy requires tunable red emitting diode lasers: Preferred wavelength 633 nm Single-mode operation Tuning range 50 pm (40 GHz) Determines the smallest measurement distance about 4 mm Narrow spectral line width 10 MHz (0.015 pm) Determines the maximal measurement distance about 15 m Output power 5 mw Current tunable, no moving parts Solution: ECDL with mode spacing larger the spectral width of the RBG RBG 50 pm n L 4 mm FP 50 pm - within RBGs spectral width only one mode! Narrow line width due to high quality resonator (High facet reflectivity) 18/10/

15 Scheme of the external cavity laser Single mode operation 34 pm, i.e. 25 GHz Emission line width (self-delayed heterodyne) Between mode hops smaller 10 MHz coherence length of 30 m At mode hop increase to about 15 MHz Side mode suppression ratio: Better than 25 db 18/10/

16 Diode lasers as pump sources for non-linear frequency conversion, e.g. SHG Low power application (25 mw) for Raman spectroscopy Non-linear frequency conversion Second Harmonic Generation (SHG) Pump source Distributed Feedback (DFB) RW Laser SHG-crystal periodically poled MgO:LiNbO 3 for 488 nm at 25 C RW-SHG-Waveguide (3 µm x 5 µm x 11.5 mm) higher efficiency Diode laser Microoptics WG-SHG-crystal Microoptics CuW-submount Microbench (25 mm x 5 mm) 18/10/

17 120µm Diode lasers for the generation of ps- and ns-pulses Ridge waveguide laser Methods: Ridge Gain switching Current injection Pulse length: 1 ns 1 s Q-switching Changing the properties of the laser cavity E.g. implentation of an absorber section Pulse length: 50 ps 150 ps Rep. Rate: up to 0.5 GHz µm Mode locking Coupling of longitudinal modes Passively (saturable absorber section) Actively Pulse length: 1 20 ps Resonator length determines the rep. rate in the GHz-range µm 18/10/

18 pulse power P / W intensity /a.u. Gain Switching DFB laser Geometry: L = 2 mm, W = 6 µm Pulse length 10 ns 1 ms; Rep. rate 1 MHz DFB laser with P opt = 2 W at I = 4 A MOPA system with up to P opt = 10 W 2 1 pulse = 10 ns f rep = 1 MHz L = 2 mm W = 6 m I th = 50 ma S = 0.70 W/A pulse current I / A time / ns I = 0.80 A P = 0.52 W I = 1.80 A P = 1.05 W I = 2.80 A P = 1.53 W I = 4.00 A P = 2.02 W 18/10/

19 intensity / a.u. Q-Switching Multi-Section RW- and DBR Lasers e.g. 3 section DBR laser with gain, absorber, and grating section length mm Current through gain section varied Output power can be modulated using the absorber section V SAB = -2.0 V; t mod = 1 ns; f rep = 40 MHz Pulse length Pulse power Amplified power: Widerstand zum Heizen DBR-Sektion 200µm 100 ps 300 mw 20 W µm Absorber Sektion 1500µm Gewinn-Sektion ma 200 ma 300 ma 400 ma 500mA 72ps 82ps 72ps 84ps 118ps time t / ns 18/10/

20 power / a.u. intensity / a.u. Monolythic devices for mode locking 4 section DBR-Laser DBR grating determines wavelength Fast saturable absorber for mode locking Passive and active mode locking possible DBR-Sektion Kavität Gewinn-Sektion Absorber Sektion µm µm 1500 µm 200µm Round trip: Pulse length Peak power: ~ 230 ps, rep. rate ~ 4.3 GHz ~ 8 ps, Jitter: < 1 ps 1 W at 8 ps Pulse length Rückfacette 10000µm Frontfacette 20 f active ML = 4.324GHz ACF ~13.0ps T = 20. C = -1.3V U abs I cav I gain = 180mA = 500mA FWHM; sech ~8.4ps time / ns time / ps 18/10/

21 MOPA system with tapered amplifier for Q-switched ps-pulses Master Oscillator: Q-switched DBR DBR Laser mit GaN Transistor Trapezverstärker mit GaN Transistor Power Amplifier: Tapered Laser Amplification of short pulses Maintaining Beam Quality Seperate Excitation of RW and Tapered Section DBR GaN Transistor 5x8x250 DBR2 SAB2 50mW... FBH XXXXX 1 100W GaN Transistor 5x8x500 TPA DBR1 SAB1 RWG1 200mW PRE1 TPA1 t 0.5-1ns Puls 0.5 A DC RW DC RW t< 2ns Puls 16A ECL ECL RW-Sektion Trapez-Sektion Generation of current pulses MO <1 ns, 1 A PA < 2 ns, 20 A Electronics also developed at FBH 18/10/

22 intensity / db intensity / a.u. Results: MOPA system for Q-switched ps-pulses Pulse length (FWHM) = 73 ps Pulse power: 20 W Wavelength defined by MO with emission width (FWHM ~ 0.2 nm) DBR: t puls, ~ 0.9ns t period = 25ns I g,cw = 300mA TPA: t puls, ~ 1.0ns t period = 400ns I Tpa,puls = 16A without seed pulse with seed pulse I RW,Tra = 50mA P gentec = 2.13mW P pulse = 12.2W I RW,Tra = 100mA P gentec = 2.76mW P pulse = 15.8W I RW,Tra = 50mA I RW,Tra = 100mA DBR: t puls, ~ 0.9ns t period = 25ns I g,cw = 300mA TPA: t puls, ~ 1.0ns t period = 400ns I Tpa,puls = 16A dB I RW,Tra = 200mA P gentec = 3.53mW P pulse = 20.2W I RW,Tra = 200mA 73ps wavelength / nm time / ns 18/10/

23 power / a.u. power / a.u. Pulse picking using tapered amplifier Basic principle: RW-section of TPA as selector Transparent or absorbing Controlled with GaN-HF-transistor Selectable duty cycle Amplification in tapered section master oscillator DBR cavity gain absorber 1cm f active ML = GHz time / ns pulse picker f/64 ~ 67MHz U HF transistor G D I rw S high frequency pulses (GHz) RW-section for gating Iamp low frequency pulses 1kHz - 100MHz amplifier section pulse picker element time / ns 18/10/

24 Pulse picker optical micro bench GaN high electron mobility transistor HEMT HF Ansteuerung Modenkopplung HF Ansteuerung Pulspicker Pulspicker Integeration of optical elements high-frequency electronics 500 ma current pulses 200 ps pulse width Adjustable rep.rate 1cm DBR Laser 1 khz 333 MHz Jitter smaller 25 ps Small inductivity short wires Pulspicker mit HF Transistor Auskoppeloptiken 18/10/

25 Summary and Acknowledgments Diode lasers: Compact, reliable, high-power light sources for different applications Features can be optimized with respect to the application: Wavelength Power Emission width Beam quality Pulse parameter Acknowledgments: All colleagues at the FBH Colleague at the Technische Universität Berlin (Agr. Laserspektroscopy) Financial Support: Zukunftsfond Berlin Deutsche Forschungsgemeinschaft Bundesministerium für Bildung und Forschung Europäische Gemeinschaft 18/10/

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