Enhanced Emitter Transit Time for Heterojunction Bipolar Transistors (HBT)

Size: px
Start display at page:

Download "Enhanced Emitter Transit Time for Heterojunction Bipolar Transistors (HBT)"

Transcription

1 Advances in Electrical Engineering Systems (AEES)` 196 Vol. 1, No. 4, 2013, ISSN X Copyright World Science Publisher, United States Enhanced Emitter Transit Time for Heterojunction Bipolar Transistors (HBT) 1 Mazharul Huq Chowdhury, 2 Mohammad Saad Alam 1 Nxteer Automotive, Saginaw, MI, USA *2 Auburn Hills, MI, USA saadphd@gmail.com Abstract Simulation results are presented to study the performance of improved emitter transit time using AlGaAs-GaInP composite emitter heterojunction bipolar transistor (HBT). This composite emitter HBT shows significant reduction of emitter- base capacitance C BE and improved high frequency performance. In our simulation we use Medici (2-D simulator) as a simulator. The composite emitter HBT has been compared with the conventional HBT. Results show superior performance of the composite emitter design over conventional one in terms of reduced C BE. The C BE achieved with the composite emitter design was 55% lower compared to conventional designs. However, there are no variations with the collector current which provides enhanced frequency response for a composite emitter design. Keywords emitter transit time, composite emitter heterojunction bipolar transistor, performance, enhanced frequency 1. INTRODUCTION For next generation optical communication, GaInP/GaAs heterojunction bipolar transistors (HBTs) are suitable due to their high reliability, high speed, high power capacity and high reliability. GaInP/GaAs HBTs offer significant advantages over AlGaAs/GaAs devices such as large valance band discontinuity (high electron injection efficiency), high etching selectivity between GaInP/GaAs (increases yield), low surface recombination velocity (lower noise) [1]-[2]. GaInP/GaAs HBTs do not suffer from impurities related to oxygen and thus improve the mean time failure (MIF) [3]. A very good microwave performance of GaInP HBT has been achieved (cut off frequency, f T = 140 GHz and f max = 230 GHz) using various designs such as collector under cut, tunnelling emitter and strained InGaAs base [3]-[6]. However, a common disadvantage in high speed performance of HBTs has been their large base-emitter capacitance (C BE ). This high baseemitter capacitance is caused by limited mobile carrier transport and thus charge accumulation in emitter region [7]. A low base-emitter capacitance has been reported at low collector current density (J C ) by using lightly doped emitter [8]. However, it does not solve the problem at high current density in conventional HBTs. Mobile carrier transport takes place in conventional HBT by diffusion through the base-emitter region. This causes a charge accumulation in the emitter and increased the base-emitter capacitance (C BE ). To reduce this effect a composite emitter design has been reported [9] - [10]. In this work, MEDICI simulation results of a composite emitter design (AlGaAs/GaAs) have been presented which allows significant reduction of C BE and thus improved the high frequency performance. In this design, a graded AlGaAs layer forms an electron launcher at the interface with a GaInP layer. The electron launcher injects the electron towards the emitter with high velocity which lowers the free carrier concentration in base-emitter junction and reduces the C BE. This low carrier concentration is achieved without degradation of transconductance because of the high electron velocity in the launcher region. Therefore, the overall performance is improved compared to the conventional HBT design. 2. Composite emitter HBT design In a composite emitter design a graded layer of AlGaAs is introduced which acts as an electron launcher at the interface with GaInP layer. This launcher layer injects electrons with a very high velocity into a GaInP layer and ensures that electrons have very high velocity before they enter into the base region. This creates a low free carrier concentration in the emitter and hence the transit time (τ E ) decreased. In this composite emitter design the GaInP emitter layer blocks the holes to get back into the emitter and separated

2 Mazharul Huq Chowdhury, et al., AEES, Vol. 1, No. 4, pp , the electron launched region from the base region and by this base-emitter capacitance (CBE) is decreased. Figure.1 shows the structure of a conventional HBT design which is used in this work to compare the performance with the composite structure. Conventional HBT starts from emitter cap of n-type GaInP with concentration of cm -3 with the thickness of 700 A. Then there is a 2000 A thick layer of emitter which is n-type and concentration of cm -3. After this there is a blocker layer of 2000 A of n-type GaInP with concentration of cm -3. This layer provides high frequency performance. After this there is a base layer of p-type GaAs of 600 A thickness and having Figure 2. Structure of composite emitter GaInP/GaAs HBT design By using this composition an electron launcher is made with a height of ev. Next to this layer there is a layer of un-doped GaInP with thickness of 100 A. The undoped GaInP layer reduces the spikes created in the conduction band of AlGaAs-GaInP interface. Next to this there is a 400 A thick n-type GaInP layer with a concentration of cm -3 which acts as an emitter region. After this there is a base region of 500 A of GaAs with a concentration of cm -3. The last layer is n-type GaAs of 7000 A thick with a concentration of cm - 3. It acts as a collector region. In this design there is also an emitter cap of n-type GaInP of 700 A thick with concentration of cm -3. Figure 1. Structure of conventional GaInP/GaAs HBT design concentration of cm -3. And at the end there is a layer of 7000 A thickness of n-type GaAs with concentration of cm -3 and it acts as a collector region. On the other hand, in a composite emitter HBT design (Figure. 2) there is a layer of AlGaAs with a concentration of cm -3. The aluminum (Al) composition is chosen as 0.22 to prevent inter valley scattering. 3. Medici simulation study of conventional and conventional and composite emitter GaInP/GaAs design In our simulation we have used Medici as a simulator. Medici is a 2D device simulator that can model the electrical, thermal and optical characteristics of semiconductor devices such as MOSFETs, BJTs, HBTs, and power devices, IGBTs, HEMTs, CCDs, photo detectors. It solves Poisson s, Thermal, Current-Continuity and Energy-Balance equations for electron and hole. We consider the following assumptions for our simulation through MEDICI- 1. In 0.49 Ga 0.51 P is chosen as a spacer layer. About 92% of the band gap differences transforms to a positive valence band offset. 2. Current under thermionic field emission is designed as thermionic current multiplied by tunnelling coefficient (HJTEM used as ICCG parameter in Medici). 3. To make ohmic contacts polysilicon is used. It increases gain by reduction in IPE (recombination velocity).

3 Mazharul Huq Chowdhury, et al., AEES, Vol. 1, No. 4, pp , In un-doped regions the concentration is about cm -3 (which is default value in Medici) 5. In Medici eg.model is chosen as 4 as our layer designing is considered to be as compound semiconductor material. Figure 3 shows the energy band diagram of Conventional Emitter and composite emitter of GaInP/GaAs HBT. In composite emitter design, there is a notch created in bas-emitter region which helps electron to tunnel through the emitter region quickly. This quick movement of electron through the emitter region reduces the free carrier concentration in the base-emitter region and improves frequency response by decreasing base-emitter capacitance, C BE. design HBT has been presented in Figure. 4. In a composite design at x= 0.35 µm distance there is a very high electric field of 200Kv/cm as compared to 5Kv/cm electric field present in conventional design. This high electric field helps electron to move quickly through the emitter region before they reach base region. This lowers the free electron concentration in base-emitter junction and thus reduces the C BE. On contrary, there is low electric field in the emitter of the conventional emitter HBT design. Therefore carriers move slowly through the base-emitter junction and accumulate in the base-emitter junction. This increases the electron density in the base-emitter junction and also increases the base-emitter capacitance, C BE. Figure 3. Energy band diagram of Conventional emitter GaInP/GaAs HBT Composite emitter GaInP/GaAs HBT Electric fields are very strong in a composite emitter design compare to the conventional emitter design. The electric field versus distance profile for GaInP/GaAs conventional emitter design HBT and composite emitter Figure 4. Electric field Conventional GaInP/GaAs HBT Composite emitter GaInP/GaAs HBT The drift velocity of compositionally graded AlGaAs design has been presented in Figure. 5. This figure emphasis on enhancement of velocity of composite design which improves frequency characteristics. In the case of conventional emitter design the electron velocity is lower as compare to composite emitter design (Figure. 5). The

4 Mazharul Huq Chowdhury, et al., AEES, Vol. 1, No. 4, pp , high electric field value in composite design speeds up the electron mean velocity to cm/s at x= 0.35 µm distance which is very high as compared to cm/s of conventional design. From the simulations results it is apparent that the that C BE for composite emitter design is very small as compared to conventional emitter HBT because of stronger electric fields in composite emitter design (Figure 4. and 5). The C BE of composite emitter HBT s is lower as compared to conventional emitter HBT design. This leads to enhancement of frequency response of composite emitter design. It has been found that for collector current, Ic=1 µamp/µm composite design gives out collector can be used for the same breakdown voltage and thus reduces the size of the device. On the other hand, narrow bandgap material ensures high carrier mobility through the device and this will further improve the transit time of the device. Figure 6. C BE versus Collector current conventional emitter GaInP/GaAs HBT composite emitter GaInP/GaAs HBT 4. Conclusion Figure 5. Electron mean velocity Conventional emitter GaInP/GaAs HBT Composite emitter GaInP/GaAs HBT 1.2 µf capacitance which is about 55% smaller than that value of 2.7 µf in conventional design (Figure. 6). The proposed model can be improved by using composite collector which is the combination of both wide and narrow bandgap materials. The wide bandgap material provides high breakdown voltage. Therefore, a thinner Simulation results are presented for both conventional and composite emitter AlGaAs/GaInP HBT design. Both the composite and conventional emitter HBT have been studied and analyzed on the basis of MEDICI simulator. The characteristics of composite emitter designs are found very superior as compared to conventional design in terms of low base-emitter capacitance. The base-emitter capacitance, C BE for a composite emitter design is found to be 55% lower compared to conventional emitter design. This lower base-emitter capacitance enhances frequency performance as carriers move faster through the device.

5 Mazharul Huq Chowdhury, et al., AEES, Vol. 1, No. 4, pp , References [1] Y-J. Chan, D. Pavlidis, M. Razeghi and F. Omnes, DC and Microwave Characteristics of GaInP/GaAs HEMT's Suitable for Cryogenic Operation, in: 16th International Symposium on GaAs and Related Compounds, Karuizawa, Japan, [2] P. Asbek, III-V HBTs for microwave applications: technology status and modeling challenges, in: Proc. Bipolar/BiCMOS circuits and technology meeting, Minneapolis, MN, [3] T. Takahashi, S. Sasa, A. Kawano, T. Iwai, and T. Fujii, High-Reliability InGaP/GaAs HBTs Fabricated by Self- Aligned Process, in: the Proceedings of the IEEE International Electron Device Meeting (IEDM), [4] C. C. Wu and S. S. Lu, High performance InGaP/GaAs tunnelling Emitter bipolar transistors, Jpn. J. Appl. Phys, 32 (1993) [5] D. A. Ahmari, M. T. Fresina, Q. J. Hartman, D. W. Barlage, P. J. Mares, M. Feng, and G. E. Stillman, High speed InGaP/GaAs HBT s with a strained InGaAs base, IEEE Electron Device Lett., 17 (1996) [6] W. L. Chen, H. F. Chau, M. Tutt, M. C. Ho, T. S. Kim, and T. Henderson, High-speed InGaP/GaAs HBT s using a simple collector under cut technique to reduce basecollector capacitance, IEEE Electron Device Lett., 18 (1997) [7] J. M. M. Rios, L. M. Lunardi, S. Chandrasekhar, and Y. Miyamoto, Self-consistent method for complete smallsignal parameter extraction of InP-based heterojunction bipolar transistors, IEEE Trans. Microwave Theory Tech., 45 (1997) [8] C. E. Chang, P. M. Asbeck, L. T. Tran, D. C. Streit, and A. K. Oki, Novel HBT structure for high f at low current density, in: IEDM Tech. Dig., [9] J. Hu, Q. M. Zhang, R. K. Surridge, J. M. Xu, and D. Pavlidis, A new Emitter design of InGaP/GaAs HBT s for high frequency applications, IEEE Electron Device Lett., 14 (1993) [10] J. Park, D. Pavlidis, S. Mohammadi, J. C. Garcia, Improved Emitter Transit Time using AlGaAs-GaInP Composite Emitter in GaInP/GaAs Heterojunction Bipolar Transistors, IEEE Electron Device Lett., 48 (2001)

DC Analysis of InP/GaAsSb DHBT Device Er. Ankit Sharma 1, Dr. Sukhwinder Singh 2

DC Analysis of InP/GaAsSb DHBT Device Er. Ankit Sharma 1, Dr. Sukhwinder Singh 2 IOSR Journal of Electronics and Communication Engineering (IOSR-JECE) e-issn: 2278-2834,p- ISSN: 2278-8735.Volume 10, Issue 5, Ver. I (Sep - Oct.2015), PP 48-52 www.iosrjournals.org DC Analysis of InP/GaAsSb

More information

Chapter 1. Introduction

Chapter 1. Introduction Chapter 1 Introduction 1.1 Introduction of Device Technology Digital wireless communication system has become more and more popular in recent years due to its capability for both voice and data communication.

More information

AC Analysis of InP/GaAsSb DHBT Device 1 Er. Ankit Sharma, 2 Dr. Sukhwinder Singh 1

AC Analysis of InP/GaAsSb DHBT Device 1 Er. Ankit Sharma, 2 Dr. Sukhwinder Singh 1 American International Journal of Research in Science, Technology, Engineering & Mathematics Available online at http://www.iasir.net ISSN (Print): 2328-3491, ISSN (Online): 2328-3580, ISSN (CD-ROM): 2328-3629

More information

Review Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination

Review Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination Review Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination Current Transport: Diffusion, Thermionic Emission & Tunneling For Diffusion current, the depletion layer is

More information

Chapter 6. Silicon-Germanium Technologies

Chapter 6. Silicon-Germanium Technologies Chapter 6 licon-germanium Technologies 6.0 Introduction The design of bipolar transistors requires trade-offs between a number of parameters. To achieve a fast base transit time, hence achieving a high

More information

Lecture 18: Photodetectors

Lecture 18: Photodetectors Lecture 18: Photodetectors Contents 1 Introduction 1 2 Photodetector principle 2 3 Photoconductor 4 4 Photodiodes 6 4.1 Heterojunction photodiode.................... 8 4.2 Metal-semiconductor photodiode................

More information

An Overview of InP/GaAsSb/InP DHBT in Millimeter and Sub-millimeter Range

An Overview of InP/GaAsSb/InP DHBT in Millimeter and Sub-millimeter Range An Overview of InP/GaAsSb/InP DHBT in Millimeter and Sub-millimeter Range 1 Er. Ankit Sharma, 2 Dr. Sukhwinder Singh 1 Research Scholar PEC University Of Technology, Chandigarh INDIA 2 Supervisor, Assistant

More information

High Power Performance InP/InGaAs Single HBTs

High Power Performance InP/InGaAs Single HBTs High Power Performance InP/InGaAs Single HBTs D Sawdai, K Hong, A Samelis, and D Pavlidis Solid-State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of

More information

CONTENTS. 2.2 Schrodinger's Wave Equation 31. PART I Semiconductor Material Properties. 2.3 Applications of Schrodinger's Wave Equation 34

CONTENTS. 2.2 Schrodinger's Wave Equation 31. PART I Semiconductor Material Properties. 2.3 Applications of Schrodinger's Wave Equation 34 CONTENTS Preface x Prologue Semiconductors and the Integrated Circuit xvii PART I Semiconductor Material Properties CHAPTER 1 The Crystal Structure of Solids 1 1.0 Preview 1 1.1 Semiconductor Materials

More information

InGaP/GaAsSb/GaAs DHBTs with low turn-on voltage and high current gain. Yan, BP; Hsu, CC; Wang, XQ; Bai, YK; Yang, ES

InGaP/GaAsSb/GaAs DHBTs with low turn-on voltage and high current gain. Yan, BP; Hsu, CC; Wang, XQ; Bai, YK; Yang, ES Title InGaP/GaAsSb/GaAs DHBTs with low turn-on voltage and high current gain Author(s) Yan, BP; Hsu, CC; Wang, XQ; Bai, YK; Yang, ES Citation Conference Proceedings - International Conference On Indium

More information

Department of Electrical Engineering IIT Madras

Department of Electrical Engineering IIT Madras Department of Electrical Engineering IIT Madras Sample Questions on Semiconductor Devices EE3 applicants who are interested to pursue their research in microelectronics devices area (fabrication and/or

More information

PHYSICS OF SEMICONDUCTOR DEVICES

PHYSICS OF SEMICONDUCTOR DEVICES PHYSICS OF SEMICONDUCTOR DEVICES PHYSICS OF SEMICONDUCTOR DEVICES by J. P. Colinge Department of Electrical and Computer Engineering University of California, Davis C. A. Colinge Department of Electrical

More information

NOVEL 4H-SIC BIPOLAR JUNCTION TRANSISTOR (BJT) WITH IMPROVED CURRENT GAIN

NOVEL 4H-SIC BIPOLAR JUNCTION TRANSISTOR (BJT) WITH IMPROVED CURRENT GAIN NOVEL 4H-SIC BIPOLAR JUNCTION TRANSISTOR (BJT) WITH IMPROVED CURRENT GAIN Thilini Daranagama 1, Vasantha Pathirana 2, Florin Udrea 3, Richard McMahon 4 1,2,3,4 The University of Cambridge, Cambridge, United

More information

Semiconductor Devices

Semiconductor Devices Semiconductor Devices Modelling and Technology Source Electrons Gate Holes Drain Insulator Nandita DasGupta Amitava DasGupta SEMICONDUCTOR DEVICES Modelling and Technology NANDITA DASGUPTA Professor Department

More information

Fundamentals of Power Semiconductor Devices

Fundamentals of Power Semiconductor Devices В. Jayant Baliga Fundamentals of Power Semiconductor Devices 4y Spri ringer Contents Preface vii Chapter 1 Introduction 1 1.1 Ideal and Typical Power Switching Waveforms 3 1.2 Ideal and Typical Power Device

More information

InP-based Complementary HBT Amplifiers for use in Communication Systems

InP-based Complementary HBT Amplifiers for use in Communication Systems InP-based Complementary HBT Amplifiers for use in Communication Systems Donald Sawdai and Dimitris Pavlidis Solid-State Electronics Laboratory Department of Electrical Engineering and Computer Science

More information

FABRICATION AND CHARACTERIZATION OF RESONANT CAVITY LIGHT-EMITTING TRANSISTORS MICHAEL E. LIU THESIS

FABRICATION AND CHARACTERIZATION OF RESONANT CAVITY LIGHT-EMITTING TRANSISTORS MICHAEL E. LIU THESIS FABRICATION AND CHARACTERIZATION OF RESONANT CAVITY LIGHT-EMITTING TRANSISTORS BY MICHAEL E. LIU THESIS Submitted in partial fulfillment of the requirements for the degree of Master of Science in Electrical

More information

Investigations on Compound Semiconductor High Electron Mobility Transistor (HEMT)

Investigations on Compound Semiconductor High Electron Mobility Transistor (HEMT) Investigations on Compound Semiconductor High Electron Mobility Transistor (HEMT) Nov. 26, 2004 Outline I. Introduction: Why needs high-frequency devices? Why uses compound semiconductors? How to enable

More information

LEDs, Photodetectors and Solar Cells

LEDs, Photodetectors and Solar Cells LEDs, Photodetectors and Solar Cells Chapter 7 (Parker) ELEC 424 John Peeples Why the Interest in Photons? Answer: Momentum and Radiation High electrical current density destroys minute polysilicon and

More information

Microwave Semiconductor Devices

Microwave Semiconductor Devices INDEX Avalanche breakdown, see reverse breakdown, Avalanche condition, 61 generalized, 62 Ballistic transport, 322, 435, 450 Bandgap, III-V-compounds, 387 Bandgap narrowing, Si, 420 BARITT device, 111,

More information

Review of III-V Based High Electron Mobility Transistors

Review of III-V Based High Electron Mobility Transistors IOSR Journal of Engineering (IOSRJEN) ISSN (e): 2250-3021, ISSN (p): 2278-8719 Vol. 05, Issue 04 (April. 2015), V2 PP 13-17 www.iosrjen.org Review of III-V Based High Electron Mobility Transistors Jun

More information

HOT ELECTRON INJECTION EFFECT AND IMPROVED LINEARITY IN TYPE-I/II DHBT FOR MILLIMETER-WAVE MIXED SIGNAL CIRCUIT APPLICATIONS KUANG-YU CHENG

HOT ELECTRON INJECTION EFFECT AND IMPROVED LINEARITY IN TYPE-I/II DHBT FOR MILLIMETER-WAVE MIXED SIGNAL CIRCUIT APPLICATIONS KUANG-YU CHENG HOT ELECTRON INJECTION EFFECT AND IMPROVED LINEARITY IN TYPE-I/II DHBT FOR MILLIMETER-WAVE MIXED SIGNAL CIRCUIT APPLICATIONS BY KUANG-YU CHENG DISSERTATION Submitted in partial fulfillment of the requirements

More information

RF and Microwave Semiconductor Technologies

RF and Microwave Semiconductor Technologies RF and Microwave Semiconductor Technologies Muhammad Fahim Ul Haque, Department of Electrical Engineering, Linköping University muhha@isy.liu.se Note: 1. This presentation is for the course of State of

More information

A GaAs/AlGaAs/InGaAs PSEUDOMORPHIC HEMT STRUCTURE FOR HIGH SPEED DIGITAL CIRCUITS

A GaAs/AlGaAs/InGaAs PSEUDOMORPHIC HEMT STRUCTURE FOR HIGH SPEED DIGITAL CIRCUITS IJRET: International Journal of Research in Engineering and Technology eissn: 239-63 pissn: 232-738 A GaAs/AlGaAs/InGaAs PSEUDOMORPHIC HEMT STRUCTURE FOR HIGH SPEED DIGITAL CIRCUITS Parita Mehta, Lochan

More information

A New SiGe Base Lateral PNM Schottky Collector. Bipolar Transistor on SOI for Non Saturating. VLSI Logic Design

A New SiGe Base Lateral PNM Schottky Collector. Bipolar Transistor on SOI for Non Saturating. VLSI Logic Design A ew SiGe Base Lateral PM Schottky Collector Bipolar Transistor on SOI for on Saturating VLSI Logic Design Abstract A novel bipolar transistor structure, namely, SiGe base lateral PM Schottky collector

More information

Proposal and Design of SALTran: A New Surface Accumulation Layer Transistor for Enhanced Current Gain

Proposal and Design of SALTran: A New Surface Accumulation Layer Transistor for Enhanced Current Gain Proposal and Design of SALTran: A New Surface Accumulation Layer Transistor for Enhanced Current Gain A dissertation submitted in partial fulfillment of the requirement for the degree of Master of Science

More information

A STUDY INTO THE APPLICABILITY OF P + N + (UNIVERSAL CONTACT) TO POWER SEMICONDUCTOR DIODES AND TRANSISTORS FOR FASTER REVERSE RECOVERY

A STUDY INTO THE APPLICABILITY OF P + N + (UNIVERSAL CONTACT) TO POWER SEMICONDUCTOR DIODES AND TRANSISTORS FOR FASTER REVERSE RECOVERY Thesis Title: Name: A STUDY INTO THE APPLICABILITY OF P + N + (UNIVERSAL CONTACT) TO POWER SEMICONDUCTOR DIODES AND TRANSISTORS FOR FASTER REVERSE RECOVERY RAGHUBIR SINGH ANAND Roll Number: 9410474 Thesis

More information

Modelling Electronic Characteristic of InP/InGaAs Double Heterojunction Bipolar Transistor

Modelling Electronic Characteristic of InP/InGaAs Double Heterojunction Bipolar Transistor International Journal of Electrical and Computer Engineering (IJECE) Vol. 5, No. 3, June 2015, pp. 525~530 ISSN: 2088-8708 525 Modelling Electronic Characteristic of InP/InGaAs Double Heterojunction Bipolar

More information

ECE 440 Lecture 29 : Introduction to the BJT-I Class Outline:

ECE 440 Lecture 29 : Introduction to the BJT-I Class Outline: ECE 440 Lecture 29 : Introduction to the BJT-I Class Outline: Narrow-Base Diode BJT Fundamentals BJT Amplification Things you should know when you leave Key Questions How does the narrow-base diode multiply

More information

HIGH-SPEED TYPE-II GaAsSb/InP DHBTs FOR MIXED-SIGNAL IC APPLICATIONS HUIMING XU DISSERTATION

HIGH-SPEED TYPE-II GaAsSb/InP DHBTs FOR MIXED-SIGNAL IC APPLICATIONS HUIMING XU DISSERTATION HIGH-SPEED TYPE-II GaAsSb/InP DHBTs FOR MIXED-SIGNAL IC APPLICATIONS BY HUIMING XU DISSERTATION Submitted in partial fulfillment of the requirements for the degree of Doctor of Philosophy in Electrical

More information

Lecture 24: Bipolar Junction Transistors (1) Bipolar Junction Structure, Operating Regions, Biasing

Lecture 24: Bipolar Junction Transistors (1) Bipolar Junction Structure, Operating Regions, Biasing Lecture 24: Bipolar Junction Transistors (1) Bipolar Junction Structure, Operating Regions, Biasing BJT Structure the BJT is formed by doping three semiconductor regions (emitter, base, and collector)

More information

MSE 410/ECE 340: Electrical Properties of Materials Fall 2016 Micron School of Materials Science and Engineering Boise State University

MSE 410/ECE 340: Electrical Properties of Materials Fall 2016 Micron School of Materials Science and Engineering Boise State University MSE 410/ECE 340: Electrical Properties of Materials Fall 2016 Micron School of Materials Science and Engineering Boise State University Practice Final Exam 1 Read the questions carefully Label all figures

More information

Equivalent circuit modeling of InP/InGaAs Heterojunction Phototransistor for application of Radio-on-fiber systems

Equivalent circuit modeling of InP/InGaAs Heterojunction Phototransistor for application of Radio-on-fiber systems Equivalent circuit modeling of InP/InGaAs Heterojunction Phototransistor for application of Radio-on-fiber systems Jae-Young Kim The Graduate School Yonsei University Department of Electrical and Electronic

More information

General look back at MESFET processing. General principles of heterostructure use in FETs

General look back at MESFET processing. General principles of heterostructure use in FETs SMA5111 - Compound Semiconductors Lecture 11 - Heterojunction FETs - General HJFETs, HFETs Last items from Lec. 10 Depletion mode vs enhancement mode logic Complementary FET logic (none exists, or is likely

More information

Modelling and Analysis of Four-Junction Tendem Solar Cell in Different Environmental Conditions Mr. Biraju J. Trivedi 1 Prof. Surendra Kumar Sriwas 2

Modelling and Analysis of Four-Junction Tendem Solar Cell in Different Environmental Conditions Mr. Biraju J. Trivedi 1 Prof. Surendra Kumar Sriwas 2 IJSRD - International Journal for Scientific Research & Development Vol. 3, Issue 08, 2015 ISSN (online): 2321-0613 Modelling and Analysis of Four-Junction Tendem Solar Cell in Different Environmental

More information

Lecture Course. SS Module PY4P03. Dr. P. Stamenov

Lecture Course. SS Module PY4P03. Dr. P. Stamenov Semiconductor Devices - 2013 Lecture Course Part of SS Module PY4P03 Dr. P. Stamenov School of Physics and CRANN, Trinity College, Dublin 2, Ireland Hilary Term, TCD 01 st of Feb 13 Diode Current Components

More information

Key Questions. ECE 340 Lecture 39 : Introduction to the BJT-II 4/28/14. Class Outline: Fabrication of BJTs BJT Operation

Key Questions. ECE 340 Lecture 39 : Introduction to the BJT-II 4/28/14. Class Outline: Fabrication of BJTs BJT Operation Things you should know when you leave ECE 340 Lecture 39 : Introduction to the BJT-II Fabrication of BJTs Class Outline: Key Questions What elements make up the base current? What do the carrier distributions

More information

Small-Signal Analysis and Direct S-Parameter Extraction

Small-Signal Analysis and Direct S-Parameter Extraction Small-Signal Analysis and Direct S-Parameter Extraction S. Wagner, V. Palankovski, T. Grasser, R. Schultheis*, and S. Selberherr Institute for Microelectronics, Technical University Vienna, Gusshausstrasse

More information

Section 2.3 Bipolar junction transistors - BJTs

Section 2.3 Bipolar junction transistors - BJTs Section 2.3 Bipolar junction transistors - BJTs Single junction devices, such as p-n and Schottkty diodes can be used to obtain rectifying I-V characteristics, and to form electronic switching circuits

More information

NAME: Last First Signature

NAME: Last First Signature UNIVERSITY OF CALIFORNIA, BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences EE 130: IC Devices Spring 2003 FINAL EXAMINATION NAME: Last First Signature STUDENT

More information

Davinci. Semiconductor Device Simulaion in 3D SYSTEMS PRODUCTS LOGICAL PRODUCTS PHYSICAL IMPLEMENTATION SIMULATION AND ANALYSIS LIBRARIES TCAD

Davinci. Semiconductor Device Simulaion in 3D SYSTEMS PRODUCTS LOGICAL PRODUCTS PHYSICAL IMPLEMENTATION SIMULATION AND ANALYSIS LIBRARIES TCAD SYSTEMS PRODUCTS LOGICAL PRODUCTS PHYSICAL IMPLEMENTATION SIMULATION AND ANALYSIS LIBRARIES TCAD Aurora DFM WorkBench Davinci Medici Raphael Raphael-NES Silicon Early Access TSUPREM-4 Taurus-Device Taurus-Lithography

More information

Introduction to semiconductor technology

Introduction to semiconductor technology Introduction to semiconductor technology Outline 7 Field effect transistors MOS transistor current equation" MOS transistor channel mobility Substrate bias effect 7 Bipolar transistors Introduction Minority

More information

ANISOTYPE GaAs BASED HETEROJUNCTIONS FOR III-V MULTIJUNCTION SOLAR CELLS

ANISOTYPE GaAs BASED HETEROJUNCTIONS FOR III-V MULTIJUNCTION SOLAR CELLS ANISOTYPE Ga BASED HETEROJUNCTIONS FOR III-V MULTIJUNCTION SOLAR CELLS A.S. Gudovskikh 1,*, K.S. Zelentsov 1, N.A. Kalyuzhnyy 2, V.M. Lantratov 2, S.A. Mintairov 2 1 Saint-Petersburg Academic University

More information

Optodevice Data Book ODE I. Rev.9 Mar Opnext Japan, Inc.

Optodevice Data Book ODE I. Rev.9 Mar Opnext Japan, Inc. Optodevice Data Book ODE-408-001I Rev.9 Mar. 2003 Opnext Japan, Inc. Section 1 Operating Principles 1.1 Operating Principles of Laser Diodes (LDs) and Infrared Emitting Diodes (IREDs) 1.1.1 Emitting Principles

More information

MOSFET short channel effects

MOSFET short channel effects MOSFET short channel effects overview Five different short channel effects can be distinguished: velocity saturation drain induced barrier lowering (DIBL) impact ionization surface scattering hot electrons

More information

CHAPTER I INTRODUCTION

CHAPTER I INTRODUCTION CHAPTER I INTRODUCTION High performance semiconductor devices with better voltage and current handling capability are required in different fields like power electronics, computer and automation. Since

More information

Proposal of Novel Collector Structure for Thin-wafer IGBTs

Proposal of Novel Collector Structure for Thin-wafer IGBTs 12 Special Issue Recent R&D Activities of Power Devices for Hybrid ElectricVehicles Research Report Proposal of Novel Collector Structure for Thin-wafer IGBTs Takahide Sugiyama, Hiroyuki Ueda, Masayasu

More information

PN Junction in equilibrium

PN Junction in equilibrium PN Junction in equilibrium PN junctions are important for the following reasons: (i) PN junction is an important semiconductor device in itself and used in a wide variety of applications such as rectifiers,

More information

High Performance Lateral Schottky Collector Bipolar Transistors on SOI for VLSI Applications

High Performance Lateral Schottky Collector Bipolar Transistors on SOI for VLSI Applications High Performance Lateral Schottky Collector Bipolar Transistors on SOI for VLSI Applications A dissertation submitted in partial fulfillment of the requirement for the degree of Master of Science (Research)

More information

A High Breakdown Voltage Two Zone Step Doped Lateral Bipolar Transistor on Buried Oxide Thick Step

A High Breakdown Voltage Two Zone Step Doped Lateral Bipolar Transistor on Buried Oxide Thick Step A High Breakdown Voltage Two Zone Step Doped Lateral Bipolar Transistor on Buried Oxide Thick Step Sajad A. Loan, S. Qureshi and S. Sundar Kumar Iyer Abstract----A novel two zone step doped (TZSD) lateral

More information

Simulation of GaAs MESFET and HEMT Devices for RF Applications

Simulation of GaAs MESFET and HEMT Devices for RF Applications olume, Issue, January February 03 ISSN 78-6856 Simulation of GaAs MESFET and HEMT Devices for RF Applications Dr.E.N.GANESH Prof, ECE DEPT. Rajalakshmi Institute of Technology ABSTRACT: Field effect transistor

More information

SYED AMMAL ENGINEERING COLLEGE

SYED AMMAL ENGINEERING COLLEGE SYED AMMAL ENGINEERING COLLEGE (Approved by the AICTE, New Delhi, Govt. of Tamilnadu and Affiliated to Anna University, Chennai) Established in 1998 - An ISO 9001:2008 Certified Institution Dr. E.M.Abdullah

More information

Luminous Equivalent of Radiation

Luminous Equivalent of Radiation Intensity vs λ Luminous Equivalent of Radiation When the spectral power (p(λ) for GaP-ZnO diode has a peak at 0.69µm) is combined with the eye-sensitivity curve a peak response at 0.65µm is obtained with

More information

SRM INSTITUTE OF SCIENCE AND TECHNOLOGY (DEEMED UNIVERSITY)

SRM INSTITUTE OF SCIENCE AND TECHNOLOGY (DEEMED UNIVERSITY) SRM INSTITUTE OF SCIENCE AND TECHNOLOGY (DEEMED UNIVERSITY) QUESTION BANK I YEAR B.Tech (II Semester) ELECTRONIC DEVICES (COMMON FOR EC102, EE104, IC108, BM106) UNIT-I PART-A 1. What are intrinsic and

More information

15 Transit Time and Tunnel NDR Devices

15 Transit Time and Tunnel NDR Devices 15 Transit Time and Tunnel NDR Devices Schematics of Transit-time NDR diode. A packet of carriers (e.g., electrons) is generated in a confined and narrow zone (generation region) and injected into the

More information

To appear in: Y.-S. Park et al., eds., Proceedings of WOFE-99, World Scientific, 2000.

To appear in: Y.-S. Park et al., eds., Proceedings of WOFE-99, World Scientific, 2000. To appear in: Y.-S. Park et al., eds., Proceedings of WOFE-99, World Scientific, 2000. VLSI-COMPATIBLE PROCESSING AND LOW-VOLTAGE OPERATION OF MULTIEMITTER Si/SiGe HETEROJUNCTION BIPOLAR TRANSISTORS A.

More information

3-7 Nano-Gate Transistor World s Fastest InP-HEMT

3-7 Nano-Gate Transistor World s Fastest InP-HEMT 3-7 Nano-Gate Transistor World s Fastest InP-HEMT SHINOHARA Keisuke and MATSUI Toshiaki InP-based InGaAs/InAlAs high electron mobility transistors (HEMTs) which can operate in the sub-millimeter-wave frequency

More information

Effects of a p n junction on heterojunction far infrared detectors

Effects of a p n junction on heterojunction far infrared detectors Infrared Physics & Technology 50 (2007) 274 278 www.elsevier.com/locate/infrared Effects of a p n junction on heterojunction far infrared detectors S.G. Matsik a, *, M.B.M. Rinzan a, A.G.U. Perera a, H.H.

More information

FUNDAMENTALS OF MODERN VLSI DEVICES

FUNDAMENTALS OF MODERN VLSI DEVICES 19-13- FUNDAMENTALS OF MODERN VLSI DEVICES YUAN TAUR TAK H. MING CAMBRIDGE UNIVERSITY PRESS Physical Constants and Unit Conversions List of Symbols Preface page xi xiii xxi 1 INTRODUCTION I 1.1 Evolution

More information

Power Bipolar Junction Transistors (BJTs)

Power Bipolar Junction Transistors (BJTs) ECE442 Power Semiconductor Devices and Integrated Circuits Power Bipolar Junction Transistors (BJTs) Zheng Yang (ERF 3017, email: yangzhen@uic.edu) Power Bipolar Junction Transistor (BJT) Background The

More information

Reliability of deep submicron MOSFETs

Reliability of deep submicron MOSFETs Invited paper Reliability of deep submicron MOSFETs Francis Balestra Abstract In this work, a review of the reliability of n- and p-channel Si and SOI MOSFETs as a function of gate length and temperature

More information

Gallium nitride (GaN)

Gallium nitride (GaN) 80 Technology focus: GaN power electronics Vertical, CMOS and dual-gate approaches to gallium nitride power electronics US research company HRL Laboratories has published a number of papers concerning

More information

Characterizing Fabrication Process Induced Effects in Deep Submicron PHEMT's Using Spectrally Resolved Light Emission Imaging

Characterizing Fabrication Process Induced Effects in Deep Submicron PHEMT's Using Spectrally Resolved Light Emission Imaging Characterizing Fabrication Process Induced Effects in Deep Submicron PHEMT's Using Spectrally Resolved Light Emission Imaging Zhuyi Wang, Weidong Cai, Mengwei Zhang and G.P. Li Department of Electrical

More information

CHAPTER 2 HEMT DEVICES AND BACKGROUND

CHAPTER 2 HEMT DEVICES AND BACKGROUND CHAPTER 2 HEMT DEVICES AND BACKGROUND 2.1 Overview While the most widespread application of GaN-based devices is in the fabrication of blue and UV LEDs, the fabrication of microwave power devices has attracted

More information

Semiconductor Device Physics and Simulation

Semiconductor Device Physics and Simulation Semiconductor Device Physics and Simulation MICRODEVICES Physics and Fabrication Technologies Series Editors: Ivor Brodie and Arden Sher SRI International Menlo Park, California Recent volumes in the series:

More information

Semiconductor Physics and Devices

Semiconductor Physics and Devices Metal-Semiconductor and Semiconductor Heterojunctions The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is one of two major types of transistors. The MOSFET is used in digital circuit, because

More information

Basic concepts. Optical Sources (b) Optical Sources (a) Requirements for light sources (b) Requirements for light sources (a)

Basic concepts. Optical Sources (b) Optical Sources (a) Requirements for light sources (b) Requirements for light sources (a) Optical Sources (a) Optical Sources (b) The main light sources used with fibre optic systems are: Light-emitting diodes (LEDs) Semiconductor lasers (diode lasers) Fibre laser and other compact solid-state

More information

Tunneling Field Effect Transistors for Low Power ULSI

Tunneling Field Effect Transistors for Low Power ULSI Tunneling Field Effect Transistors for Low Power ULSI Byung-Gook Park Inter-university Semiconductor Research Center and School of Electrical and Computer Engineering Seoul National University Outline

More information

Bipolar Junction Transistors (BJT)

Bipolar Junction Transistors (BJT) Bipolar Junction Transistors (BJT) deal Transistor Bipolar Transistor Terminals P Bipolar Transistor Physics Large Signal Model Early Effect Small Signal Model Reading: (Sedra, Smith, 7 th edition) 4.1

More information

InP-based Waveguide Photodetector with Integrated Photon Multiplication

InP-based Waveguide Photodetector with Integrated Photon Multiplication InP-based Waveguide Photodetector with Integrated Photon Multiplication D.Pasquariello,J.Piprek,D.Lasaosa,andJ.E.Bowers Electrical and Computer Engineering Department University of California, Santa Barbara,

More information

Improving the Breakdown Voltage, ON resistance and Gate charge of InGaAs LDMOS Power Transistors

Improving the Breakdown Voltage, ON resistance and Gate charge of InGaAs LDMOS Power Transistors Improving the Breakdown Voltage, ON resistance and Gate charge of InGaAs LDMOS Power Transistors M. Jagadesh Kumar and Avikal Bansal Department of Electrical Engineering, Indian Institute of Technology

More information

Prepared by: Dr. Rishi Prakash, Dept of Electronics and Communication Engineering Page 1 of 5

Prepared by: Dr. Rishi Prakash, Dept of Electronics and Communication Engineering Page 1 of 5 Microwave tunnel diode Some anomalous phenomena were observed in diode which do not follows the classical diode equation. This anomalous phenomena was explained by quantum tunnelling theory. The tunnelling

More information

Power MOSFET Zheng Yang (ERF 3017,

Power MOSFET Zheng Yang (ERF 3017, ECE442 Power Semiconductor Devices and Integrated Circuits Power MOSFET Zheng Yang (ERF 3017, email: yangzhen@uic.edu) Evolution of low-voltage (

More information

MICROWAVE ENGINEERING-II. Unit- I MICROWAVE MEASUREMENTS

MICROWAVE ENGINEERING-II. Unit- I MICROWAVE MEASUREMENTS MICROWAVE ENGINEERING-II Unit- I MICROWAVE MEASUREMENTS 1. Explain microwave power measurement. 2. Why we can not use ordinary diode and transistor in microwave detection and microwave amplification? 3.

More information

Lecture 4 -- Tuesday, Sept. 19: Non-uniform injection and/or doping. Diffusion. Continuity/conservation. The five basic equations.

Lecture 4 -- Tuesday, Sept. 19: Non-uniform injection and/or doping. Diffusion. Continuity/conservation. The five basic equations. 6.012 ELECTRONIC DEVICES AND CIRCUITS Schedule -- Fall 1995 (8/31/95 version) Recitation 1 -- Wednesday, Sept. 6: Review of 6.002 models for BJT. Discussion of models and modeling; motivate need to go

More information

COE/EE152: Basic Electronics. Lecture 5. Andrew Selasi Agbemenu. Outline

COE/EE152: Basic Electronics. Lecture 5. Andrew Selasi Agbemenu. Outline COE/EE152: Basic Electronics Lecture 5 Andrew Selasi Agbemenu 1 Outline Physical Structure of BJT Two Diode Analogy Modes of Operation Forward Active Mode of BJTs BJT Configurations Early Effect Large

More information

THE METAL-SEMICONDUCTOR CONTACT

THE METAL-SEMICONDUCTOR CONTACT THE METAL-SEMICONDUCTOR CONTACT PROBLEM 1 To calculate the theoretical barrier height, built-in potential barrier, and maximum electric field in a metal-semiconductor diode for zero applied bias. Consider

More information

High performance InP/InAlAs/GaAsSb/InP double heterojunction bipolar transistors

High performance InP/InAlAs/GaAsSb/InP double heterojunction bipolar transistors Solid-State Electronics 5 (26) 92 97 www.elsevier.com/locate/sse High performance InP/InAlAs/GaAsSb/InP double heterojunction bipolar transistors S.W. Cho a, J.H. Yun a, D.H. Jun a, J.I. Song a, I. Adesida

More information

Bipolar Transistors. Ideal Transistor. Reading: (4-5 th edition) 8-16, Bipolar Transistor - Terminals. NPN Bipolar Transistor Physics

Bipolar Transistors. Ideal Transistor. Reading: (4-5 th edition) 8-16, Bipolar Transistor - Terminals. NPN Bipolar Transistor Physics Bipolar Transistors deal Transistor Bipolar Transistor Terminals Reading: (45 th edition) 816, 2633 P Bipolar Transistor Physics Large Signal Model Early Effect Small Signal Model Modern Electronics: F3

More information

Relation Between Low-Frequency Noise and Long-Term Reliability of Single AlGaAs/GaAs Power HBT s

Relation Between Low-Frequency Noise and Long-Term Reliability of Single AlGaAs/GaAs Power HBT s IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 47, NO. 4, APRIL 2000 677 Relation Between Low-Frequency Noise and Long-Term Reliability of Single AlGaAs/GaAs Power HBT s Saeed Mohammadi, Dimitris Pavlidis,

More information

Low-frequency noises in GaAs MESFET s currents associated with substrate conductivity and channel-substrate junction

Low-frequency noises in GaAs MESFET s currents associated with substrate conductivity and channel-substrate junction Article Optoelectronics April 2011 Vol.56 No.12: 1267 1271 doi: 10.1007/s11434-010-4148-6 SPECIAL TOPICS: Low-frequency noises in GaAs MESFET s currents associated with substrate conductivity and channel-substrate

More information

FinFET Devices and Technologies

FinFET Devices and Technologies FinFET Devices and Technologies Jack C. Lee The University of Texas at Austin NCCAVS PAG Seminar 9/25/14 Material Opportunities for Semiconductors 1 Why FinFETs? Planar MOSFETs cannot scale beyond 22nm

More information

Atomic-layer deposition of ultrathin gate dielectrics and Si new functional devices

Atomic-layer deposition of ultrathin gate dielectrics and Si new functional devices Atomic-layer deposition of ultrathin gate dielectrics and Si new functional devices Anri Nakajima Research Center for Nanodevices and Systems, Hiroshima University 1-4-2 Kagamiyama, Higashi-Hiroshima,

More information

Numerical study on very high speed silicon PiN diode possibility for power ICs in comparison with SiC-SBD

Numerical study on very high speed silicon PiN diode possibility for power ICs in comparison with SiC-SBD Numerical study on very high speed silicon PiN diode possibility for power ICs in comparison with SiC-SBD Kenichi Takahama and Ichiro Omura Kyushu Institute of Technology Senshui-cho 1-1, Tobata-ku, Kitakyushu

More information

Photodiode: LECTURE-5

Photodiode: LECTURE-5 LECTURE-5 Photodiode: Photodiode consists of an intrinsic semiconductor sandwiched between two heavily doped p-type and n-type semiconductors as shown in Fig. 3.2.2. Sufficient reverse voltage is applied

More information

Optical Fiber Communication Lecture 11 Detectors

Optical Fiber Communication Lecture 11 Detectors Optical Fiber Communication Lecture 11 Detectors Warriors of the Net Detector Technologies MSM (Metal Semiconductor Metal) PIN Layer Structure Semiinsulating GaAs Contact InGaAsP p 5x10 18 Absorption InGaAs

More information

Record I on (0.50 ma/μm at V DD = 0.5 V and I off = 100 na/μm) 25 nm-gate-length ZrO 2 /InAs/InAlAs MOSFETs

Record I on (0.50 ma/μm at V DD = 0.5 V and I off = 100 na/μm) 25 nm-gate-length ZrO 2 /InAs/InAlAs MOSFETs Record I on (0.50 ma/μm at V DD = 0.5 V and I off = 100 na/μm) 25 nm-gate-length ZrO 2 /InAs/InAlAs MOSFETs Sanghoon Lee 1*, V. Chobpattana 2,C.-Y. Huang 1, B. J. Thibeault 1, W. Mitchell 1, S. Stemmer

More information

Research of new structure super fast recovery power diode *

Research of new structure super fast recovery power diode * 4th International Conference on Mechatronics, Materials, Chemistry and Computer Engineering (ICMMCCE 2015) Research of new structure super fast recovery power diode * Li Ma 1,a, Linnan Chen2,b,Yong Gao3,c

More information

EJERCICIOS DE COMPONENTES ELECTRÓNICOS. 1 er cuatrimestre

EJERCICIOS DE COMPONENTES ELECTRÓNICOS. 1 er cuatrimestre EJECICIOS DE COMPONENTES ELECTÓNICOS. 1 er cuatrimestre 2 o Ingeniería Electrónica Industrial Juan Antonio Jiménez Tejada Índice 1. Basic concepts of Electronics 1 2. Passive components 1 3. Semiconductors.

More information

THE JFET. Script. Discuss the JFET and how it differs from the BJT. Describe the basic structure of n-channel and p -channel JFETs

THE JFET. Script. Discuss the JFET and how it differs from the BJT. Describe the basic structure of n-channel and p -channel JFETs Course: B.Sc. Applied Physical Science (Computer Science) Year & Sem.: Ist Year, Sem - IInd Subject: Electronics Paper No.: V Paper Title: Analog Circuits Lecture No.: 12 Lecture Title: Analog Circuits

More information

Contribution of Gate Induced Drain Leakage to Overall Leakage and Yield Loss in Digital submicron VLSI Circuits

Contribution of Gate Induced Drain Leakage to Overall Leakage and Yield Loss in Digital submicron VLSI Circuits Contribution of Gate Induced Drain Leakage to Overall Leakage and Yield Loss in Digital submicron VLSI Circuits Oleg Semenov, Andrzej Pradzynski * and Manoj Sachdev Dept. of Electrical and Computer Engineering,

More information

Comparison of conventional and thermally-stable cascode (TSC) AlGaAs/GaAs HBTs for microwave power applications

Comparison of conventional and thermally-stable cascode (TSC) AlGaAs/GaAs HBTs for microwave power applications Solid-State Electronics 43 (1999) 1429±1436 Comparison of conventional and thermally-stable cascode (TSC) AlGaAs/GaAs HBTs for microwave power applications Shawn S.H. Hsu a, *, Burhan Bayraktaroglu b,

More information

Lecture Wrap up. December 13, 2005

Lecture Wrap up. December 13, 2005 6.012 Microelectronic Devices and Circuits Fall 2005 Lecture 26 1 Lecture 26 6.012 Wrap up December 13, 2005 Contents: 1. 6.012 wrap up Announcements: Final exam TA review session: December 16, 7:30 9:30

More information

n-channel LDMOS WITH STI FOR BREAKDOWN VOLTAGE ENHANCEMENT AND IMPROVED R ON

n-channel LDMOS WITH STI FOR BREAKDOWN VOLTAGE ENHANCEMENT AND IMPROVED R ON n-channel LDMOS WITH STI FOR BREAKDOWN VOLTAGE ENHANCEMENT AND IMPROVED R ON 1 SUNITHA HD, 2 KESHAVENI N 1 Asstt Prof., Department of Electronics Engineering, EPCET, Bangalore 2 Prof., Department of Electronics

More information

UNIT 3: FIELD EFFECT TRANSISTORS

UNIT 3: FIELD EFFECT TRANSISTORS FIELD EFFECT TRANSISTOR: UNIT 3: FIELD EFFECT TRANSISTORS The field effect transistor is a semiconductor device, which depends for its operation on the control of current by an electric field. There are

More information

Strained Si Heterojunction Bipolar Transistors. By Mouhsine Fjer, BSc, MSc

Strained Si Heterojunction Bipolar Transistors. By Mouhsine Fjer, BSc, MSc Strained Si Heterojunction Bipolar Transistors By Mouhsine Fjer, BSc, MSc A Thesis Submitted to the Faculty of Engineering for Degree of Doctor of Philosophy School of Electrical, Electronic and Computer

More information

Sub-micron technology IC fabrication process trends SOI technology. Development of CMOS technology. Technology problems due to scaling

Sub-micron technology IC fabrication process trends SOI technology. Development of CMOS technology. Technology problems due to scaling Goodbye Microelectronics Welcome Nanoelectronics Sub-micron technology IC fabrication process trends SOI technology SiGe Tranzistor in 50nm process Virus The thickness of gate oxide= 1.2 nm!!! Today we

More information

ECE 3040 Dr. Alan Doolittle.

ECE 3040 Dr. Alan Doolittle. ECE 3040 Dr. Alan Doolittle I have thoroughly enjoyed meeting each of you and hope that I have had a positive influence on your carriers. Please feel free to consult with me in your future work. If I can

More information

Physics of Waveguide Photodetectors with Integrated Amplification

Physics of Waveguide Photodetectors with Integrated Amplification Physics of Waveguide Photodetectors with Integrated Amplification J. Piprek, D. Lasaosa, D. Pasquariello, and J. E. Bowers Electrical and Computer Engineering Department University of California, Santa

More information

4H-SiC V-Groove Trench MOSFETs with the Buried p + Regions

4H-SiC V-Groove Trench MOSFETs with the Buried p + Regions ELECTRONICS 4H-SiC V-Groove Trench MOSFETs with the Buried p + Regions Yu SAITOH*, Toru HIYOSHI, Keiji WADA, Takeyoshi MASUDA, Takashi TSUNO and Yasuki MIKAMURA ----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------

More information