High Power and Energy Femtosecond Lasers

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1 High Power and Energy Femtosecond Lasers PHAROS is a single-unit integrated femtosecond laser system combining millijoule pulse energies and high average powers. PHAROS features a mechanical and optical design optimized for industrial applications such as precise material processing. Compact size, integrated thermal stabilization system and sealed design allow PHAROS integration into machining workstations. The use of solid state laser diodes for pumping of Yb medium significantly reduces maintenance cost and provides long laser lifetime. Most of the PHAROS output parameters can be easily set via PC in seconds. Tunability of laser output parameters allows PHAROS system to cover Intensity, a.u. Pulse energy, µj Delay, fs Pulse duration of PHAROS Pharos mj Pharos-SP 1. mj Pharos-SP 1 mj Pharos-W µj Pharos-1W µj Gaussian fit 3 fs Repetition rate, khz Pulse energy vs base repetition rate Relative spectral intensity, a.u. Waist diameter, µm FEATURES 19 fs ps tunable pulse duration mj maximum pulse energy W output power 1 khz 1 MHz tunable base repetition rate Pulse picker for pulse-on-demand operation Rugged industrial grade mechanical design Automated harmonics generators (1 nm, 33 nm, nm, nm) Optional CEP stabilization Possibility to lock oscillator to external clock applications normally requiring different classes of lasers. Tunable parameters include: pulse duration (19 fs ps), repetition rate (single pulse to 1 MHz), pulse energy (up to mj) and average power (up to W). Its deliverable power is sufficient for most of material processing applications at high machining speeds. The built in pulse picker allows convenient control of the laser output in pulse on demand mode. PHAROS compact and robust optomechanical design features stable laser operation across varying environments. PHAROS is equipped with an extensive software package which ensures smooth hands free operation. Spectral FWHM =. nm Wavelength, nm 1 Spectrum of PHAROS 3 Z location, mm Typical PHAROS M² measurement data Typical PHAROS far field beam profile at khz Typical PHAROS near field beam profile at khz Rev. 1113

2 Rev SPECIFICATIONS Product name PH1-1 PH1-1 PH1- PH1-SP-1mJ PH1-SP-1.mJ PH1-SP-1W PH1-mJ Max. average power 1 W 1 W W W 1 W W Pulse duration (assuming Gaussian pulse shape) Ambient temperature, C Ambient temperature. 3 Output power, RMS=.1% < 9 fs < 19 fs < 3 fs Pulse duration range 9 fs 1 ps ( ps on request) 19 fs 1 ps ( ps on request) 3 fs 1 ps Max. pulse energy >. mj or >. mj > 1 mj > 1. mj > 1 mj > mj Beam quality TEM₀₀ ; M² < 1. TEM₀₀ ; M² < 1.3 Base repetition rate 1 khz 1 MHz ¹) Pulse selection Centre wavelength Single-Shot, Pulse-on-Demand, any base repetition rate division Beam direction, µrad 1 nm ± nm Output pulse-to-pulse stability <. % rms over hours ²) Power stability <. % rms over 1 h Pre-pulse contrast < 1 : 1 Post-pulse contrast < 1 : Polarization Beam pointing stability Oscillator output Burst mode PHYSICAL DIMENSIONS Linear, horizontal Temperature Horizontal Vertical < µrad/ C Optional, please contact for specifications Laser head (L) 3 (W) 1 (H) mm 3) Rack for power supply and chiller UTILITY REQUIREMENTS Electric Operating temperature Relative humidity 1) Some particular repetition rates are software denied due to system design. ) Under stable environmental conditions. 3) Dimensions might increase for non-standard laser specifications PHAROS laser outline drawing (L) 3 (W) 3 (H) mm 11 V AC, Hz, A or V AC, Hz, 1 A 1 3 C (air conditioning recommended) < % (non condensing) 1 - PHAROS output power with power lock enabled under unstable environment 3 1 (1) () nm output without H () Auto H Auto 3H, H 1 nm 33, nm 13 nm output with Auto H DANGER VISIBLE AND/OR INVISIBLE LASER RADIATION AVOID EYE OR SKIN EXPOSURE TO DIRECT, REFLECTED OR SCATTERED RADIATION CLASS IV LASER PRODUCT 1 1

3 .1.1 Ultrafast Lasers RMS <.3% Pump current, A Pump current, A PHAROS long term stability graph Output power of industrial PHAROS lasers operating / and current of pump diodes during the years 1. Carrier Envelope Phase, rad. σ = mrad Carrier envelope phase (CEP) over the long period with active phase stabilization system 1 Phase std (last 1k samples), mrad Std of all samples = mrad Std of all samples = 11 mrad CEP stability over a long time scale Time, s CEP stability over a short time scale Pharos CEP stability when laser is isolated from all noticeable noise sources vibrations, acoustics, air circulation and electrical noise. System can achieve < 3 mrad std of CEP stability over a long time scale (> hours) and < mrad over a short time scale (< min) Rev Phase std (last 1k samples), mrad AUTOCORRELATORS SPECTROMETERS

4 Rev Automated Harmonics Generators SPECIFICATIONS PHAROS harmonics energy vs pulse repetition rate PHAROS laser can be equipped with automated harmonics modules. Selection of fundamental (13 nm), second (1 nm), third (33 nm), fourth ( nm) or fifth ( nm) harmonic output is available through software control. Harmonics generators are designed to be used in industrial applications where a single output wavelength is desired. Modules are mounted directly on the output of the laser and integrated into the system. Product name H H-3H H-H H-H Output wavelength (automated selection) 13 nm 1 nm 13 nm 1 nm 33 nm 13 nm 1 nm nm 13 nm nm nm Input pulse energy μj 1 μj 1 μj 1 μj Pump pulse duration Conversion efficiency Beam quality (M²) μj pump Beam quality (M²) > μj pump 1) Max 1 W output. ) Max.1 W output. Pulse energy, µj PHAROS-W-µJ SH ( µj pump) TH ( µj pump) SH ( µj pump) TH ( µj pump) SH ( µj pump) TH ( µj pump) > % (H) < 1.3 (H), typical < 1.1 < 1. (H) Repetition rate, khz > % (H) > % (3H) < 1.3 (H), typical < 1.1 < 1. (3H), typical < 1. < 1. (H) < 1. (3H) fs FEATURES 1 nm, 33 nm, nm and nm Output selection by software Mounts directly on a laser head and integrated into the system Rugged industrial grade mechanical design > % (H) > 1 % (H) 1) > 1 % (H) 1) > % (H) ) < 1.3 (H), typical < 1.1 n/a (H) < 1. (H) n/a (H) n/a n/a DANGER VISIBLE AND/OR INVISIBLE LASER RADIATION AVOID EYE OR SKIN EXPOSURE TO DIRECT, REFLECTED OR SCATTERED RADIATION CLASS IV LASER PRODUCT RMS =.% RMS =.3% H output stability H output stability

5 Industrial grade Optical Parametric Amplifier I-OPA is the first industrial grade optical parametric amplifier which features long-term stable output with a reliable handsfree operation. Manually tunable output wavelength extends application possibilities of a single laser source instead of requiring multiple lasers based on different technologies. In comparison to standard ORPHEUS line devices, the I-OPA lacks only a computer controlled wavelength selection. On the other hand, in-laser mounted design provides mechanical stability and eliminates the effects of air-turbulence ensuring stable long-term performance and minimizing energy fluctuations. PHAROS I-OPA MODEL COMPARISON TABLE FEATURES Based on experience with ORPHEUS line Manually tunable wavelength Industrial grade design provides excellent long-term stability Very small footprint Bandwidth limited or short-pulse configurations available CEP option available Product name I-OPA I-OPA-F I-OPA-ONE Based on ORPHEUS model ORPHEUS ORPHEUS-F ORPHEUS-ONE Pump pulse energy 1 µj 1 µj 1 µj Pulse repetition rate Up to 1 MHz Tuning range of signal 3 13 nm 9 nm 13 nm Tuning range of idler 13 nm 1 nm nm Conversion efficiency at peak, signal+idler combined Pulse bandwidth 1) Pulse duration ) Applications > 1 % when pump energy µj > % when pump energy 1 µj 1 9 nm when pumped by Pharos 1 cm 9 nm when pumped by Pharos-SP 13 9 fs when pumped by Pharos 1 19 fs when pumped by Pharos-SP Micro-machining Microscopy Spectroscopy 1) I-OPA-F outputs broad bandwidth pulses which are compressed externally. ) Output pulse duration depends on wavelength and pump laser pulse duration. Output power, mw > 1 % cm 9 nm 1 cm 1 nm < 9 nm < nm < 1 1 nm Nonlinear microscopy Ultrafast spectroscopy Wavelength, nm I-OPA-ONE signal I-OPA-ONE idler I-OPA signal I-OPA idler I-OPA module energy conversion curves. Pump: PHAROS-1W, 1 µj, 1 khz > 1 % when pump energy 3 1 µj > 1 % when pump energy 3 µj 1 cm 1 nm 3 fs Micro-machining Mid-IR generation Pulse energy, µj Rev. 1113

6 Rev COMPARISON WITH OTHER FEMTOSECOND AND PICOSECOND LASERS Laser technology Our solution HG or HIRO I-OPA-F I-OPA-ONE Pulse energy at 1 khz, using PHAROS-1W laser Excimer laser (193 nm, 13 nm) H of PHAROS ( nm) µj TH of Ti:Sa ( nm) H of PHAROS ( nm) 1 µj TH of Nd:YAG (3 nm) 3H of PHAROS (33 nm) µj SH of Nd:YAG ( nm) H of PHAROS (1 nm) µj 3 µj Ti:Sapphire ( nm) OPA output ( nm) 1 µj Nd:YAG (1 nm) PHAROS output (13 nm) 1 µj Cr:Forsterite (1 nm) OPA output (1 13 nm) µj Erbium (1 nm) OPA output (1 1 nm) 3 µj 1 µj Thulium / Holmium (1.9.1 µm) OPA output (19 nm) µj 1 µj Other sources (.. µm) OPA output 1 µj Note that the pulse energy scales linearly in a broad range of pump parameters. For example, a PHAROS-W laser at khz ( µj energy) will increase the output power twice, and the pulse energy times compared to the reference table above. The pulse duration at the output is <3 fs in all cases. The OPA output is not limited to these particular ranges of operation, it is continuously tunable as shown in energy conversion curves. Output power, mw Output power, mw Output power Humidity Output power Temperature Humidity, % Beam position, µm Position X Position Y Humidity I-OPA beam pointing and output power measurements under harsh environment conditions (humidity and temperature cycling) (39) Beam position, µm Position X Idler Signal Residual OPA pump (1 nm or 13 nm) Optional Uncompressed Fundamental (for SHBC) Fundamental (13 nm) 1 Pharos with I-OPA output ports Position Y DANGER VISIBLE AND/OR INVISIBLE LASER RADIATION AVOID EYE OR SKIN EXPOSURE TO DIRECT, REFLECTED OR SCATTERED RADIATION CLASS IV LASER PRODUCT Temperature Humidity, % Beam direction, µrad Beam direction, µrad Direction X Direction Y Humidity Direction X Temperature Direction Y PHAROS with I-OPA-F and compressors for signal and ilder Humidity, % 9

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