Laser patterning and projection lithography

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1 Introduction to Nanofabrication Techniques: Laser patterning and projection lithography Benjamin Johnston Macquarie University David O Connor Bandwidth Foundry - USYD

2 The OptoFab node of ANFF Broad ranging suite of facilities across three institutes with expertise, and synergies in photonics, sensing and functional materials.

3 Overview Direct write lithographic techniques How photomasks are produced Other lithographic applications of direct laser writing Hi-resolution projection lithography i-line Stepper facility Photolytic techniques Selective layer removal, laser micromachining

4 Photomask production We have seen in the introduction that contact optical lithography requires a photomask. Some of the most commonly used photomasks are chrome on glass type (though plastic and/or printed photomasks are becoming common for low-res requirements) These photomasks begin their lives as a high quality glass substrate, with a layer of chrome, covered in a photoresist layer. Photoresist (~1um) Chrome (~100 s nm) Glass (1-3 mm) Soda or Quartz

5 Laser Writing A short wavelength laser with high quality scanning optics is used to process the photoresist. This a scan and step process.

6 Develop, chrome etch and strip - Develop resist (positive or negative) - Chrome etch ammonium nitrate + nitric - Strip resist Acetone or suitable solvent

7 Facilities at Bandwidth Foundry Heidelberg DWL200 - Argon/krypton Ion laser (λ<450nm) - Precision stages and all granite base - Stable cleanroom conditions Ultra-High Resolution Write Head Direct written feature sizes 500 nm to 100 mm On wafers or for photomasks To provide fast writing application capabilities for proof of principal research at reasonable pricing

8 Grey Scale resist patterning

9 Projection lithography - With shorter wavelength sources and large area precision optics, photomask reticules can be projected with high image fidelity and magnifications of 5-8x. i-line stepper facility - Mercury i-line, 365.4nm, is an efficient UVA source for producing high fidelity imaging of small features. - The 1-2um features on a common photomask can produce features as small as 200nm

10 Fast chip reproduction by precision stepping 5 inch photomask 21 22mm chip on a 6mm wafer

11 ANFF Stepper Facility ASML PAS5500/100 Stepper 2 um trench 200 x 500 nm Rib 400 nm trenches 1.2 um pitch grid

12 Direct Laser Patterning Direct laser ablation can often be a good starting point for prototyping designs and device on the microscale. Selective removal of resists, metal films, and ITO is relatively straight forward. CNT removal from polymer sheets for flexible circuits

13 A case study in hybrid techniques: Bridging atomic-scale to macro-world Atomic scale doping Giordano Scappucci

14 A case study in hybrid techniques: Bridging atomic-scale to macro-world Atomic scale doping 1. Registration markers Robust, UHV-compatible, to bridge atomic scale to macro world 2. STM lithography 3. Doping precision in x,y 4. Doping precision in z 5. Ohmic contacts (EBL) and measure Using reg. markers, align macroscopic contacts to the buried nanostructure

15 On Silicon No worries. Requirements 1. Clean (UHV compatible) 2. Robust (Visibility after thermal treatment) - STM tip positioning in-situ - EBL alignment ex-situ Solution 1. High thermal budget field oxide to protect the surface from EBL resist nm deep, 1-2um wide survive 1300 C in situ flash and visible ex-situ F. Ruess et al Nano Letters 2004

16 But on Germanium. hmmm Germanium has some advantages for atomic/nano electronics, but it does not have the thermal budget to cope with the same processing techniques as silicon and retain its crystal structure. A potential Solution: ultrafast laser ablation Requirements 1. Clean 2. Robust Additional benefit Dry, non contact Fast turnaround Minimal thermal-impact on active device area

17 It does the job! - Femtosecond laser pulses just above ablation threshold - Virtually athermal material removal 266nm, 15 ns 800nm, 100 fs

18 The atomic to macroscopic scales have been bridged for Ge

19 Thanks

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