DEVELOPMENT PROCESS FOR PVCz HOLOGRAM

Size: px
Start display at page:

Download "DEVELOPMENT PROCESS FOR PVCz HOLOGRAM"

Transcription

1 Journal of Photopolymer Science and Technology Volume 4, Number 1(1991) DEVELOPMENT PROCESS FOR PVCz HOLOGRAM Yasuo YAMAGISHI, Takeshi ISHITSUKA, and Yasuhiro YONEDA Fujitsu Laboratories Ltd. Morinosato Wakamiya Atsugi, Kanagawa Japan We investigated the formation of index modulation for volume holograms consisting of poly-n-vinylcarbazole (PVCz), and achieved a new process that enables large holograms and uniform quality. Conventionally PVCz holograms are developed by two sequential dipping process: first into good solvent, then into poor solvent. When a swollen PVCz film is dipped into poor solvent, PVCz molecules precipitate into small grains. In the upper layer small grains can pack closely, because the solvent in the film can escape outside. However, the solvent in the lower layer is prevented from escaping by the closely packed upper layer, and the remaining solvent forms gaps corresponding to the degree of swelling. As the result of the difference in swelling between highly exposed and low exposed areas, refractive index modulation appears. Based on the investigation above, we found a new process where the holograms are developed by single dipping process into a mixture of volatile good solvent and nonvolatile poor solvent. When the film swollen by the mixture is carried out, the solvent in the film becomes poor solvent rich and small grains are formed. With this new process all areas of a hologram can be developed under same conditions, so large holograms with uniform quality becomes possible. 1. Introduction Volume holograms have been used as high-function optical elements, for such applications bar code readers [1,2] and head-up displays (HUDs) [3], because various optical functions can be integrated into a thin film. They have also created the new field of holographic art. Dichromated gelatin has been widely used for volume holograms because recording films are easily obtained and Received Accepted April 17, May 20,

2 large holograms are possible, even though the material is very susceptible to humidity so needs a tough cover. More stable material is required to make the reliability of equipments up, or to hand down works of art to posterity. The material consisting of poly-n-vinylcarbazole (PVCz) is very resistant to humidity [4], though several problems are present themselves. The most serious problem with PVCz holograms is the difficulties in controlling developing conditions. PVCz holograms are developed by the same process used in dichromated gelatin: first dipping into good solvent, then into poor solvent [4]. In this process, it is difficult to obtain a large hologram, because the upper area dries more than the lower area when the swollen film is carried to poor solvent. In this paper we discuss the formation of refractive index modulation in PVCz hologram, and describe a new development process which enables large hologram with uniform quality. 2. Experimental Material: Poly-N-vinylcarbazole was used as a base polymer. Iodoform and rubren were chosen as the initiator and sensitizer respectively. Polycarbonate was added to improve the diffraction efficiency. A certain amount of these materials are dissolved in the solvent, the mixture of dichlorobenzene and tetrahydrofuran, then filtered. Photosensitive PVCz film was spin-coated on a glass substrate from the solution to a thickness of 6-10 p.m and dried at 60 C. Fabricating method: Latent patterns of transmission holograms or reflection hologram were recorded into photosensitive PVCz films with an Ar ion laser light (~, = 488 or 515 nm) which intensity on the film was about 1 mw/cm2. After exposure iodoform and rubren were extracted by dipping into xylene, then the films were developed following. (a) Conventional process: First the films were swollen with good solvent of xylene toluene mixture. Then the swollen films were raised slowly and dipped into poor solvent of pentane. (b) New process: The films were dipped into a mixture of volatile good solvent and nonvolatile poor solvent. Then swollen films were raised slowly and dried. Measurement: Refractive index and film thickness of PVCz film were measured at the same time before and after development using a prism film coupler (Metricon LTD. PC-2000). In this method laser light (He-Ne laser) is injected into a film through a prism (Fig. 1). The light can be guided in the film when the incident angle is 9m as specified by following equation [5]. 27t1A, d ni cosom io = 2 it m m=1, 2, 3, (1) tang t12 = (11e24) / (n12-ne2 ) tang ~12 = (fle2 -not ) / (n12 -ne2 ) ne =n1 sinom 128

3 where (12 and ct o are the phase shift of the reflection, ni and no are refractive index of film and substrate respectively, and d is the thickness of film. We observed the cross section of a PVCz hologram by scanning electron microscope (SEM). Here the spatial frequency was 1000 line/mm. The hologram was broken after the cooled by liquid nitrogen. Diffraction efficiency of transmission hologram was measured by He-Ne laser light. The efficiency was defined as the power ratio of 1st order diffraction light for incident light. The efficiency of reflection hologram was measured by white light. Transmitted and reflected light was detected by multichannel spectrophotometer (Otsuka electronics LTD. MCPD-100). 3. Results and discussion Formation of index modulation: Fig. 2 shows the cross section of hologram observed by SEM. Small grains and microgaps between grains are observed in the photograph. The gaps are increasing and decreasing as the cycle of 1.tm which corresponds to the interference fringe. Small gaps or voids reduces the average of refractive index according to the equation (2) [6]. n$2 ={3 n2-2 (n2-1) V} / {3 + (n2-1) V) (2) where na is the average of refractive index, n the index of the material, V the volume ratio of gaps. So microgaps, which are increasing and decreasing corresponds to the interference fringe, are thought to cause the index modulation. To know the reduction of refractive index, we measured the index of PVCz hologram with a prism film coupler. Fig. 3 shows the relationship between mode number and equivalent refractive index (ne), where the transmission hologram with spatial frequency of 2000 line/mm was used. For uniform film, ne decreases gradually and the curve has no inflection point. Though the coated film showed the curve having no inflection point, the curve of the developed PVCz hologram had an inflection point and separated into two areas as shown in Fig. 3. In the area of large 0, (mode number is small), ne appears higher. This is thought to mean that the upper area of the film has higher index than the lower (Fig. 4). Fig. 1. Prism film coupler used for measurements of the refractive index and film thickness. Fig. 2. Cross section PVCz hologram. of a developed 129

4 J. Photopolym. Sci. Technol., Vol. 4, No.1, 1991 Fig. 3. Equivalent refractive index measured by prism coupler. The solid line is measured and the d otted line is calculated. Fig. 4. Wave guide model for double layered film. When the incident angle is large, the light is guided only in the upper layer. We calculated the wave guide modes using equation (1), assuming double layered structure, and could fit the calculated curve in well with that of actual hologram. From the calculated curve shown as dotted line in Fig. 3, which was most likely fit to the measured curve, we estimated the index for the upper layer, for the lower layer, and the thickness 2.3 µm for the upper, 4.9 µm for the lower. The estimated index of upper layer is near to the index of PVCz (n=1.672), so it is thought that the grains are packed closely and hologram is not formed in the upper layer. This supposition will be supported by Fig. 5. efficiency. used. Incident angle dependence of the diffraction The same hologram that was shown in Fig. 3 was 130

5 Fig. 2 where fringes are not observed in the upper area. To conf i rm this supposition we measured the incident angle dependence on diffraction efficiency, because thinner hologram gives broader peak top for the efficiency curve. Fig. 5 shows the diffraction efficiency of the same hologram (same point) as measured in Fig. 3. It also shows the calculated efficiencies for 7.2 µm thick hologram (total thickness of the hologram) and 4.9 µm thick hologram (estimated thickness of the lower layer), using Moharam's way [7]. As shown in the figure, the curve of measured efficiency fitted in well with the calculated curve of 4.9 µm thick hologram. Refractive indices dependence on exposure energy also supports the existence of hologram in the lower layer (Fig. 6). In Fig. 6, PVCz films were developed after exposure with single light beam and holograms were not formed. As shown in the figure, only the indices of lower layers were reduced by the development and depended on the exposure energy. In the lower layer the reduction of index became smaller by light exposure, so a modulation of exposure energy results in a refractive index modulation. Fig. 6. Exposure energy dependence on the refractive indices of upper and lower layers. Interfarent pattern was not recorded. From these results, the refractive index modulation is thought to be formed through following (Fig. 7). When a exposed film is dipped in good solvent, low exposed area swells more than highly exposed area, because photo exposure reduces the solubility of PVCz for solvents. Next swollen film is carried to poor solvent, and solvent mixing starts from the upper layer. When the poor solvent reaches a critical density, PVCz molecules precipitate into small grains. In the upper layer small grains can pack closely, because the solvent in the medium can escape outside. On the other hand, the solvent in the lower layer will be prevented from escaping by the closely packed upper layer, and the remaining solvent will form gaps, As the amount of remaining solvent is thought to correspond to the degree of swelling, refractive index modulation will be formed. 131

6 I Photopolym. Sci. Technol., Vol. 4, No.1, 1991 Fig. 7. Formation of micro gaps during the development process. New developing process: Based on the results above, a new process has been developed. In the new process, an exposed film is swollen by the mixture of a volatile good solvent and a nonvolatile poor solvent. The mixture works as a good solvent. During the swollen film is raised, the mixture in the film becomes poor solvent and PVCz precipitates in small grains, because the good solvent vaporizes more than the poor solvent. In this way, swelling and precipitation are controlled to same condition in all area, so a large hologram with uniform quality can be realized. Table 1 shows the combinations of good and poor solvents which were able to develop PVCz hologram by the new process. Dichloromethane, dichloroethane and chlorobenzene were used as good solvents with different boiling point. Hydrocarbons of pentane, hexane, heptane, octane and nonane were used as poor solvents with different boiling point. As shown table 1, holograms were developed by the new process, when a volatile good solvent and a nonvolatile poor solvent were used. Table 1. Combinations of the solvents for new process. 132

7 Fig. 8 shows the diffraction efficiency of transmission type holograms with the spatial frequency of 2200 lines/mm. More than 70% of efficiency, which was almost same as that of the hologram developed by conventional process, was obtained. Fig. 9 shows the diffraction efficiency and transmittance of reflection hologram. The transmittance of violet light tended to decrease due to scattering caused by small grains. However this decrease is not thought to make serious problem in use of HUDs or Lipman hologram, because sensitivity of violet light is low for human eyes. Fig. 8. Diffraction efficiency of the developed by our new process. transmission holograms Fig. 9. Diffraction efficiency of the reflection holograms developed by our new process. 133

8 4. Conclusion We investigated the origin of the refractive index modulation of a PVCz hologram. Micro gaps between small grains reduce the refractive index. As the light exposure represses the reduction, refractive index modulation appears. We also found that a developed film has double layered structure and hologram is formed in the lower layer. Based on these results, we developed a new process, where hologram is developed by single dipping into a mixture of volatile good solvent and nonvolatile poor solvent. This new process enables large hologram with uniform quality, so PVCz hologram will be applied to various optical elements and holographic arts. Acnowledgment: The authors would like to thank H. Ikeda, F. Yamagishi and H. Okuyama for their suggestion and encouragement during the course of this work. Thanks also to Y. Kuramitsu, M. Tani and N. Ikeda for their discussion and support. w 6. Reffrence 1. K. Yamazaki et. al. "New holographic technology for a compact POS scanner," App!. Opt. Vol. 29, No. 11, pp , April H. Ikeda et. al. "Shallow-type truncated symbol-reading point-of-sale hologram scanner," Appl. Opt. Vol.24, pp , R. B. Wood and M. A. Thomas "A holographic head-up display for automotive applications," SPIE Vol. 958, June Y. Yamagishi et. al. "Holographic recording material containing poly-n-vinylcarbazole," Proceedings of the SPIE, Vol. 600, pp.14-19, R. Th. Kersten "Numerical solution of the mode-equation of planar dielectric waveguides to determine their refractive index and thickness by means of a prismfilm coupler," Opt. Commun. Vol. 9, No. 4, pp , December K. Kinoshita "Progress in optics IV," pp. 115, 1965, North Holland Publishing Company, Amsterdam. 7. M. G. Moharam and T. K. Gaylord "Rigorous coupled-wave analysis of planar-grating diffraction," J. Opt. Soc. Am. Vol. 71, No. 7, pp , July

PHOTOPOLYMER FOR RECORDING HOLOGRAMS. Hideo Tanigawa, Taichi Ichihashi, and Takashi Matsuo*

PHOTOPOLYMER FOR RECORDING HOLOGRAMS. Hideo Tanigawa, Taichi Ichihashi, and Takashi Matsuo* PHOTOPOLYMER FOR RECORDING HOLOGRAMS Hideo Tanigawa, Taichi Ichihashi, and Takashi Matsuo* MY0001406 Osaka National Research Institute, AIST 1-8-31, Midorigaoka, Ikeda, Osaka 563-8577, Japan Phone: +81-727-51-9537,

More information

Defense Technical Information Center Compilation Part Notice

Defense Technical Information Center Compilation Part Notice UNCLASSIFIED Defense Technical Information Center Compilation Part Notice ADPO11531 TITLE: Evanescent - Wave Recording in Very Thin Layers DISTRIBUTION: Approved for public release, distribution unlimited

More information

Design and Analysis of Resonant Leaky-mode Broadband Reflectors

Design and Analysis of Resonant Leaky-mode Broadband Reflectors 846 PIERS Proceedings, Cambridge, USA, July 6, 8 Design and Analysis of Resonant Leaky-mode Broadband Reflectors M. Shokooh-Saremi and R. Magnusson Department of Electrical and Computer Engineering, University

More information

Fabrication Techniques of Optical ICs

Fabrication Techniques of Optical ICs Fabrication Techniques of Optical ICs Processing Techniques Lift off Process Etching Process Patterning Techniques Photo Lithography Electron Beam Lithography Photo Resist ( Microposit MP1300) Electron

More information

Characterization of High Resolution Photographic Emulsion BB640 by Holographic Methods

Characterization of High Resolution Photographic Emulsion BB640 by Holographic Methods 24 International Symposium on Silver Halide Technology Characterization of High Resolution Photographic Emulsion BB64 by Holographic Methods M. Ulibarrena, L. Carretero, S. Blaya, R. Madrigal and A. Fimia

More information

ON FABRICATION OF LARGE FORMAT OPTOELECTRONIC ELEMENTS

ON FABRICATION OF LARGE FORMAT OPTOELECTRONIC ELEMENTS Journal of Optoelectronics and Advanced Materials Vol. 5, No., March 003, p. 39-43 ON FABRICATION OF LARGE FORMAT OPTOELECTRONIC ELEMENTS P. Sharlandjiev, B. Markova Central Laboratory of Optical Storage

More information

Invited Paper. recording. Yuri N. Denisyuk, Nina M. Ganzherli and Irma A. Maurer

Invited Paper. recording. Yuri N. Denisyuk, Nina M. Ganzherli and Irma A. Maurer Invited Paper Thick-layered light-sensitive dichromated gelatin for 3D hologram recording Yuri N. Denisyuk, Nina M. Ganzherli and Irma A. Maurer loffe Physico-Technical Institute of the Academy of Sciences

More information

Low aberration monolithic diffraction gratings for high performance optical spectrometers

Low aberration monolithic diffraction gratings for high performance optical spectrometers Low aberration monolithic diffraction gratings for high performance optical spectrometers Peter Triebel, Tobias Moeller, Torsten Diehl; Carl Zeiss Spectroscopy GmbH (Germany) Alexandre Gatto, Alexander

More information

Developing characteristics of Thermally Fixed holograms in Fe:LiNbO 3

Developing characteristics of Thermally Fixed holograms in Fe:LiNbO 3 Developing characteristics of Thermally Fixed holograms in Fe:LiNbO 3 Ran Yang *, Zhuqing Jiang, Guoqing Liu, and Shiquan Tao College of Applied Sciences, Beijing University of Technology, Beijing 10002,

More information

Fabrication of large grating by monitoring the latent fringe pattern

Fabrication of large grating by monitoring the latent fringe pattern Fabrication of large grating by monitoring the latent fringe pattern Lijiang Zeng a, Lei Shi b, and Lifeng Li c State Key Laboratory of Precision Measurement Technology and Instruments Department of Precision

More information

The range of applications which can potentially take advantage of CGH is very wide. Some of the

The range of applications which can potentially take advantage of CGH is very wide. Some of the CGH fabrication techniques and facilities J.N. Cederquist, J.R. Fienup, and A.M. Tai Optical Science Laboratory, Advanced Concepts Division Environmental Research Institute of Michigan P.O. Box 8618, Ann

More information

Effects of Photographic Gamma on Hologram Reconstructions*

Effects of Photographic Gamma on Hologram Reconstructions* 1650 JOURNAL OF THE OPTICAL SOCIETY OF AMERICA VOLUME 59. NUMBER 12 DECEMBER 1969 Effects of Photographic Gamma on Hologram Reconstructions* J AMES C. WYANT AND M. PA RKER G IVENS The Institute of Optics,

More information

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. The lithographic process

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. The lithographic process Section 2: Lithography Jaeger Chapter 2 Litho Reader The lithographic process Photolithographic Process (a) (b) (c) (d) (e) (f) (g) Substrate covered with silicon dioxide barrier layer Positive photoresist

More information

Hybrid Integration Technology of Silicon Optical Waveguide and Electronic Circuit

Hybrid Integration Technology of Silicon Optical Waveguide and Electronic Circuit Hybrid Integration Technology of Silicon Optical Waveguide and Electronic Circuit Daisuke Shimura Kyoko Kotani Hiroyuki Takahashi Hideaki Okayama Hiroki Yaegashi Due to the proliferation of broadband services

More information

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. EE143 Ali Javey Slide 5-1

Section 2: Lithography. Jaeger Chapter 2 Litho Reader. EE143 Ali Javey Slide 5-1 Section 2: Lithography Jaeger Chapter 2 Litho Reader EE143 Ali Javey Slide 5-1 The lithographic process EE143 Ali Javey Slide 5-2 Photolithographic Process (a) (b) (c) (d) (e) (f) (g) Substrate covered

More information

Testing Aspherics Using Two-Wavelength Holography

Testing Aspherics Using Two-Wavelength Holography Reprinted from APPLIED OPTICS. Vol. 10, page 2113, September 1971 Copyright 1971 by the Optical Society of America and reprinted by permission of the copyright owner Testing Aspherics Using Two-Wavelength

More information

Polarizer-free liquid crystal display with double microlens array layers and polarizationcontrolling

Polarizer-free liquid crystal display with double microlens array layers and polarizationcontrolling Polarizer-free liquid crystal display with double microlens array layers and polarizationcontrolling liquid crystal layer You-Jin Lee, 1,3 Chang-Jae Yu, 1,2,3 and Jae-Hoon Kim 1,2,* 1 Department of Electronic

More information

Radial Coupling Method for Orthogonal Concentration within Planar Micro-Optic Solar Collectors

Radial Coupling Method for Orthogonal Concentration within Planar Micro-Optic Solar Collectors Radial Coupling Method for Orthogonal Concentration within Planar Micro-Optic Solar Collectors Jason H. Karp, Eric J. Tremblay and Joseph E. Ford Photonics Systems Integration Lab University of California

More information

Gerhard K. Ackermann and Jurgen Eichler. Holography. A Practical Approach BICENTENNIAL. WILEY-VCH Verlag GmbH & Co. KGaA

Gerhard K. Ackermann and Jurgen Eichler. Holography. A Practical Approach BICENTENNIAL. WILEY-VCH Verlag GmbH & Co. KGaA Gerhard K. Ackermann and Jurgen Eichler Holography A Practical Approach BICENTENNIAL BICENTENNIAL WILEY-VCH Verlag GmbH & Co. KGaA Contents Preface XVII Part 1 Fundamentals of Holography 1 1 Introduction

More information

Chapter 5 5.1 What are the factors that determine the thickness of a polystyrene waveguide formed by spinning a solution of dissolved polystyrene onto a substrate? density of polymer concentration of polymer

More information

Waveguiding in PMMA photonic crystals

Waveguiding in PMMA photonic crystals ROMANIAN JOURNAL OF INFORMATION SCIENCE AND TECHNOLOGY Volume 12, Number 3, 2009, 308 316 Waveguiding in PMMA photonic crystals Daniela DRAGOMAN 1, Adrian DINESCU 2, Raluca MÜLLER2, Cristian KUSKO 2, Alex.

More information

Photonics and Optical Communication

Photonics and Optical Communication Photonics and Optical Communication (Course Number 300352) Spring 2007 Dr. Dietmar Knipp Assistant Professor of Electrical Engineering http://www.faculty.iu-bremen.de/dknipp/ 1 Photonics and Optical Communication

More information

CHIRPED FIBER BRAGG GRATING (CFBG) BY ETCHING TECHNIQUE FOR SIMULTANEOUS TEMPERATURE AND REFRACTIVE INDEX SENSING

CHIRPED FIBER BRAGG GRATING (CFBG) BY ETCHING TECHNIQUE FOR SIMULTANEOUS TEMPERATURE AND REFRACTIVE INDEX SENSING CHIRPED FIBER BRAGG GRATING (CFBG) BY ETCHING TECHNIQUE FOR SIMULTANEOUS TEMPERATURE AND REFRACTIVE INDEX SENSING Siti Aisyah bt. Ibrahim and Chong Wu Yi Photonics Research Center Department of Physics,

More information

Section 2: Lithography. Jaeger Chapter 2. EE143 Ali Javey Slide 5-1

Section 2: Lithography. Jaeger Chapter 2. EE143 Ali Javey Slide 5-1 Section 2: Lithography Jaeger Chapter 2 EE143 Ali Javey Slide 5-1 The lithographic process EE143 Ali Javey Slide 5-2 Photolithographic Process (a) (b) (c) (d) (e) (f) (g) Substrate covered with silicon

More information

Lecture 7. Lithography and Pattern Transfer. Reading: Chapter 7

Lecture 7. Lithography and Pattern Transfer. Reading: Chapter 7 Lecture 7 Lithography and Pattern Transfer Reading: Chapter 7 Used for Pattern transfer into oxides, metals, semiconductors. 3 types of Photoresists (PR): Lithography and Photoresists 1.) Positive: PR

More information

Exposure schedule for multiplexing holograms in photopolymer films

Exposure schedule for multiplexing holograms in photopolymer films Exposure schedule for multiplexing holograms in photopolymer films Allen Pu, MEMBER SPIE Kevin Curtis,* MEMBER SPIE Demetri Psaltis, MEMBER SPIE California Institute of Technology 136-93 Caltech Pasadena,

More information

Surface Topography and Alignment Effects in UV-Modified Polyimide Films with Micron Size Patterns

Surface Topography and Alignment Effects in UV-Modified Polyimide Films with Micron Size Patterns CHINESE JOURNAL OF PHYSICS VOL. 41, NO. 2 APRIL 2003 Surface Topography and Alignment Effects in UV-Modified Polyimide Films with Micron Size Patterns Ru-Pin Pan 1, Hua-Yu Chiu 1,Yea-FengLin 1,andJ.Y.Huang

More information

TL2 Technology Developer User Guide

TL2 Technology Developer User Guide TL2 Technology Developer User Guide The Waveguide available for sale now is the TL2 and all references in this section are for this optic. Handling and care The TL2 Waveguide is a precision instrument

More information

HOE for clock distribution in integrated circuits : Experimental results

HOE for clock distribution in integrated circuits : Experimental results HOE for clock distribution in integrated circuits : Experimental results D. Prongué and H. P. Herzig University of Neuchâtel, Institute of Microtechnology, CH-2000 Neuchâtel, Switzerland ABSTRACT This

More information

System demonstrator for board-to-board level substrate-guided wave optoelectronic interconnections

System demonstrator for board-to-board level substrate-guided wave optoelectronic interconnections Header for SPIE use System demonstrator for board-to-board level substrate-guided wave optoelectronic interconnections Xuliang Han, Gicherl Kim, Hitesh Gupta, G. Jack Lipovski, and Ray T. Chen Microelectronic

More information

Micro-Optic Solar Concentration and Next-Generation Prototypes

Micro-Optic Solar Concentration and Next-Generation Prototypes Micro-Optic Solar Concentration and Next-Generation Prototypes Jason H. Karp, Eric J. Tremblay and Joseph E. Ford Photonics Systems Integration Lab University of California San Diego Jacobs School of Engineering

More information

Chapter 17: Wave Optics. What is Light? The Models of Light 1/11/13

Chapter 17: Wave Optics. What is Light? The Models of Light 1/11/13 Chapter 17: Wave Optics Key Terms Wave model Ray model Diffraction Refraction Fringe spacing Diffraction grating Thin-film interference What is Light? Light is the chameleon of the physical world. Under

More information

Confocal Imaging Through Scattering Media with a Volume Holographic Filter

Confocal Imaging Through Scattering Media with a Volume Holographic Filter Confocal Imaging Through Scattering Media with a Volume Holographic Filter Michal Balberg +, George Barbastathis*, Sergio Fantini % and David J. Brady University of Illinois at Urbana-Champaign, Urbana,

More information

Module - 2 Lecture - 13 Lithography I

Module - 2 Lecture - 13 Lithography I Nano Structured Materials-Synthesis, Properties, Self Assembly and Applications Prof. Ashok. K.Ganguli Department of Chemistry Indian Institute of Technology, Delhi Module - 2 Lecture - 13 Lithography

More information

Integrated into Nanowire Waveguides

Integrated into Nanowire Waveguides Supporting Information Widely Tunable Distributed Bragg Reflectors Integrated into Nanowire Waveguides Anthony Fu, 1,3 Hanwei Gao, 1,3,4 Petar Petrov, 1, Peidong Yang 1,2,3* 1 Department of Chemistry,

More information

Compensation of hologram distortion by controlling defocus component in reference beam wavefront for angle multiplexed holograms

Compensation of hologram distortion by controlling defocus component in reference beam wavefront for angle multiplexed holograms J. Europ. Opt. Soc. Rap. Public. 8, 13080 (2013) www.jeos.org Compensation of hologram distortion by controlling defocus component in reference beam wavefront for angle multiplexed holograms T. Muroi muroi.t-hc@nhk.or.jp

More information

Full Color Holographic Optical Element Fabrication for Waveguide-type Head Mounted Display Using Photopolymer

Full Color Holographic Optical Element Fabrication for Waveguide-type Head Mounted Display Using Photopolymer Journal of the Optical Society of Korea Vol. 17, No. 3, June 2013, pp. 242-248 DOI: http://dx.doi.org/10.3807/josk.2013.17.3.242 Full Color Holographic Optical Element Fabrication for Waveguide-type Head

More information

A novel tunable diode laser using volume holographic gratings

A novel tunable diode laser using volume holographic gratings A novel tunable diode laser using volume holographic gratings Christophe Moser *, Lawrence Ho and Frank Havermeyer Ondax, Inc. 85 E. Duarte Road, Monrovia, CA 9116, USA ABSTRACT We have developed a self-aligned

More information

Electronically switchable Bragg gratings provide versatility

Electronically switchable Bragg gratings provide versatility Page 1 of 5 Electronically switchable Bragg gratings provide versatility Recent advances in ESBGs make them an optimal technological fabric for WDM components. ALLAN ASHMEAD, DigiLens Inc. The migration

More information

A BASIC EXPERIMENTAL STUDY OF CAST FILM EXTRUSION PROCESS FOR FABRICATION OF PLASTIC MICROLENS ARRAY DEVICE

A BASIC EXPERIMENTAL STUDY OF CAST FILM EXTRUSION PROCESS FOR FABRICATION OF PLASTIC MICROLENS ARRAY DEVICE A BASIC EXPERIMENTAL STUDY OF CAST FILM EXTRUSION PROCESS FOR FABRICATION OF PLASTIC MICROLENS ARRAY DEVICE Chih-Yuan Chang and Yi-Min Hsieh and Xuan-Hao Hsu Department of Mold and Die Engineering, National

More information

Advances in holographic replication with the Aztec structure

Advances in holographic replication with the Aztec structure Advances in holographic replication with the Aztec structure James J. Cowan TelAztec, LLC, 15 A Street Burlington, MA 01803, USA Abstract Holograms that are predominantly in use today as replicable devices

More information

EE143 Fall 2016 Microfabrication Technologies. Lecture 3: Lithography Reading: Jaeger, Chap. 2

EE143 Fall 2016 Microfabrication Technologies. Lecture 3: Lithography Reading: Jaeger, Chap. 2 EE143 Fall 2016 Microfabrication Technologies Lecture 3: Lithography Reading: Jaeger, Chap. 2 Prof. Ming C. Wu wu@eecs.berkeley.edu 511 Sutardja Dai Hall (SDH) 1-1 The lithographic process 1-2 1 Photolithographic

More information

Section 1 ADVANCED TECHNOLOGY DEVELOPMENTS. High-Efficiency Holographic Gratings for High-Power Laser Systems. l.a

Section 1 ADVANCED TECHNOLOGY DEVELOPMENTS. High-Efficiency Holographic Gratings for High-Power Laser Systems. l.a Section 1 ADVANCED TECHNOLOGY DEVELOPMENTS l.a High-Efficiency Holographic Gratings for High-Power Laser Systems Large-aperture holographic transmission gratings that possess high diffraction efficiency

More information

Goodman Laboratory Technical Report

Goodman Laboratory Technical Report Goodman Laboratory Technical Report 1. Introduction Volume Holographic Gratings J.Christopher Clemens and Scott Seagroves Recently, Barden et al. (1998) 1 explored the potential for using volume holographic

More information

E LECTROOPTICAL(EO)modulatorsarekeydevicesinoptical

E LECTROOPTICAL(EO)modulatorsarekeydevicesinoptical 286 JOURNAL OF LIGHTWAVE TECHNOLOGY, VOL. 26, NO. 2, JANUARY 15, 2008 Design and Fabrication of Sidewalls-Extended Electrode Configuration for Ridged Lithium Niobate Electrooptical Modulator Yi-Kuei Wu,

More information

Influence of Photo-illumination on Greenish Metallic Luster of Safflower Red Pigment Film

Influence of Photo-illumination on Greenish Metallic Luster of Safflower Red Pigment Film 18 Bull. Soc. Photogr. Imag. Japan. (18) Vol. 28 No. 2: 18 22 Letter Influence of Photo-illumination on Greenish Metallic Luster of Safflower Red Pigment Film Hitoshi Yajima, Maiko Sasaki, Keiko Takahashi,

More information

Narrowing spectral width of green LED by GMR structure to expand color mixing field

Narrowing spectral width of green LED by GMR structure to expand color mixing field Narrowing spectral width of green LED by GMR structure to expand color mixing field S. H. Tu 1, Y. C. Lee 2, C. L. Hsu 1, W. P. Lin 1, M. L. Wu 1, T. S. Yang 1, J. Y. Chang 1 1. Department of Optical and

More information

OPTI510R: Photonics. Khanh Kieu College of Optical Sciences, University of Arizona Meinel building R.626

OPTI510R: Photonics. Khanh Kieu College of Optical Sciences, University of Arizona Meinel building R.626 OPTI510R: Photonics Khanh Kieu College of Optical Sciences, University of Arizona kkieu@optics.arizona.edu Meinel building R.626 Announcements Homework #3 is due today No class Monday, Feb 26 Pre-record

More information

Sub-micron integrated grating couplers for singlemode planar optical waveguides

Sub-micron integrated grating couplers for singlemode planar optical waveguides Sub-micron integrated grating couplers for singlemode planar optical waveguides Colin M. Hayes, Marcelo B. Pereira, Baylor C. Brangers, Mustafa M. Aslan, Rodrigo S. Wiederkehr, and Sergio B. Mendes Department

More information

Device Fabrication: Photolithography

Device Fabrication: Photolithography Device Fabrication: Photolithography 1 Objectives List the four components of the photoresist Describe the difference between +PR and PR Describe a photolithography process sequence List four alignment

More information

Grating-waveguide structures and their applications in high-power laser systems

Grating-waveguide structures and their applications in high-power laser systems Grating-waveguide structures and their applications in high-power laser systems Marwan Abdou Ahmed*, Martin Rumpel, Tom Dietrich, Stefan Piehler, Benjamin Dannecker, Michael Eckerle, and Thomas Graf Institut

More information

Holography as a tool for advanced learning of optics and photonics

Holography as a tool for advanced learning of optics and photonics Holography as a tool for advanced learning of optics and photonics Victor V. Dyomin, Igor G. Polovtsev, Alexey S. Olshukov Tomsk State University 36 Lenin Avenue, Tomsk, 634050, Russia Tel/fax: 7 3822

More information

CD-SEM for 65-nm Process Node

CD-SEM for 65-nm Process Node CD-SEM for 65-nm Process Node 140 CD-SEM for 65-nm Process Node Hiroki Kawada Hidetoshi Morokuma Sho Takami Mari Nozoe OVERVIEW: Inspection equipment for 90-nm and subsequent process nodes is required

More information

Rotational matched spatial filter for biological pattern recognition

Rotational matched spatial filter for biological pattern recognition Rotational matched spatial filter for biological pattern recognition Hitoshi Fujii, Silverio P. Almeida, and James E. Dowling Randomly oriented microbiological patterns are recognized by rotating a matched

More information

Part 5-1: Lithography

Part 5-1: Lithography Part 5-1: Lithography Yao-Joe Yang 1 Pattern Transfer (Patterning) Types of lithography systems: Optical X-ray electron beam writer (non-traditional, no masks) Two-dimensional pattern transfer: limited

More information

Major Fabrication Steps in MOS Process Flow

Major Fabrication Steps in MOS Process Flow Major Fabrication Steps in MOS Process Flow UV light Mask oxygen Silicon dioxide photoresist exposed photoresist oxide Silicon substrate Oxidation (Field oxide) Photoresist Coating Mask-Wafer Alignment

More information

A Visual Indication of Environmental Humidity Using a Colour Changing Hologram Recorded in a Self-developing Photopolymer

A Visual Indication of Environmental Humidity Using a Colour Changing Hologram Recorded in a Self-developing Photopolymer Dublin Institute of Technology ARROW@DIT Articles Centre for Industrial and Engineering Optics 2008-01-23 A Visual Indication of Environmental Humidity Using a Colour Changing Hologram Recorded in a Self-developing

More information

Micropolarizer Array for Infrared Imaging Polarimetry

Micropolarizer Array for Infrared Imaging Polarimetry Brigham Young University BYU ScholarsArchive All Faculty Publications 1999-01-01 Micropolarizer Array for Infrared Imaging Polarimetry M. W. Jones Gregory P. Nordin nordin@byu.edu See next page for additional

More information

Chapter Ray and Wave Optics

Chapter Ray and Wave Optics 109 Chapter Ray and Wave Optics 1. An astronomical telescope has a large aperture to [2002] reduce spherical aberration have high resolution increase span of observation have low dispersion. 2. If two

More information

Physics 197 Lab 8: Interference

Physics 197 Lab 8: Interference Physics 197 Lab 8: Interference Equipment: Item Part # per Team # of Teams Bottle of Bubble Solution with dipper 1 8 8 Wine Glass 1 8 8 Straw 1 8 8 Optics Bench PASCO OS-8518 1 8 8 Red Diode Laser and

More information

Multiple wavelength resonant grating filters at oblique incidence with broad angular acceptance

Multiple wavelength resonant grating filters at oblique incidence with broad angular acceptance Multiple wavelength resonant grating filters at oblique incidence with broad angular acceptance Andrew B. Greenwell, Sakoolkan Boonruang, M.G. Moharam College of Optics and Photonics - CREOL, University

More information

Department of Astronomy, Graduate School of Science, the University of Tokyo, Hongo, Bunkyo-ku, Tokyo , Japan;

Department of Astronomy, Graduate School of Science, the University of Tokyo, Hongo, Bunkyo-ku, Tokyo , Japan; Verification of the controllability of refractive index by subwavelength structure fabricated by photolithography: toward single-material mid- and far-infrared multilayer filters Hironobu Makitsubo* a,b,

More information

Silver halide sensitized gelatin derived from BB-640 holographic emulsion

Silver halide sensitized gelatin derived from BB-640 holographic emulsion Silver halide sensitized gelatin derived from BB-640 holographic emulsion Cristian Neipp, Inmaculada Pascual, and Augusto Beléndez Silver halide sensitized gelatin SHSG is one of the most interesting techniques

More information

Fabrication of micro structures on curve surface by X-ray lithography

Fabrication of micro structures on curve surface by X-ray lithography Fabrication of micro structures on curve surface by X-ray lithography Yigui Li 1, Susumu Sugiyama 2 Abstract We demonstrate experimentally the x-ray lithography techniques to fabricate micro structures

More information

Photolithography II ( Part 2 )

Photolithography II ( Part 2 ) 1 Photolithography II ( Part 2 ) Chapter 14 : Semiconductor Manufacturing Technology by M. Quirk & J. Serda Saroj Kumar Patra, Department of Electronics and Telecommunication, Norwegian University of Science

More information

Pulsed Laser Ablation of Polymers for Display Applications

Pulsed Laser Ablation of Polymers for Display Applications Pulsed Laser Ablation of Polymers for Display Applications James E.A Pedder 1, Andrew S. Holmes 2, Heather J. Booth 1 1 Oerlikon Optics UK Ltd, Oxford Industrial Estate, Yarnton, Oxford, OX5 1QU, UK 2

More information

Development of a Thin Double-sided Sensor Film EXCLEAR for Touch Panels via Silver Halide Photographic Technology

Development of a Thin Double-sided Sensor Film EXCLEAR for Touch Panels via Silver Halide Photographic Technology Development of a Thin Double-sided Sensor Film EXCLEAR for Touch Panels via Silver Halide Photographic Technology Akira ICHIKI* Yuichi SHIRASAKI* Tadashi ITO** Tadahiro SORORI*** and Tadahiro KEGASAWA****

More information

Superimposed surface-relief diffraction grating holographic lenses on azo-polymer films

Superimposed surface-relief diffraction grating holographic lenses on azo-polymer films Superimposed surface-relief diffraction grating holographic lenses on azo-polymer films Ribal Georges Sabat * Department of Physics, Royal Military College of Canada, PO Box 17000 STN Forces, Kingston,

More information

University of New Orleans. Jian Liu. Rasheed M.A. Azzam University of New Orleans,

University of New Orleans. Jian Liu. Rasheed M.A. Azzam University of New Orleans, University of New Orleans ScholarWorks@UNO Electrical Engineering Faculty Publications Department of Electrical Engineering 10-1-1996 Infrared quarter-wave reflection retarders designed with high-spatial-frequency

More information

Photolithography I ( Part 1 )

Photolithography I ( Part 1 ) 1 Photolithography I ( Part 1 ) Chapter 13 : Semiconductor Manufacturing Technology by M. Quirk & J. Serda Bjørn-Ove Fimland, Department of Electronics and Telecommunication, Norwegian University of Science

More information

Planar micro-optic solar concentration. Jason H. Karp

Planar micro-optic solar concentration. Jason H. Karp Planar micro-optic solar concentration Jason H. Karp Eric J. Tremblay, Katherine A. Baker and Joseph E. Ford Photonics Systems Integration Lab University of California San Diego Jacobs School of Engineering

More information

Physics 431 Final Exam Examples (3:00-5:00 pm 12/16/2009) TIME ALLOTTED: 120 MINUTES Name: Signature:

Physics 431 Final Exam Examples (3:00-5:00 pm 12/16/2009) TIME ALLOTTED: 120 MINUTES Name: Signature: Physics 431 Final Exam Examples (3:00-5:00 pm 12/16/2009) TIME ALLOTTED: 120 MINUTES Name: PID: Signature: CLOSED BOOK. TWO 8 1/2 X 11 SHEET OF NOTES (double sided is allowed), AND SCIENTIFIC POCKET CALCULATOR

More information

Basics of Holography

Basics of Holography Basics of Holography Basics of Holography is an introduction to the subject written by a leading worker in the field. The first part of the book covers the theory of holographic imaging, the characteristics

More information

Silicon photonic devices based on binary blazed gratings

Silicon photonic devices based on binary blazed gratings Silicon photonic devices based on binary blazed gratings Zhiping Zhou Li Yu Optical Engineering 52(9), 091708 (September 2013) Silicon photonic devices based on binary blazed gratings Zhiping Zhou Li Yu

More information

Supplementary Information for. Surface Waves. Angelo Angelini, Elsie Barakat, Peter Munzert, Luca Boarino, Natascia De Leo,

Supplementary Information for. Surface Waves. Angelo Angelini, Elsie Barakat, Peter Munzert, Luca Boarino, Natascia De Leo, Supplementary Information for Focusing and Extraction of Light mediated by Bloch Surface Waves Angelo Angelini, Elsie Barakat, Peter Munzert, Luca Boarino, Natascia De Leo, Emanuele Enrico, Fabrizio Giorgis,

More information

Investigation of Photopolymer-based Holographic Optical Elements for Solar Applications

Investigation of Photopolymer-based Holographic Optical Elements for Solar Applications Dublin Institute of Technology ARROW@DIT Doctoral Science 2015-11 Investigation of Photopolymer-based Holographic Optical Elements for Solar Applications Hoda Akbari Dublin Institute of Technology Follow

More information

Diffraction, Fourier Optics and Imaging

Diffraction, Fourier Optics and Imaging 1 Diffraction, Fourier Optics and Imaging 1.1 INTRODUCTION When wave fields pass through obstacles, their behavior cannot be simply described in terms of rays. For example, when a plane wave passes through

More information

New Waveguide Fabrication Techniques for Next-generation PLCs

New Waveguide Fabrication Techniques for Next-generation PLCs New Waveguide Fabrication Techniques for Next-generation PLCs Masaki Kohtoku, Toshimi Kominato, Yusuke Nasu, and Tomohiro Shibata Abstract New waveguide fabrication techniques will be needed to make highly

More information

Achievement of Arbitrary Bandwidth of a Narrow Bandpass Filter

Achievement of Arbitrary Bandwidth of a Narrow Bandpass Filter Achievement of Arbitrary Bandwidth of a Narrow Bandpass Filter Cheng-Chung ee, Sheng-ui Chen, Chien-Cheng Kuo and Ching-Yi Wei 2 Department of Optics and Photonics/ Thin Film Technology Center, National

More information

Synthesis of projection lithography for low k1 via interferometry

Synthesis of projection lithography for low k1 via interferometry Synthesis of projection lithography for low k1 via interferometry Frank Cropanese *, Anatoly Bourov, Yongfa Fan, Andrew Estroff, Lena Zavyalova, Bruce W. Smith Center for Nanolithography Research, Rochester

More information

i- Line Photoresist Development: Replacement Evaluation of OiR

i- Line Photoresist Development: Replacement Evaluation of OiR i- Line Photoresist Development: Replacement Evaluation of OiR 906-12 Nishtha Bhatia High School Intern 31 July 2014 The Marvell Nanofabrication Laboratory s current i-line photoresist, OiR 897-10i, has

More information

Study of the stability in holographic reflection gratings recorded in PVA/AA based photopolymer

Study of the stability in holographic reflection gratings recorded in PVA/AA based photopolymer Study of the stability in holographic reflection gratings recorded in PVA/AA based photopolymer Elena Fernández 1,3*, Rosa Fuentes 1,3, Manuel Ortuño 2,3, Andres Marquez 2,3, Augusto Beléndez 2,3 and Inmaculada

More information

Femtosecond laser microfabrication in. Prof. Dr. Cleber R. Mendonca

Femtosecond laser microfabrication in. Prof. Dr. Cleber R. Mendonca Femtosecond laser microfabrication in polymers Prof. Dr. Cleber R. Mendonca laser microfabrication focus laser beam on material s surface laser microfabrication laser microfabrication laser microfabrication

More information

Fabrication of suspended micro-structures using diffsuser lithography on negative photoresist

Fabrication of suspended micro-structures using diffsuser lithography on negative photoresist Journal of Mechanical Science and Technology 22 (2008) 1765~1771 Journal of Mechanical Science and Technology www.springerlink.com/content/1738-494x DOI 10.1007/s12206-008-0601-8 Fabrication of suspended

More information

Silicon Photonic Device Based on Bragg Grating Waveguide

Silicon Photonic Device Based on Bragg Grating Waveguide Silicon Photonic Device Based on Bragg Grating Waveguide Hwee-Gee Teo, 1 Ming-Bin Yu, 1 Guo-Qiang Lo, 1 Kazuhiro Goi, 2 Ken Sakuma, 2 Kensuke Ogawa, 2 Ning Guan, 2 and Yong-Tsong Tan 2 Silicon photonics

More information

Chapter 3 Fabrication

Chapter 3 Fabrication Chapter 3 Fabrication The total structure of MO pick-up contains four parts: 1. A sub-micro aperture underneath the SIL The sub-micro aperture is used to limit the final spot size from 300nm to 600nm for

More information

ABSTRACT 1. INTRODUCTION

ABSTRACT 1. INTRODUCTION Reflectance Fabry-Perot modulator utilizing electro-optic ZnO thin film Vikash Gulia* and Sanjeev Kumar Department of Physics and Astrophysics, University of Delhi, Delhi-117, India. *E-mail: vikasgulia222@rediffmail.com

More information

Dublin Institute of Technology. Vincent Toal Dublin Institute of Technology,

Dublin Institute of Technology. Vincent Toal Dublin Institute of Technology, Dublin Institute of Technology ARROW@DIT Articles School of Physics 2011 Comment on C.E. Close, M.R. Gleeson and J.T. Sheridan "Monomer Diffusion Rates in Photopolymer Material Part 1. Low Spatial Frequency

More information

Wavelength-controlled hologram-waveguide modules for continuous beam-scanning in a phased-array antenna system

Wavelength-controlled hologram-waveguide modules for continuous beam-scanning in a phased-array antenna system Waveleng-controlled hologram-waveguide modules for continuous beam-scanning in a phased-array antenna system Zhong Shi, Yongqiang Jiang, Brie Howley, Yihong Chen, Ray T. Chen Microelectronics Research

More information

KrF EXCIMER LASER LITHOGRAPHY TECHNOLOGY FOR 64MDRAM

KrF EXCIMER LASER LITHOGRAPHY TECHNOLOGY FOR 64MDRAM Journa' of Photopolymer Science and Technology Volume 4, Number 3 (1991) 361-369 KrF EXCIMER LASER LITHOGRAPHY TECHNOLOGY FOR 64MDRAM MASAYUKI ENDO, YOSHIYUKI TAM, TOSHIKI YABU, SHOZO OKADA MASARU SASAGO

More information

Bandpass Interference Filters

Bandpass Interference Filters Precise control of center wavelength and bandpass shape Wide selection of stock wavelengths from 250 nm-1550 nm Selection of bandwidths Available in 1/2 and 1 sizes High peak transmission values Excellent

More information

Enameled Wire Having Polyimide-silica Hybrid Insulation Layer Prepared by Sol-gel Process

Enameled Wire Having Polyimide-silica Hybrid Insulation Layer Prepared by Sol-gel Process Journal of Photopolymer Science and Technology Volume 28, Number 2 (2015) 151 155 2015SPST Enameled Wire Having Polyimide-silica Hybrid Insulation Layer Prepared by Sol-gel Process Atsushi Morikawa 1,

More information

High Sensitivity Sensor Based on Porous Silicon Waveguide

High Sensitivity Sensor Based on Porous Silicon Waveguide Mater. Res. Soc. Symp. Proc. Vol. 934 2006 Materials Research Society 0934-I10-04 High Sensitivity Sensor Based on Porous Silicon Waveguide Guoguang Rong 1, Jarkko J. Saarinen 2, John E. Sipe 2, and Sharon

More information

attosnom I: Topography and Force Images NANOSCOPY APPLICATION NOTE M06 RELATED PRODUCTS G

attosnom I: Topography and Force Images NANOSCOPY APPLICATION NOTE M06 RELATED PRODUCTS G APPLICATION NOTE M06 attosnom I: Topography and Force Images Scanning near-field optical microscopy is the outstanding technique to simultaneously measure the topography and the optical contrast of a sample.

More information

Longitudinal mode selection in laser cavity by moiré volume Bragg grating

Longitudinal mode selection in laser cavity by moiré volume Bragg grating Longitudinal mode selection in laser cavity by moiré volume Bragg grating Daniel Ott* a, Vasile Rotar a, Julien Lumeau a, Sergiy Mokhov a, Ivan Divliansky a, Aleksandr Ryasnyanskiy b, Nikolai Vorobiev

More information

FINDINGS. REU Student: Philip Garcia Graduate Student Mentor: Anabil Chaudhuri Faculty Mentor: Steven R. J. Brueck. Figure 1

FINDINGS. REU Student: Philip Garcia Graduate Student Mentor: Anabil Chaudhuri Faculty Mentor: Steven R. J. Brueck. Figure 1 FINDINGS REU Student: Philip Garcia Graduate Student Mentor: Anabil Chaudhuri Faculty Mentor: Steven R. J. Brueck A. Results At the Center for High Tech Materials at the University of New Mexico, my work

More information

k λ NA Resolution of optical systems depends on the wavelength visible light λ = 500 nm Extreme ultra-violet and soft x-ray light λ = 1-50 nm

k λ NA Resolution of optical systems depends on the wavelength visible light λ = 500 nm Extreme ultra-violet and soft x-ray light λ = 1-50 nm Resolution of optical systems depends on the wavelength visible light λ = 500 nm Spatial Resolution = k λ NA EUV and SXR microscopy can potentially resolve full-field images with 10-100x smaller features

More information

Linewidth control by overexposure in laser lithography

Linewidth control by overexposure in laser lithography Optica Applicata, Vol. XXXVIII, No. 2, 2008 Linewidth control by overexposure in laser lithography LIANG YIYONG*, YANG GUOGUANG State Key Laboratory of Modern Optical Instruments, Zhejiang University,

More information

COS FUV Grating Holographic Recording Specification

COS FUV Grating Holographic Recording Specification COS FUV Grating Holographic Recording Specification Date: Document Number: Revision: Contract No.: NAS5-98043 CDRL No.: N/A Prepared By: E. Wilkinson 11-12-98 E. Wilkinson, COS Instrument Scientist, CU/CASA

More information

2. The Basic principle of optical fibre (Or) Working principle of optical fibre (or) Total internal reflection

2. The Basic principle of optical fibre (Or) Working principle of optical fibre (or) Total internal reflection Introduction Fibre optics deals with the light propagation through thin glass fibres. Fibre optics plays an important role in the field of communication to transmit voice, television and digital data signals

More information